• 한국전기전자재료학회논문지
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• 제11권3호
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• pp.195-202
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• 1998

The LPCVD system of batch type for the massproduction of semiconductor fabrication has a problem of phosphorous concentration uniformity in the boat. In this paper we study an improvement of the uniformity for phosphorous concentration and sheet resistance. These property was improved by using the nitrogen process and modified long nozzle for gas injection tube in the doped polysilicon deposition system. The phosphorous concentration and its uniformity for polysilicon film are measured by XRF(X-ray Fluorescence) for the conventional process condition and nitrogen process. In conventional process condition, the phosphorous concentration, it uniformity and sheet resistance for polysilicon film are in the range of 3.8~5.4$\times$10\ulcorner atoms/㎤, 17.3% and 59~$\Omega$/ , respectively. For the case of nitrogen process the corresponding measurements exhibited between 4.3~5.3$\times$10\ulcorner atoms/㎤, 10.6% and 58~81$\Omega$/ . We find that in the nitrogen process the uniformity of phosphorous concentration improved compared with conventional process condition, however, the sheet resistance in the up zone of the boat increased about 12 $\Omega$/ . In modified long nozzle, the phosphorous concentration, its uniformity and sheet resistance for polysilicon films are in the range of 4.5~5.1$\times$10\ulcorner atoms/㎤, 5.3% and 60~65$\Omega$/ respectively. Annealing after $N_2$process gives the increment of grain size and the decrement of roughness. Modification of nozzle gives the increment of injection amount of PH$_3$. Both of these suggestion result in the stable phosphorous concentration and sheet resistance. The results obtained in this study are also applicable to process control of batch type system for memory device fabrication.

• 한국표면공학회지
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• 제18권3호
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• pp.105-115
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• 1985

Lead-tin-copper ternary alloy electrodeposition is conducted onto the inner bore surface of plain bearings as an overlay in order to investigate the effect of slot width, current density and fluoboric acid concentration on the uniformity of overlay. The thickness of overlay is analyzed by means of current distribution resulting from the overvoltage of plating bath and the apparent distance between cathode and anode. The result demonstrate that the uniformity of overlay is remarkably dependent of the slot size and current density, but has little bearing on the fluoboric acid concentration over 100g/L. This present study indicates that uniform overlay is obtainable within the tolerable thickness of ${\pm}2{\mu}m$ by using the slot width of 22mm. The surface morphology examination also shows the important role of concentration polarization of the micro-uniformity of overlay. The micro-uniformity has improved at the low concentration polarization which resulted from operating at the low current density and high fluoboric acid concentration. The surface morphology of deposits exhibits the vivid pyramid crystalline in the plating condition of low concentration polarizatio and all deposits have columnar structure parallel to the applied electric field regardless of the electroplating condition used.

• 한국전기전자재료학회논문지
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• 제18권10호
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• pp.929-935
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• 2005

In this paper, synthetic conditions of titania nanparticle was investigated to enhance its uniformity of the particle size as a child particle on organic mother particle of liquid powder type electronic paper. The physical properties are very important to improve the uniformity of electrical charging properties Concentration of titania raw material ($C_9H_{19}NO_4Ti$) in the ethanol solvent, pH, and concentration of the solution in the D.I. water were selected as parameters. As a result, ultrafine and well crystallized titania nanoparticle with good uniformity could be synthesized as the concentration of the $C_9H_{19}NO_4Ti$ in the ethanol solvent, pH of the solution, and the amount of the D.I. water were increased. Using the optimized conditions, the titania nanparoticle with uniformly ultrafime size of 10 nm could be synthesized.

• 한국환경과학회지
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• 제22권11호
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• pp.1481-1498
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• 2013

The SCR (selective catalytic reduction) system is highly-effective technique for NOx reduction from exhaust gases. In this study, the effects of the direction and size of nozzle and the ammonia injection concentration on the performance of SCR system are analyzed by using the computational fluid dynamics method. When the nozzle is arranged in zigzaged direction which is normal to exhausted gas flow, it is shown that the uniformity of gas flow and the NH3/NO molar ratio is improved remarkably. With the change of the ammonia injection concentration from 0.2 vol%(wet) to 1.0 vol%(wet), the uniformity of gas flow shows a good results. As the size of nozzle diameter changes from 6 mm to 12 mm, the uniformity of gas flow is maintained well. It is shown that the uniformity of the $NH_3/NO$ molar ratio becomes better with decreasing the ammonia injection concentration and the size of nozzle diameter.

• 한국전산유체공학회:학술대회논문집
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• 한국전산유체공학회 2010년 춘계학술대회논문집
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• pp.567-570
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• 2010

With continuously increasing flat panel display size, uniformity of thin film deposition has been drawing more attentions and associated fabrication methodologies are being actively investigated. Since the convective flow field of mixture gas plays a significant role for deposition characteristics of thin film in an APCVD system, it is greatly important to maintain uniform distribution and consistent concentration of mixture gas species. In this paper, computational study has been performed for the improvement of flow uniformity of mixture gas in an APCVD reactor during thin film deposition process. A diffuser slit has bee designed to spread the locally concentrated gas flow exiting from the flow distributor. A uniform flow distributor has been developed which has less dependency on operating conditions for global flow uniformity

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2006년도 제26회 춘계학술대회논문집
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• pp.130-134
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• 2006

분사면 냉각성능을 개선하기 위한 액체로켓 엔진 연료 매니폴드내의 분리판 설치에 따른 분사균일성 변화를 관찰하였다. 3차원 전산유동해석으로 5개 후보 설계에 대하여 분사균일성을 비교하였으며 최적설계에 대하여 측정결과와 비교함으로써 해석방법을 검증하였다. case I과 II는 매니폴드로 공급되는 유량 전체가 분리판 아래로만 흘러 유속이 크게 증가한다. 하지만 분리판이 끝나는 지점에서의 유속변화와 분사면 중심에서의 유량의 집중으로 분사균일성이 크게 저하된다. 이에 비해 분리판이 입구에서 떨어져 장착된 case III와 IV는 유동이 분리판 위, 아래로 흐를 수 있어 유량집중이 완화되므로 균일한 분사특성을 가진다. 비교한 5가지 설계 중 냉각성능과 분사균일성 측면에서 case IV가 최적으로 판단된다.

• International Journal of Advanced Culture Technology
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• 제10권3호
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• pp.295-306
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• 2022

The NOx removal performance of the SCR process depends on various factors such as catalytic factors (catalyst composition, shape, space velocity, etc.), temperature and flow rate distribution of the exhaust gas. Among them, the uniformity of the flow flowing into the catalyst bed plays the most important role. In this study, the flow characteristics in the SCR reactor in the design stage were simulated using a three-dimensional numerical analysis technique to confirm the uniformity of the airflow. Due to the limitation of the installation space, the shape of the inlet duct was compared with the two types of inlet duct shape because there were many curved sections of the inlet duct and the duct size margin was not large. The effect of inlet duct shape, guide vane or mixer installation, and venturi shape change on SCR reactor internal flow, airflow uniformity, and space utilization rate of ammonia concentration were studied. It was found that the uniformity of the airflow reaching the catalyst layer was greatly improved when an inlet duct with a shape that could suppress drift was applied and guide vanes were installed in the curved part of the inlet duct to properly distribute the process gas. In addition, the space utilization rate was greatly improved when the duct at the rear of the nozzle was applied as a venturi type rather than a mixer for uniform distribution of ammonia gas.

• 한국세라믹학회지
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• 제42권8호
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• pp.548-553
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• 2005

$TiO_2$ nanofibers were fabricated by annealing electrospun $TiO_2$/PVP nanofibers for 3 h at $500^{\circ}C$ in air. Size and uniformity of electrospun $TiO_2$ nanofiber diameters were evaluated via XRD and SEM by varying electric field, PVP concentration, Ti tetraisopropoxide concentration and precursor flow rate. Experimental results revealed that the effect of PVP concentration on size and uniformity of electrospun $TiO_2$ nanofiber diameters was most profound, however, the other effects were relatively small. Uniform fibers with no beads were observed for the electrospun anatase titania nanofibers with a diameter of 170 nm.

• 대한기계학회논문집B
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• 제22권2호
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• pp.173-183
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• 1998

An optimization procedure to find the inlet concentration profile that yields the most uniform deposition rate in a cylindrical CVD chamber has been developed. Assuming that the chemical reaction time is negligibly small, a SIMPLE based finite-volume method is adopted to solve the fully elliptic equations for momentum, temperature, and concentration. The inlet concentration profile is expressed by a linear combination of Chebyshev polynomials and the coefficients of which are determined by the local random search technique. It is shown that the present method is very effective in improving the uniformity of the deposition rate, especially when Re is high and/or the wafer is placed close to the inlet. The optimal profiles have been obtained for various Re, Gr, and geometry combinations.

• 마이크로전자및패키징학회지
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• 제23권2호
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• pp.97-104
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• 2016

L-ascorbic acid 환원제를 사용하는 무전해 은도금 공정으로 Ag 코팅 Cu 플레이크를 제조하는 과정에서 전처리 방법 및 L-ascorbic acid의 농도에 따른 Ag 코팅층의 균일도 변화와 대기 중 승온에 따른 내산화 특성을 평가하였다. 전처리 방법에 따른 Cu 플레이크 표면 산화층의 제거 정도가 Ag 코팅층의 균일도에 큰 영향을 미치는 것을 관찰할 수 있었고, 플레이크에서의 홀 결함 발생정도도 Ag 코팅 Cu 플레이크의 내산화 특성에 다소 영향을 미쳤다. 또한 L-ascorbic acid 환원제의 농도는 Ag 코팅층의 생성 균일도 및 두께 등에 큰 영향을 미치는 대표 공정변수임을 확인할 수 있었는데, L-ascorbic acid의 농도가 0.04 M일 경우 가장 우수한 품질의 Ag 코팅 Cu 플레이크가 제조되었나, 농도를 0.06 M로 증가시킬 경우 미세한 순수 Ag 입자들의 생성으로 인해 Ag가 코팅되지 않은 Cu 표면 면적이 증가하면서 시료의 내산화 특성을 크게 감소시켰다.