• 제목/요약/키워드: Conductive Metal

검색결과 317건 처리시간 0.025초

Effect of Cobalt Loading on the Performance and Stability of Oxygen Reduction and Evolution Reactions in Rechargeable Zinc-air Batteries

  • Sheraz Ahmed;Joongpyo Shim;Gyungse Park
    • 대한화학회지
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    • 제68권2호
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    • pp.87-92
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    • 2024
  • The commercialization of rechargeable metal-air batteries is extremely desirable but designing stable oxygen reduction reaction (ORR) catalysts with non-noble metal still has faced challenges to replace platinum-based catalysts. The nonnoble metal catalysts for ORR were prepared to improve the catalytic performance and stability by the thermal decomposition of ZIF-8 with optimum cobalt loading. The porous carbon was obtained by the calcination of ZIF-8 and different loading amounts of Co nanoparticles were anchored onto porous carbon forming a Co/PC catalyst. Co/PC composite shows a significant increase in the ORR value of current and stability (500 h) due to the good electronic conductive PCN support and optimum cobalt metal loading. The significantly improved catalytic performance is ascribed to the chemical structure, synergistic effects, porous carbon networks, and rich active sites. This method develops a new pathway for a highly active and advantageous catalyst for electrochemical devices.

비균일 열전도성 반응블럭의 반응특성 연구 (A Kinetic Study of Non-uniform Thermal Conductive Reaction Block)

  • 박성호;윤여일;김성현
    • 공업화학
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    • 제8권5호
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    • pp.872-879
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    • 1997
  • 암모니아와 금속염과의 기-고 반응을 이용한 화학열펌프에서 열전달 특성과 물질전달 특성을 개선하기 위하여 금속염을 팽창흑연에 반지름 방향으로 겉보기 밀도가 증가하도록 함침시켜 새로운 비균일 열전도성 반응블럭을 제조하였다. 이것은 겉보기 밀도가 반지름 방향으로 165, 222, 279, 337, $394(kg/m^3)$로 증가하도록 만든 것으로 균일 열전도성 반응블럭과 반응특성을 비교하였다. 실험결과 열전달특성은 비균일 열전도성 반응블럭이 훨씬 좋았고, 반응을 반복함에 따라 물질전달과 반응특성이 개선되었으며 반응의 재현성도 양호함을 알 수 있었다.

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잉크젯 인쇄 기술을 이용한 인쇄회로기판용 나노구리배선 개발 (Cu Line Fabricated with Inkjet Printing Technology for Printed Circuit Board)

  • 서상훈;이로운;윤관수;정재우;이희조;육종관
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2008년도 추계학술대회A
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    • pp.1806-1809
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    • 2008
  • Study that form micro pattern by direct ink jet printing method is getting attention recently. Direct ink jet printing spout fine droplet including nano metal particle by force or air pressure. There is reason which ink jet printing method is profitable especially in a various micro-patterning technology. It can embody patterns directly without complex process such as mask manufacture or screen-printing for existent lithography. In this study, research of a technology that ejects fine droplet form of Pico liter and forms metal micro pattern was carried with inkjet head of piezoelectricity drive system. Droplet established pattern while ejecting consecutively and move on the surface at the fixed speed. Patterns formed in ink are mixed with organic solvent and polymer that act as binder. So added thermal hardening process after evaporate organic solvent at isothermal after printing. I executed high frequency special quality estimation of CPW transmission line to confirm electrical property of manufactured circuit board. We tried a large area printing to confirm application possibility of an ink jet technology.

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비정질 $Ge_2Sb_2Te_5$ 박막의 상변화에 따른 전기적 특성 연구 (The electrical properties and phase transition characteristics of amorphous $Ge_2Sb_2Te_5$ thin film)

  • 양성준;이재민;신경;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.210-213
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    • 2004
  • The phase transition between amorphous and crystalline states in chalcogenide semiconductor films can controlled by electric pulses or pulsed laser beam; hence some chalcogenide semiconductor films can be applied to electrically write/erase nonvolatile memory devices, where the low conductive amorphous state and the high conductive crystalline state are assigned to binary states. Memory switching in chalcogenides is mostly a thermal process, which involves phase transformation from amorphous to crystalline state. The nonvolatile memory cells are composed of a simple sandwich (metal/chalcogenide/metal). It was formed that the threshold voltage depends on thickness, electrode distance, annealing time and temperature, respectively.

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Removal of Post Etch/Ash Residue on an Aluminum Patterned Wafer Using Supercritical CO2 Mixtures with Co-solvents and Surfactants: the Removal of Post Etch/Ash Residue on an Aluminum Patterned Wafer

  • You, Seong-sik
    • 반도체디스플레이기술학회지
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    • 제16권2호
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    • pp.55-60
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    • 2017
  • The supercritical $CO_2$ (sc-$CO_2$) mixture and the sc-$CO_2$-based Photoresist(PR) stripping(SCPS) process were applied to the removal of the post etch/ash PR residue on aluminum patterned wafers and the results were observed by scanning of electron microscope(SEM). In the case of MDII wafers, the carbonized PR was able to be effectively removed without pre-stripping by oxygen plasma ashing by using sc-$CO_2$ mixture containing the optimum formulated additives at the proper pressure and temperature, and the same result was also able to be obtained in the case of HDII wafer. It was found that the efficiency of SCPS of ion implanted wafer improved as the temperature of SCPS was high, so a very large amount of MEA in the sc-$CO_2$ mixture could be reduced if the temperature could be increased at condition that a process permits, and the ion implanted photoresist(IIP) on the wafer was able to be removed completely without pre-treatment of plasma ashing by using the only 1 step SCPS process. By using SCPS process, PR polymers formed on sidewalls of metal conductive layers such as aluminum films, titanium and titanium nitride films by dry etching and ashing processes were removed effectively with the minimization of the corrosion of the metal conductive layers.

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산화물이 코팅된 전도성 금속 분말의 제조 및 태양전지 전면 전극으로의 응용 (Synthesis of Metal Oxide-Coated Conductive Metal Powders and Their Application to Front Electrodes for Solar Cells)

  • 박진경;이영인
    • 한국재료학회지
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    • 제24권9호
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    • pp.502-507
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    • 2014
  • Recently, improvement in the conversion efficiency of silicon-based solar cells has been achieved by decreasing emitter doping concentration, because the lightly doped emitter can effectively prevent the recombination of electrons and holes generated by solar light irradiation. This type of emitter is very thin due to the low doping concentration, thus conductive materials (i.e., silver) used for front electrodes can easily penetrate the emitter during a firing process because of their large diffusivity in silicon. This results in junction leakage currents which might reduce cell efficiencies. In this study, $Al_2O_3$-coated Ag powders were synthesized by an ultrasonic spray pyrolysis method and applied to the conductive materials of the front electrode to control the junction leakage current. The $Al_2O_3$ shell obstructs the Ag diffusion into the emitter during the firing process. The powder is spherical with a core-shell structure and the thickness of the $Al_2O_3$ shell is tens of nanometers. Solar cells were fabricated using pure Ag powders or the $Al_2O_3$-coated Ag powder as front electrode materials, and the conversion efficiency and junction leakage current were compared to investigate the role of the $Al_2O_3$ shell during the firing processes.

Electrical Switching Characteristics of Ge-Se Thin Films for ReRAM Cell Applications

  • Kim, Jang-Han;Nam, Ki-Hyun;Chung, Hong-Bay
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.343-344
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    • 2012
  • It has been known since the mid 1960s that Ag can be photodissolved in chalcogenide glasses to form materials with interesting technological properties. In the 40 years since, this effect has been used in diverse applications such as the fabrication of relief images in optical elements, micro photolithographic schemes, and for direct imaging by photoinduced Ag surface deposition. ReRAM, also known as conductive bridging RAM (CBRAM), is a resistive switching memory based on non-volatile formation and dissolution of a conductive filament in a solid electrolyte. Especially, Ag-doped chalcogenide glasses and thin films have become attractive materials for fundamental research of their structure, properties, and preparation. Ag-doped chalcogenide glasses have been used in the formation of solid electrolyte which is the active medium in ReRAM devices. In this paper, we investigated the nature of thin films formed by the photo-dissolution of Ag into Ge-Se glasses for use in ReRAM devices. These devices rely on ion transport in the film so produced to create electrically programmable resistance states. [1-3] We have demonstrated functionalities of Ag doped chalcogenide glasses based on their capabilities as solid electrolytes. Formation of such amorphous systems by the introduction of Ag+ ions photo-induced diffusion in thin chalcogenide films is considered. The influence of Ag+ ions is regarded in terms of diffusion kinetics and Ag saturation is related to the composition of the hosting material. Saturated Ag+ ions have been used in the formation of conductive filaments at the solid electrolyte which is the active medium in ReRAM devices. Following fabrication, the cell displays a metal-insulator-metal structure. We measured the I-V characteristics of a cell, similar results were obtained with different via sizes, due to the filamentary nature of resistance switching in ReRAM cell. As the voltage is swept from 0 V to a positive top electrode voltage, the device switches from a high resistive to a low resistive, or set. The low conducting, or reset, state can be restored by means of a negative voltage sweep where the switch-off of the device usually occurs.

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Resistive Memory Switching in Ge5Se5 Thin Films

  • Kim, Jang-Han;Hwang, Yeong-Hyeon;Chung, Hong-Bay
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.326-326
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    • 2014
  • It has been known since the mid 1960s that Ag can be photodissolved in chalcogenide glasses to form materials with interesting technological properties. In the 40 years since, this effect has been used in diverse applications such as the fabrication of relief images in optical elements, micro photolithographic schemes, and for direct imaging by photoinduced Ag surface deposition. ReRAM, also known as conductive bridging RAM (CBRAM), is a resistive switching memory based on non-volatile formation and dissolution of a conductive filament in a solid electrolyte. Especially, Ag-doped chalcogenide glasses and thin films have become attractive materials for fundamental research of their structure, properties, and preparation. Ag-doped chalcogenide glasses have been used in the formation of solid electrolyte which is the active medium in ReRAM devices. In this paper, we investigated the nature of thin films formed by the photo-dissolution of Ag into Ge-Se glasses for use in ReRAM devices. These devices rely on ion transport in the film so produced to create electrically programmable resistance states [1-3]. We have demonstrated functionalities of Ag doped chalcogenide glasses based on their capabilities as solid electrolytes. Formation of such amorphous systems by the introduction of Ag+ ions photo-induced diffusion in thin chalcogenide films is considered. The influence of Ag+ ions is regarded in terms of diffusion kinetics and Ag saturation is related to the composition of the hosting material. Saturated Ag+ ions have been used in the formation of conductive filaments at the solid electrolyte which is the active medium in ReRAM devices. Following fabrication, the cell displays a metal-insulator-metal structure. We measured the I-V characteristics of a cell, similar results were obtained with different via sizes, due to the filamentary nature of resistance switching in ReRAM cell. As the voltage is swept from 0 V to a positive top electrode voltage, the device switches from a high resistive to a low resistive, or set. The low conducting, or reset, state can be restored by means of a negative voltage sweep where the switch-off of the device usually occurs.

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Effects of a Metal Plane on a Meandered Slot Antenna for UHF RFID Applications

  • Kim, Ji-Kwon;Oh, Il-Young;Koo, Tae-Wan;Kim, Jun-Chul;Kim, Dong-Su;Yook, Jong-Gwan
    • Journal of electromagnetic engineering and science
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    • 제12권2호
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    • pp.176-184
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    • 2012
  • In this paper, the effects of a metal plane on the performance of a meandered slot RFID antenna are evaluated in a real environment, and 3 metal plane cases are considered (the most likely scenarios in which metal conductive materials are placed near the tag antenna). The metal plane effects can be categorized as matching degradation and antenna gain variation. First, matching degradation due to the antenna's induced mutual impedance is experimentally investigated. In addition, the gain variation is investigated to figure out the change in the radiation characteristics. With the derived antenna parameters, the read range is calculated with the Friis transmission equation and measured to analyze the effects of a metal plane on RFID system performance. The calculated and measured read range varies from 9.3 m to 19.1 m as the distance between the RFID antenna and the metal plane changes.

금속 나노 입자를 이용한 인쇄 회로 기판의 회로 형성 (Formation of electric circuit for printed circuit board using metal nano particles)

  • 정재우
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.545-545
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    • 2007
  • Recently, innovative process has been investigated in order to replace the conventional high-cost micro patterning processes on the electronic products. To produce desirable profit margins from this low cost products, printed circuit board(PCB), will require dramatic changes in the current manufacturing philosophies and processes. Innovative process using metal nano particles replaces the current industry standard of subtractive etched of copper as a highly efficient way to produce robust circuitry on low cost substrates. An advantage of using metal nano particles process in patterned conductive line manufacturing is that the process is additive. Material is only deposited in desired locations, thereby reducing the amount of chemical and material waste. Simply, it just draws on the substrate as glass epoxy or polyimide with metal nano particles. Particles, when their size becomes nano-meter scale, show some specific characteristics such as enhanced reactivity of surface atoms, decrease in melting point, high electric conductivity compared with the bulk. Melting temperature of metal gets low, the metal nano particles could be formated onto polymer substrates and sintered under $300^{\circ}C$, which would be applied in PCB. It can be getting the metal line of excellent electric conductivity.

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