• Title/Summary/Keyword: Cr/Ag

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Effects of Ag Seed Layer on the Magnetic Properties and the Microstructural Evolution of SmCo/Cr Thin Films (Ag 씨앗층이 SmCo/Cr 박막의 자기적 특성과 미세구조에 미치는 영향)

  • 이성래;고광식;김영근
    • Journal of the Korean Magnetics Society
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    • v.11 no.2
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    • pp.63-71
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    • 2001
  • The effects of an Ag seed layer on the magnetic properties and the microstructural evolution of SmCo/Cr thin films deposited on glass substrates were investigated. Coercivity of the films is 2.0 kOe when the thickness of Ag seed layer was 1nm thick, but it increased to 2.7 kOe when the Ag seed layer thickness is 3 nm. The increase of coercivity for film with 3 nm-thick Ag is due to roughness of Cr and grain size of Cr by the Ag microbumps. Ar partial pressure influenced on the formation of Ag microbumps, for example, they were formed at 5 mTorr when Ag thickness was 1 nm. The mechanism of magnetization reversal of the SmCo films changed from domain wall motion to domain rotation as the Ag inserted. This was thought to be due to inhibition of domain wall motion by the reduction of Cr grain size and the increase of roughness.

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Underlayer for Coercivity Enhancement of Ti/CoCrPt Thin Films (보자력 향상을 위한 Ti/CoCrPt박막의 하지층)

  • Jang, Pyung-Woo
    • Journal of the Korean Magnetics Society
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    • v.12 no.3
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    • pp.94-98
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    • 2002
  • Sputtering conditions and various underlayer such as Al, Cu, Ni, Cr, Ag, Mg, Fe, Co, Pd, Au, Pt, Mo and Hf were investigated for coercivity enhancement of 20 nm Ti/CoCrPt thin films in order to increase the coercivity of the films thinner than 20 nm. Among them, Ag and Mg were effective to increase the coercivity. Particularly 2 nm Ag was very effective to increase the coercivity and nucleation field as well as to reduce ${\alpha}$ value in CoCrPt thin film such that the coercivity of 2 nm Ag/18 nm Ti/10 nm CoCrPt film was 2200 Oe. However, it seemed that other coercivity enhancement mechanism operated in CoCrPt films because Ti (002) preferred texture was not developed with Ag underlayer contrary to a general expectation. And the coercivity and nucleation field were decreased when glass substrate with rougher surface was used.

Exchange Coupling in CoZr/Ag/CoCr Trilayered Films (CoZr/Ag/CoCr 삼층박막의 교환결합)

  • 백종성;박용성;임우영;이수형;김종오
    • Journal of the Korean Magnetics Society
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    • v.8 no.6
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    • pp.357-361
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    • 1998
  • For CoZr/Ag/CoCr trilayered films deposited by DC and FR magnetron sputtering method, ferromagentic resonance experiments have been used to investigate the dependence of the exchange coupling between CoZr and CoCr layers separated by Ag layer on the thickness of the Ag layer. The coupling strength K increases with increasing Ag thickness up to 10 $\AA$ with a maximum value of 748 Oe, but oscillates with increasing Ag thickness in the range from 20 to 100 $\AA$. The coupling strength is positive for all samples. Hence, it seems that the exchange coupling between CoZr and CoCr layers separated by Ag layer is ferromagnetic.

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Effect of the Alloying Elements in Ag-Cu-Zr-X Brazing Alloy on the Microstructure and the Bond Strength of $Al_2O_3$/Ni-Cr Steel Brazed Joint (알루미나/니켈크롬강 접합체의 미세조직 및 접합강도에 미치는 Ag-Cu-Zr-X 브레이징 합금성분의 영향)

  • Kim, Jong-Heon;Yoo, Yeon-Chul
    • Transactions of Materials Processing
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    • v.7 no.5
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    • pp.465-473
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    • 1998
  • The effect of alloying elements of Ag-Cu-Zr-X brazing alloy on the microstructure and the bond strength of $Al_2O_3/Ni-Cr$ brazed steel joint was investigated. The reaction layer, $ZrO_2$ (a=5.146 ${\AA}$ , b=5.213 ${\AA}$ , c=5.311 ${\AA}$ )was formed at the interface of $Al_2O_3/Ni-Cr$ steel joint by the redox reaction between alumina and Zr. The addition of An and Al to the Ag-Cu-Zr brazing alloy gave rise to changes in the thickness of the reaction product layer and the morphology of the brazement. Sn caused the segregation of Zr was decreased b Al the $ZrO_2$ layer formed at the Ag-Cu-Zr-Al alloy was thinner than that of $ZrO_2$ formed at the Ag-Cu-Zr-An alloy. The fracture shear strength was strongly dependent on the microstructure of the brazement. Brazing with Ag-Cu-Zr-Sn alloy resulted in a better bond strength than with Ag-Cu-Zr or Ag-Cu-Zr-Al alloy.

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Determination of Cr(Ⅵ) by Glassy Carbon and Platinum Electrodes Modified With Polypyrrole Film (폴리피롤 막으로 변성시킨 유리질 탄소 및 백금 전극에서 Cr(Ⅵ) 이온의 정량)

  • Yoo, Kwang Sik;Woo, Sang Beom;Jyoung, Jy Young
    • Journal of the Korean Chemical Society
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    • v.43 no.4
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    • pp.407-411
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    • 1999
  • Studies have been carried out on the fabrication of PPy/GC and PPy/Pt electrode modified with polypyrrole film and determination of Cr(VI) by using 3-electrode system with modified electrodes. Modified electrodes were able to easily fabricated by cyclic voltammetry scanned from +1.0V to -1.0V(vs. Ag/AgCl) at 50 mV/sec. Film thickness could be controlled at same condition by the number of cycling up to 26 times. Reduction behaviour of Cr(VI) at PPy/GC electrode could be seen at wide potential ranges from +0.6V to -0.5V(vs. Ag/AgCl), and maximum reduction peak potential of the ion was observed at -0.25V(vs.Ag/AgCl). Calibration graph at its potential was linear from 0.1 ppm to 80.O ppm. Slope factor and relative coefficient were 1.75 mA/ppm and 0.998, respectively. Reduction behaviour of Cr(VI) at PPy/Pt electrode was similar to PPy/GC electrode, Calibration graph was linear from l.0 ppm to 60.0 ppm. Slope factor and relative coefficient were 0.5mA/ppm and 0.923, respectively. But PPy/GC modified electrode had about 3 times higher sensitivity than PPy/Pt modified electrode. Reduction behaviour of Cu(II), As(IlI), Pb(II), and Cd(II) couldn't be seen at PPy/GC electrode,Its metals had not lnterfered with Cr (VI) determination.

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Mechanical Properties and Electrical Conductivities of In-Situ Cu-9Fe-1.2X(X=Ag, Cr, Co) Microcomposite Wires (Cu-9Fe-1.2X (X=Ag, Cr, Co)계 미세복합재료전선의 기계적 특성 및 전기전도도)

  • Song, Jae-Suk;Im, Mun-Su;An, Jang-Ho;Hong, Sun-Ik
    • Korean Journal of Materials Research
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    • v.10 no.1
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    • pp.41-48
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    • 2000
  • In this study, microstructure and mechanical properties and electrical conductivities of in situ Cu-Fe-Xi(Xi=Ag, Cr or Co) alloy wires obtained by cold drawing combined with intermediate heat treatments have investigated. During cold working the primary and secondary dendrite arms are aligned along the drawing direction and elongated into filaments after deformation processing. The addition of Ag was found to be more effective in reducing the microstructural scale at the given draw ratio than that of Co or Cr throughout the drawing processing. The ultimate tensile strength and the conductivity of the Cu-Fe based composites containing Ag were higher than those of Cu-Fe composites containing Co or Cr. The good mechanical and electrical properties of Cu-Fe-Ag wires may be associated with the more uniform distribution of the finer filaments in the wires containing silver. The strength of Cu-Fe-Xi composites is dependent on the spacing of the Fe filaments in accord with a Hall-Petch relationship. The fracture surfaces of all the specimens showed ductile-type fracture and iron filaments occasionally observed on the fracture surfaces.

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Evaluation of Fe-Cr Systems Metallic Interconnectorby Spark Plasma Sintering (방전플라즈마 소결법을 이용한 Fe-Cr계 금속 연결재의 특성 평가)

  • Chang, Se-Hun;Hong, Ji-Min;Choi, Se-Weon;Kim, Hwi-Jun;Ahn, Jung-Ho;Oh, Ik-Hyun
    • Korean Journal of Materials Research
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    • v.17 no.8
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    • pp.397-401
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    • 2007
  • Fe based SOFC(Solid Oxide Fuel Cell) interconnector was fabricated by using the spark plasma sintering process and its microstructure and mechanical properties were investigated in this study. To fabricate the interconnector, the Fe-26Cr powder was mixed with the Ag (5, 10, 20wt.%) particles. In the Fe-26Cr-Ag sintered bodies, the Ag particles were almost dispersed at the grain boundary of the Fe-26Cr. The sintered bodies have the density of 87.2-97.5%, the density increases with increasing Ag content at sintering temperature of $850^{\circ}C$. Also, the compressive yield strength increases with increasing Ag content at the same sintering temperature.

Study of contact resistance using the transmission line method (TLM) pattern for metal of electrode (Cr/Ag & Ni) (TLM pattern을 사용한 Cr/Ag 및 Ni 전극에 따른 접합 저항 연구)

  • Hwang, Min-Young;Koo, Ki-Mo;Koo, Sun-Woo;Oh, Gyu-Jin;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.349-349
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    • 2010
  • Great performance of many semiconductor devices requirs the use of low-resistance ohmic contact. Typically, transmission line method (TLM) patterns are used to measure the specific contact resistance between silicon and metal. In this works, we investigate contact resistance for metal dependent (Cr/Ag, Ni) using TLM pattern based on silicon-on-insulator (SOI) wafer. The electrode with Ni linearly increases contact resistance as the pattern distance increase from $15{\mu}m$ to $75{\mu}m$ in accumulation part, but non-linearly increase in inversion part. In additional, the electrode with Cr/Ag linearly increases contact resistance as the pattern distance increase from $15{\mu}m$ to $75{\mu}m$ in inversion part, but non-linearly increase in accumulation part.

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