• Title/Summary/Keyword: Co deposition

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Effects of Organic Passivation Layers by Vapor Deposition Polymerization(VDP) for Organic Thin-Film Transistors(OTFTs) (Vapor Deposition Polymerization(VDP)을 이용한 페시베이션이 유기박막트렌지스터에 주는 영향)

  • Park, Il-Houng;Hyung, Gun-Woo;Choi, Hak-Bum;Kim, Jae-Hyeuk;Kim, Woo-Young;Kim, Young-Kwan
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.114-115
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    • 2007
  • In this paper, it was demonstrated that organic thin-film transistors (OTFTs) were fabricated with the organic passivation layer by vapor deposition polymerization (VDP) processing, In order to form polymeric film as an passivation layer, VDP process was also introduced instead of spin-coating process, where polymeric film was co-deposited by high-vacuum thermal evaporation from 6FDA and ODA followed by curing, Field effect mobility, threshold voltage, and on-off current ratio with 450-nm-thick organic passivation layer were about $0.21\;cm^2/Vs$, IV, and $1\;{\times}\;10^5$, respectively.

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Effect of Metal Ni Atomic Layer Deposition Coating on Ni/YSZ, Anode of Solid Oxide Fuel Cells (SOFCs) (고체산화물 연료전지의 Anode인 Ni/YSZ에 Ni 원자층 증착 코팅의 효과)

  • Kim, Jun Ho;Mo, Su In;Park, Gwang Seon;Kim, Hyung Soon;Kim, Do Heyoung;Yun, Jeong Woo
    • Journal of the Microelectronics and Packaging Society
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    • v.29 no.1
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    • pp.61-66
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    • 2022
  • This study is to increase the surface area and maximize the effect of the catalyst by coating a nanometersized metal catalyst material on the anode layer using atomic layer deposition (ALD) technology. ALD process is known to produce uniform films with well-controlled thickness at the atomic level on substrates. We measured the performance by coating metals (Ni) on Ni/YSZ, which is the most widely known anode material for solid oxide fuel cells. ALD coatings began to show a decrease in cell performance over 3 nm coatings.

A Study on the Deposition of DLC Films from $CH_4-CO_2$ Gas Mixture by PECVD Method ($CH_4-CO_2$혼합가스로부터 PECVD법에 의한 DLC 박막 증착에 관한 연구)

  • Jin, Eok-Yong
    • Korean Journal of Materials Research
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    • v.6 no.3
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    • pp.324-332
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    • 1996
  • DLC 박막을 RF 플라즈마 화학증착법(PECVD)을 이용하여 CH4와 CO2기체로부터 합성하였다. 증착압력, CH4와 CO2가스의 조성비, 바이어스 전압(-VB) 등의 증착조건 변화에 따른 증착속도는 증착층의 두께를 알파스텝으로 측정하여 결정하였으며, 박막의 구조 변화에 따른 증착속도는 증착층의 두께를 알파스텝으로 측정하여 결정하였으며, 박막의 구조 변화는 FTIR 분광분석을 이용하여 분석을 행하였다. 이 연구로부터 얻은 실험 결과는 다음과 같다: 1) 증착속도는 증착압력 및 바이어스 전압의 증가에 따라 증가한다. 2)바이어스 전압 300V이상에서, CO2량 증가는 순증착속도를 증가 시킨다. 3) 순수한 CH4가스를 사용할 경우에는 바이어스전압(-VB)이 증가함에 따라 박막내 수소의 함량과 sp3/sp2비는 감소하는 경향을 나타낸다. 4)증착압력이 증가함에 따라 박막내 수소함량은 증가하며, sp3/sp2비는 감소한다. 5)50mTorr의 증착압력에 증착시, CH4-+Co2 혼합가스에서 이산화탄소의 부피분율에 따라서는 박막내 수소함량은 감소하며, sp3/sp2비는 증가한다.

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Composition, preferred orientation and magnetic properties of Ni-Fe-Co alloy electrodeposits (Ni-Fe-Co 박막도금층의 조성, 우선배향 및 자기적 성질)

  • 예길촌;김선윤;문근호;김용웅
    • Journal of Surface Science and Engineering
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    • v.28 no.6
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    • pp.352-360
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    • 1995
  • The effect of electrolysis conditions on the composition, the magnetic properties and the preferred orientation of Ni-Fe-Co alloy deposits was investigated using the sulfate-chloride bath paddle agitated. Cathode current efficiency increases with the current density, showing the different tendency of the variation from that of the Ni-Fe electrodeposits. The Co content of the deposits decreases with increasing current density, while the content of Ni and Fe is shown to be minimum or maximum at 3A/$dm^2$ respectively. The Ni/Fe ratio of the alloy deposits is lower than that of Ni-Fe deposits. The coercive force($H_c$) of the deposits increases with the Co content in deposit, showing the relatively low value in the range of 1.8~5.0Wt.% Co. The anisotropy field ($H_k$) of the deposits is higher than that of Ni-Fe alloy deposits, The preferred orientation of the deposits is generally (200), but the orientation factor(R) changes with both the increase of current density and the magnetic field applied during deposition.

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EFFECT OF PARAMAGNETIC Co$_{67}$Cr$_{33}$ UNDERLAYER ON CRYSTALLOGRAPHIC AND MAGNETIC CHARACTERISTICS OF Co-Cr-Ta LAYERS IN PERPENDICULAR MAGNETIC RECORDING MEDIA

  • Kim, Kyung-Hwan;Nakagawa, Shigeki;Takayama, Seiryu;Naoe, Masahiko
    • Journal of Surface Science and Engineering
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    • v.29 no.6
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    • pp.847-850
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    • 1996
  • The bi-layered films composed of Co-Cr-Ta layers and paramagnetic $Co_{67}Cr_{33}$ underlayer were deposited by suing Facing Targets Sputtering(FTS). The effects of $Co_{67}Cr_{33}$ underlayer on the crystallographic and magnetic characteristics of the Co-Cr-Ta layer deposited on the underlayer was investigated. The diffraction intensity $I_{p(002)}$ of Co-Cr-Ta layers on the $Co_{67}Cr_{33}$ layer was stronger than that of single layer and Co-Cr-Ta/Ti double layer. Therefore, the crystallinity of Co-Cr-Ta layer was imporved by the $Co_{67}Cr_{33}$ underlayer rather than Ti ones. However, te coercivity H$_{c\bot}$ of Co-Cr-Ta layers deposited on $Co_{67}Cr_{33}$ underlayer was as low as 250 Oe even at substrate temperature of $220^{\circ}C$. This H$_{c\bot}$ decrease seems to be attributed to the effect of the $Co_{67}Cr_{33}$ underlayer as well as interval time between deposition of the underlayer and the Co-Cr-Ta layer.

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Magnetic properties and the shapes of magnetic domain for $CoCr_{16.2}Pt_{10.8}Ta_4$ alloy films with the prior deposition of Ti layer ($CoCr_{16.2}Pt_{10.8}Ta_4$ 합금박막의 Ti 우선증착에 따른 자기적 특성과 자구형상변화)

  • 이인선;김동원
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.10 no.1
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    • pp.17-22
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    • 2000
  • A quaternary alloy film of $CoCr_{16.2}Pt_{10.8}Ta_4$was investigated for its magnetic properties and c-axis orientation with and without Ti underlayer. Additional elements such as Ta, Pt have been frequently introduced in CoCr alloy film for perpendicular recording as a means of improving magnetic performance. It has been reported that the addition of Pt and Ta in CoCr increase the coercivity and the magnetic isolation of columnar grains, respectively. However, CoCrPtTa perpendicular magnetic layer should be more increased its perpendicular magnetic anisotropy than at present for the application of ultrahigh recording density. The improvement of underlayers and substrate materials is one of the promised schemes to intensify the perpendicular magnetic anisotropy. In this study, the insertion of Ti underlayer shows the remarkable improvement of c-axis orientation compare with the direct deposition on the bare glass. The mechanism about this effect of Ti underlayer on CoCrPtTa is not to be clarified yet. Meanwhile, it is found that the magnetic domain of CoCrPtTa on 20 nm Ti underlayer has the continuous stripe pattern but the one of CoCrPtTa on 90 nm Ti underlayer shows the discrete mass type from the results of MFM investigation. This phenomenon is to be a distinct evidence that the improvement of perpendicular anisotropy by the adoption of Ti underlayer is originated from the reinforcement of the grain boundary segregation in CoCrPtTa alloy. Moreover, the transition of the M-H hysteresis pattern with the thickness of Ti underlayer indicates that the major contribution of Ti underlayer is not the magnetocrystalline anisotropy but the shape anisotropy due to the formation of uniform columnar grains by the nonmagnetic alloy segregation.

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PIII&D (Plasma immersion ion implantation & deposition) 기술을 이용하여 제조된 NbN 박막이 인공관절용 UHMWPE 소재의 마모에 미치는 영향 평가

  • Park, Won-Ung;Kim, Eun-Gyeom;Mun, Seon-U;Kim, Gyeong-Hun;Im, Sang-Ho;Han, Seung-Hui
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.228-228
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    • 2012
  • 인공관절은 노인성 질환이나 자가 면역질환, 신체적인 외상 등으로 인하여 발생하는 관절의 손상 부위를 대체하기 위하여 고안된 관절의 인공 대용물이다. 인공 관절 중 인공 고관절의 경우 관절 운동을 하는 라이너(Liner)와 헤드(Head) 부분이 마모에 관여하여 인공관절의 수명에 영향을 미치게 되는데, 헤드 소재로서는 Co-Cr-Mo 합금이, 라이너 소재로서는 고분자 소재인 UHMWPE (Ultra High Molecular Weight Polyethylene)가 주로 사용되고 있다. 이러한 MOP (Metal-On-Polymer) 구조의 인공관절의 경우, 충격흡수의 장점이 있는 반면, 관절 운동시 발생하는 UHMWPE의 wear debris에 의한 골용해로 인하여 관절이 느슨해지는 문제점이 발생하여 재시술을 필요로 하게 된다. 또한 메탈 헤드의 마모로 인한 금속이온의 용출은 세포 독성의 문제를 야기하여 인공관절의 수명을 낮추는 또 하나의 요인이 되고 있다. 이러한 문제점들을 해결 하기 위하여, 본 연구에서는 PIII&D (Plasma Immersion Ion Implantation & Deposition)공정을 이용하여 Co-Cr-Mo 합금 소재 위에 niobium nitride (NbN) 박막을 증착하여 상대재인 UHMWPE의 마모를 줄이고자 하는 연구를 진행하였다. 마모량의 감소를 위하여, 박막을 증착하기 전에 Co-Cr-Mo 합금 위에 질소를 이온주입 하는 pre-ion implantation 공정을 도입하였으며, Co-Cr-Mo 합금과 NbN박막 사이의 접착력을 증가시키기 위하여 박막의 증착 초기에 이온주입과 증착을 동시에 수행하는 dynamic ion mixing공정을 수행하였다. 실험 결과 pre-ion implantation 공정을 도입한 경우 현재 상용화 되어있는 Co-Cr-Mo 합금에 비하여 마모량을 2배 이상 감소시키는 것을 확인 할 수 있었으며, dynamic ion mixing 공정을 도입한 경우 장시간의 마모 시험에서도 UHMWPE의 마모량을 2배 가까이 줄일 수 있었다.

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Laser-induced chemical vapor deposition of micro patterns for TFT-LCD circuit repair (레이저 국소증착을 이용한 TFT-LCD 회로수정 패턴제조)

  • Park Jong-Bok;Jeong Sungho;Kim Chang-Jae;Park Sang-Hyuck;Shin Pyung-Eun;Kang Hyoung-Shik
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.657-662
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    • 2005
  • In this study, the deposition of micrometer-scale metallic interconnects on LCD glass for the repair of open-circuit type defects is investigated. Although there had been a few studies Since 1980 s for the deposition of metallic interconnects by laser-induced chemical vapor deposition, those studies mostly used continuous wave lasers. In this work, a third harmonic Nd:YLF laser (351nm) of high repetition rates, up to 10 KHz, was used as the illumination source and $W(CO)_6$ was selected as the precursor. General characteristics of the metal deposit (tungsten) such as height, width, morphology as well as electrical properties were examined for various process conditions. Height of the deposited tungsten lines ranged from 35 to 500 nm depending on laser power and scan speed while the width was controlled between $3\~50{\mu}$ using a slit placed in the beam path. The resistivity of the deposited tungsten lines was measured to be below 1 $O\cdot{\mu}m$, which is an acceptable value according to the manufacturing standard. The tungsten lines produced at high scan speed had good surface morphology with little particles around the patterns. Experimental results demonstrated that it is likely that the deposit forms through a hybrid process, namely through the combination of photolytic and pyrolytic mechanisms.

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A Study on Wind-drift Sand Deposition by Vegetation and Coastal Debris using a Wind Tunnel Test (식생 및 해안표착물에 의한 비사 퇴적 풍동실험 연구)

  • Je, Young Jun;Jeon, Yong Ho;Yoon, Han Sam
    • Journal of the Korean Society for Marine Environment & Energy
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    • v.16 no.3
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    • pp.163-170
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    • 2013
  • The correlation and interaction mechanisms between marine debris and the vegetation zone were studied on the Jinu-do natural beach of the Nakdong river estuary. Laboratory wind tunnel experiments were carried out under the wind-field and bottom-sand conditions using wind tunnel test equipment to investigate the sedimentation characteristics of wind-drift sand deposition around marine debris and the vegetation zone. The major environmental factors/loads considered in this study were the motion of sand by wind on the beach, deposition of marine debris, and change in the vegetation zone/line. When the marine debris was installed in the wind tunnel, deposition at the front of the structure appeared first by wind action, and then deposition developed from behind at 70% of the front ground level. In contrast, in the case of vegetation, the deposition phenomenon appeared first from behind the vegetation zone/line, and was 60% higher than the front. When the height of the debris and vegetation was the same, the required experimental time to bury the vegetation completely was about twice that of the marine debris.