• Journal of the Korea Academia-Industrial cooperation Society
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• v.6 no.1
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• pp.78-82
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• 2005

Display manufacturing process has adopted RCA cleaning, applying to larger area and coping with environmental issue for last ten years. However, the approaching concept of ozonized, hydrogenised, or electrolyzed water cleaning technologies is within RCA clean paradigm. In this work, only electrolyzed anode water was applied to clean particles and organics as well as metals based on Pourbaix concept, and as a test vehicle, MgO particles were introduced to prove the new concept. The electrolyzed anode water is very oxidative with high oxidation reduction potential (ORP) and low in pH of more than 900 mV and 3.1, respectively. MgO particles were immersed in the anode water and its weight losses due to dissolution were measured with time. Weight losses were in the ranges of 100 to 500 micrograms in 250 ml anode water depending on their ORP and pH. Therefore it was concluded that the cleaning radicals in the anode water was at least in the range of 1 to $5{\times}10^{20}$ ea per 250 ml anode water equivalent to $1{\times}10^{18} ea/cm^2$. Hence it can be assumed that the anode water applied to display cleaning from now on $1{\times}10^{10}$ to $1{\times}10^{15} ea/cm^2$ ranges of contaminants are being treated. In addition, it was observed that anode water did not develop micro-roughness on hydrophobic surface while it did on the native silicon oxide.

• Korean Journal of Materials Research
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• v.6 no.8
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• pp.817-824
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• 1996

Removal of Cu impurities on Si substrates using remote H-plasma was investigated. Si substrates were intentionally contaminated by 1ppm ${CuCI}_{2}$, standard chemical solution. To determine the optimal process condition, remote H-plasma cleaning was conducted varying the parameters of rf power, cleaning time and remoteness(the distance between the center of plasma and the surface of Si substrate). After remote H-plasma cleaning was conducted, Si surfaces were analysed by TXRF(total x-ray reflection fluorescence) and AFM(atomic force microscope). The concentration of Cu impurity was reduced by more than a factor of 10 and its RMS roughness was improved by more than 30% after remote H-plasma cleaning. TXRF analysis results show that remote H-plasma cleaning is effective in eliminating Cu impurity on Si surface when it is performed under the optimal process condition. AFM analysis results also verifies that remote H-plasma cleaning makes no damage to the Si surface. The deposition mechanism of Cu impurity may be explained by the redox potential(oxidation-reduction reaction potential) theory. Based on the XPS analysis results we could draw a conclusion that Cu impurities on the Si substrate are removed together with the oxide by a "lift-off" mechanism when the chemical oxide( which forms when Cu ions are adsorbed on the Si surface) is etched off by reactive hydrogen atoms.gen atoms.

• Proceedings of the Materials Research Society of Korea Conference
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• 2008.05a
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• pp.30.1-30.1
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• 2008

• Proceedings of the KIEE Conference
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• 1995.07c
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• pp.1362-1364
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• 1995

In this paper, the automatic device for measuring the salt contamination on insulators was developed. The device consists of electronic insulators, measuring system, monitoring system, and printer. It was shown that the level of salt contamination measured by the developed device is similar to that measured by the brush cleaning method. Therefore, the developed automatic measuring device can be used in field, in order to predict the cleaning time of insulators and prevent the failure due to the salt contamination.

• Proceedings of the Korean Operations and Management Science Society Conference
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• 2001.10a
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• pp.411-415
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• 2001

Advances in computer and sensor technology have made it possible to obtain superlarge manufacturing process data in real time, letting us to extract meaningful information from these superlarge data sets. We propose a systematic data analysis procedure which field engineers can apply easily to manufacture quality products. The procedure consists of data cleaning and data analysis stages. Data cleaning stage is to construct a database suitable for statistical analysis from the original superlarge manufacturing process data. In the data analysis stage, we suggest a graphical easy-to-implement approach to extract practical information from the cleaned database. This study will help manufacturing companies to achieve six sigma quality.

• KCID journal
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• v.18 no.2
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• pp.25-32
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• 2011

The 21 livestock farms considering future installation of biogas systems were studied. These farms were examined how to raise the livestock, to treat manure, to operate facility with respect to manure characteristics. The 15 farms out of 21 farms have applied to the marine dumping and consignment treatment for treating manure and even farms which have equipped liquid fertilizing system have less capacity facility than legal standards. Characteristics of manure were affected by the scale of swine barn, clean water usage, frequency of cleaning, cleaning method, feces-urine separating method, etc. Retention time in storage (over 20 days) has resulted in lower concentration of organic matter which could reduce biogas production. This indicates that systematic barn management system is required. Inhibition tests showed that disinfectant and citric acid did not affected digestion rates at 10 times higher concentration than recommendation. However hypochlorous acid is likely to affect the anaerobic microbial activity.

• The Research Journal of the Costume Culture
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• v.12 no.3
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• pp.407-414
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• 2004

A natural dye aqueous walnut shell extract was obtained by extraction of walnut shell using water at various conditions in this study. Silk fabrics were dyed at various dyeing and mordanting conditions using walnut shell extract and various mordants (Al, Cu, Fe ions). Studies have been made on the effects of dyeing and mordanting conditions on the dyeing properties and fastness (light, water and dry cleaning fastness) of dyed silk Fabric. The results obtained in this study were as follows;. The dye content in the walnut shell extract increased with increasing extraction temperature to 90℃ and extraction time to 120min, and thereafter the dye content decreased a little. The dry cleaning and water fastness of non-mordanted silk fabrics were better than those of mordanted silk fabrics.

• Journal of Industrial Technology
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• v.37 no.1
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• pp.12-15
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• 2017

It is important in dentistry that the provisional cement should be cleaned thoroughly from the crown before definitive cementation. The provisional cement has been removed by physical means such as curette, scaler, pumice, or sand-blasting with alumina particles, which is time-consuming, irritating, tedious, even causing crack. To avoid such troubles occurring through such physical cleaning means, the chemical solutions for dissolving the provisional cement remaining in dental crown were prepared, and solubilizing power of the solutions was measured and compared. The solution composed of MEA, NaOH, chloride chemicals ($CHCl_3$, $CCl_4$, $CH_2Cl_2$), surfactants (Igepal, Tween20), chelating agent (EDTA), and Ethyl cellosolve was most effective for dissolving the provisional cement.

• Journal of the Korean Society of Clothing and Textiles
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• v.27 no.9_10
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• pp.1134-1143
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• 2003

The purpose of this study is to investigate surface color change and effects of mordants on the K/S values of silk and wool fabrics dyed with Lac extract, according to the mordanting methods and conditions such as temperature, concentration and time of the mordanting bath. The results were as follow; 1 K/S values of the silk and wool fabrics according to the temperature of the mordanting bath were shown a slight decline beyond 40$^{\circ}C$. 2. Surface color of the silk changed from red to reddish purple and that of the wool showed red tone when mordanted with Aluminum postassium sulfate, Copper acetate and Copper (II) sulfate regardless of the mordanting conditions. 3. The light and dry cleaning fastness of silk and wool fabrics dyed with Lac extract according to the mordanting methods were very good.

• Journal of the Semiconductor & Display Technology
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• v.6 no.2 s.19
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• pp.5-10
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• 2007

According to the advantageous features of flash memory, its exploitation and application in mobile and ubiquitous related devices as well as voluminous storage devices is being increased rapidly. The inherent properties that are determined by configuration of flash memory unit might restrict the promising expansion in its utilization. In this paper, we study policies based on threshold values, instead of using global search, in order to satisfy our objective that is to decrease the necessary processing cost or penalty for recycling of flash memory space at the same time minimizing the potential degradation of performance. The proposed cleaning methods create partitions of candidate memory regions, to be reclaimed as free, by utilizing global or dynamic threshold values. The impact of the proposed policies is evaluated through a number of experiments, the composition of the optimal configuration featuring the methods is tested through experiments as well.