• Title/Summary/Keyword: Deposition property

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Formation of Alumian gradient coatings by Ion Beam Assistant Deposition

  • Xue-Jianming
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.118-122
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    • 1998
  • $Al_2O_x$(0$Al_2O_3$ gradient coatings were formed by evaporating pure aluminium(99.9%) in $O_2$ environment with an IBAD facility, 12keV $Ar^+$ was used to irradiate the coatings simultaneously during the deposition. Sample's composition and depth profile were analysed by RBS and AES measurement, and their microhardness and porosity property were also measured in the experiment. Results show that, the oxygen concentration in the deposited coatings has a nearly linear relationship with the inputting gas flow before $O_2$ partial pressure in the target chamber reaches $1.2\times10^{-3}$ mbar under which stoichiometric $Al_2O_3$ could be formed; and sample's microhardness and porosity property is affected significantly by the oxygen concentration in the coatings.

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Ambient Oxygen Effects on the Growth of ZnO Thin Films by Pulsed Laser Deposition

  • Park, Jae-Young;Kim, Sang-Sub
    • Korean Journal of Materials Research
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    • v.17 no.6
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    • pp.303-307
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    • 2007
  • ZnO thin films were prepared by pulsed laser deposition on amorphous fused silica substrates at different ambient $O_2$ pressures varying from 0.5 to 500 mTorr, to observe the effect of ambient gas on their crystalline structure, morphology and optical properties. Results of X-ray diffraction, scanning electron microscopy, atomic force microscopy and photoluminescence studies showed that crystallinity, surface features and optical properties of the films significantly depended on the oxygen background pressure during growth. A low oxygen pressure (0.5 mTorr) seems to be suitable for the growth of highly c-axis oriented and smoother films possessing a superior luminescent property. The films grown at the higher $O_2$ pressures (50-500 mTorr) were found to have many defects probably due to an excessive incorporation of oxygen into ZnO lattice. We speculate that the film crystallinity could be affected by the kinetics of atomic arrangement during deposition at the higher oxygen pressures.

Optimization of Plasma Spray Coating Parameters of Alumina Ceramic by Taguchi Experimental Method (실험계획법에 의한 알루미나 세라믹의 플라즈마 용사코팅 최적화)

  • 이형근;김대훈;윤충섭
    • Journal of Welding and Joining
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    • v.18 no.6
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    • pp.96-101
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    • 2000
  • Sintered alumina ceramic substrate has been used for the insulating substrate for thick Hybrid IC owing to its cheapness and good insulating properties. Some of thick HIC's are important to eliminate the heat emitted from the parts that are mounted on the ceramic substrate. Sintered ceramic substrate can not transfer and emit the heat efficiently. It's been tried to do plasma spray coating of alumina ceramic on the metal substrates that have a good heat emission property. The most important properties to commercialize this ceramic coated metal substrate are surface roughness and deposition efficiency. In this study, plasma spray coating parameters are optimized to minimize the surface roughness and to maximize the deposition efficiency using Taguchi experimental method. By this optimization, the deposition efficiency was greatly improved from 35% at the frist time to 75% finally.

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The Effect of Solution Agitation on the Electroless Cu Deposition Within Nano-patterns (용액 교반이 미세 패턴 내 무전해 구리 도금에 미치는 영향)

  • Lee, Joo-Yul;Kim, Man;Kim, Deok-Jin
    • Journal of the Korean institute of surface engineering
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    • v.41 no.1
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    • pp.23-27
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    • 2008
  • The effect of solution agitation on the copper electroless deposition process of ULSI (ultra large scale integration) interconnections was investigated by using physical, electrochemical and electrical techniques. It was found that proper solution agitation was effective to obtain superconformal copper configuration within the trenches of $130{\sim}80nm$ width. The transition of open potential during electroless deposition process showed that solution agitation induced compact structure of copper deposits by suppressing mass transfer of cuprous ions toward substrate. Also, the specific resistivity of copper layers was lowered by increasing agitation speed, which made the deposited copper particles smaller. Considering both copper deposit configuration and electric property, around 500 rpm of solution agitation was the most suitable for the homogeneous electroless copper filling within the ultra-fine patterns.

Characteristics of Laser Aided Direct Metal Powder Deposition Process for Nickel-based Superalloy

  • Zhang, Kai;Liu, Weijun;Shang, Xiaofeng
    • Proceedings of the Korean Powder Metallurgy Institute Conference
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    • 2006.09a
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    • pp.521-522
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    • 2006
  • Laser additive direct deposition of metals is a new rapid manufacturing technology, which combines with computer aided design, laser cladding and rapid prototyping. The advanced technology can build fully-dense metal components directly from CAD files with neither mould nor tool. Based on the theory of this technology, a promising rapid manufacturing system called "Laser Metal Deposition Shaping (LMDS)" is being developed significantly. The microstructure and mechanical properties of the LMDS-formed samples are tested and analyzed synthetically. As a result, significant processing flexibility with the LMDS system over conventional processing capabilities is recognized, with potentially lower production cost, higher quality components, and shorter lead time.

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