• Title/Summary/Keyword: Crystalline silicon solar cell

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Application Possibility of Mono-Crystalline Silicon Solar Cell for Photovoltaic Concentrating System (단결정 실리콘 태양전지의 집광형 시스템으로의 적용 가능성)

  • Kang, Kyung-Chan;Kang, Gi-Hwan;Yu, Gwon-Jong;Huh, Chang-Su
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.22-23
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    • 2007
  • We tried to find the possibility of mono-crystalline silicon solar cell for photovoltaic concentrating system which is major cost portion for PV system using fresnel lens. With solar simulator and I-V curve tracer, we analyzed maximum output characteristics and measured the temperature of concentrated area using infrared camera. Because of temperature increase, there was no merit when concentrating. But at low radiant power, it showed more efficient operation. The combination of heat-sink technology and tracking system to our concentrating PV system would give better performance results.

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Fabrication of Multi-crystalline Silicon Solar Cell by using Wafer Adhesion Texturing Method (웨이퍼 접착 텍스쳐링 방식을 이용한 다결정 실리콘 태양전지 제조)

  • Yoon, Seok-Il;Roh, Si-Cheol;Choi, Jeong- Ho;Jung, Jong-Dae;Seo, Hwa-Il
    • Journal of the Semiconductor & Display Technology
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    • v.15 no.4
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    • pp.67-72
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    • 2016
  • In this study, the texturing and the emitter formation processes were carried out with the wafer adhesion method to increase the productivity and reduce the production cost of the multi-crystalline silicon solar cell. After fabricating $156{\times}156mm$ solar cell according to the wafer adhesion method, the operation characteristics were analyzed and compared with those of the solar cell fabricated by the standard process method. In the case of a solar cell formed by the wafer adhesion method, it showed Jsc of $32.87mA/cm^2$, Voc of 0.612V, FF of 78.04% and efficiency of 15.71% respectively. The efficiency of the solar cell formed by the wafer adhesion method was 0.1% higher than that of the solar cell formed by the standard method. In addition, the productivity of the texturing and the emitter formation processes is expected to be approximately doubled. Therefore, it is expected that the manufacturing cost of the multi-crystalline solar cell can be reduced due to the improved productivity compared with the standard process.

Electrical Characteristics of Mono Crystalline Silicon Solar Cell for Concentrating PV System using Fresnel Lenses (프레넬 렌즈를 이용한 집광 시 단결정 실리콘 태양전지의 전기적 특성)

  • Kang, Kyung-Chan;Kang, Gi-Hwan;Yu, Gwon-Jong;Huh, Chang-Su
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.218-219
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    • 2007
  • Silicon feed stock shortage have acted as major restraints for growth of photovoltaic industry. Concentrating photovoltaic (CPV) system will reduce the use of silicon PV materials. This paper presents the application possibility of mono-crystalline silicon solar cell, which has increased in market share, for PV concentrator. We measured the power of solar cell using sun simulator and I-V curve tracer and compared the results. The comparison of results showed that the concentrated solar cell generated the power more approximately 7 times than without concentration in spite of non-heat sink. If CPV technology included heat sink combines already developed PV tracking system, it will have a merit economically.

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The Study on the Characteristic of Mono Crystalline Silicon Solar Cell with Change of $O_2$ Injection during Drive-in Process and PSG Removal (단결정 실리콘 태양전지 도핑 확산 공정에서 주입되는 $O_2$ 가스와 PSG 유무에 따른 특성 변화)

  • Choi, Sung-Jin;Song, Hee-Eun;Yu, Gwon-Jong;Lee, Hi-Deok
    • 한국태양에너지학회:학술대회논문집
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    • 2011.04a
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    • pp.105-110
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    • 2011
  • The doping procedure in crystalline silicon solar cell fabrication usually contains oxygen injection during drive-in process and removal of phosphorous silicate glass(PSG). In this paper, we studied the effect of oxygen injection and PSG on conversion efficiency of solar cell. The mono crystalline silicon wafers with $156{\times}156mm^2$, $200{\mu}m$, $0.5-3.0{\Omega}{\cdot}cm$ and p-type were used. After etching $7{\mu}m$ of the surface to form the pyramidal structure, the P(phosphorous) was injected into silicon wafer using diffusion furnace to make the emitter layer. After then, the silicon nitride was deposited by the PECVD with 80 nm thickness and 2.1 refractive index. The silver and aluminium electrodes for front and back sheet, respectively, were formed by screen-printing method, followed by firing in 400-425-450-550-$880^{\circ}C$ five-zone temperature conditions to make the ohmic contact. Solar cells with four different types were fabricated with/without oxygen injection and PSG removal. Solar cell that injected oxygen during the drive-in process and removed PSG after doping process showed the 17.9 % conversion efficiency which is best in this study. This solar cells showed $35.5mA/cm^2$ of the current density, 632 mV of the open circuit voltage and 79.5 % of the fill factor.

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Investigation of the crystalline silicon solar cells with porous silicon layer (다공성 실리콘 막을 적용한 결정질 실리콘 태양전지 특성 연구)

  • Lee, Eun-Joo;Lee, Il-Hyung;Lee, Soo-Hong
    • 한국신재생에너지학회:학술대회논문집
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    • 2007.06a
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    • pp.295-298
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    • 2007
  • Reduction of optical losses in crystalline silicon solar cells by surface modification is one of the most important issues of silicon photovoltaics. Porous Si layers on the front surface of textured Si substrates have been investigated with the aim of improving the optical losses of the solar cells, because an anti-reflection coating(ARC) and a surface passivation can be obtained simultaneously in one process. We have demonstrated the feasibility of a very efficient porous Si ARC layer, prepared by a simple, cost effective, electrochemical etching method. Silicon p-type CZ (100) oriented wafers were textured by anisotropic etching in sodium carbonate solution. Then, the porous Si layers were formed by electrochemical etching in HF solutions. After that, the properties of porous Si in terms of morphology, structure and reflectance are summarized. The structure of porous Si layers was investigated with SEM. The formation of a nanoporous Si layer about 100nm thick on the textured silicon wafer result in a reflectance lower than 5% in the wavelength region from 500 to 900nm. Such a surface modification allows improving the Si solar cell characteristics. An efficiency of 13.4% is achieved on a monocrystalline silicon solar cell using the electrochemical technique.

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Thin Film Amorphous/Bulk Crystalline Silicon Tandem Solar Cells with Doped nc-Si:H Tunneling Junction Layers

  • Lee, Seon-Hwa;Lee, Jun-Sin;Jeong, Chae-Hwan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.257.2-257.2
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    • 2015
  • In this paper, we report on the 10.33% efficient thin film/bulk tandem solar cells with the top cell made of amorphous silicon thin film and p-type bulk crystalline silicon bottom cell. The tunneling junction layers were used the doped nanocrystalline Si layers. It has to allow an ohmic and low resistive connection. For player and n-layer, crystalline volume fraction is ~86%, ~88% and dark conductivity is $3.28{\times}10-2S/cm$, $3.03{\times}10-1S/cm$, respectively. Optimization of the tunneling junction results in fill factor of 66.16 % and open circuit voltage of 1.39 V. The open circuit voltage was closed to the sum of those of the sub-cells. This tandem structure could enable the effective development of a new concept of high-efficiency and low cost cells.

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Two-dimensional model simulation for reflectance of single crystalline silicon solar cell (단결정 실리콘 태양전지 2차원 모델의 반사율 시뮬레이션)

  • Lee, Sang-Hun;Kang, Gi-Hwan;Yu, Gwon-Jong;Ahn, Hyung-Keun;Han, Deuk-Young
    • 한국태양에너지학회:학술대회논문집
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    • 2012.03a
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    • pp.237-242
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    • 2012
  • At present, crystalline solar cells take up a significant percentage of the solar industry. The ways of increasing the efficiency of crystalline solar cell are texturing and AR(Anti-Reflection) coating, and the purpose of these technologies is to increase the amount of available light on the solar cell by reducing the reflectivity. The reflectance of crystalline silicon solar cell combined with such technologies will be able to predict using the proposed simulation in this paper. The simulation algorithm was made using MATLAB, and it is a combination of the theories of reflection in textured wafer and in anti-reflection coated wafer. The simulation results were divided into three wavelength band and were compared with actual reflectance measured by a spectrometer. The wavelength band from 300 to 380 was named ultraviolet region and the wavelength band from 380 to 780 is named visible region. Finally, the wavelength band from 780 to 1200 named infrared region. When compared with measured reflection data, the simulation results had a small error from 0.4 to 0.5[%] in visible region. The error occurred in the rest two regions is larger than visible region. The extreme error occurred the infrared region is due to internal reflection effect, but in the ultraviolet region, the rationale on reduction phenomenon of reflectance occurred in small range did not proved. If these problem will be solve, this simulation will have high reliability more than now and be able to predict the reflectance of solar cells.

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Brief Review of Silicon Solar Cells (실리콘 태양전지)

  • Yi, Jun-Sin
    • Journal of the Korean Vacuum Society
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    • v.16 no.3
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    • pp.161-166
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    • 2007
  • Photovoltaic (PV) technology permits the transformation of solar light directly into electricity. For the last five years, the photovoltaic sector has experienced one of the highest growth rates worldwide (over 30% in 2006) and for the next 20 years, the average production growth rate is estimated to be between 27% and 34% annually. Currently the cost of electricity produced using photovoltaic technology is above that for traditional energy sources, but this is expected to fall with technological progress and more efficient production processes. A large scale production of solar grade silicon material of high purity could supply the world demand at a reasonably lower cost. A shift from crystalline silicon to thin film is expected in the future. The technical limit for the conversion efficiency is about 30%. It is assumed that in 2030 thin films will have a major market share (90%) and the share of crystalline cells will have decreased to 10%. Our research at Sungkyunkwan University of South Korea is confined to crystalline silicon solar cell technology. We aim to develop a technology for low cost production of high efficiency silicon solar cell. We have successfully fabricated silicon solar cells of efficiency more than 16% starting with multicrystalline wafers and that of efficiency more than 17% on single crystalline wafers with screen printing metallization. The process of transformation from the first generation to second generation solar cell should be geared up with the entry of new approaches but still silicon seems to remain as the major material for solar cells for many years to come. Local barriers to the implementation of this technology may also keep continuing up to year 2010 and by that time the cost of the solar cell generated power is expected to be 60 cent per watt. Photovoltaic source could establish itself as a clean and sustainable energy alternate to the ever depleting and polluting non-renewable energy resource.

A Study on Large Area Black Silicon Solar Cell Using Radio-Frequency Multi-Hollow cathode Plasma System (Radio Frequency Multi-Hollow Cathode 플라즈마 시스템을 이용한 대면적 블랙 실리콘 태양전지에 관한 연구)

  • 유진수;임동건;양계준;이준신
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.52 no.11
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    • pp.496-500
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    • 2003
  • A low-cost, large area, random, maskless texturing scheme independent of crystal orientation is expected to significantly impact terrestrial photovoltaic technology. We investigated silicon surface microstructures formed by reactive ion etching (RIE) in Multi-Hollow cathode system. Desirable texturing effect has been achieved when radio-frequency (rf) power of about 20 Watt per one hollow cathode glow is applied for our RF Multi-Hollow cathode system. The black silicon etched surface shows almost zero reflectance in the visible region as well as in near IR region. The etched silicon surface is covered by columnar microstructures with diameters from 50 to 100 nm and depth of about 500 nm. We have successfully achieved 11.7% efficiency of mono-crystalline silicon solar cell and 10.2% multi-crystalline silicon solar cell.