• 한국환경과학회지
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• 제15권6호
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• pp.533-538
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• 2006

Removal of $NO_x$ on $CaO/TiO_2$ photocatalyst manufactured by the addition of $Ca(OH)_2$ was measured in relation with the amount of $Ca(OH)_2$ and calcination temperature. In case of pure $TiO_2$, the $NO_x$ removal decreased greatly with the increase of calcination temperature from $500^{\circ}C\;to\;700^{\circ}C$, whereas in the photocatalyst added with $Ca(OH)_2$, the removed amount of $NO_x$ was high and constant regardless of calcination temperature. Considering $NO_x$ removal patterns depending on the amount of $Ca(OH)_2$ added(50, 30, 10wt%), high removal rate showed at the photocatalysts containing less than 30wt% of $Ca(OH)_2$, and it was about 30% higher than that of pure $TiO_2$. From the XRD patterns, it is seen that the addition of $Ca(OH)_2$ contributes to maintaining the anatase structure that is favourable to photocatalysis. It also indicates that the possibility of the formation of calcium titanate($CaTiO_3$) by reacting with $TiO_2$ above $700^{\circ}C$. Apart from the favourable crystalline structure, the addition of $Ca(OH)_2$ helped increase the alkalinity of photocatalyst surface, thus promoting the photooxidation reaction of $NO_x$.

• 수산해양기술연구
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• 제32권4호
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• pp.411-420
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• 1996

The structure of the scale formed on the surface of Fe - Cr - X alloys exposed to 1143K high sulfidation($Ps_2$ = 1.11$\times$$10^-7$ atm, $Po_2$ = 3.11$\times$$10^-20$ atm) or sulfidation/oxidation(($Ps_2$= 1.06$\times$$10^-7$ atm, ($Po_2$ = 3.11$\times$$10^-18$ atm) environment has been observed and analysed using XRD, SEM/EDS. To investigate the possibility of protective film formed on the surface of the alloys, Aluminium, Nickel were selected as alloying elements. Thermodynamic phase stability diagram was used to predict the reaction path of scale formed on Fe - Cr - X alloys. Parabolic rate constant($K_p$) value with 6wt% Al in Fe - 25Cr alloy decreased significantly compared with the Fe - 25Cr alloy without 6wt% Al. Since thin layer of defect free sulfide film, (Al, Cr)Sx, was formed at the alloy/scale interface. Fe - rich sulfide scale at outer layer and Cr - rich sulfide scale containing porosity at inner layer of Fe - 25Cr alloy have been observed. The reaction path for these scales could be predicted by the thermodynamic stability diagram.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1988년도 추계학술대회 논문집 학회본부
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• pp.147-150
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• 1988

Since the integration level of VLSI circuits progresses very quickly, a highly reliable thin $SiO_2$ film is required to fabricate a small-geometry MOS device. In the present study we have attempted to eliminate the failure-causing defects that develop in thin oxide films during the oxidation step by performing a long-time preoxidation and postoxidation annealing. The TDDB test and the copper decoration method were used to calculate the oxide defects density of MOS device. The dielectric reliability of high-quality thin oxides have been studied by using the time-zero-dielectric-breakdown (ramp-voltage-stressed I-V) and time-dependent-dielectric -breakdown (Constant-stressed I-V) tests. Failure times against temperature and electric field are examined and acceleration factors are abtained for each parameter. Based on the data obtained, breakdown wearout limitation for thin oxide films is estimated.

• Transactions on Electrical and Electronic Materials
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• 제18권6호
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• pp.311-315
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• 2017

The perovskite system $(Ba^{2+}{_{1-x}}La^{3+}{_x})Fe^{3+}{_{1-t}}Fe^{4+}{_t}O_{3-y}$ (y = (1 - x --t)/2) having a composition of x = 0.0, 0.1, 0.2, and 0.3 showedean increase in $Fe^{4+}$ mole ratios with an increase in oxygen partial pressure ($N_2{\rightarrow}air{\rightarrow}O_2$), and with an increasefin s, the $Fe^{3+}$ quantity decreased and oxygen content (3-y value) increased. For each N sampls heat-treated in $N_2$ gas, a considerable weight gain, i.e.g a steadynincrease if oxygen content, was observed in the TGA data on the cooling process. The conductivity values at a constant temperature were in the order of $N_2$$O_2$; the respective log ${\sigma}$ values (${\Omega}^{-1}{\cdot}cm^{-1}$) at 323 K of the BL0 sample were -5.75 (BL0-N), -3.39 (BL0-A), and -0.53 (BL0-O). The mixed valencies of $Fe^{3+}$ and $Fe^{4+}$ ions in each sample were also confirmed by both the oxidation curve above 350 mV and the cathodic reduction curve below 200 mV from cyclic voltammetry.

• 대한원격탐사학회지
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• 제3권1호
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• pp.1-10
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• 1987

The study was performed to recognize the most preferable spectral chennels for discriminating geological materials using the portable radiometer. The portable radiometer covers the visible and short infrared regions from approximately 0.4 to 2.5 microns which are coincided with Landsat TM, and the rock samples used for the study are pyrophylites, andesites, granite, granodiorite and silicified sedimentary rocks which are collected in Yangsan-Dongrae fault area. The analysis of the rock sample provides a preliminary basis for determining the wavelength regions showing diagnostic spectral features and for discriminating hydrothermal altered rocks from the unaltered rocks. The measurement of spectral of spectral reflectance for the rock samples was carried out in the laboratory which environment condition such as temperature, light sources, and humidity are constant. The analysis of the measured data was based on correlation between the reflectance value of the rock samples, and the follow discriptions are output of the study. 1) Pyrophyllite shows absorption at 0.83 $\mu\textrm{m}$ due to the oxidation of pyrite, and absorption at 2.22 $\mu\textrm{m}$ due to OH. 2) The altered rocks have generally higher reflectance than the unaltered rocks. 3) The ratio mesurement of pyrophyllites shows strong absorption at band 5/6 and band 6/4(in Landsat TM 5/7, 7/4). The ratio 1/5(Landsat TM 1/5) may be useful to discriminate andesite from the granite.

• 전기전자학회논문지
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• 제20권2호
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• pp.205-208
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• 2016

본 논문에서는 서로 다른 터치스크린용 실버페이스트를 본딩 방식으로 ITO 필름(ITO : Indium Tin Oxide film)위에 전도성 패턴을 형성하고 5장씩 본딩하여 건조 하였다. 여기서 건조 조건은 ITO 필름( ITO film)이 산화가 발생하지 않는 조건 이다. 신뢰성 테스트는 열 충격테스트와 고온 고습테스트를 진행한다. 각 테스트는 5장씩의 전도성 패턴 본딩상태를 확인한다. 전도성 패턴본딩을 각 240, 480, 615 시간 마다 상태를 확인하였다. 이러한 신뢰성 테스트 통해 서로 다른 실버페이스트의 접착력, 전도성의 변화 등을 알 수 있으므로 품질 저하를 막을 수 있다. 그리고 저온경화 실버페이스트는 표면에 변색이 빨리 올 수 있음을 알 수 있었다.

• Journal of Microbiology and Biotechnology
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• 제22권10호
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• pp.1446-1451
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• 2012

Levodopa or L-3,4-dihydroxyphenylalanine (L-DOPA) is the precursor of the neurotransmitter dopamine. L-DOPA is a famous treatment for Parkinson's disease symptoms. In this study, electroenzymatic synthesis of L-DOPA was performed in a three-electrode cell, comprising a Ag/AgCl reference electrode, a platinum wire auxiliary electrode, and a glassy carbon working electrode. L-DOPA had an oxidation peak at 376 mV and a reduction peak at -550 mV. The optimum conditions of pH, temperature, and amount of free tyrosinase enzyme were pH 7, $30^{\circ}C$, and 250 IU, respectively. The kinetic constant of the free tyrosinase enzyme was found for both cresolase and catacholase activity to be 0.25 and 0.4 mM, respectively. A cyclic voltammogram was used to investigate the electron transfer rate constant. The mean heterogeneous electron transfer rate ($k_e$) was $5.8{\times}10^{-4}$ cm/s. The results suggest that the electroenzymatic method could be an alternative way to produce L-DOPA without the use of a reducing agent such as ascorbic acid.

• Korean Chemical Engineering Research
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• 제60권4호
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• pp.620-629
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• 2022

가열 속도, 몰 공간속도, 질화반응온도 등 다양한 실험 조건을 변화하며 바나디움 산화물과 암모니아와의 승온 질화반응을 통하여 바나디움 산화질화물을 제조하여 특성분석을 수행하였으며 제조된 바나디움 산화질화물 상에서 암모니아 분해반응의 촉매 활성을 검토하였다. 제조된 촉매의 물리·화학적 특성을 알아보기 위하여 N₂ 흡착분석, X-선 회절분석(XRD), 수소 승온환원(H₂-TPR), 산소 존재 하 승온산화 (TPO), 암모니아 탈착 (NH₃-TPD), 투과전자현미경(TEM) 분석을 수행하였다. 340 ℃에서 5 m² g^-1의 낮은 비표면적을 갖는 V₂O₅의 환원에 의하여 V₂O₃ 으로의 변환은 미세 기공 형성에 의해 115 m² g^-1 높은 비표면적 값을 보여주었으며 그 이상의 질화반응 온도가 증가함에 따라 소결현상에 의해 지속적인 비표면적의 감소를 초래하였다. 비표면적에 가장 큰 영향을 미치는 질화반응 변수는 반응온도였으며, 단일 상의 VN_xO_y의 x + y 값은 질화반응온도가 증가함에 따라 1.5에서 1.0으로 근접하였으며 680 ℃의 높은 반응온도에서 입방 격자상수 a는 VN 값에 근접하였다. 본 실험 조건 중에 질화반응온도가 가장 높았던 680 ℃에서 암모니아 전환율은 93%로 나타났으며 비활성화는 관찰되지 않았다.

• 공업화학
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• 제2권1호
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• pp.47-55
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• 1991

탄소침적된 수소첨가반응용 Ni 촉매의 활성재생에 관하여 연구하였다. 침적된 탄소는 여러 가지 농도의 산소로 산화시켜 제거하였으며, 촉매의 활성은 아닐린 수소첨가반응을 model 반응으로 하여 측정하였다. 탄소침적된 촉매를 산화처리할 경우 처리온도가 증가함에 따라 표면적이 증가하다가 감소하는 현상을 보였으며, 최대 표면적을 나타내는 처리온도는 처리 산소농도가 감소함에 따라 증가하였다. 처리 산소농도가 높을수록 침적탄소의 산화에 의한 반응열로 인하여 Ni 입자의 소결현상 및 담체의 기공감소가 심하게 나타났다. 5 % 산소로 처리한 촉매의 경우, 촉매의 활성이 약 90% 까지 회복되었으나 20% 산소로 처리한 촉매의 경우, 활성의 회복을 기대할 수 없었다. 5 % 산소로 재생처리할 경우, 촉매의 활성은 산화처리 시간이 증가할수록 증가하였으나, 1 시간 이후에는 거의 일정하였다.

• 한국세라믹학회지
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• 제33권5호
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• pp.572-582
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• 1996

전류밀도, 70mA/cm2와 전류인가시간, 5초, 10초 조건의 양극반응으로 다공성 실리콘을 제작하여 800~110$0^{\circ}C$에서 열산화시킨 후 AI 전극을 증착시켜 만든 MOS(Metal Oxide Semiconductor) 구조의 C-V(Capacilance-Voltage) 특성을 조사하였다. 800, 90$0^{\circ}C$의 저온과 20~30분 이내의 단시간 산화에서는 산화막의 유전상수가 보통의 열산화막보다 크게 나타나고, 산화온도가 110$0^{\circ}C$의 고온과 60분 이상의 장시간 산화의 경우에는 3.9에 근접한 값을 갖는다. 이는 다공성 실리콘 산화막내에 존재하는 산화되지 않은 silicon들에 의한 효과와 표면적 증가에 의한 정전용량의 증가 효과가 복합적으로 작용하는 것이 그 원인이라 생각된다.