• Title/Summary/Keyword: Conditioning Disk

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The Study on the Performance Characteristics due to the Degree of Superheat in $NH_3$ Refrigeration System (III) -The Comparison of Heat Exchanger Types- ($NH_3$ 냉동장치의 과열도에 관한 성능 특성 연구(III) -열교환기 타입별 비교-)

  • Lee Jong-In;Kim Yang-Hyun;Park Chan-Soo;Ha Ok-Nam
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.17 no.12
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    • pp.1132-1138
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    • 2005
  • Recently, production and use of freon substances are restrained due to depletion of ozone layer and global warming. In this aspect of environmental problems, the best solution is to use the natural refrigerant such as ammonia. Thus, this study is to find the optimal operating conditions by comparing the performance between the shell and tube type and shell and disk type heat exchangers using the ammonia refrigerant, and to verify the superiority of the shell and disk type heat exchanger that is not used in field of refrigeration and air conditioning. Finally, this study shows that the shell and disk type heat exchanger is applicable to the ammonia refrigeration system, and this system minimizes the refrigerant charge and installation space.

Study on the Pad Wear Profile Based on the Conditioner Swing Using Deep Learning for CMP Pad Conditioning (CMP 패드 컨디셔닝에서 딥러닝을 활용한 컨디셔너 스윙에 따른 패드 마모 프로파일에 관한 연구)

  • Byeonghun Park;Haeseong Hwang;Hyunseop Lee
    • Tribology and Lubricants
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    • v.40 no.2
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    • pp.67-70
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    • 2024
  • Chemical mechanical planarization (CMP) is an essential process for ensuring high integration when manufacturing semiconductor devices. CMP mainly requires the use of polyurethane-based polishing pads as an ultraprecise process to achieve mechanical material removal and the required chemical reactions. A diamond disk performs pad conditioning to remove processing residues on the pad surface and maintain sufficient surface roughness during CMP. However, the diamond grits attached to the disk cause uneven wear of the pad, leading to the poor uniformity of material removal during CMP. This study investigates the pad wear rate profile according to the swing motion of the conditioner during swing-arm-type CMP conditioning using deep learning. During conditioning, the motion of the swing arm is independently controlled in eight zones of the same pad radius. The experiment includes six swingmotion conditions to obtain actual data on the pad wear rate profile, and deep learning learns the pad wear rate profile obtained in the experiment. The absolute average error rate between the experimental values and learning results is 0.01%. This finding confirms that the experimental results can be well represented by learning. Pad wear rate profile prediction using the learning results reveals good agreement between the predicted and experimental values.

The Pad Recovery as a function of Diamond Shape on Diamond Disk for Metal CMP (Metal CMP 용 컨디셔너 디스크 표면에 존재하는 다이아몬드의 형상이 미치는 패드 회복력 변화)

  • Kim, Kyu-Chae;Kang, Young-Jae;Yu, Young-Sam;Park, Jin-Goo;Won, Young-Man;Oh, Kwang-Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.13 no.3 s.40
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    • pp.47-51
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    • 2006
  • Recently, CMP (Chemical Mechanical Polishing) is one of very important processing in semiconductor technology because of large integration and application of design role. CMP is a planarization process of wafer surface using the chemical and mechanical reactions. One of the most important components of the CMP system is the polishing pad. During the CMP process, the pad itself becomes smoother and glazing. Therefore it is necessary to have a pad conditioning process to refresh the pad surface, to remove slurry debris and to supply the fresh slurry on the surface. A conditioning disk is used during the pad conditioning. There are diamonds on the surface of diamond disk to remove slurry debris and to polish pad surface slightly, so density, shape and size of diamond are very important factors. In this study, we characterized diamond disk with 9 kinds of sample.

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A Study on the Ultrasonic Conditioning for Interlayer Dielectic CMP (층간절연막 CMP의 초음파 컨디셔닝 특성에 관한 연구)

  • 서헌덕;정해도;김형재;김호윤;이재석;황징연;안대균
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2000.05a
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    • pp.854-857
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    • 2000
  • Chemical Mechanical Polishing(CMP) has been accepted as one of the essential processes for VLSI fabrication. However, as the polishing process continues, pad pores get to be glazed by polishing residues, which hinder the supply of new slurry. This defect makes removal rate decrease with a number of polished wafer and the desired within-chip planarity, within wafer and wafer-to-wafer nonuniformity are unable to be achieved. So, pad conditioning is essential to overcome this defect. The eletroplated diamond grit disk is used as the conventional conditioner, And alumina long fiber, the .jet power of high pressure deionized water and vacuum compression are under investigation. But, these methods have the defects like scratches on wafer surface by out of diamond grits, subsidences of pad pores by over-conditioning, and the limits of conditioning effect. To improve these conditioning methods. this paper presents the Characteristics of Ultrasonic conditioning aided by cavitation.

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A Study on Novel Conditioning for CMP (화학기계적연마(CMP) 컨디셔닝에 관한 연구)

  • Lee, Sung-Hoon;Kim, Hyoung-Jae;Ahn, Dae-Gyun;Jeong, Hae-Do
    • Journal of the Korean Society for Precision Engineering
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    • v.16 no.5 s.98
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    • pp.40-47
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    • 1999
  • In CMP for semiconductor wafer films, the acceptable within-chip planarity, within-wafer and wafer-to-wafer nonuniformity could be achieved by conditioning. The role of conditioning is to remove continuously polishing residues from pad and to maintain the initial pad surface pores. To reach these requirements, the diamond grits disk has been considered as a conventional conditioner. However, we have investigated many defects as scratch on wafers out of diamond grits shedding, contaminations from bonding materials, and pad pore subsidences by over-conditioning. So, this paper studies the effect of ultrasonic vibration in CMP conditioning as a representative. The effect of ultrasonic vibration was certified through ILD, Metal CMP.

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Required Mowing Power and Bale Density of Miscanthus × Giganteus for Field Biomass Harvesting using Different Methods

  • Jun, Hyeon-Jong;Choi, Il-Su;Kang, Tae-Gyoung;Choi, Yong;Choi, Duck-Kyu;Lee, Choung-Keun
    • Journal of Biosystems Engineering
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    • v.39 no.4
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    • pp.253-260
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    • 2014
  • Purpose: This study investigated the harvesting properties of the giant miscanthus (Miscanthus ${\times}$ giganteus) to measure the required mowing power for different stem conditioning methods in order to shorten the drying time after mowing and the bale density so that the crop can be used as biomass in the winter season. Methods: The required mowing power and bale density were measured using a power measurement device, three different mower-conditioners, and a mid-sized round baler under different working speeds and conditioning methods. Results: For the various mower-conditioners, the average stem length from mowing was 0.86-0.91 m, and the available working speed was 1.6 m/s. The steel roller-type mower-conditioner showed better stem conditioning but could not mow over a working speed of 1.6 m/s. The required average power of the mower-conditioners varied from 23.8 kW for the steel roller-type rotary disk mower-conditioner with a working width of 2.4 m to 37.2 kW for the flail-type rotary disk mower-conditioner with a working width of 3.2 m at a working speed of 1.6 m/s. The bale densities were $155.8-172.2kg/m^3$. The highest bale density was measured for stems with no conditioning and a moisture content of 11.3% (d.b.) mowed by the rotary disk mower. The bale density was affected by the mowing method because of the low moisture content of the miscanthus stems. Conclusions: In terms of the working performance and conditioning statue, the steel roller-type mower-conditioner is a better choice at a working width of 2.4 m, while the flail finger-type mower-conditioner is better at a working width of 3.2 m. The type of mower-conditioner used for giant miscanthus harvesting should be determined by considering the harvest area, workable period, and working performance of a mower-conditioner and baler during the winter.

The Study on Performance Characteristics in Freon Refrigeration System using Shell and Disk Type Heat Exchanger (셸앤디스크형 열교환기를 적용한 프레온 냉동장치의 성능특성 연구)

  • Kim, Yang-Hyun;Park, Chan-Soo;Lee, Seong-Jae;Kim, Jin-Hyun;Ha, Ok-Nam
    • Proceedings of the SAREK Conference
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    • 2005.11a
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    • pp.579-584
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    • 2005
  • Nowadays heat exchangers that have been applied for freon refrigerating systems, a shell and tube type condenser and a flooded evaporator have been used, but because of their large size, large space for installation and amount of refrigerants are needed. In this study, we will find the most suitable operating condition of shell and disk type optimum heat exchanger which can minimize the amount of a refrigerant and allow its minimum leakage. The condensing pressure of refrigeration system is increased from 15.0bar to 16.0bar and degree of superheat is increased from 0 to $10^{\circ}C$ at each condensing pressure. As a result of study, It revealed that shell and disk type heat exchanger was applicable to the freon refrigeration system

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Stability Analysis of the Karman Boundary-Layer Flow

  • Lee, Yun-Yong;Hwang, Young-Kyu
    • International Journal of Air-Conditioning and Refrigeration
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    • v.10 no.1
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    • pp.50-63
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    • 2002
  • The Karman boundary-layer has been numerically investigated for the disturbance wave number, wave velocity, azimuth angle and radius (Reynolds number, Re). The disturbed flow over rotating disk can lead to transition at a much lower Re than that of the well-known Type I instability. This early transition is due to the excitation of the Type II. Presented are the neutral stability results concerning these instabilities by solving newly formulated stability equations with consideration of whole convective terms. When the present numerical results are compared with the previously known results, the value of critical Re corresponding to Type I is moved from ${Re}_{c.1}$=285.3 to 270.2 and the value corresponding to Type II from ${Re}_{c.2}$=69.4 to 36.9, respectively. Also, the corresponding wave number is moved fro)m $k_1$=0.378 to 0.386 for Type I; from $k_2$=0.279 to 0.385 for Type II. For Type II, the upped limit of wave number and azimuth angle is $k_u$=0.5872, $\varepsilon_u$=$-17.5^{\circ}$, while its lower limit is near $k_u$=0, $\varepsilon_u$=$-28.4^{\circ}$. This implies that the disturbances will be relatively fast amplified at small Re and within narrow bands of wave number compared with the previous results.