• 제목/요약/키워드: Dense plasma

검색결과 205건 처리시간 0.028초

한국 성인에서 혈중 LDL 입자의 크기에 영향을 미치는 관련 인자 연구 (Plasma LDL Particle Sizes Affect the Blood Lipid Profile and Dietary Intakes among Korean Adults)

  • 서연경;김형숙;김정숙;김철호;최혜미
    • 대한지역사회영양학회지
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    • 제9권1호
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    • pp.58-65
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    • 2004
  • The purpose of this research was to examine the relationship between the plasma LDL particle size and blood lipid profile, dietary factors and anthropometric values (body mass index, waist circumference and waist/hip ratio). The subjects were 173 adults aged 23 to 81 years, selected from the Outpatient Clinic and Cardiovascular Department of the Seoul Municipal Hospital. Dietary data were obtained using a 3-day food record and analyzed using Korean and US nutrient databases. The subjects were divided into three groups by LDL particle size : type A (large buoyant LDL, > 25.5 nm, n=96), type I (Intermediate LDL,$25.2\leq-\leq25.5$ nm, n=18), and type B (small dense LDL, < 25.2 nm, n=59) groups. The type B group had higher age, waist circumference, and waist/hip ratio (WHR) than the type A and type I groups. Serum concentration of triglyceride, Apo B, LDL/HDL cholesterol ratio and atherogenic index were significantly higher in the type B group as compared to those in the other two groups. HDL cholesterol level and Apo A-I/Apo B ratio were significantly lower in the type B group than the other two groups. The plasma LDL particle size was highly correlated with triglyceride (r= -0.450), Apo B (r= -0.402) and HDL cholesterol (r= 0.418). However, there was no correlation between plasma LDL particle size and dietary intakes. This study showed that small dense LDL was an important biochemical risk factor that was associated with other risk factors.

저온 플라즈마 처리에 의한 전자파 차폐성 금속화 합성섬유의 계면 밀착성 개선 (Improvement of Interfacial Adhesion of Metal Plated Synthetic Fabrics for Electromagnetic Wave Shielding by Using Cold Plasma)

  • 천태일
    • 한국염색가공학회지
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    • 제10권2호
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    • pp.8-17
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    • 1998
  • In this study we have examined electroless chemical plating on the plasma grafted poly [ethylene terephathalate](PET) fabric in order to improve the interfacial adhesion between metal and fiber. The vapour phase of acrylic acid introduced on the PET surface and the graft polymerization was carried out by using cold plasma, resulting in the grafting yield of 0.8-1.3 wt%. The carboxyl group of the plasma grafted was identified by FT-IR-ATR spectra. The Interfacial adhesion was related to the carboxyl group. After electroless chemical plating of nickel, it showed that the more the carboxyl, the better the interfacial adhesion. Comparing to the untreated, the plasma grafted fabric showed fairly good interfacial adhesion(5B grade, ASTM D3359) . The shielding effect of electromagnetic wave showed 95dB. The shielding effect depends on the fabric structure, the surface structure, and the cross sectional shape of fibers. The dense fabric structure, the etched surface like a microcrater, and the trigonal cross sectional shape were prefered.

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STRUCTURAL ANALYSIS OF COPPER PHTHALOCYANINE THIN FILMS FABRICATED BY PLASMA-ACTIVATED EVAPORATION

  • Kim, Jun-Tae;Jang, Seong-Soo;Lee, Soon-Chil;Lee, Won-Jong
    • 한국표면공학회지
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    • 제29권6호
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    • pp.851-856
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    • 1996
  • Copper Phthalocyanine (CuPc) thin films were fabricated on the silicon wafers by plasma activated evaporation method and structural analysis were carried out with various spectroscopies. The CuPc films had dense and smooth morphology and they also showed good mechanical properties and chemical resistance. The main molecular structure of the CuPc, which is the conjugated aromatic heterocyclic ring structure, was maintained even in the plasma process. However, metal-ligand (Cu-N) bands were deformed by the plasma process and the structure became amorphous especially at higher process pressures. Oxygen impurities were incorporated in the film and carboxyl functional groups were formed at the peripheral benzene ring. The structure and morphology of the films were dependent on the process pressure but relatively irrespective of the RF power.

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펄스직류방전과 유도결합방전의 복합에 의한 SCM440강의 이온질화 (Ion Nitriding Using Pulsed D.C Glow Discharge Combined with Inductively Coupled Plasma)

  • 김윤기
    • 한국표면공학회지
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    • 제43권2호
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    • pp.91-96
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    • 2010
  • SCM440 steels were nitrided using pulsed dc plasma combined with inductively coupled plasma (ICP) generated by 13.56 MHz rf power in order to enhance case hardening depth. The case hardening depth was increased with rf power. The effective case-depth with ICP at 900 watt was as 1.6 times as that nitrided without ICP. The hardening depth was also increased up to 1.45 times. The compound layers formed on top surface were dense and thin when pulsed dc plasma was combined with ICP.

Topics on Power Photonics for High-Power Solid-state Laser

  • Nakatsuka, Masahiro
    • 한국광학회:학술대회논문집
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    • 한국광학회 2003년도 하계학술발표회
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    • pp.6-7
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    • 2003
  • The inertial fusion research at ILE, Osaka moves to the fast ignition scheme with using PW laser system to achieve hot core plasma of keV-temperature by heating additionally the dense plasma imploded by the multi-beam Gekko laser system. The solid-state lasers have been developed of the peak-power from TW to PW region with the chirped pulse amplification (CPA) and optical parametric amplification (OPA) technology. (omitted)

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O2 플라즈마로 처리한 폴리머 기판 위에 성장된 GZOB 박막의 특성 (The Characteristics of GZOB Thin Film on O2 Plasma Treated Polymer Substrate)

  • 유현규;이종환;이태용;허원영;이경천;신현창;송준태
    • 한국전기전자재료학회논문지
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    • 제22권8호
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    • pp.645-649
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    • 2009
  • We investigated the effects of a high density $O_2$ plasma treatment on the structural and electrical properties of Ga-, B- codoped ZnO (GZOB) films. The GZOB films were deposited on polymer substrate without substrate heating by DC magnetron sputtering. Prior to the GZOB film growth, we treated a polymer substrate with highly dense inductively coupled oxygen plasma. The optical transmittance of the GZOB film, about 80 %, was maintained regardless of the plasma pre-treatment. The resistivity of the GZOB film on PC substrate decreased from 9.08 ${\times}$ $10^{-3}$ ${\Omega}-cm$ without an $O_2$ plasma pre-treatment to 2.12 ${\times}$ $10^{-3}$ ${\Omega}-cm$ with an $O_2$ plasma pre-treatment. And PES substrate decreased from 1.14 ${\times}$ $10^{-2}$ ${\Omega}-cm$ without an $O_2$ plasma pre-treatment to 6.13 ${\times}$ $10^{-3}$ ${\Omega}-cm$ with an $O_2$ plasma pre-treatment.

Effect of HF and Plasma Treated Glass Surface on Vapor Phase-Polymerized Poly(3,4-ethylenedioxythiophene) Thin Film : Part I

  • Lee, Joonwoo;Kim, Sungsoo
    • 통합자연과학논문집
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    • 제6권4호
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    • pp.211-214
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    • 2013
  • In this study, in order to investigate how consecutive treatments of glass surface with HF acid and water vapor/Ar plasma affect the quality of 3-aminopropyltriethoxysilane self-assembled monolayer (APS-SAM), poly(3,4-ethylenedioxythiophene) (PEDOT) thin films were vapor phase-polymerized immediately after spin coating of FeCl3 and poly-urethane diol-mixed oxidant solution on the monolayer surfaces prepared at various treatment conditions. For the film characterization, various poweful tools were used, e.g., FE-SEM, an optical microscope, four point probe, and a contact angle analyzer. The characterization revealed that HF treatment is not desirable for the synthesis of a high quality PEDOT thin film via vapor phase polymerization method. Rather, sole treatment with plasma noticeably improved the quality of APS-SAM on glass surface. As a result, a highly dense and smooth PEDOT thin film was grown on uniform oxidant film-coated APS monolayer surface.

서스펜션 플라즈마 용사를 이용한 이트리아 안정화 지르코니아 (7.5 wt% Y2O3-ZrO2) 코팅 증착 및 특성 (Fabrication and Characteristics of Yttria-stabilized Zirconia (7.5 wt% Y2O3-ZrO2) Coating Deposited via Suspension Plasma Spray)

  • 이원준;권창섭;김성원;오윤석;김형태;임대순
    • 한국분말재료학회지
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    • 제20권6호
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    • pp.445-452
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    • 2013
  • Yttria-stabilized zirconia (YSZ) coatings are fabricated via suspension plasma spray (SPS) for thermal barrier applications. Three different suspension sets are prepared by using a planetary mill as well as ball mill in order to examine the effect of starting suspension on the phase evolution and the microstructure of SPS prepared coatings. In the case of planetary-milled commercial YSZ powder, a deposited thick coating turns out to have a dense, vertically-cracked microstructure. In addition, a dense YSZ coating with fully developed phase can be obtained via suspension plasma spray with suspension from planetary-milled mixture of $Y_2O_3$ and $ZrO_2$.

RF Plasma CVD법에 의해 증착된 카본나노튜브(CNT)의 특성에 대한 기판 온도의 영향 (The Effects of Substrate Temperature on Properties of Carbon Nanotube Films Deposited by RF Plasma CVD)

  • 김동선
    • Korean Chemical Engineering Research
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    • 제46권1호
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    • pp.50-55
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    • 2008
  • RF plasma CVD법을 이용하여 금속 촉매(Fe)가 증착된 $SiO_2$ 기판 위에 $H_2$$C_2H_2$의 혼합가스를 사용하여 증착된 탄소나노튜브(carbon nanotube, CNT)의 특성에 대한 기판의 온도의 영향을 조사하였다. $SiO_2$ 위에 철 촉매는 RF 마그네트론 스퍼터에 의해 만들어졌다. 고 순도의 나노튜브 박막을 얻기 위해서 기판 홀더 위에 접지된 그리드 메쉬 커버를 설치하였다. 증착된 CNT의 표면 미세구조 및 화학적 구조를 SEM, Raman, XPS, 그리고 TEM으로 측정하였다. 증착된 CNT 박막들은 대나무 같은 다중벽 구조를 가지는 탄소 파이버 형태였으며 $55^{\circ}C$에서 보다 $600^{\circ}C$에서 보다 더 치밀한 구조를 보이나 $650^{\circ}C$에서는 밀도가 다소 감소함을 알 수 있었다.

Measurement of EUV (Extreme Ultraviolet) and electron temperature in a hypocycloidal pinch device for EUV lithography

  • Lee, Sung-Hee;Hong, Young-June;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.108-108
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    • 2010
  • We have generated Ne-Xe plasma in dense plasma focus device with hypocycloidal pinch for extreme ultraviolet (EUV) lithography and investigated an electron temperature. We have applied an input voltage 4.5 kV to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ne-Xe(30%) gas in accordance with pressure. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium (LTE) conditions, the electron temperature of the hypocycloidal pinch plasma focus could be obtained by the optical emission spectroscopy (OES). The electron temperature has been measured by Boltzmann plot. The light intensity is proportion to the Bolzman factor. We have been measured the electron temperature by observation of relative Ne-Xe intensity. The EUV emission signal whose wavelength is about 6~16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD) and the line intensity has been detected by using a HR4000CG Composite-grating Spectrometer.

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