• Title/Summary/Keyword: Deposition characteristics

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Spreading and Deposition Characteristics of a Water Droplet Impacting on Hydrophobic Textured Surfaces (소수성 텍스쳐 표면에 충돌한 단일 액적의 퍼짐 및 고착 특성)

  • Lee, Jae-Bong;Moon, Joo-Hyun;Lee, Seong-Hyuk
    • Journal of ILASS-Korea
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    • v.17 no.1
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    • pp.14-19
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    • 2012
  • The present study conducts experimental investigation on spreading and deposition characteristics of a $4.3{\mu}l$ de-ionized (DI) water droplet impacting upon aluminum (Al 6061) flat and textured surfaces. The micro-textured surface consisted the micro-hole arrays (hole diameter: $125{\mu}m$, hole depth: $125{\mu}m$) fabricated by the conventional micro-computer numerical control (${\mu}$-CNC) milling machine process. We examined the surface effect of texture area fraction ${\varphi}_s$ ranging from 0 to 0.57 and impact velocity of droplet ranging from 0.40 m/s to 1.45 m/s on spreading and deposition characteristics from captured images. We used a high-speed camera to capture sequential images for investigate spreading characteristics and the image sensor to capture image of final equilibrium deposition droplet for analyze spreading diameter and contact angle. We found that the deposition droplet on textured surfaces have different wetting states. When the impact velocity is low, the non-wetting state partially exists, whereas over 0.64 m/s of impact velocity, totally wetting state is more prominent due to the increase kinetic energy of impinging droplet.

Investigation of Thermo-mechanical Characteristics for Remanufacturing of a ATC Part using a DED Process (DED 공정을 이용한 ATC 부품의 재제조를 위한 열-기계 특성 고찰)

  • K. K. Lee;D. G. Ahn
    • Transactions of Materials Processing
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    • v.33 no.4
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    • pp.277-284
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    • 2024
  • Interest in remanufacturing of part has significantly increased to reduce used material and energy together. The directed energy deposition (DED) process has widely applied to remanufacturing of the part. An excessive residual stress takes place in the vicinity of the deposited region by the DED process due to rapid heating and rapid cooling (RHRC) phenomenon. The excessive residual stress decreases the reliability of the remanufactured part. Therefore, thermo-mechanical analysis for the remanufacturing of the part is needed to investigate heat transfer and residual stress characteristics in the vicinity of the deposited region. The thermo-mechanical analysis of a large volume deposition is significantly difficult to perform due to the requirement of a long computation time and a large computer memory. The goal of this paper is to investigate thermo-mechanical characteristics for remanufacturing of the ATC part using a DED process. The methodology of the thermo-mechanical analysis for a large volume deposition is proposed. From the results of analysis, heat transfer and residual stress characteristics during deposition and cooling stages are investigated. In addition, the proper deposition strategy from the viewpoint of the residual stress is discussed.

A Study on the Deposition Characteristics of Ultrafine SiO2 Particles by Temperature Control in Deposition Zone (증착 구간에서의 온도 제어에 따른 SiO2 초미립자의 증착 특성 고찰)

  • You, Soo-Jong;Kim, Kyo-Seon
    • Journal of Industrial Technology
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    • v.16
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    • pp.157-168
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    • 1996
  • The deposition characteristics of ultrafine $SiO_2$ particles were investigated in a tube furnace reactor theoretically and experimentally controlling tube wall temperature in deposition zone. The model equations such as mass and energy balance equations and aerosol dynamic equations inside reactor and deposition tube were solved to predict the particle growth and deposition. The particle size and deposition efficiencies of $SiO_2$ particles were calculated, changing the process conditions such as tube furnace setting temperature, total gas flow rate inlet $SiCl_4$ concentration and were compared with the experimental results.

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Growth Characteristics of Thick $\textrm{SiO}_2$ Using $\textrm{O}_3$/TEOS APCVD ($\textrm{O}_3$/TEOS를 이용한 후막 $\textrm{SiO}_2$의 성장특성 연구)

  • Lee, U-Hyeong;Choe, Jin-Gyeong;Kim, Hyeon-Su;Yu, Ji-Beom
    • Korean Journal of Materials Research
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    • v.9 no.2
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    • pp.144-148
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    • 1999
  • We have studied the deposition characteristics of thick silicon dioxide film on Si substrate by $O_3$/TEOS APCVD(Atmospheric Pressure Chemical Vapor Deposition). The effect of deposition parameters such as the distance between showerhead and substrate, deposition temperature, TEOS flow rate and $O_3$/TEOS ratio on deposition rate, surface morphology, and properties of films as investigated. As deposition temperature increased, deposition rate decreased but the surface morphology and adhesion of film to substrate improved. As the distance between showerhead and substrate decreased, the deposition rate increased. Etching rate using the BOE increased as TEOS flow rate increased, but was independent of$ O_3$/TEOS ratio. Deposition rate of $5\mu\textrm{m}$/hour was obtained under the condition that the distance between showerhead and substrate was 5mm and the deposition temperature was $370^{\circ}C$.

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유기층 증착속도에 따른 OLEDs의 전기적, 광학적 특성

  • Lee Yeong-Hwan;Kim Gwi-Yeol;Hong Jin-Ung
    • Proceedings of the Korean Society Of Semiconductor Equipment Technology
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    • 2006.05a
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    • pp.135-138
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    • 2006
  • OLEDs are attractive because of possible application in display with low operating voltage, low power consumption, self-emission and capability of multicolor emission by the selection of emissive material. We investigated the effects of deposition rate on the electrical characteristics, physical characteristics and optical characteristics of OLEDs in the ITO(indium-tin-oxide)/N,N'-diphenyl-N,N'-bis(3-methyphenyl)-1,1'-biphenyl-4,4'-diamine(TPD)/tris(8-hydroxyquinoline)aluminum($Alq_3$)/Al device. We measured current density, luminous flux and luminance characteristics of devices with varying deposition rates of TPD and $Alq_3$. It has been found that optimal deposition rate of TPD and $Alq_3$ were respectively $1.5{\AA}/s$ from the device structure. An AFM measurement results, surface roughness of the deposited film was the lowest when deposition rate was $1.5{\AA}/s$.

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Electrophoretic Deposition for the Growth of Carbon nanofibers on Ni-Cu/C-fiber Textiles

  • Nam, Ki-Mok;Mees, Karina;Park, Ho-Seon;Willert-Porada, Monika;Lee, Chang-Seop
    • Bulletin of the Korean Chemical Society
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    • v.35 no.8
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    • pp.2431-2437
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    • 2014
  • In this study, Ni, Ni-Cu and Ni/Cu catalysts were deposited onto C-fiber textiles via the electrophoretic deposition method, and the growth characteristics of carbon nanofibers on the deposited catalyst/C-fiber textiles were investigated. The catalyst deposition onto C-fiber textiles was accomplished by immersing the C-fiber textiles into Ni or Ni-Cu mixed solutions, producing the substrate by post-deposition of Ni onto C-fiber textiles with pre-deposited Cu, and passing it through a gas mixture of $N_2$, $H_2$ and $C_2H_4$ at $700^{\circ}C$ to synthesize carbon nanofibers. For analysis of the characteristics of the synthesized carbon nanofibers and the deposition pattern of catalysts, SEM, EDS, BET, XRD, Raman and XPS analysis were conducted. It was found that the amount of catalyst deposited and the ratio of Ni deposition in the Ni-Cu mixed solution increased with an increasing voltage for electrophoretic deposition. In the case of post-deposition of Ni catalyst onto substrates with pre-deposited Cu, both bimetallic catalyst and carbon nanofibers with a high level of crystallizability were produced. Carbon nanofibers yielded with the catalyst prepared in Ni and Ni-Cu mixed solutions showed a Y-shaped morphology.

Deposition Characteristics and Mechanical Properties of Stainless Steel 316L Fabricated via Directed Energy Deposition (에너지 제어 용착을 이용한 스테인리스 316L의 적층 특성 및 기계적 물성 평가)

  • Yang, Seung-weon;Lee, Hyub;Shim, Do-Sik
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.20 no.6
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    • pp.59-69
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    • 2021
  • Directed energy deposition (DED) is an additive manufacturing technology involving a focused high-power laser or electron beam propagating over the substrate, resulting in melt pool formation while simultaneously supplying metal powder to the melt pool area to deposit the material. DED is performed to repair and strengthen parts in various applications, as it can be easily integrate local area cladding and cross-material deposition. In this study, we characterize stainless steel 316 L parts fabricated via DED based on various deposition conditions and geometries to widen the application of DED. The deposition characteristics are investigated by varying the laser power and powder feed rate. Multilayer deposition with a laser power of 362 W and a powder feed rate of 6.61 g/min indicate a height closest to the design value while affording high surface quality. The microhardness of the specimen increases from the top to the bottom of the deposited area. Tensile tests of specimens with two different deposition directions indicate that horizontally long specimens with respect to a substrate demonstrate a higher ultimate tensile strength and yield strength than vertically long specimens with lower elongation.

Numerical simulation of wet deposition flux by the deposition model (침적 모형에 의한 습성침적 플럭스 수치모의)

  • 이화운;문난경;임주연
    • Journal of Environmental Science International
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    • v.11 no.12
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    • pp.1235-1242
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    • 2002
  • The purpose of this study is to estimate wet deposition flux and to investigate wet deposition characteristics by using the ADOM model. Wet deposition flux of highly reactive $SO_2$ is estimated by applying observed meteorological parameters and concentrations of chemical species to the ADOM model. Wet deposition is largely dependent on large scale precipitation and cloud thickness. Wet deposition flux of sulfate depends on $SO_2$ oxidation in clouds. When large amount of $SO_2$ is converted to sulfate, deposition flux of sulfate increases, but wet deposition flux of $SO_2$ is small. On the whole, the pattern of sulfate wet deposition flux agrees with the typical pattern of sulfate wet deposition that is high in the summer(July) and low in the winter(January).

Preliminary Study on the Effects of Out-of-Plane Deposition Angle on Product Characteristics of a UV Photo-Curing Process (UV 광경화 공정에서 평면 외 적층 경사각에 따른 제품 특성 변화에 관한 기초 연구)

  • Jang, Yong-Hun;Ahn, Dong-Gyu;Song, Jae-Guk;Kim, Dong-In;Shin, Bo-Sung
    • Journal of the Korean Society for Precision Engineering
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    • v.34 no.1
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    • pp.65-72
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    • 2017
  • The goal of this paper is to investigate the effects of out-of-plane deposition angle on product characteristics of a UV photo-curing process. Specimens are manufactured from a commercialized UV photo-curing machine, the NOBEL V1.0. The influence of the out-of-plane deposition angle of the specimen on surface characteristics, including morphology of the sloped surface, pick-to-pick distance of convex region, and roughness of the sloped surface, is examined via the observation of the sloped surface. In addition, the influence of the radius of curvature of the specimen on the surface roughness of the sloped surface is evaluated. The effects of the out-of-plane deposition angle on impact strength of specimens are investigated via Izod impact experiments. Finally, we discuss the influence of the out-of-plane deposition angle on failure characteristics of specimens for impact loads.

Characteristics of Vanadium Oxide Grown by Atomic Layer Deposition for Hole Carrier Selective Contacts Si Solar Cells (실리콘 전하선택접합 태양전지 적용을 위한 원자층 증착법으로 증착된 VOx 박막의 특성)

  • Park, Jihye;Chang, Hyo Sik
    • Korean Journal of Materials Research
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    • v.30 no.12
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    • pp.660-665
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    • 2020
  • Silicon heterojunction solar cells can achieve high conversion efficiency with a simple structure. In this study, we investigate the passivation characteristics of VOx thin films as a hole-selective contact layer using ALD (atomic layer deposition). Passivation characteristics improve with iVoc (implied open-circuit voltage) of 662 mV and minority carrier lifetime of 73.9 µs after post-deposition annealing (PDA) at 100 ℃. The improved values are mainly attributed to a decrease in carbon during the VOx thin film process after PDA. However, once it is annealed at temperatures above 250 ℃ the properties are rapidly degraded. X-ray photoelectron spectroscopy is used to analyze the chemical states of the VOx thin film. As the annealing temperature increases, it shows more formation of SiOx at the interface increases. The ratio of V5+ to V4+, which is the oxidation states of vanadium oxide thin films, are 6:4 for both as-deposition and annealing at 100 ℃, and 5:5 for annealing at 300 ℃. The lower the carbon content of the ALD VOx film and the higher the V5+ ratio, the better the passivation characteristics.