• 한국결정성장학회:학술대회논문집
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• 한국결정성장학회 1996년도 The 9th KACG Technical Annual Meeting and the 3rd Korea-Japan EMGS (Electronic Materials Growth Symposium)
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• pp.75-87
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• 1996

This review is presented under the following headings: 1.Introduction 1.1 Brief review of the properties of AlN 1.2 Historical survey of work on ceramic and single crystal AlN 2.Thermochemical background 3.Crystal growth 4.Doping 5.Potential applications and future work The known properties of AlN which make it of interest for various are discussed briefly. The properties include chemical stability, crystal structure and lattice constants, refractive indices and other optical properties, dielectric constant, surface acoustic wave velocity and thermal conductivity. The history of work in single crystals, thin films and ceramics are outlined and the thermochemistry of AlN reviewed together with some of the relevant properties of aluminium and nitrogen; the problems encountered in growing crystals of AlN are shown to arise directly from these thermochemical relationships. Methods have been reported in the literature for growing AlN crystals from melts, solution and vapour and these methods are compared critically. It is proposed that the only practicable approach to the growth of AlN is by vapour phase methods. All vapour based procedures share the share the same problems: $.$the difficulty of preventing contamination by oxygen & carbon $.$the high bond energy of molecular nitrogen $.$the refractory nature of AlN (melting point~3073K at 100ats.) $.$the high reactivity of Al at high temperatures It is shown that the growth of epitactic layers and polycrystalline layers present additional problems: $.$chemical incompatibility of substrates $.$crystallographic mismatch of substrates $.$thermal mismatch of substrates The result of all these problems is that there is no good substrate material for the growth of AlN layers. Organometallic precursors which contain an Al-N bond have been used recently to deposit AlN layers but organometallic precursors gave the disadvantage of giving significant carbon contamination. Organometallic precursors which contain an Al-N bound have been used recently to deposit AlN layers but organometallic precursors have the disadvantage of giving significant carbon contamination. It is conclude that progress in the application of AlN to optical and electronic devices will be made only if considerable effort is devoted to the growth of larges, pure (and particularly, oxygen-free) crystals. Progress in applications of epi-layers and ceramic AlN would almost certainly be assisted also by the availability of more reliable data on the pure material. The essential features of any stategy for the growth of AlN from the vapour are outlined and discussed.

• 한국전기전자재료학회논문지
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• 제37권3호
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• pp.297-303
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• 2024

In this study, KTN heterolayer thin films were fabricated by alternately stacking films of K(Ta_0.70Nb_0.30)O₃ and K(Ta_0.55Nb_0.45)O₃ synthesized using the sol-gel method. The sintering temperature and time were 750℃ and 1 hour, respectively. All specimens exhibited a polycrystalline pseudo-cubic crystal structure, with a lattice constant of approximately 0.398 nm. The average grain size was around 130~150 nm, indicating relatively uniform sizes regardless of the number of coatings. The average thickness of a single-coated film was approximately 70 nm. The phase transition temperature of the KTN heterolayer films was found to be approximately 8~12℃. Moreover, the 6-coated KTN heterolayer film displayed an excellent dielectric constant of about 11,000. As the number of coatings increased, and consequently the film thickness, the remanent polarization increased, while the coercive field decreased. The 6-coated KTN heterolayer film exhibited a remanent polarization and coercive field of 11.4 μC/cm² and 69.3 kV/cm at room temperature, respectively. ΔT showed the highest value at a temperature slightly above the Curie temperature, and for the 6-coated KTN heterolayer film, the ΔT and ΔT/ΔE were approximately 1.93 K and 0.128×10^-6 K·m/V around 40℃, respectively.

• 한국전기전자재료학회논문지
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• 제37권4호
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• pp.433-438
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• 2024

Piezoelectric ceramics play an important role in various electronic applications. However, traditional ceramics are difficult to be used in some complicated structures, due to their low flexibility and high brittleness. To solve this problem, this study prepared and investigated ceramic/polymer composites that can utilize a good flexibility of polymers. Polyvinylidene fluoride-trifluoroethylene (PVDF-TrFE) and 0.77(Bi_1/2Na_1/2)TiO₃-0.23SrTiO₃ (BNST23) ceramics were selected to fabricate the composites. Ceramic/polymer composites were prepared using various volume fractions of BNST23 ceramics. The distribution of piezoceramic particles in BNST23/PVDF-TrFE composites was investigated using optical microscopy (OM) and scanning electron microscopy (SEM). The dielectric and piezoelectric properties of the composites were significantly influenced by the volume fraction of the piezoelectric ceramics. As a result, the highest piezoelectric constant (d₃₃) of 56 pC/N was obtained in a composites with 70% volume fraction of BNST23 ceramics. Accordingly, it is expected that BNST23/PVDF-TrFE composites can be applied to various sensor applications.

• 한국전기전자재료학회논문지
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• 제37권4호
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• pp.457-463
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• 2024

(Bi_1/2Na_1/2)TiO₃(BNT) piezoelectric ceramics are one of the promising materials that can replace Pb(Zr, Ti)O₃(PZT) piezoelectric ceramics due to the high electromechanical strain properties. However, it is still difficult to use practical applications because the required electric field for inducing electromechanical strain is relatively higher than that of PZT ceramics. To overcome this problem, it has been intensively studied on doping impurity or modifying other ABO₃ for BNT-based piezoelectric ceramics. Therefore, this study investigated the effects of La₂O₃ doping on the phase transition behavior and electromechanical strain properties in BNT-SrTiO₃ (BNT-ST) lead-free piezoelectric ceramics. In the case of the temperature-dependent dielectric properties, it was confirmed that a phase transition from ferroelectrics to relaxors is induced with increasing La₂O₃ content. As a result, the electromechanical strain properties of BNT-ST ceramics were improved. The highest S_max/E_max value corresponding to 300 pm/V was obtained at 2 mol% La₂O₃-dopped BNT-ST ceramics. Accordingly, this study successfully demonstrated that La₂O₃ doping is effective on the inducing phase transition from ferroelectrics to relaxors and the improving electromechanical strain properties of BNT-ST lead-free piezoelectric ceramics.

• 동굴
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• 제63호
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• pp.1-8
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• 2004

비자성이며 비전도성의 물리적 성질을 갖는 자연산 퀄쯔(quartz)와 제주도 삼방산 근처에서 채취한 화산 용암석 스코리아를 대상으로 자성화(magnetization) 처리를 하여 특성을 분석하였다. 마그네타이징(magnetizing) 처리를 위하여 강력한 기계화학적 분쇄 반응을 시켰으며, 분쇄 반응시 알코올계의 솔벤트를 반응용매로 사용하였다. 퀼쯔와 스코리아의 마그네타이징 처리에서 비중이 작은 스코리아와 비교적 비중이 큰 퀼쯔의 경우에서도 분쇄반응 후 분말이 수면 위에 떠있는 부유특성이 있음을 확인하였고, 친유성(oleophilic)으로 기름에 대한 흡착성이 우수함을 확인하였다. 실험과정에서 자연산 퀼쯔와 함께 스코리아를 바탕물질로 기계-화학적 반응(MCR) 기술로 고 분산성 흡착 반응에 의한 고분자 물질을 생성, 유도하여 퀼쯔-나노복합체(quartz nanocomposite)를 제조하였다. 부착성 융합복합물질의 특징으로부터 시그니토마그네틱스(Segnetomagnetics)로 분류되는 합성분말은 특히 유류성분에 대하여 높은 흡착성을 가지며, 강한 자기적 성질을 띄는 10～50 nm두께의 하나 또는 그 이상의 이질적 융합화합물 층이 석영이나 수정체의 표면에 형성되어 특유의 자기적, 전기적 성질을 나타냄이 확인되었다. 따라서 퀼쯔에 비하여 제주도를 비롯한 화산지역에 널리 분포되어있는 양질의 저렴한 화산암재 스코리아를 활용하여 자성화 양산체제를 갖춘다면, 최근에 빈발하고 있는 해양 선박사고를 비롯하여 내수면 선박사고 등으로 수면 상에 유출된 회수곤란성 저밀도 유류물질을 연속적으로 흡착, 제거할 수 있는 흡유성자기유류 회수용 기능성 재료로의 응용개발 가능성과 함께 유용한 산업용 기능성 신소재로의 활용성에서 환경복원용신기능성 신소재, 국민보건 향상과 건강산업 육성발전을 위한 건강용품 개발 및 목재 등의 식물성 유기재료의 자성화 처리를 위한 응용기술로의 활용가능성면에서도 기대되는 바가 크다.

• 전자공학회논문지
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• 제53권6호
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• pp.155-166
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• 2016

전자유도 가열시설에서 정밀하고 일정한 주파수 성분에 의해 가열물체에 발열을 유도하려면 LC공진회로 설계단계에서 출력 주파수에 대한 커패시터의 정전용량(C)과 워크코일의 유도계수(L) 설정이 중요하다. 하지만 고유의 발열계수를 가진 물체의 가열위치와 범위에 직접유도를 하는 워크코일은 고정적으로 설계되는 반면 커패시터는 가변되도록 설계되어야만 전체장비의 활용도가 높아진다. 본 논문에서는 $1000V_{MAX}$ 최대전압과 $200I_{MAX}$ 전류에서 최대 700kHz의 고주파 LC공진 출력이 되도록 커패시터 내부구성 원자재 선정 및 공정설계 단계까지 단일전극 용량별 샘플을 추출하였다. 그리고 정전용량 규격변화에 따라 주파수 변화특성과 출력 파라메타 결과를 바탕으로 HF-LC공진용 전도냉각 커패시터의 최적설계를 위한 관계를 증명하는 기초 실험결과를 제시하였다.

• E2M - 전기 전자와 첨단 소재
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• 제10권5호
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• pp.434-439
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• 1997

It this paper, the piezoelectric and electro-induced strain properties of (P $b_{1-}$2x/3/B $i_{x}$ )[N $i_{1}$3/N $b_{2}$3/)$_{0.4}$( $Ti_{0.6}$Z $r_{0.4}$)$_{0.6}$] $O_3$ceramics (x=0, 0.005, 0.02) were investigated with the substitution of B $i^{3+}$, and the feasibility of the application for bimorph actuator was evaluated by measuring the dynamic properties of the piezoelectric bimorph fabricated with above ceramics. Dielectric constant was enhanced with the increase of B $i^{3+}$ substitution, and appeared the maximum value of 5032 at x=0.01 composition. Increasing the substitution of B $i^{3+}$, the electromechanical coefficient( $k_{p}$ , $k_{31}$ ) was increased up to the substitution of 0.5 mol% B $i^{3+}$, showed the value of 0.656, 0.439, respectively. The piezoelectric constant( $d_{33}$ $d_{31}$ ) had the highest value of 344, 825 with the substitution of 0.5 mol% B $i^{3+}$. The strain, generated by 60 Hz AC electric field, had the largest value of 1200($\times$10$^{-6}$ $\Delta$1/1) in the composition with the substitution of 0.5 mol% B $i^{3+}$. The dynamic properties of the bimorph actuator, fabricated with the composition substitution of 0.5 mol% B $i^{3+}$, showed the largest value of 325 $\mu$m at $\pm$150 V square pulse. square pulse.are pulse..

• 한국전자파학회논문지
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• 제17권9호
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• pp.900-912
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• 2006

본 논문에서는 1.575 GHz에서 운용되는 미사일 탄두 탑재형 GPS 수신 안테나를 원형 패치 안테나 구조로 미사일 탄두부의 중간에 장착하였으며, 원형 링 구조의 단락 핀을 이용하여 패치면과 접지면을 연결하였다. 제안된 안테나는 이중 급전과 이중 급전점의 위상 차이를 이용하여 미사일 비행 축과 수직한 방향(H-면)에서 무지향성의 방사 특성을 갖도록 설계되었다. 유전체로 1.6 mm 높이의 $FR4(\varepsilon_r=4.6)$를 사용하였으며 무지향성 방사패턴은 원형 패치 직경 59.5 mm, 단락 핀 직경 14 mm일 때 최적화되었다. 또한 실제 미사일 형태를 갖도록 직경 100 mm, 길이 500 mm의 원통형 몸체를 탄두 하단부에 장착하였다. 이때 이중 급전점의 사이각과 이중 급전점의 위상을 변화시키면서 H-면에서의 방사 패턴의 변화를 측정하였으며 그 결과, 이중 급전점의 사이각과 이중 급전점의 위상 차이가 각각 $100^{\circ}$일 때 이득 -5.55 dBd, 최대/최소 방사 전력 레벨 차 3.98 dB를 갖는 무지향성에 가까운 방사 패턴 특성을 얻을 수 있었다.

• 한국재료학회지
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• 제20권11호
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• pp.606-610
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• 2010

Films consisting of a silicon quantum dot superlattice were fabricated by alternating deposition of silicon rich silicon nitride and $Si_3N_4$ layers using an rf magnetron co-sputtering system. In order to use the silicon quantum dot super lattice structure for third generation multi junction solar cell applications, it is important to control the dot size. Moreover, silicon quantum dots have to be in a regularly spaced array in the dielectric matrix material for in order to allow for effective carrier transport. In this study, therefore, we fabricated silicon quantum dot superlattice films under various conditions and investigated crystallization behavior of the silicon quantum dot super lattice structure. Fourier transform infrared spectroscopy (FTIR) spectra showed an increased intensity of the $840\;cm^{-1}$ peak with increasing annealing temperature due to the increase in the number of Si-N bonds. A more conspicuous characteristic of this process is the increased intensity of the $1100\;cm^{-1}$ peak. This peak was attributed to annealing induced reordering in the films that led to increased Si-$N_4$ bonding. X-ray photoelectron spectroscopy (XPS) analysis showed that peak position was shifted to higher bonding energy as silicon 2p bonding energy changed. This transition is related to the formation of silicon quantum dots. Transmission electron microscopy (TEM) and electron spin resonance (ESR) analysis also confirmed the formation of silicon quantum dots. This study revealed that post annealing at $1100^{\circ}C$ for at least one hour is necessary to precipitate the silicon quantum dots in the $SiN_x$ matrix.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.342-343
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• 2013

AlSb is a promising material for optical devices, particularly for high-frequency and nonlinear-optical applications. And AlSb offers significant potential for devices such as quantum-well lasers, laser diodes, and heterojunction bipolar transistors. In this work we study molecular beam epitaxy (MBE) growth of an unstrained AISb film on a GaAs substrate and identify the real-time monitoring capabilities of in situ spectroscopic ellipsometry (SE). The samples were fabricated on semi-insulating (0 0 1) GaAs substrates using MBE system. A rotating sample stage ensured uniform film growth. The substrate was first heated to $620^{\circ}C$ under As2 to remove surface oxides. A GaAs buffer layer approximately 200 nm- thick was then grown at $580^{\circ}C$. During the temperature changing process from $580^{\circ}C$ to $530^{\circ}C$, As2 flux is maintained with the shutter for Ga being closed and the reflection high-energy electron diffraction (RHEED) pattern remaining at ($2{\times}4$). Upon reaching the preset temperature of $530^{\circ}C$, As shutter was promptly closed with Sb shutter open, resulting in the change of RHEED pattern from ($2{\times}4$) to ($1{\times}3$). This was followed by the growth of AlSb while using a rotating-compensator SE with a charge-coupled-device (CCD) detector to obtain real-time SE spectra from 0.74 to 6.48 eV. Fig. 1 shows the real time measured SE spectra of AlSb on GaAs in growth process. In the Fig. 1 (a), a change of ellipsometric parameter ${\Delta}$ is observed. The ${\Delta}$ is the parameter which contains thickness information of the sample, and it changes in a periodic from 0 to 180o with growth. The significant change of ${\Delta}$ at~0.4 min means that the growth of AlSb on GaAs has been started. Fig. 1b shows the changes of dielectric function with time over the range 0.74~6.48 eV. These changes mean phase transition from pseudodielectric function of GaAs to AlSb at~0.44 min. Fig. 2 shows the observed RHEED patterns in the growth process. The observed RHEED pattern of GaAs is ($2{\times}4$), and the pattern changes into ($1{\times}3$) with starting the growth of AlSb. This means that the RHEED pattern is in agreement with the result of SE measurements. These data show the importance and sensitivity of SE for real-time monitoring for materials growth by MBE. We performed the real-time monitoring of AlSb growth by using SE measurements, and it is good agreement with the results of RHEED pattern. This fact proves the importance and the sensitivity of SE technique for the real-time monitoring of film growth by using ellipsometry. We believe that these results will be useful in a number of contexts including more accurate optical properties for high speed device engineering.