• 한국신재생에너지학회:학술대회논문집
• /
• 2010.06a
• /
• pp.58.2-58.2
• /
• 2010

This paper deals with the simulation of solid particle coating technology via supersonic nozzle in vacuum environment to devote as an aerosol-deposition device. In order to improve efficiencies of nozzle and coating process, effects of shockwave, nozzle geometry, and substrate location were studied computationally under a fixed chamber pressure of 0.01316 bar which is nearly vacuous. Shockwave is the important factor affect to entire flow because shockwave in the jet flow dissipates the kinetic energy of the flow in the supersonic condition. Results show that various nozzle geometries have significant effect on the supersonic flow and we know that the supersonic nozzle should be optimized to minimize the loss of the flow. Another parameter, the distance between substrate and nozzle tip, shows little effect in this study.

• Journal of the Korean institute of surface engineering
• /
• v.27 no.2
• /
• pp.65-73
• /
• 1994

Effects of deposition parameter on the ionic conductivity and structural change of the Lithium borosili-cate solid electrolyte films, prepared by rf sputtering using 7$LI_2O-3B_2O_3-1SiO_2$ single phase target and also a mosaic target enriched with $LI_2O$, were analyzed by measuring AC impedance and IR absorption spectra for the films. Thed solid electrolyte film deposited from the single phase target exhibited very low ionic conductivi-ty of $10^{-10}{\Omega}^{-1}cm{-1}$ at room temperature, a result of low $Li^+$ ion content(7.52 at%) in the film. The $Li^+$ con-ductivity for the films deposited from the mosaic target, however, significantly increased to $10^{-7}{\Omega}^{-1}cm{-1}$ due to both an increased $Li^+$content (14.75 at %) and a structural change of the films. The increased ionic conduc-tivity of the film appears to be associated with an easiness of ionic mobility by structural change of glassy film from a some close packed network structure to a open one. These structural changes of film were found to be closely related to the increase in the peak intensity at~$960cm^{-1}$ of IR absorption spectra for the glassy films. With increasing either argon pressure from 3 to 21 mtorr or rf power from 2 to 3 W/$cm^2$, the $Li^+$ conduc-tivity for the films significantly increased to an order of $10^{-6}{\Omega}^{-1}cm{-1}$ due to an increase in openness of film structure, as confirmed by both an increase in the IR absorption peak intensity at ~$960cm^{-1}$ and a resultant reduction of activation energy for mobility of $Li^+$ ion.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2002.07a
• /
• pp.383-386
• /
• 2002

Polycrystalline Cu(In,Ga)Se$_2$(CIGS) thin-films were grown by co-evaporation on a soda lime glass substrate. In this paper the effects of the Se evaporation temperature on the properties of CuIn0.75Ga0.25Se2 (CIGS) thin films. Structure, surface morphology and optical properties of CIGS thin films deposited at various Se evaporation temperatures have been investigated using a number of analysis techniques. X-ray diffraction (XRD) analysis shows that CIGS films exhibit a strong <112> preferred orientation. As expected, at higher Se evaporation temperatures the films displayed a lower degree of crystallinity. The <112> peak was also enhanced and other CIGS peaks appeared simultaneously. These results were supported by experimental work using scanning electron microscopy When the Se evaporation temperature was increased, the average grain size also decreased together with a reduction Cu content. The Se evaporation temperature also had a significant inf1uence on the transmission spectra. Increasing the Se evaporation temperature, the cell efficiency was improved dramatically to 11.75% with Voc = 556 mV, Jsc = 32.17 mA/cm2 and FF = 0.66. The Se evaporation temperature is an important parameter in thin film deposition regardless of the deposition technique being used to deposit thin films

• Proceedings of the Korean Vacuum Society Conference
• /
• 2000.02a
• /
• pp.210-210
• /
• 2000

Vertically well aligned multi-wall carbon nanotubes (CNT) were grown on nickel coated glass substrates by plasma enhanced hot filament chemical vapor deposition at low temperatures below 600$^{\circ}C$. Acetylene and ammonia gas were used as the carbon source and a catalyst. Effects of growth parameters such as pre-treatment of substrate, plasma intensity, filament current, imput gas flow rate, gas composition, substrate temperature and different substrates on the growth characteristics of CNT were systematically investigated. Figure 1 shows SEM image of CNT grown on Ni coated glass substrate. Diameter of nanotube was 30 to 100nm depending on the growth condition. The diameter of CNT decreased and density of CNT increased as NH3 etching time etching time increased. Plasma intensity was found to be the most critical parameter to determine the growth of CNT. CNT was not grown at the plasma intensity lower than 500V. Growth of CNT without filament current was observed. Raman spectroscopy showed the C-C tangential stretching mode at 1592 cm1 as well as D line at 1366 cm-1. From the microanalysis using HRTEM, nickel cap was observed on the top of the grown CNT and very thin carbon amorphous layer of 5nm was found on the nickel cap. Current-voltage characteristics using STM showed about 34nA of current at the applied voltage of 1 volt. Electron emission from the vertically well aligned CNT was obtained using phosphor anode with onset electric field of 1.5C/um.

• Proceedings of the Korean Nuclear Society Conference
• /
• 1998.05b
• /
• pp.216-221
• /
• 1998

A study on induction plasma deposition with ceramic materials, yttria-stabilized-zirconia ZrO$_2$-Y$_2$O$_3$ (m.p 264O $^{\circ}C$), was conducted with a view developing a new method for nuclear fuel fabrication Before making dense pellets more than 96％TD., the spraying condition was optimized through the process parameters, such as chamber pressure, plasma plate power powder spraying distance, sheath gas composition, probe position, particle size and powders different morphology. The results with a 5mm thick deposit on rectangular planar graphite substrates showed a 97.11％ theoretical density when the sheath gas flow rate was Ar/H$_2$120/20 l/min, probe position 8cm, particle size -75 ${\mu}{\textrm}{m}$ and spraying distance 22cm by AMDRY146 powder. The degree of influence of the main effects on density were powder morphology. particle size, sheath gas composition, plate power and spraying distance, in that order. Among the two parameter interactions, the sheath gas composition and chamber pressure affects density greatly. By using the multi-pellets mold wheel type, the pellet density did not exceed 94%T.D., owing to the spraying angle.

• Journal of the Korean institute of surface engineering
• /
• v.36 no.1
• /
• pp.14-21
• /
• 2003

Thin films of ZrO$_2$ and TiO$_2$ were deposited on Si(100) substrates using RF magnetron sputtering technique. To study an influence of the sputtering parameters, systematic experiments were carried out in this work. XRD data show that the $ZrO_2$ films were mainly grown in the [111] orientation at the annealing temperature between 800 and $1000^{\circ}C$ while the crystal growth direction was changed to be [012] at above $1000^{\circ}C$. FT-IR spectra show that the oxygen stretching peaks become strong due to $SiO_2$ layer formation between film layers and silicon surface after annealing, and proved that a diffusion caused by either oxygen atoms of $ZrO_2$ layers or air into the interface during annealing. Different crystal growth directions were observed with the various deposition parameters such as annealing temperature, RF power magnitude, and added $O_2$ amounts. The growth rate of $TiO_2$ thin films was increased with RF power magnitude up to 150 watt, and was then decreased due to a sputtering effect. The maximum growth rate observed at 150 watt was 1500 nm/hr. Highly oriented, crack-free, stoichiometric polycrystalline $TiO_2$<110> thin film with Rutile phase was obtained after annealing at $1000^{\circ}C$ for 1 hour.

• Korean Journal of Materials Research
• /
• v.4 no.7
• /
• pp.783-791
• /
• 1994

Piezoelectric ZnO thin films were deposited on 7059 glass substrate by rf magnetron sputtering. The effects of deposition parameter, such as rf power, gas pressure and $O_{2}$/Ar gas ratio, on the crystallinity and electrical properties of the deposited ZnO thin films were studied. It was found that the deposition rate was higher than the previously reported values. ZnO films were suitable for SAW filter since a standard deviation of XRD (002) peak rocking curve was less than $6^{\circ}$. ZnO thin films, which were deposited at $O_{2}$/Ar ratio larger than 25%, showed high resistance. SAW filter was fabricated using ZnO film, of which thickness was 0.25 of the wavelength of the propatating surface acoustic wave. The measured frequency response was consistent with the calculated one. The SAW filter had center frequency 39.08 MHz, phase velocity 2501 m/sec and insertion loss 29 dB.

• Journal of Power System Engineering
• /
• v.16 no.2
• /
• pp.49-53
• /
• 2012

Thermal spray coatings developed by deposition of splats, it formed by impacting molten droplets on substrates during thermal spray process. In this study, the Ni-based coatings were fabricated by thermal spray process with two different process parameters, oxygen gas flow and acetylene gas flow, with three different levels of each parameters. The morphology of splats and microstructure were observed by optical microscope. Hardness test were performed on the Ni-based coatings. It was confirmed that process parameters of thermal spray process have effect in morphology of splats. These effects also have important implications on the deposit microstructure and properties of Ni-based coatings.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2001.04a
• /
• pp.483-486
• /
• 2001

Rapid Prototyping(RP) has been widely applied in designing and developing processes a new product. The functional requirements of a rapid prototyping system are high speed and high accuracy, and they depend on the operating parameters, some of which can be set by users. The accuracy is evaluated by dimensional errors and form errors of manufactured pars. A specially designed specimen with various features has been used for the accuracy evaluation. According to the Taguchi experimental design techniques, and orthogonal array of experiments has been set which has the least number of experimental runs to find the parametric effects. A laser scanner is used to obtain the point data of the parts and Surfacer is used to determine the lengths and angles. The conditions for the FDM manufacturing parametrs have been found.

• Journal of the Semiconductor & Display Technology
• /
• v.19 no.1
• /
• pp.55-60
• /
• 2020

This study designed High impedance filter to reduce RF loss to heater heating wire and increase RF current flowing to heater ground wire. Effects such as D / R improvement and process reproducibility could be seen. In addition, RF parameter distribution optimization was possible by understanding the RF path of PE-CVD equipment using Plasma and designing filter.