• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.7
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• pp.641-646
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• 2003

The dielectric carbon nitride thin films were deposited onto Si(100) substrate using a pulsed laser ablation of pure graphite target combined with a high voltage discharge plasma in the presence of a N$_2$ reactive gas. We calculated dielectric constant, $\varepsilon$$\_$s/, with a capacitance Schering bridge method. We investigated the influence of the laser ablation of graphite target and DC high voltage source for the plasma. The properties of the deposited carbon nitride thin films were influenced by the high voltage source during the film growth. Deposition rate of carbon nitride films were increased drastically with the increase of high voltage source. Infrared absorption clearly shows the existence of C=N bonds and C=N bonds. The carbon nitride thin films were observed crystalline phase confirmed by x-ray diffraction data.

• Journal of the Korean Society of Safety
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• v.11 no.1
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• pp.67-74
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• 1996

In order to investigate the effect and reliability coming up to properties of the matter due to the change of solid structure in dielectrics, the effect of dielectric characteristics for thermal treated LDPE film was made researches. Specimens of LDPE with thickness 100 [$\mu\textrm{m}$] were investigated into the change of solid structure by ageing. Thermal treated specimen were made, that were after applying heat at 100 [$^{\circ}C$] for 1 [hour] \circled1 air-cooled specimen slowly, \circled2 water-cooled specimen under the ,com temperature, \circled3 liquid nitrogen gas-cooled specimen rapidly. With specimen of thermal treated three types turn out and original, it was for dielectric characteristics to be experimented in the temperature range of 20~120 [$^{\circ}C$], frequency range of 30~1.5${\times}10^5/$[Hz], appling voltage from 300 to 1500[㎷]. Consequently, the degree of crystallinity was changed with 49~57 [%] according to the thermal treatment. In case of frequency, 100 [Hz], on the thermal dependance in dielectric characteristics, tan decreases due to cooling method.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.41-43
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• 2004

Dielectric thin films of $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ were deposited on $Pt(111)/Ti/SiO_2/Si$ substrates in situ by pulsed laser deposition(PLD) and annealed with different gases which are forming gas and oxygen gas, respectively. The diffusion of hydrogen into the ferroelectric film was caused by annealing process and resulted in the destruction of polarization. The dielectric properties of forming gas annealed PLT thin films, which are dielectric constant, ferroelectric characteristic, and leakage current characteristics, were degraded

• Proceedings of the KIEE Conference
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• 2001.11a
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• pp.124-127
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• 2001

In this study, the electrical properties of polymer thin film layered by spin-coating method was investigated, and this polymer is one of the polymer applied to insulation layer for display, this polymer has relatively high dielectric constant, hygroscopic property and easy to make thin film by spin-coating. That is, in this study use the polymer that is cyano acrylate terpolymer, and the MIM(Metal/Insulator/Metal) structures were fabricated to measure the electrical properties such as Voltage-Current characteristics and dielectric characteristics. Also the conductivity and dielectric constant has been calculated. As a result, the conductivity in room temperature was $0.85{\times}10^{-14}{\sim}1.35{\times}10^{-14}$[S/cm]. The fact that this polymer be acted as insulator can be supported by this result. The dielectric constant was calculated as $10.39{\sim}12.05$ higher than Dopont Inc., this make it possible to accumulate more charges in insulation layer under same condition.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.872-875
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• 2003

Carbon nitride($CN_x$) thin films were deposited on quartz substrates using reactive RF magnetron sputtering system at uarious deposition conditions and investigated dielectric characteristics. Samples for capacitance measurements were of the MIM(Metal-Insulator-Metal) type devices. Aluminum film electrodes were prepared by a vacuum thermal evaporation method before and after the deposition of carbon nitride films. Capacitances were measured by a FLUKE PM6306 RCL Meter at room temperature. Current-voltage(I-V) characteristics and resistivity were measured by a CATS CA-EDA semiconductor test and analyzer. The carbon nitride films showed ${\alpha}-C_3N_4$ and ${\beta}-C_3N_4$ etc. peaks through Raman and FTIR. Observed surface of film and side structure using SEM(Scanning Electron Microscope), and measured thickness of film by ${\alpha}-step$. We can find that the dielectric constant was the lowest value in 50% nitrogen ratio and the resistivity was the highest value in 70% nitrogen ratio.

• Proceedings of the KIEE Conference
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• 2005.11a
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• pp.15-17
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• 2005

In this study, tunable dielectric materials are important for resonator, variable capacitor, phased array antenna and other devices application. In this paper, Dielectric constant increased and tuning range increased with the increased of $BaSrTiO_3/Li_{2}CO_{3}$ content, which probably can be explained by the substitution of Ba3+, Li1+ on BaTiO3 lattice. The tunability and dielectric loss of the $BaSrTiO_2/Li_{2}CO_{3}$ thick film, sintered at $1150^{\circ}C$, were about 43 % and 0.234 at 10$\sim$15 MHz, respectively. In case of BaSrTi/MgO, Dielectric constant decreased and tenability increased with the added of $BaSrTiO_3/MgO$. The ferroelectrics properties were distinct when adding Li to BST ceramic thick film, and paraelectrics pattern was distinct when adding Mg.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.260-261
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• 2005

The heterolayered thick/thin structure consisting of $Pb(Zr_{0.52}Ti_{0.48})O_3$ and $BaTiO_3(BT)$ were fabricated by a sol-gel process. PZT powders, prepared by the sol-gel method, were mixed with an organic vehicle and the PZT thick films were fabricated by the screen printing techniques on alumina substrate with Pt electrodes. The microstructural and dielectric characteristics of the stacked heterolayered PZT/BT/PZT films were investigated by varying the number of coating $BaTiO_3$ layers. The existence of a $BaTiO_3$ layer between the PZT thick films of the tri-layer $Pb(Zr_xTi_{1-x})O_3/BaTiO_3/Pb(Zr_xTi_{1-x})O_3$thick/thin/thick film can greatly improve the leakage current properties of the PZT thick films. The average thickness of a PZT(5248)/$BaTiO_3$ heterolayered thick/thin film was 25$\mu$m. The relative dielectric constant and dielectric loss of the PZT(5248)/$BaTiO_3$-3 heterolayered thin film coated three times were 1087 and 1.00% at 1[MHz].

• Journal of Information Display
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• v.7 no.3
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• pp.27-30
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• 2006

This paper presents a comprehensive study on threshold voltage $(V_{th})$ control of organic thin-film transistors (OTFTs) with dual-gate structure. The fabrication of dual-gate pentacene OTFTs using plasma-enhanced atomic layer deposited (PEALD) 150 nm thick $Al_{2}O_{3}$ as a bottom gate dielectric and 300 nm thick parylene or PEALD 200 nm thick $Al_{2}O_{3}$ as both a top gate dielectric and a passivation layer was investigated. The $V_{th}$ of OTFT with 300 nm thick parylene as a top gate dielectric was changed from 4.7 V to 1.3 V and that with PEALD 200 nm thick $Al_{2}O_{3}$ as a top gate dielectric was changed from 1.95 V to -9.8 V when the voltage bias of top gate electrode was changed from -10 V to 10 V. The change of $V_{th}$ of OTFT with dual-gate structure was successfully investigated by an analysis of electrostatic potential.

• Proceedings of the KIEE Conference
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• 2005.07c
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• pp.2013-2015
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• 2005

In this paper, Effect of $BaSrTiO_3/Li_2CO_3$ on low temperature sintering and dielectric property of thick films has been investigated for variable capacitor on high frequency. The thick films were fabricated by the tape casting and then the structural and dielectric properties as a function of an addition composition ratio and sintering temperature were studied. For the thick film sintered at $1050^{\circ}C$, it was densified to 96% of $BaSrTiO_3$ theoretical density by the addition of 10 $wt{\cdot}%$ $BaSrTiO_3/Li_2CO_3$. Dielectric constant increased and Curie temperature lowered with the increased of $BaSrTiO_3/Li_2CO_3$ content, which probably can be explained by the substitution of $Ba^{3+},Li^{1+}$ on $RaTiO_3$ lattice. The tunability and dielectric loss of the $BaSrTiO_3/Li_2CO_3$ thick film, sintered at $1350^{\circ}C$, were about 26% and 0.234 at $10{\sim}15MHz$, respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.311-312
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• 2006

The dielectric Properties of add $Li_2CO_3$ to ($Ba_{0.6}Sr_{0.4})TiO_3$ powder in this research, made thick film by tape casting method and annealing at $970^{\circ}C$ for 2 hours each from the $O_2$, Ar and O2-plasma atmosphere were investigated. The dielectric Properties of Ar atmosphere was to higher with tunability. The dielectric constant was increased and Curie temperature was shifted to higher temperature with increasing of annealing temperature.