• Proceedings of the KIEE Conference
• /
• 1993.07b
• /
• pp.612-614
• /
• 1993

Sputtering requires a way to bombard the target with sufficient momentum. Positive ions are the most convenient source since their energy and momentum can be controlled by applying a potential to the target. Although many types of discharges have been used for sputtering, magnetrons are now the most widely used because of the high ion current densities. Namely, plasma near the target electrode is confined by magnetic field using permanent magnet, so that the collision probability is increased. It is important to develop RF magnetron sputtering system which has many excellent merits compared with conventional methods. Our study aims to develop 1 kW RF source(13.56 MHz, TR type) and to accumulate the design and construction technology of RF magnetron sputter-deposition system. We developed 1 kW RF sputtering system to deposit thin film. These films are deposited by this RF source matched by auto-matching system using primarily argon gas. Target of Au, Ni, Al, and $SiO_2$ was well deposited on the argon pressure of 5-10 mTorr.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.183-183
• /
• 2011

리튬 이온 배터리의 cathode 및 electrolyte 재료로 사용되는 LiCoO2을 sputtering이나 pulsed laser deposition을 이용하여 박막으로 증착하기 위해서는 target이 필요하다. Target은 원료 분말을 가압 성형한 후 고온에서 소결하여 제조된다. LiCoO2 target 제조과정에서 고밀도를 얻기 힘들고 Li 성분의 증발이 일어난다. 또한 Li2O 분말은 흡습성이 매우 크다. 본 연구에서는 시간과 온도를 조절하여 최적화된 소결 과정을 통해 target의 밀도가 이론밀도와 근사한 값을 갖도록 하고, LiCoO2 또는 Co3O4 분말에 각각 흡습성이 낮은 Li2CO3 분말을 첨가하여 Li 성분을 조절하였다. Li과 Co의 조성비가 1:1-2:1인 고밀도의 LiCoO2 target을 제조하여 박막 증착 후 Li과 Co의 조성비가 1:1이 되도록 하였다.

• Korean Journal of Materials Research
• /
• v.20 no.12
• /
• pp.629-635
• /
• 2010

Abstract In this study characteristics of Al-doped ZnO thin film by HIPIMS (High power impulse sputtering) are discussed. Deposition speed of HIPIMS with conventional balanced magnetic field is measured at about 3 nm/min, which is 30% of that of conventional RF sputtering process with the same working pressure. To generate additional magnetic flux and increase sputtering speed, electromagnetic coil is mounted at the back side of target. Under unbalanced magnetic flux from electromagnet with 1.5A coil current, deposition speed of AZO thin film is increased from 3 nm/min to 4.4 nm/min. This new value originates from the decline of particles near target surface due to the local magnetic flux going toward substrate from electromagnet. AZO film sputtered by HIPIMS process shows very smooth and dense film surface for which surface roughness is measured from 0.4 nm to 1 nm. There are no voids or defects in morphology of AZO films with varying of magnetic field. When coil current is increased from 0A to 1A, transmittance of AZO thin film decreases from 80% to 77%. Specific resistance is measured at about $2.9{\times}10-2\Omega{\cdot}cm$. AZO film shows C-axis oriented structure and its grain size is calculated at about 5.3 nm, which is lower than grain size in conventional sputtering.

• Journal of the Korean Magnetics Society
• /
• v.11 no.6
• /
• pp.262-266
• /
• 2001

The magnetic switching volume is known as an important parameter to understand the magnetization reversal process, thermal stability of the written information and media noise. This parameter is influenced significantly by the microstructure of the magnetic layer as well as underlayer. Therefore, we fabricated CoSm/Cr thin films with varying magnetic layer thickness under constant sputtering by using a dc magnetic sputtering machine. The magnetic layer thickness effect on the magnetic switching volume have been studied by the means of magnetic viscosity and dc demagnetization remanence curve mesurements. From these measurements, we found that the switching volumes increased with increasing the magnetic layer thickness, whereas the coercivity showed different behavior. These may be a result of the increased intergranular coupling and the larger volume fraction of the magnetic layer.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.327-327
• /
• 2013

본 연구에서는 $SiO_2$ Target과 $In_2O_3$ Target으로 co-sputtering방법을 이용해 증착한 Si-doped $In_2O_3$ (ISO) 박막의 Si 도핑 농도에 따른 전기적, 광학적, 구조적 특성에 대해 연구하였고, 이를 유기태양 전지(OPVs) 에 적용함으로써 그 가능성을 타진하였다. $In_2O_3$ target의 DC power를 100 W로 고정시킨 채 $SiO_2$ target의 RF power 크기를 20~60 W 변화시키면서 상온에서 실험을 진행한 결과 최적 조건은 박막의 두께가 200 nm일 때 Working pressure는 3 mTorr이고, RF power는 50 W이었다. 이 조건으로 제작된 ISO 박막은 550 nm에서 81.51%의 광투과율과 51.91 Ohm/sq.의 비교적 낮은 면저항이 나타남을 Hall measurement 및 UV/Vis spectroscopy 분석을 통해 알 수 있었다. 또한 X-ray diffraction 분석법과 Transmission Electron Microscope 분석법을 통해 $SiO_2$ 도핑 power가 50 W 이상으로 증가할 경우 ISO 박막의 결정성이 감소하여 완벽한 비정질상의 ISO 투명박막이 형성됨을 확인할 수 있었다. 비정질 특성을 갖는 ISO 투명 전극을 이용하여 유기 박막형 태양전지를 제작한 결과 Voc (0.576 V), Jsc (7.671 mA/$cm^2$), FF (62.96%), PCE (2.78%)의 특성을 나타냄으로서 co-sputtering 공정을 통해 최적화된 ISO 박막을 유기 박막형 태양전지에 적용함으로써 광전소자로의 적용 가능성을 확인할 수 있었다.

• Journal of Magnetics
• /
• v.6 no.3
• /
• pp.90-93
• /
• 2001

Co/$Al_O_3$/NiFe and CO/$Al_O_3$/Co tunnel junctions were fabricated by a radio frequency magnetron sputtering at room temperature with hard mask on glass and $4^{\circ}$ tilt cut Si (111) substrates. The barrier layer was formed through two steps. After the Al layer was deposited, it was oxidized in the chamber of a reactive ion etching system (RIE) with $O_2$plasma at various conditions. The dependence of the TMR value and junction resistance on the thickness of Al layer (before oxidation) and oxidation parameters were investigated. Magnetoresistance value of 7% at room temperature was obtained by optimizing the Al layer thickness and oxidation conditions. Circular shape junctions on $4^{\circ}$tilt cut Si (111) substrate showed 4% magnetoresistance. Photovoltaic energy conversion effect was observed with the cross-strip geometry junctions on Si substrate.

• Journal of the Semiconductor & Display Technology
• /
• v.8 no.3
• /
• pp.13-17
• /
• 2009

we have studied characterization of microbolometer based on the co-sputtered silicon-antimony ($Si_{1-x}Sb_x$) thin film for infrared microbolometer. We have investigated the resistivity and the temperature coefficient of resistance (TCR) with annealing. We deposited the films using co-sputtering method at $200^{\circ}C$ in the Ar environment. The Sb concentration has been adjusted by applying variable DC power from Sb targets. TCR of deposited $Si_{1-x}Sb_x$ films have been measured the range of -2.3~-2.8%/K. The resistivity of the film is low but TCR is higher than the other bolometer materials. Resistivity of the films has not been affected hugely according to the low annealing temperature however the resistivity has been dramatically decreased over $250^{\circ}C$. It is caused of a phase change due to the rearrangement of Si and Sb atoms during crystallization process of the films.

• Journal of the Korean Vacuum Society
• /
• v.22 no.3
• /
• pp.119-125
• /
• 2013

In this study, we studied the properties of ZnO(Al) and ZnO(AlGa) thin film according to film thickness deposited on SLG by In-line magnetron sputtering system. XRD, FESEM, 4-point probe, Hall measurement system and UV/Vis-NIR spectrophotometer were employed to analyze the properties of ZnO(Al) and ZnO(AlGa) thin film. The all films exhibited (002) preferential orientation with clear peak shape and high intensity. The carrier concentration and Hall mobility of ZnO(Al) and ZnO(AlGa) thin film were improved with increasing thickness. The resistivity of both films decreased when the film thickness was raised from 500 nm to 1,450 nm. And then relatively the resistivity of ZnO(AlGa) film was lower than that of ZnO(Al) film. The transmittance of the films decreased with increasing film thickness but all films exhibited optical transmittances of over 83.3% in the visible region.

• Journal of the Korean Ceramic Society
• /
• v.34 no.2
• /
• pp.202-208
• /
• 1997

Bi-layered SrBi2Ta2O9(SBT) films were deposited on Pt/Ti/SiO2/Si sibstrates by rf magnetron sputt-ering at room temperature and then were annealed at 75$0^{\circ}C$, 80$0^{\circ}C$ and 85$0^{\circ}C$ for 1 hour in oxygen at-mosphere. The film composition of SrBi2Ta2O9 was obtained after depositing at room temperature and annealing at 80$0^{\circ}C$. Excess 20mole% Bi2O3 and 30 mole% SrCO3 were added to the target to compensate for the lack of Bi and Sr in SBT film. 200 nm thick SBT film exhibited and dense microstructure, adielectric constant of 210, and a dissipation factor of 0.05 at 1 MHz frequency. The films exhibited Curie temperature of 32$0^{\circ}C$ and a dielectric constant of 314 at that temperature under 100 kHz frequency. The remanent polarization(2Pr) and the coercive field(2Ec) of the SBT films were 9.1 $\mu$C/$\textrm{cm}^2$ and 85 kV/cm at an applied voltage of 3V, resspectively and the SBT film showed a fatigue-free characteristics up to 1010 cy-cles under 5V bipolar pulse. The leakage current density of the SBT film was about 7$\times$10-7A/$\textrm{cm}^2$ at 150 kV/cm. Fatigue-free SBT films prepared by rf magnetron sputtering can be suitable for application to non-volatile memory device.

• Proceedings of the Korean Magnestics Society Conference
• /
• 2002.12a
• /
• pp.196-197
• /
• 2002

보편적으로 알려진 CoCr합금 수직기록매체의 경우, 기록매체에서 출력되는 신호의 크기가 작고 열적안정성이 떨어지는 문제점이 있다. 이러한 CoCr합금 수직기록매체를 대체할 기록 매체로 Co/Pd 다층박막에 관한 연구를 수행하였다. Co/Pt 및 Co/Pd계 다층박막은 수직배향성을 가지며 일찍부터 Magneto-optical 매체로 연구되었다. Co/Pd 다층박막은 자성재료와 비자성재료를 약 2~3개 원자층의 박막 두께(10$\AA$이하)로 번갈아 가며 진공증착한 것으로. CoCr합금계 수직기록매체에 비해 열적안정성이 뛰어나고 수직방향의 잔류 자화가 큰 장점을 가지고 있다. (중략)