• Bulletin of the Korean Chemical Society
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• v.28 no.12
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• pp.2214-2218
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• 2007

The effects of bath temperature on electrochemical behavior, alloy composition, crystallographic structure, morphology and the magnetic properties of electrodeposited Co-Pt-W(P) films were investigated. Electrochemical studies show that alloy electrodeposition has been shifted to more positive potentials and the critical time for nucleation decreased as electrolyte temperature increased. As the temperature increased from 40 oC to 80 oC, tungsten content in the deposit increased, while phosphorus content decreased. The films deposited at T = 40 oC exhibited soft magnetic properties. However, electrodeposited at T = 70 oC, the films exhibited hard magnetic properties. It is also demonstrated that higher temperature more than 70 oC could weaken hard magnetic properties. XRD results indicated that the deposits obtained at 50 oC-70 oC showed enhancement of [00.1] P.O. (preferred orientation) with the bath temperature, which resulted in the stronger perpendicular magnetic anisotropy.

• Journal of the Korean Magnetics Society
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• v.5 no.5
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• pp.528-532
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• 1995

Ferromagnetic resonance experiments have been used to investigate the magnetic properties of amorphous $Co_{89.5}Zr_{10.5}$ thin films deposited by DC magnetron sputtering method. In the thickness range from $350\;{\AA}$ to $3,200\;{\AA}$, measurements were carried out in a static magnetic field perpendicular and parallel to the film plane and in a conventional 9.44 GHz spectrometer at room temperature. The ferromagnetic resonance spectra by the field perpendicular to the film plane showed standing spin wave. The spacing and the relative intensities between the various spin wave resonance peaks are analysed considering surface magnetic anisotropy. The surface magnetic anisotropy constant ($K_{so},\;K_{sd}$) of amorphous $Co_{89.5}Zr_{10.5}$ thin films are $0.02\;erg/\textrm{cm}^2$ and $0.55\;erg/\textrm{cm}^2$ respectively regardless of the film thickness except for $3,200\;{\AA}$ film. In case of $3,200\;{\AA}$ these values are $0.46\;erg/\textrm{cm}^2$ and $0.55\;erg/\textrm{cm}^2$ respectively.

• Transactions on Electrical and Electronic Materials
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• v.7 no.1
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• pp.42-50
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• 2006

Co-Fe-Al-O nano-granular thin films with high electrical resistivity, fabricated by radio frequency magnetron sputtering under an $Ar+O_2$ atmosphere, are found to show good soft magnetic properties in the GHz frequency range. The real part value of the relative permeability is 260 at low frequencies and this value is maintained up to the GHz frequency range. A non-integrated type noise filter on a coplanar waveguide transmission line is demonstrated by using the Co-Fe-Al-O nano-granular thin film with the dimensions of $4\;mm(l){\times}4\;mm(w){\times}0.1\;{\mu}m(t)$. The insertion loss is very low being less than 0.3 dB and this low value is maintained up to 2 GHz. At a ferromagnetic resonance frequency of 3.3 GHz, the degree of noise suppression is measured to be 3 dB. This level of noise attenuation is small for real applications, but there is much room for further improvement by increasing the magnetic volume and integrating the magnetic thin film into the CPW transmission line.

• Proceedings of the Materials Research Society of Korea Conference
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• 1998.08a
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• pp.51.4-51
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• 1998

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.11
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• pp.596-602
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• 2000

Diamond thin films were synthesized on WC-Co substrate at various experimental parameters using 13.56MHz RF PACVD)radio frequency plasma-assisted chemical vapor deposition). In order to increased the nucleation density, the WC-Co substrate was polished with 3${\mu}m$ diamond paste. And the WC-Co substrate was preatreated in $HNO_3\;:\;H_2O$ = 1:1 and $O_2$ plasma. In $H_2-CH_4$ gas mixture, the crystallinity of thin film increased with decreasing $CH_4$ concentration at 800W discharge power and 20torr reaction pressure. In $H_2-CH_4-O_2$ gas mixture, the crystallinity of thin film increased with increasing $O_2$ concentration at 800W discharge power, 200torr reaction pressure and 4% $CH_4$ concentration.

• Applied Science and Convergence Technology
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• v.24 no.6
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• pp.242-244
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• 2015

ZnO:Ga thin films were deposited by RF magnetron sputtering technique from ZnO (3 wt.% $Ga_2O_3$) target onto glass substrates under various RF power. The influence of RF power on the structural, electrical, and optical properties of ZnO:Ga thin films was investigated by X-ray diffraction, atomic force microscopy, Hall method and optical transmission spectroscopy. As the RF power increases from 50 to 110W, the crystallinity is deteriorated, the root main square surface roughness is decreased and the sheet resistance is increased. The increase of sheet resistance is caused by decreasing carrier concentration due to interstitial Ga ion. All films are transparent up to 80% in the visible wavelength range and the adsorption edge is a red-shift with increasing RF power.

• Proceedings of the Korean Magnestics Society Conference
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• 1993.03a
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• pp.88-89
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• 1993

• Proceedings of the Korean Magnestics Society Conference
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• 2008.12a
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• pp.54.2-54.2
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• 2008

• Journal of the Korean Ceramic Society
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• v.33 no.5
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• pp.514-518
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• 1996

Sb doped SnO2(ATO: Antinomy doped Tin Oxide) thin films were prepared by a DC magnetron spttuering method using an oxide target and the electrical characteristics of ATO films were investigated. The experimen-tal conditions are as follows :Ar flow rate ; 0~100 sccm deposition tempera-ture ; 250~40$0^{\circ}C$ DC sputter powder ; 150~550W and sputteing pressure ; 2~7 mTorr, The thickness of depositied ATO films were 600$\AA$~1100 $\AA$ ranges. The resistivity of ATO films was decreased due to the increase of the crystallinity of ATO films with deposition temperature. The decrease of carrier concentration of films with the increase of oxygen flow rate and working pressure is responsible for the increase of resistivity. Increasing of sputtering power raised the resistivity of films by decreasing the carrier mobility.

• Proceedings of the KIEE Conference
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• 2002.11a
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• pp.6-8
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• 2002

In order to prepare magnetic recording layer with a good quality crystallographic characteristic. We prepared $Co_{77}Cr_{20}Ta_3$ layer for perpendicular magnetic recording media on slide glass substrate by Two-Step Methode. The thickness of magnetic layer was fixed 100 nm and buffer layer were varied from 10 to 50 nm, and input current was varied from 0.2[A] to 0.5[A]. The surface morphology and crystal orientation of the CoCrTa films were examined with XRD. Prepared thin films showed improvement of dispersion angle of c-axis orientation ${\Delta}{\theta}_{50}$ caused by inserting buffer layer.