• Title/Summary/Keyword: Cu surface

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Effect of KF Treatment of Cu(In,Ga)Se2 Thin Films on the Photovoltaic Properties of CIGS Solar Cells (Cu(In,Ga)Se2 박막의 KF 처리가 CIGS태양전지에 미치는 영향)

  • Jeong, Gwang Sun;Cha, Eun Seok;Moon, Sun Hong;Ahn, Byung Tae
    • Current Photovoltaic Research
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    • v.3 no.2
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    • pp.65-70
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    • 2015
  • We applied KF on CIGS film to modify CIGS surface with a wider-bandgap surface layer. With the KF deposition the surface of CIGS film had fine particle on the CIGS surface at 350 and $300^{\circ}C$. No fine particle was detected at 500 and $250^{\circ}C$. With the KF treatment, the Ga and O content increased at the surface, while the In and Cu content decreased. The valence band maximum was lowered with KF treatment. The composition profile and band structure were positive side of applying KF on the CIGS surface. However, the efficiency decreased with the KF treatment due to high series resistance, probably due to too thick surface layer. A smaller amount of KF should be supplied and more systematic analysis is necessary to obtain a reproducible higher efficiency CIGS solar cells.

Development of A Process Map for Extrusion of Cu-Ti Bimetal Bar (구리-타이타늄 이중봉 직접압출의 공정지도 개발)

  • Kim Joong-Sik;Lee Yong-Sin;Sim K.S.;Park H.J.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.499-502
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    • 2005
  • A process map has been developed, which can identify the process conditions for weak mechanical bonding at the contact surface during the direct extrusion of a Cu-Ti bimetal bar. Bonding mechanism between Cu and Ti was assumed as a cold pressure welding. Then, the plastic deformation at the contact zone causes mechanical bonding and a new bonding criterion for pressure welding was developed as a function of the principal stretch ratio and normal pressure at the contact surface by analyzing micro local extrusion at the contact zone. Finite element analyses for extrusion of Cu-Ti bimetal bars were performed for various process conditions. The deformation history at the contact surface was traced and the proposed new bonding criterion was applied to predict whether the mechanical bonding at the Cu-Ti contact surface happens. Finally, a process map for the extrusion of Cu-Ti bimetal bar is suggested.

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Substrate effects on the characteristics of $YBa_2Cu_3O_{7-x}$ thin films prepared by RF magnetron sputtering (RF마그네트론 스퍼터링법으로 제조한 $YBa_2Cu_3O_{7-x}$전도체 박막의 특성에 대한 기판의 영향)

  • 신현용;박창엽
    • Electrical & Electronic Materials
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    • v.8 no.1
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    • pp.6-12
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    • 1995
  • High Tc superconducting YBa$_{2}$Cu$_{3}$$O_{7-x}$ thin films were prepared on various substrates by off-axis rf magnetron sputtering method to examine the substrate effects on the film structure and its R-T characteristics. The SEM analysis showed that the surface morphology of the grown YBa$_{2}$Cu$_{3}$O.sub 7-x/, film has different characteristic structure with different substrate used. The film on (100) SrTiO$_{3}$ substrate has critical current density of 3*10$^{5}$ A/cm$^{2}$ at 77K under zero magnetic field. The X-ray diffraction measurements revealed that the films on (100) SrTiO$_{3}$ substrate have mixed a-axis and c-axis normal to the substrate surface and the films on (100) MgO and ZrO$_{2}$/sapphire substrates have c-axis normal orientation to the substrate surface. However, YBa$_{2}$Cu$_{3}$$O_{7-x}$ films on (100) sapphire substrates showed no preferential orientation.ion.

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A Study on Formation of Thick Hardened Layer on Al Alloy Surface by PYAW Process (PTAW법에 의한 Al 합금 표면의 후막경화층 형성에 관한 연구)

  • 임병수;김봉수;오세훈;황선효;서창제
    • Journal of Welding and Joining
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    • v.15 no.5
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    • pp.92-103
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    • 1997
  • The purpose of this study is to improve the wear resistance and hardness of Al alloy by making a formation of the thick surface hardening layers. The thick surface hardening layers were formed by PTAW(Plasma Transferred Arc Welding), with the addition of metal powders (Cu), ceramics powders (NbC, TiC), and mixture powders (Cu+NbC) in Al alloy (A1050, A5083). Mechanical properties of overlaid layers (wear resistance, hardness) were investigated in relation to the microstructure. The results obtained are summarized as follows: The depth of penetration was increased with increasing powder feeding rate. It is considered that these increase were due to the thermal pinch effect by the addition of powders, especially, for the Cu powders, were due to the heat of reaction with the matrix. The hardness and wear resistance of overlaid layers were improved with increasing powder feeding rate. For the Cu powders, it is considered that these increase were due to the increase of the formation of ${\theta}(CuAl_2)$ phase with increasing feeding rate of Cu powers.

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Surface Characterization of Cu as Electrolyte in ECMP (ECMP 공정에서 전해질에 따른 Cu 표면 특성 평가)

  • Kwon, Tae-Young;Kim, In-Kwon;Cho, Byung-Gwun;Park, Jin-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.528-528
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    • 2007
  • Cu CMP widely has been using for the formation of multilevel metal interconnects by the Cu damascene process. And lower dielectric constant materials are required for the below 45nm technology node. As the dielectric constant of dielectric materials are smaller, the strength of dielectric materials become weaker. Therefore these materials are easily damaged by high down pressure during conventional CMP. Also, technical problems such as surface scratches, delamination, dishing and erosion are also occurred. In order to overcome these problems in CMP, the ECMP (electro-chemical mechanical planarization) has been introduced. In this process, abrasive free electrolyte, soft pad and low down force were used. The electrolyte is one of important factor to solve these problems. Also, additives are required to improve the removal rate, uniformity, surface roughness, defects, and so on. In this study, KOH and $NaNO_3$ based electrolytes were used for Cu ECMP and the electrochemical behavior was evaluated by the potentiostat. Also, the Cu surface was observed by SEM as a function of applied voltage and chemical concentration.

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The Effects of Plasma Treatments on the Surface Energy of the Polycarbonates and on the Adhesion Strength of the Cu Film/Polycarbonate Interface (플라즈마 표면처리에 의한 폴리카보네이트의 표면에너지 및 구리박막과의 접착력 변화에 관한 연구)

  • Cho Byeong-Hoon;Lee Won-Jong;Park Young-Ho
    • Korean Journal of Materials Research
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    • v.15 no.11
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    • pp.745-750
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    • 2005
  • Polycarbonates are widely used as housing materials of electronic handsets. Since the polycarbonate is electrically insulating, there should be a conducting layer on the polycarbonate for EMI shielding. In this study, we sputter deposited Cu films on the polycarbonate substrates for EMI shielding. Plasma treatments of polycarbonates were used to increase the adhesion strength of the Cu film/polycarbonate interface. The surface energy of the polycarbonate was greatly increased from $30mJ/m^2 \;to\; 65mJ/m^2$ by a 200 W $O_2$ plasma treatment for 10s. It is thought that this is because of the ion bombardment. The adhesion strength of the sputter deposited Cu film to the polycarbonate was quantitatively measured by a 4 point bending tester. A moderate plasma surface treatment of the polycarbonate increased the Cu film/polycarbonate adhesion strength by $30\%$. The EMI shielding efficiency of the sputter deposited $10{\mu}m$ Cu lam on the polycarbonate showed 90dB in the range of 100MHz to 1000MHz.

Ag and Cu Precipitation in Multi-Layer Chip Inductors Prepared with V2O5 Doped NiCuZn Ferrites (V2O5 도핑된 NiCuZn 페라이트로 제조된 칩인덕터에서의 Ag/cu 석출)

  • Je, Hae-June;Kim, Byung-Kook
    • Korean Journal of Materials Research
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    • v.13 no.8
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    • pp.503-508
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    • 2003
  • The purpose of this study is to investigate the effect of $V_2$$O_{5}$ addition on the Ag and Cu precipitation in the NiCuZn ferrite layers of 7.7${\times}$4.5${\times}$1.0 mm sized multi-layer chip inductors prepared by the screen printing method using 0∼0.5 wt% $V_2$$O_{5}$ -doped ferrite pastes. With increasing the $V_2$$O_{5}$ content and sintering temperature, Ag and Cu oxide coprecipitated more and more at the polished surface of ferrite layers during re-annealing at $840^{\circ}C$. It was thought that during the sintering process, V dissolved in the NiCuZn ferrite lattice and the Ag-Cu liquid phase of low melting point was formed in the ferrite layers due to the Cu segregation from the ferrite lattice and Ag diffusion from the internal electrode. During re-annealing at $840^{\circ}C$, the Ag-Cu liquid phase came out the polished surface of ferrite layers, and was decomposed into the isolated Ag particles and the Cu oxide phase during the cooling process.

Nano-Scale Surface Observation of Cyclically Deformed Copper and Cu-Al Single Crystals (반복변형된 동 및 동알루미늄 단결정 표면형상의 나노-스케일 관찰)

  • ;;Hitoshii ISHII
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 1999.06a
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    • pp.67-72
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    • 1999
  • Scanning probe Microscope(SPM) such as Scanning Tunneling Microscope(STM) and Atomic Force Microscope(AFM) was shown to be the powerful tool for nano-scale characterization of material surfaces Using this technique, surface morphology of the cyclically deformed Cu or Cu-Al single crystal was observed. The surface became proportionately rough as the number of cycles increased, but after some number of cycles no further change was observed. Slip steps with the heights of 100 to 200 nm and the widths of 1000 to 2000 nm were prevailing at the stage. The slipped distance of one slip system at the surface was not uniform. and formation of the extrusions or intrusions was assumed to occur such place. By comparing the morphological change caused by crystallographic orientation, strain amplitude, number of cycles or stacking fault energy, some interesting results which help to clarify the basic mechanism of fatigue damage were obtained. Furthermore, applicability of the scanning tunneling microscopy to fatigue damage is discussed.

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A Study of Optimization of Electrodeposited CuSnZn Alloys Electrolyte and Process

  • Hur, Jin-Young;Lee, Ho-Nyun;Lee, Hong-Kee
    • Journal of the Korean institute of surface engineering
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    • v.43 no.2
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    • pp.64-72
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    • 2010
  • CuSnZn electroplating was investigated as alternative to Ni plating. Evaluation of electrolyte and plating process was performed to control physical characteristics of the film, and to collect practical data for application. Hull-cell test was conducted for basic comparison of two commercialized products and developed product. Based on hull-cell test results, long term test of three electrolytes was performed. Various analysis on long term tested electrolyte and samples have been done. Reliable and practical data was collected using FE-SEM (FEI, Sirion), EDX (ThermoNoran SIX-200E), ICP Spectrometer (GBC Scientifi c, Integra XL), FIB (FEI, Nova600) for anlysis. Physical analysis and reliability test of the long term tested film were also carried out. Through this investigation plating time, plating speed, electrolyte composition, electrolyte metal consumption, hardness and corrosion resistance has been compared. This set of data is used to predict and control the chemical composition of the film and modify the physical characteristics of the CuSnZn alloy.

Microstructure and Hardness of Al-Cu Alloy Coating on Monel 400 by Hot Dipping (액상 침적에 의한 Monel 400기지상에 형성된 Al-Cu 합금 코팅층의 조직 및 경도)

  • 조선욱;이임렬
    • Journal of the Korean institute of surface engineering
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    • v.29 no.4
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    • pp.278-285
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    • 1996
  • The structure of coating layer formed by hot dip Al-Cu alloy coating on Monel 1400 metal was studied. The coating layer consists of alloyed layer adjacent to the Monel 400 substrate and Al-Cu alloy. It was found that the hardness of coating increased with dipping time and heat treatment associated with the diffusion and the formation of intermetallic compound at the interface. However the thickness of coating layer was decreased at high dipping temperature due to tile higher viscosity of liquid coating alloy. Diffusion heat treatment at $600^{\circ}C$ after coating resulted in the disappearence of adhered Al(Cu) and $CuAl_2$ phases, and then they transformed into the new phases of CuAl and Al7Cu4Ni at coating layer.

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