• Title/Summary/Keyword: Cu-10Sn

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Characterization of the SnAg Electrodeposits according to the Current Density and Cross-sectional Microstructure Analysis in the Cu Pillar Solder Bump (전류밀도에 따른 SnAg 도금층의 특성 및 Cu 필라 솔더 범프의 단면 미세구조 측정)

  • Kim, Sang-Hyuk;Hong, Seong-Ki;Yim, Hyunho;Lee, Hyo-Jong
    • Journal of Surface Science and Engineering
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    • v.48 no.4
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    • pp.131-135
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    • 2015
  • We investigated the surface morphology and the change of Ag concentration for SnAg electrodeposits according to the current density using labmade and commercial plating solutions. The concentration of Ag in the SnAg electrodeposits decreased with increasing the current density. The Ag concentrations at the conditions of over $50mA/cm^2$ were below 3 wt% and the surface was relatively smooth. Cu pillar bump was fabricated by using SnAg electroplating, and it was reflowed at $240^{\circ}C$ for 90 sec. The cross-sectional microstructure was investigated by using EBSD measurement and it was found that the grain size of SnAg became smaller by increasing the number of reflow treatments.

The Effect of SnO2 Addition on Sintering Behaviors in a Titanium Oxide-Copper Oxide System

  • Lee, Ju-Won;Oh, Kyung-Sik;Chung, Tai-Joo;Paek, Yeong-Kyeun
    • Journal of Powder Materials
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    • v.29 no.5
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    • pp.357-362
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    • 2022
  • The low-temperature sinterability of TiO2-CuO systems was investigated using a solid solution of SnO2. Sample powders were prepared through conventional ball milling of mixed raw powders. With the SnO2 content, the compositions of the samples were Ti1-xSnxO2-CuO(2 wt.%) in the range of x ≤ 0.08. Compared with the samples without SnO2 addition, the densification was enhanced when the samples were sintered at 900℃. The dominant mass transport mechanism seemed to be grain-boundary diffusion during heat treatment at 900℃, where active grain-boundary diffusion was responsible for the improved densification. The rapid grain growth featured by activated sintering was also obstructed with the addition of SnO2. This suggested that both CuO as an activator and SnO2 dopant synergistically reduced the sintering temperature of TiO2.

A study on the properties of thin films using a $Cu_2ZnSnS_4$ compound target (화합물 $Cu_2ZnSnS_4$ bulk 타겟을 사용하여 제조한 박막 특성에 관한 연구)

  • Seol, Jae-Seung;Jung, Young-Hee;Nam, Hyo-Duck;Bae, In-Ho;Kim, Kyoo-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.869-873
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    • 2002
  • $Cu_2ZnSnS_4$ (CZTS) thin film is one of the candidate materials for the solar cell. It has an excellent optical absorption coefficient as well as appropriate 1.4~1.5eV band gap. The purpose of this study is replacing a half of high-cost Indium(In) atoms with low-cost Zinc(Zn) atoms and the other half with low-cost Tin(Sn) atoms in the lattice of CIS. In annealing process of thin films deposited with mixture target, the thin films were appeared the peeling. The resistivity was decreased. Thin films were deposited on ITO glass substrates using a compound target which were made by $CU_2S$, ZnS, $SnS_2$ powder were sintered in the atmosphere of Al at room temperature by rf magnetron sputtering We investigated potentialities of a low-cost material for the solar cell by measuring of thin film composition, the structure and optical properties. We could get an appropriate $Cu_2ZnSnS_4$ composition A (112) preferred orientation was appeared without annealing temperature as shown in the diffraction peaks of the CIS cells and was available for photovoltaic thin film materials. The band gap increased from 1.4 to 1.7eV as the composition ratio of Zn/Sn.. The optical absorption coefficient of the thin film was above $10^4cm^{-1}$.

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Characterization of Atomic-Layer Deposited ZnSnO Buffer Layer for 18%- Efficiency Cu(In,Ga)Se2 Solar Cells (18% 효율 Cu(In,Ga)Se2 박막태양전지용 ZnSnO 버퍼층의 원자층 증착법 및 분석)

  • Kim, Sun Cheul;Kim, Seung Tae;Ahn, Byung Tae
    • Current Photovoltaic Research
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    • v.3 no.2
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    • pp.54-60
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    • 2015
  • ZnSnO thin films were deposited by atomic layer deposition (ALD) process using diethyl zinc ($Zn(C_2H_5)_2$) and tetrakis (dimethylamino) tin ($Sn(C_2H_6N)_4$) as metal precursors and water vapor as a reactant. ALD process has several advantages over other deposition methods such as precise thickness control, good conformality, and good uniformity for large area. The composition of ZnSnO thin films was controlled by varying the ratio of ZnO and $SnO_2$ ALD cycles. The ALD ZnSnO film was an amorphous state. The band gap of ZnSnO thin films increased as the Sn content increased. The CIGS solar cell using ZnSnO buffer layer showed about 18% energy conversion efficiency. With such a high efficiency with the ALD ZnSnO buffer and no light soaking effect, AlD ZnSnO buffer mighty be a good candidate to replace Zn(S,O) buffer in CIGSsolar cells.

Bioleaching of valuable metals from electronic scrap using fungi(Aspergillus niger) as a microorganism (곰팡이균(Aspergillus niger)을 이용(利用)한 전자스크랩중 유가금속(有價金屬)의 미생물(微生物) 침출(浸出) 연구(硏究))

  • Ahn, Jae-Woo;Jeong, Jin-Ki;Lee, Jae-Chun;Kim, Dong-Gin
    • Resources Recycling
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    • v.14 no.5 s.67
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    • pp.24-31
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    • 2005
  • In order to recover valuable metals from fine-grained electronic waste, bioleaching of Cu, Zn, Al, Co, Ni, Fe, Sn and Pb were carried out using Aspergillus niger as a leaching microorganism in a shaking flask. Aspergillus niger was able to grow in the presence of electronic scrap. The formation of organic acids(citric and oxalic acid) from Aspergillus niger caused the mobilization of metals from waste electronic scrap. In a preliminary study, in order to obtain the data on the leaching of Cu, Zn, Al, Fe, Co and Ni from electronic scrap, chemical leaching using organic acid(Citric acid and Oxalic acid) was accomplished. At the electronic scrap concentration of 50 g/L, Aspergillus niger were able to leach more than 95% of the available Cu, Co. But Al, Zn, Pb and Sn were leached about 15-35%. Ni and Fe were detected in the leachate less than 10%.

The Effects of UBM and SnAgCu Solder on Drop Impact Reliability of Wafer Level Package

  • Kim, Hyun-Ho;Kim, Do-Hyung;Kim, Jong-Bin;Kim, Hee-Jin;Ahn, Jae-Ung;Kang, In-Soo;Lee, Jun-Kyu;Ahn, Hyo-Sok;Kim, Sung-Dong
    • Journal of the Microelectronics and Packaging Society
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    • v.17 no.3
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    • pp.65-69
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    • 2010
  • In this study, we investigated the effects of UBM(Under Bump Metallization) and solder composition on the drop impact reliability of wafer level packaging. Fan-in type WLP chips were prepared with different solder ball composition (Sn3.0Ag0.5Cu, and Sn1.0Ag0.5Cu) and UBM (Cu 10 ${\mu}m$, Cu 5 ${\mu}m$\Ni 3 ${\mu}m$). Drop test was performed up to 200 cycles with 1500G acceleration according to JESD22-B111. Cu\Ni UBM showed better drop performance than Cu UBM, which could be attributed to suppression of IMC formation by Ni diffusion barrier. SAC105 was slightly better than SAC305 in terms of MTTF. Drop failure occurred at board side for Cu UBM and chip side for Cu\Ni UBM, independent of solder composition. Corner and center chip position on the board were found to have the shortest drop lifetime due to stress waves generated from impact.

Wettability of SAC305-coated Cu Fabricated by Low Temperature Process Using Ultrafine SAC305 Nanoparticles (초미세 SAC305 나노입자를 사용한 저온 코팅법으로 제조된 SAC305 코팅 Cu의 솔더 젖음성)

  • Shin, Yong Moo;Choi, Tae Jong;Cho, Kyung Jin;Jang, Seok Pil;Lee, Jong-Hyun
    • Journal of the Microelectronics and Packaging Society
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    • v.22 no.3
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    • pp.25-30
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    • 2015
  • SAC-coated Cu specimens were fabricated by novel pad finish process using a phenomenon that metal nanoparticles less than 20 nm in diameter melted at a temperature lower than the melting point of bulk metal, and their wettabilities were evaluated. The thickness of SAC305 layer coated at low temperature of $160^{\circ}C$ using SAC305 ink was extremely thin as the level of several nanometers. It was analyzed by Auger electron spectroscopy that $Cu_6Sn_5$ intermetallic layer with a thickness of 10~100 nm and $Cu_3Sn$ intermetallic layer with a thickness of 50~150 nm were sequentially formed under the SAC305 coating layer. The thickness of formed intermetallic layers was thicker in electroplated Cu than rolled Cu, which attributed to improved surface roughness in the electroplated Cu. The improved surface roughness induces the contact, melting, and reaction of a larger number of SAC305 nanoparticles per the unit area of Cu specimen. In the wetting angle test using SAC305 solder balls, the Cu coated with SAC305 through the low temperature process presented evidently low wetting angles than those in non-coated Cu, indicating that only a few nanometer-thick SAC305 coating layer on Cu could also cause the enhancement of wettability.

Effect of Zn content on Shear Strength of Sn-0.7Cu-xZn and OSP surface finished Joint with High Speed Shear Test (Sn-0.7Cu-xZn와 OSP 표면처리 된 기판의 솔더접합부의 고속 전단강도에 미치는 Zn의 영향)

  • Choi, Ji-Na;Bang, Jae-Oh;Jung, Seung-Boo
    • Journal of the Microelectronics and Packaging Society
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    • v.24 no.1
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    • pp.45-50
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    • 2017
  • We investigated effect of Zn content on shear strengh of Sn-0.7Cu-xZn and OSP surface finished solder joints. Five pastes of Sn-0.7Cu-xZn (x=0, 0.5, 1.0, 1.5, 2.0 wt.%) solders were fabricated by mixing of solder powder and flux using planatary mixer. $180{\mu}m$ diameter solder balls were formed on OSP surface finished Cu electrodes by screen print method, and the reflow process was performed. The shear strength was evaluated with two high shear speeds; 0.01 and 0.1 m/s. The thickness of the intermetallic compound(IMC) layer was decreased with increasing Zn content in Sn-0.7Cu-xZn solder. The highest shear strength was 3.47 N at the Zn content of 0.5 wt.%. As a whole, the shear strength at condition of 0.1 m/s was higher than that of 0.01 m/s because of impact stress. Fracture energies were calculated by F-x (Force-displacement) curve during high speed shear test and the tendency of fracture energy and that of shear strength were good agreement each other. Fracture took place within solder matrix at lower Zn content, and fracture occured near the interface of OSP surface finished Cu electrode and solder at higher Zn content.

Tin Oxide-modulated to Cu(OH)2 Nanowires for Efficient Electrochemical Reduction of CO2 to HCOOH and CO (SnO2/Cu(OH)2 Nanowires 전극을 이용한 전기화학적 이산화탄소 환원 특성)

  • Chaewon Seong;Hyojung Bae;Sea Cho;Jiwon Heo;Eun Mi Han;Jun-Seok Ha
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.4
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    • pp.91-97
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    • 2023
  • Electrochemical (EC) CO2 reduction is a promising method to convert CO2 into valuable hydrocarbon fuels and chemicals ecofriendly. Here, we report on a facile method to synthesize surface-controlled SnO2/Cu(OH)2 nanowires (NWs) and its EC reduction of CO2 to HCOOH and CO. The SnO2/Cu(OH)2 NWs (-16 mA/cm2) showed superior electrochemical performance compared to Cu(OH)2 NWs (-6 mA/cm2) at -1.0 V (vs. RHE). SnO2/Cu(OH)2 NWs showed the maximum Faradaic efficiency for conversion to HCOOH (58.01 %) and CO (29.72 %). The optimized catalyst exhibits a high C1 Faradaic efficiency stable electrolysis for 2 h in a KHCO3 electrolyte. This study facilitates the potential for the EC reduction of CO2 to chemical fuels.

A study on the properties of Cu$_2$ZnSnS$_4$ thin films prepared by rf magnetron sputtering process (RF Magnetron Sputtering법으로 제조한 Cu$_2$ZnSnS$_4$박막 특성에 관한 연구)

  • 이재춘;설재승;남효덕;배인호;김규호
    • Journal of Surface Science and Engineering
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    • v.35 no.1
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    • pp.39-46
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    • 2002
  • $Cu_2$$ZnSnS_4$(CZTS) thin film is one of the candidate materials for the solar cell. It has an excellent optical absorption coefficient as well as appropriate 1.4~1.5eV band gap. The purpose of this study is replacing a half of high-cost Indium(In) atoms with low-cost Zinc(Zn) atoms and the other half with low-cost Tin(Sn) atoms in the lattice of CIS. Thin films were deposited on ITO glass substrates using a compact target which were made by $Cu_2$S, ZnS, SnS$_2$ powder at room temperature by rf magnetron sputtering and were annealed in the atmosphere of Ar and $S_2$(g). We investigated potentialities of a low-cost material for the solar cell by measuring of thin film composition, the structure and optical properties. We could get an appropriate $Cu_2$$ZnSnS_4$ composition. Structure was coarsened with increasing temperature and (112), (200), (220), (312) planes appeared to conform to all the reflection Kesterite structure. A (112) preferred orientation was advanced with increasing the annealing temperature as shown in the diffraction peaks of the CIS cells and was available for photovoltaic thin film materials. The band gap increased from 1.51 to 1.8eV as the annealing temperature increased. The optical absorption coefficient of the thin film was about $10^4$$cm^{-1}$.