• Journal of Navigation and Port Research
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• v.28 no.10 s.96
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• pp.955-960
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• 2004

The treated ballast water from previous treatment contains microorganisms and pathogenic organisms in an electrolytic treatment system. The experimental methods included using a peristaltic flow pump placed upward on an electrode pole. Due to the reaction time, the hydraulic retention time indicated unlike microorganisms on the flow rate. In electrolysis, dioxide iridium-coated titanium (Ti/Ir02) and stainless steel plates were used for the anode and cathode, respectively. Current density controls make use of a DC power supply on 250V, 100Amper. Experimental use of a current density between 0.1 and 1.0A/dm2 was able to disinfect the microorganism (E. coli, Bacteria, Bacillus sp.) in seawater for 5 seconds of reaction time. The removal rate was approximately $90\%,$ while the current density was 2.0A/dm2 and the electrode distance was 75mm. This study shows that the electrolytic treatment system has a potential for the sterilization of ballast water.

• Journal of the Korean Vacuum Society
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• v.6 no.1
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• pp.85-90
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• 1997

A new ionized sputtering process was developed to fill small trench or via using additional ionizing mechanism of sputtered particles from 32cm $AlCu_x$(x=0.5%) cathode target with rotating magnet, then drawn toward substrate by small negative DC potential. The radial uniformity in RFI magnetron sputtering was studied by plasma diagnosis and appropriate RFI coil design to improve it. Optical emission intensities of excited species. $Ar^{\circ}, \;Ar^+;Al^+, \;Al^{\circ}$ are measured across the radial direction and showed close correlation with deposit's bottom to top thickness ratios in trenches and vias of submicron opening and 1.5 aspect ratio. After increase of the diameter of RF coil from 29 cm to 32 cm and improved the power leading feedthrough symmetry by removal of asymmetric single turn region, there was an increase of uniformity from 7.5% to 1.5% in bottom to top thickness ratio in 0.6 $\mu\textrm{m}$ vias.

• Korean Journal of Fisheries and Aquatic Sciences
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• v.38 no.6
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• pp.372-378
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• 2005

An analysis method of tetracyclines far fish and shellfish products containing large amount of low molecular materials and pigments was established. The recovery of the established analysis method for four tetracycline samples was $72-100\%$ and higher than other methods reported. Especially, proposed sample treatment protocol was shown to be effective for the removal of low molecular materials and pigments that tend to interfere with accurate analysis. The detection limit of oxytetracycline (OTC) and tetracycline (TC) from the sample was 0.02 ppm, and the detection limit of chlortetracycline (CTC) and doxycycline (DC) from the sample was 0.1ppm, To examine the efficiency of the established method and identify tetracycline usage in fish farms, tetracycline group antibiotics in the flounder being cultured was monitored. The improved method can be used for fish and shellfish products effectively and all surveyed fish farms have used tetracycline all the year round. The proposed method was adopted as official method for fishery products by Korean Food and Drug Administration in 2003 and it is being used by regulatory authority as National Fishery Products Quality Inspection Service.

• Journal of the East Asian Society of Dietary Life
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• v.15 no.6
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• pp.700-706
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• 2005

We are concerned about how to apply the theories of oriental medicine appropriately, which direction should it be taken, and how it should be developed. And it is believed to be essential for the government to make efforts to set a standard and laws to validate the medicinal effects and process of the assessment so that the systematic development can be encouraged, and to prepare guidance for the food development for national health improvement Ihis study was peformed to provide basic data that predict the usefulness of oriental medicinal herbs to remove the dampness through diuresis for excess syndrome obesity with oriental diet therapy cuisine(Yak-Sun). Five oriental medicininal herbs, Coix lachryma-jobi L, Atractylodes lancea DC., Ligusticum wallichii F., Angelica sinensis D., Zingiber officinale R. were collected and made into mixing extracts(OMCE). And we examined the effects of OMCE on body weight serum glucose, insulin and lipid profile improvement in rats fed high fat diets. Sprague-Dawley rae(230-250 g) were randomly divided into five groups : basal diet(normal diet control group, NCG), only high fat diet(High fat control group, HCG), high fat diet and supplemented with 25mg/100g body weight 50mg/100g body weight 75mg/100g body weight by OMCE(HLG, HMG, HHG). These experimental diets were fed for 6 weeks. The OME fed groups decreased more significantly in weight serum glucose insulin and lipids than the high fat control group did. These results imply that the OMCE can be used as a safe and clinically applicable ingredients for diet called Yaksun of excess syndrome obesity in human.

• KSTLE International Journal
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• v.6 no.2
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• pp.39-44
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• 2005

Friction and wear properties of the Boron carbide ($B_{4}C$) coating 100 nm thickness were studied under various relative humidity (RH). The boron carbide film was deposited on silicon substrate by DC magnetron sputtering method using $B_{4}C$ target with a mixture of Ar and methane ($CH_4$) as precursor gas. Friction tests were performed using a reciprocation type friction tester at ambient environment. Steel balls of 3 mm in diameter were used as counter-specimen. The results indicated that relative humidity strongly affected the tribological properties of boron carbide coating. Friction coefficient decreased from 0.42 to 0.09 as the relative humidity increased from $5\%$ to $85\%$. Confocal microscopy was used to observe worn surfaces of the coating and wear scars on steel balls after the tests. It showed that both the coating surface and the ball were significantly worn-out even though boron carbide is much harder than the steel. Moreover, at low humidity ($5\%$) the boron carbide showed poor wear resistance which resulted in the complete removal of coating layer, whereas at the medium and high humidity conditions, it was not. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) analyses were performed to characterize the chemical composition of the worn surfaces. We suggest that tribochemical reactions occurred during sliding in moisture air to form boric acid on the worn surface of the coating. The boric acid and the tribochemcal layer that formed on steel ball resulted in low friction and wear of boron carbide coating.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.105-105
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• 2009

$ZrO_2$ is one of the most attractive high dielectric constant (high-k) materials. As integrated circuit device dimensions continue to be scaled down, high-k materials have been studied more to resolve the problems for replacing the EY31conventional $SiO_2$. $ZrO_2$ has many favorable properties as a high dielectric constant (k= 20~25), wide band gap (5~7 eV) as well as a close thermal expansion coefficient with Si that results in good thermal stability of the $ZrO_2/Si$ structure. In order to get fine-line patterns, plasma etching has been studied more in the fabrication of ultra large-scale integrated circuits. The relation between the etch characteristics of high-k dielectric materials and plasma properties is required to be studied more to match standard processing procedure with low damaged removal process. Due to the easy control of ion energy and flux, low ownership and simple structure of the inductively coupled plasma (ICP), we chose it for high-density plasma in our study. And the $BCl_3$ included in the gas due to the effective extraction of oxygen in the form of $BCl_xO_y$ compound In this study, the surface kinetic properties of $ZrO_2$ thin film was investigated in function of Ch addition to $BCl_3/Ar$ gas mixture ratio, RF power and DC-bias power based on substrate temperature. The figure 1 showed the etch rate of $ZrO_2$ thin film as function of gas mixing ratio of $Cl_2/BCl_3/Ar$ dependent on temperature. The chemical state of film was investigated using x-ray photoelectron spectroscopy (XPS). The characteristics of the plasma were estimated using optical emission spectroscopy (OES). Auger electron spectroscopy (AES) was used for elemental analysis of etched surface.

• Proceedings of the KAIS Fall Conference
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• 2010.11a
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• pp.115-116
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• 2010

광역상수도의 경우 수자원공사 및 지방상수도 사업자들에 의해 전문적으로 수질을 관리하고 음용수를 보급하고 있으나 소규모 수도시설의 경우 전문능력을 갖춘 관리자가 아닌 마을의 대표자가 맡아 관리함에 따라 안정성 및 유지관리의 어려움이 자주 제기되고 있다.[1] 또한 소규모 수도시설의 경우 취수원으로 지하수나 계곡수를 이용하여 여과나 염소소독을 거쳐 음용수로 이용함에 따라 중금속 및 무기이온 등 각종 오염물질이 효과적으로 제거되지 않아 이를 사용하는 주민들이 불편함을 겪고 있는 실정이다. 환경부의 법정 수질 검사에 따르면 부적합 판정을 받은 곳의 대부분은 마을상수도와 소규모 급수시설인 것으로 나타났으며 초과 항목으로는 무기이온 중 특히 불소와 질산성질소 인 것으로 나타났다.[2] 이러한 문제점을 해결하고자 기존의 고도 정수처리 시설인 막여과, 오존처리, 활성탄 흡착 공정 등을[3-5] 적용하고 있으나 소규모 수도시설에 적용하기에는 유지관리, 규모, 경제적 측면 등 여러 한계점을 지니고 있다. 따라서 본 연구에서는 이러한 문제점을 해결하기 위한 방안으로 전기응집기술을 이용하여 음용수 수질기준을 초과하는 무기이온 중 불소와 질산성 질소를 제거하고자 하였다. 전기응집기술은 제거효율이 높고, 운전이 용이하며 부가적인 화학약품의 첨가가 불필요하다.[6,7] 또한 기존의 고도정수처리 기술에 비해 전기응집 공정은 처리효율과 경제적인 측면 모두를 만족시키고 있어 소규모 수도시설의 불소와 질산성질소를 효과적으로 제거할 수 있는 방안으로 판단된다. 본 연구에 사용된 실험장치는 직류전원공급장치 (DC power supply), 반응조, 전극으로 구성되어 있다. 직류전원공급장치는 최대전압 30 Volt, 최대 전류 30 Amper 까지 조절 가능하였으며 반응조의 크기는 14.5cm(w) ${\times}$ 9cm(L) ${\times}$ 22cm(H) 이고 실용적 1.5L이다. 반응조의 상부에는 전극이 고정될 수 있도록 0.5cm 간격의 홈을 만들어 제작 하였다. 전극은 가용성 전극인 알루미늄 (Al), 스테인레스스틸(SUS304)를 이용하였다. 이를 통해 전류밀도, 전극간격 등의 변수를 두어 최적의 전기응집 운전 조건을 파악하였으며 이는 소규모 수도시설의 수질개선 향상에 도움이 될 수 있을 것으로 판단된다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.145-145
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• 2008

High-k materials have been paid much more attention for their characteristics with high permittivity to reduce the leakage current through the scaled gate oxide. Among the high-k materials, $ZrO_2$ is one of the most attractive ones combing such favorable properties as a high dielectric constant (k= 20 ~ 25), wide band gap (5 ~ 7 eV) as well as a close thermal expansion coefficient with Si that results in good thermal stability of the $ZrO_2$/Si structure. During the etching process, plasma etching has been widely used to define fine-line patterns, selectively remove materials over topography, planarize surfaces, and trip photoresist. About the high-k materials etching, the relation between the etch characteristics of high-k dielectric materials and plasma properties is required to be studied more to match standard processing procedure with low damaged removal process. Among several etching techniques, we chose the inductively coupled plasma (ICP) for high-density plasma, easy control of ion energy and flux, low ownership and simple structure. And the $BCl_3$ was included in the gas due to the effective extraction of oxygen in the form of $BCl_xO_y$ compounds. During the etching process, the wafer surface temperature is an important parameter, until now, there is less study on temperature parameter. In this study, the etch mechanism of $ZrO_2$ thin film was investigated in function of $Cl_2$ addition to $BCl_3$/Ar gas mixture ratio, RF power and DC-bias power based on substrate temperature increased from $10^{\circ}C$ to $80^{\circ}C$. The variations of relative volume densities for the particles were measured with optical emission spectroscopy (OES). The surface imagination was measured by scanning emission spectroscope (SEM). The chemical state of film was investigated using energy dispersive X-ray (EDX).

• Restorative Dentistry and Endodontics
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• v.25 no.4
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• pp.527-535
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• 2000

The purpose of this study was to evaluate effects of smear layer and dentin primers on the sealing ability of root canals. 126 extracted human teeth with single, straight canals and mature apices were used. The Samples were first classified into six groups as follows: presence of smear layer; absence of smear layer; Scotchbond Bond Multi-Purpose; All Bond 2; Mac Bond 2; Clearfil Liner Bond 2. A Positive control was also established. All teeth except the control group were then obturated with thermoplasticized gutta-percha and AH26. Electrochemical and dye penetration technique were later used to evaluate the degree of micro leakage through the root canal. Seventy teeth were then immersed in a 1% potassium chloride solution and An external power supply(DC 10 V) was then applied to the circuit for the electrochemical microleakage test. The degree of Microleakage was determined over period of 28 days before being evaluated. In total, 48 teeth were submitted to the dye infiltration technique. All specimen were suspended in 2% methylene blue dye for 1 week before being longitudinally split. The degree of dye infiltration was measured under a stereo microscope at ${\times}10$ magnification and evaluated. The results were as follows: 1. Apical microleakage increased throughout the test period in all group and one group having a smear layer showed a dramatic increase under electrochemical test (p<0.05). In the group having smear layer, the degree of apical microleakage was the highest, and the micro leakage was much higher than in the smear layer removed group in electrochemical test (p<0.05). Scotchbond Multi-Purpose, All Bond 2, Mac Bond 2 and Clearfil Liner Bond 2 showed lower micro leakage than one group having smear layer. The All Bond 2 and Clearfil Liner Bond 2 treated groups showed the lowest microleakage in electrochemical test (p<0.05). 2. There was no significant difference between the experimental groups in dye penetration technique. These results suggested that the removal of the smear layer from root canal and concomitantly the application of dentin primer into root canal could improve the sealing ability of root canal obturation.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.169-169
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• 2008

To keep pace with scaling trends of CMOS technologies, high-k metal oxides are to be introduced. Due to their high permittivity, high-k materials can achieve the required capacitance with stacks of higher physical thickness to reduce the leakage current through the scaled gate oxide, which make it become much more promising materials to instead of $SiO_2$. As further studying on high-k, an understanding of the relation between the etch characteristics of high-k dielectric materials and plasma properties is required for the low damaged removal process to match standard processing procedure. There are some reports on the dry etching of different high-k materials in ICP and ECR plasma with various plasma parameters, such as different gas combinations ($Cl_2$, $Cl_2/BCl_3$, $Cl_2$/Ar, $SF_6$/Ar, and $CH_4/H_2$/Ar etc). Understanding of the complex behavior of particles at surfaces requires detailed knowledge of both macroscopic and microscopic processes that take place; also certain processes depend critically on temperature and gas pressure. The choice of $BCl_3$ as the chemically active gas results from the fact that it is widely used for the etching o the materials covered by the native oxides due to the effective extraction of oxygen in the form of $BCl_xO_y$ compounds. In this study, the surface reactions and the etch rate of $Al_2O_3$ films in $BCl_3/Cl_2$/Ar plasma were investigated in an inductively coupled plasma(ICP) reactor in terms of the gas mixing ratio, RF power, DC bias and chamber pressure. The variations of relative volume densities for the particles were measured with optical emission spectroscopy (OES). The surface imagination was measured by AFM and SEM. The chemical states of film was investigated using X-ray photoelectron spectroscopy (XPS), which confirmed the existence of nonvolatile etch byproducts.