• Title/Summary/Keyword: Destruction and Removal Efficiency (DRE)

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A Study on Destruction Potential of Sulfur Hexafluoride (SF6) Using High Ionization Energy (고이온화에너지를 이용한 육불화황 (SF6) 분해가능성 연구)

  • Ryu, Jae-Yong;Kim, Jong-Bum;Choi, Chang-Yong;Lee, Sang-Joon;Kwak, Hee-Sung;Yun, Young-Min
    • Journal of Korean Society for Atmospheric Environment
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    • v.28 no.4
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    • pp.446-453
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    • 2012
  • Destruction and removal efficiency (DRE) of $SF_6$ was tested with varying degrees of ionization and initial concentrations of $SF_6$. The applied dose of ionization energy varied from 0 to 400 kGy. The initial concentration of $SF_6$ gas also varied from 1,000 ppm to 2,500 ppm. In order to assess the effect of a residence time on DRE (Destruction and Removal Efficiency, %), experiments were also conducted at different irradiation times of 3, 5, 10, 15, and 20 sec, respectively. The DRE of $SF_6$ increased with an increasing amount of dose and current. Regardless of initial concentration of $SF_6$, 90% level of DRE was achieved by applying over 10 mA of electrical current.

Evaluation Method on Destruction and Removal Efficiency of Perfluorocompounds from Semiconductor and Display Manufacturing

  • Lee, Jee-Yon;Lee, Jin-Bok;Moon, Dong-Min;Souk, Jun-Hyung;Lee, Seung-Yeon;Kim, Jin-Seog
    • Bulletin of the Korean Chemical Society
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    • v.28 no.8
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    • pp.1383-1388
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    • 2007
  • Recently, the semiconductor and display industries have tried to reduce the emissions of perfluorocompounds (PFCs) from the globally environmental regulation. Total amount of PFC emission can be calculated from the flow rate and the partial pressures of PFCs. For the precise measurement of PFC emission amount, the mass flow controlled helium gas was continuously injected into the equipment of which scrubber efficiency is being measured. The partial pressures of PFCs and helium were accurately measured using a mass spectrometer in each sample extracted from inlet and outlet of the scrubber system. The flow rates are calculated from the partial pressures of helium and also, PFC destruction and removal efficiency (DRE) of the scrubber is calculated from the partial pressure of PFC and the flow rate. Under this method, the relative expanded uncertainties of the flow rate and the partial pressures of PFCs are ± 2% (k = 2) in case the concentrations of NF3 and SF6 are as low as 100 μmol/mol.

A Study on Increase of Sulfur Hexafluoride(SF6) Destruction and Removal Efficiency by Conditioning Agent(H2) (수소첨가에 의한 육불화황(SF6) 분해효율 향상 기초연구)

  • Ryu, Jae-Yong;Kim, Jong-Bum;Choi, Chang-Yong;Jang, Seong-Ho;Lee, Sang-Joon
    • Journal of Environmental Science International
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    • v.21 no.9
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    • pp.1163-1169
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    • 2012
  • Destruction and removal efficiency (DRE) of $SF_6$ was tested with low degrees of ionization. The applied dose of ionization energy varied from 63.70 to 212.34 kGy. The initial concentration and flow rate of $SF_6$ gas were 1,000 ppm and 50L/min, respectively. In order to increase the DRE, injection of conditioning agent ($H_2$) were conducted. The DRE of $SF_6$ increased about 2 times with injection of $H_2$ gas.

Abatement of CF4 Using RF Plasma with Annular Shape Electrodes Operating at Low Pressure (환상형상 전극구조를 갖는 저압 RF plasma를 이용한 CF4 제거)

  • Lee, Jae-Ok;Hur, Min;Kim, Kwan-Tae;Lee, Dae-Hoon;Song, Young-Hoon;Lee, Sang-Yun;Noh, Myung-Keun
    • Journal of Korean Society for Atmospheric Environment
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    • v.26 no.6
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    • pp.690-696
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    • 2010
  • Abatement of perfluorocompounds (PFCs) used in semiconductor and display industries has received an attention due to the increasingly stricter regulation on their emission. In order to meet this circumstance, we have developed a radio frequency (RF) driven plasma reactor with multiple annular shaped electrodes, characterized by an easy installment between a processing chamber and a vacuum pump. Abatement experiment has been performed with respect to $CF_4$, a representative PFCs widely used in the plasma etching process, by varying the power, $CF_4$ and $O_2$ flow rates, $CF_4$ concentration, and pressure. The influence of these variables on the $CF_4$ abatement was analyzed and discussed in terms of the destruction & removal efficiency (DRE), measured with a Fourier transform infrared (FTIR) spectrometer. The results revealed that DRE was enhanced with the increase in the discharge power and pressure, but dropped with the $CF_4$ flow rate and concentration. The addition of small quantity of $O_2$ lead to the improvement of DRE, which, however, leveled off and then decreased with $O_2$ flow rate.

Destruction and Removal of PCBs in Waste Transformer Oil by a Chemical Dechlorination Process

  • Ryoo, Keon-Sang;Byun, Sang-Hyuk;Choi, Jong-Ha;Hong, Yong-Pyo;Ryu, Young-Tae;Song, Jae-Seol;Lee, Dong-Suk;Lee, Hwa-Sung
    • Bulletin of the Korean Chemical Society
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    • v.28 no.4
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    • pp.520-528
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    • 2007
  • A practical and efficient disposal of PCBs (polychlorinated biphenyls) in waste transformer oil by a chemical dechlorination process has been reported. The transformer oil containing commercial PCB mixtures (Aroclor 1242, 1254 and 1260) was treated by the required amounts of PEG 600 (polyethylene glycol 600), potassium hydroxide (KOH) and aluminum (Al), along with different reaction temperatures and times. The reaction of PEG with PCBs under basic condition produces arylpolyglycols, the products of nucleophilic aromatic substitution. The relative efficiencies of PCB treatment process were assessed in terms of destruction and removal efficiency (DRE, %). Under the experimental conditions of PEG600/KOH/Al/100 oC/2hr, average DRE of PCBs was approximately 78%, showing completely removal of PCBs containing 7-9 chlorines on two rings of biphenyl which appear later than PCB no. 183 (2,2',3,4,4',5',6-heptaCB) in retention time of GC/ECD. However, when increasing the reaction temperature and time to 150 oC and 240 min, average DRE of PCBs including the most toxic PCBs (PCB no. 77, 105, 118, 123 and 169) in PCB family reached 99.99% or better, with the exception of PCB no. 5 and 8 (2,3-diCB and 2,4'-diCB). In studying the reaction of PEG with PCBs, it confirmed that the process led to less chlorinated PCBs through a stepwise process with the successive elimination of chlorines. The process also permits complete recovery of treated transformer oil through simple segregating procedures.

Destruction of $NF_3$ Emitted from Semiconductor Process by Electron Beam Technology (전자빔 기술을 이용한 반도체 공정의 삼불화질소($NF_3$) 분해)

  • Ryu, Jae-Yong;Choi, Chang-Yong;Kim, Jong-Bum;Lee, Sang-Jun;Kim, Seung-Gon;Kwak, Hee-Sung;Yun, Young-Min
    • Journal of Korean Society of Environmental Engineers
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    • v.34 no.6
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    • pp.391-396
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    • 2012
  • The destruction study of $NF_3$ gas emitted from the semiconductor industry is performed with electron-beam technology. Absorbed dose (kGy) and current ranged from 0 (0) to 400 kGy (20 mA). The concentration of $NF_3$ gas ranged from 500 to 2,000 ppm. In order to assess the effect of a residence time on DRE (Destruction and Removal Efficiency, %), experiments also conducted at different irridiation times of 5 sec, 10 sec, 15 sec and 20 sec respectively. As absorbed dose and current increased, DRE of $NF_3$ was also increased. However, DRE (%) of $NF_3$ decreased with increasing the concentration of $NF_3$ gas. The DRE of $NF_3$ was about 90% at an absorbed dose of 400 kGy.

A Numerical Simulation of Hazardous Waste Destruction in a Dump Incinerator (덤프 소각기에서 유해폐기물 분해에 대한 수치해석)

  • 전영남;정오진;채종성
    • Journal of Korean Society for Atmospheric Environment
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    • v.16 no.6
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    • pp.665-674
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    • 2000
  • A major source of the hazardous waste generated is from chemical industries producing plastics, herbicides, pesticides and chlorinated solvents. All of these processes produce a class if hazardous waste termed the chlorinated hydrocarbons(CHCs), either directly or from undesirable side reactions. In this study, we investigated the destruction characteristics of hazardous waste through incineration. A nonequilibrium combustion model was used to describe the effect of the chemical kinetics due to the flame inhibition characteristics of $CCl_4$ which was used as the surrogate of hazardous waste. A parametric screening studies was made in a dump incinerator proposed in this study. The dump incinerator showed high $CCl_4$ DRE(Destruction and Removal Efficiency) as 5 nines. $CCl_4$/CH$_4$ ratio appeared to be most important in the destruction of $CCl_4$ through incineration.

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Adsorption of Specific Organics in Water on GAC and Regeneration of GAC by Countercurrent Oxidative Reaction

  • Ryoo, Keon-Sang;Kim, Tae-Dong;Kim, Yoo-Hang
    • Bulletin of the Korean Chemical Society
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    • v.23 no.6
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    • pp.817-824
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    • 2002
  • Granular activated carbon(GAC) is highly effective in removing organic compounds which are resistant to biological disintegration in wastewater treatment. However, GAC has reached its full adsorptive capacity, GAC needs to be regenerated before it can be used for a further adsorption cycle. Countercurrent oxidative reaction (COR) technique has been developed and evaluated for the regeneration of spent GAC. Various parameters such as flame temperature, the loss of carbon, destruction and removal efficiency (DRE) of organic compounds, surface area, surface structure, adsorptive capacity, etc. were examined to determine the performance of COR. The results of these tests showed that adosorptive capacity of regenerated GAC was completely recovered, the loss of carbon was controllable, flame temperature was high enough to insure complete destruction and removal $(\geq99.9999%)$ of specific organics of interest, polychlorinated biphenyls (PCBs), that are thermally stable, and on formation of toxic byproducts such as polychlorinated dibenzo-p-dioxins (PCDDs) or polychlorinated dibenzofurans (PCDFs) were detected during the regeneration process. The COR technique is environmentally benign, easy to use and less copital intensive than other available regeneration technologies.

The progress in NF3 destruction efficiencies of electrically heated scrubbers (전기가열방식 스크러버의 NF3 제거 효율)

  • Moon, Dong Min;Lee, Jin Bok;Lee, Jee-Yon;Kim, Dong Hyun;Lee, Suk Hyun;Lee, Myung Gyu;Kim, Jin Seog
    • Analytical Science and Technology
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    • v.19 no.6
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    • pp.535-543
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    • 2006
  • Being used widely in semiconductor and display manufacturing, $NF_3$ is internationally considered as one of the regulated compounds in emission. Numerous companies have been continuously trying to reduce the emissions of $NF_3$ to comply with the global environmental regulation. This work is made to report the destruction and removal efficiency (DRE) of electrically heated scrubbers and the use rate in process chambers installed in three main LCD manufacturing companies in Korea. As the measurement techniques for $NF_3$ emission, mass flow controlled helium gas was continuously supplied into the equipment by which scrubber efficiency is being measured. The partial pressures of $NF_3$ and helium were accurately measured for each sample using a mass spectrometer, as it is emitted from inlet and outlet of the scrubber system. The results show that the DRE value for electrically heated scrubbers installed before 2004 is less than 52 %, while that for the new scrubbers modified based on measurement by scrubber manufacturer has been sigificentely improved upto more than 95 %. In additon, we have confirmed the efficiency depends on such variables as the inlet gas flow rate, water content, heater temperature, and preventative management period. The use rates of $NF_3$ in process chambers were also affected by the process type. The use rate of radio frequency source chambers, built in the $1^{st}$ and $2^{nd}$ generation process lines, was determined to be less than 75 %. In addition, that of remote plasma source chambers for the $3^{rd}$ generation was measured to be aboove 95 %. Therefore, the combined application of improved scrubber and the RPSC process chamber to the semiconductor and display process can reduce $NF_3$ emmision by 99.95 %. It is optimistic that the mission for the reduction of greenhouse gas emission can be realized in these LCD manufacturing companies in Korea.

THERMAL PLASMA DECOMPOSITION OF FLUORINATED GREENHOUSE GASES

  • Choi, Soo-Seok;Park, Dong-Wha;Watanabe, Takyuki
    • Nuclear Engineering and Technology
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    • v.44 no.1
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    • pp.21-32
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    • 2012
  • Fluorinated compounds mainly used in the semiconductor industry are potent greenhouse gases. Recently, thermal plasma gas scrubbers have been gradually replacing conventional burn-wet type gas scrubbers which are based on the combustion of fossil fuels because high conversion efficiency and control of byproduct generation are achievable in chemically reactive high temperature thermal plasma. Chemical equilibrium composition at high temperature and numerical analysis on a complex thermal flow in the thermal plasma decomposition system are used to predict the process of thermal decomposition of fluorinated gas. In order to increase economic feasibility of the thermal plasma decomposition process, increase of thermal efficiency of the plasma torch and enhancement of gas mixing between the thermal plasma jet and waste gas are discussed. In addition, noble thermal plasma systems to be applied in the thermal plasma gas treatment are introduced in the present paper.