• 공기청정기술
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• 제5권4호통권19호
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• pp.70-75
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• 1992

• 공기청정기술
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• 제5권4호통권19호
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• pp.76-81
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• 1992

• 한국응용과학기술학회지
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• 제13권3호
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• pp.111-117
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• 1996

Many alternatives to Trichlorothane & Trichlorotrifluoroethane mainly used as cleaning solvent for industrial parts are developed and commercialized because the solvent is scheduled to phaseout after 1996. Considering there are many kinds of parts and contaminants in all parts cleaning, It is essential to investigating the characteristics and performance of the alternatives prior to use. For the contaminant of a standard oil, waters, hydrocarbon and halogen parts which are the comercially available and promising alternatives were experimented at the same condition of Trichlorothane & Trichlorotrifluoroethane to check the cleaning performance. Overally, the removal efficiency of halogen solvent parts was better than that of hydrocarbon or waters parts for removing the standard oil used in this experiment.

• 반도체디스플레이기술학회지
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• 제20권2호
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• pp.34-42
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• 2021

Recent cleaning technologies of mask in extremely ultraviolet semiconductor processes were reviewed, focused on newly developed issues such as particle size determination or hydrocarbon and tin contaminations. In detail, critical particle size was defined and proposed for mask cleaning where nanosized particles and its various shapes would result in surface atomic ratio increase vigorously. A new cleaning model also was proposed with amphoteric behavior of electrolytically ionized water which had already shown excellent particle removing efficiency. Having its non-equilibrium and amphoteric properties, electrolyzed ion water seemed to oxidize contaminant surface selectively in nano-scale and then to lift up oxidized ones from mask surface very effectively. This assumption should be further investigated in future in junction with hydrogen bonding and cluster of water molecules.

• Nuclear Engineering and Technology
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• 제56권7호
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• pp.2775-2780
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• 2024

Special methods for cleaning surfaces of stainless steel with a coating simulating radioactive contamination have been developed and studied. The removal of simulated surface contamination was performed using lasers in the micron spectral range with pulse durations of 8 ns and 270 fs. Optimal cleaning modes were determined for gas and liquid environments, achieving surface cleaning coefficient of over 90% in a single pass. A correlation between the degree of cleaning in liquids and the viscosity of the environment was discovered.

• 반도체디스플레이기술학회지
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• 제19권3호
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• pp.130-135
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• 2020

This paper describes the results of a study on the unmanned cleaning robot that performs the cleaning of the floating photovoltaic panels. The robot uses two SSC (Sliding Suction Cup) adsorptive devices to move up and down the slope. First, the forces generated when the robot moves up the slope are mechanically analyzed. The robot was designed and manufactured to operate stably by using the presented results. Next, the robot motion was tested on the inclined panel. It has been proven that robots are well designed and built to clean sloped panels.

• 청정기술
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• 제18권3호
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• pp.287-294
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• 2012

본 연구에서는 중고 레이저 복합기의 재제조 과정에서 복합기의 성능에 큰 영향을 미치는 인쇄회로기판(printed circuit board, PCB) 등 전자부품에 대하여 세정공정의 도입 적용 가능성을 분석하고 세정장치 및 최적의 운전조건을 설계하였다. 1단계로 물에 의한 부식의 염려가 없는 건식세정방식으로 플라즈마세정에 의한 세정성을 분석하였다. 플라즈마세정 의한 PCB세정에서는 세정이 어느 정도 이루어졌으나 플라즈마가 전도 될 수 있는 피세정물의 금속 부분 주위에서 피 세정물의 손상을 확인할 수 있었으며 레이저 복합기의 재제조용으로는 생산성 및 경제성이 부족하였다. 2단계에서는 경제성이 있는 초음파세정방식을 위하여 현재 현장에서 사용되고 있는 세정제를 포함하여 세정효율이 우수한 4종의 대체 세정제를 선정하여, 세정제의 물성을 측정하였고 세정성을 평가하였다. 준수계 세정제와 비수계 세정제보다 수계 세정제의 세정력이 우수 하였으며, 초음파 주파수가 작을수록 세정력이 우수하였다. 수계세정제 A를 사용하여 28 kHz의 초음파 세기에서 세정을 한다면 30초~1분 내에 빠른 세정이 가능할 것으로 판단되었다. 3단계에서는 선정된 세정제로 초음파 세정시스템을 구축하고, 실제 부품들을 초음파 세정하여 현장에서 사용이 적합한 최적의 세정조건을 구하였다. PCB 보드 및 대전기에 대하여 최적 세정 조건을 구한 결과, 40 kHz, $50^{\circ}C$에서 1분 30초 및 2분에 세정을 끝낼 수 있었다. 수작업에 의존하거나 외부처리를 하고 있는 중소 재제조 업체들은 본 세정시스템의 도입으로 전자부품 기능의 신뢰성이 확보되며 전체적인 재제조 공정의 생산성 및 경제성 향상에 큰 효과를 볼 수 있을 것으로 기대된다.

• 반도체디스플레이기술학회지
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• 제23권2호
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• pp.114-122
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• 2024

NF₃, Chamber cleaning gas, has a high Global Warming Potential (GWP) of 17,000, causing significant greenhouse effects. Reducing gas usage during the cleaning process is crucial while increasing the cleaning Rate and reducing cleaning standard deviation (Stdev). In a previous study with a 6-inch PECVD chamber, a multiple linear regression analysis showed that Power and Pressure had no significant effect on the cleaning Rate because of their P-values of 0.42 and 0.68. The weight for Flow is 11.55, and the weights for Power and Pressure are 1.4 and 0.7. Due to the limitations of the research equipment, which differed from those used in actual industrial settings, it was challenging to assess the effects in actual industrial environment. Therefore, to show an actual industrial environment, we conducted the cleaning process on a 12-inch PECVD chamber, which is production-level equipment, and quantitatively analyzed the effects of each variable. Power, Pressure, and NF3 Flow all had P-values close to 0, indicating strong statistical significance. The weight for Flow is 15.68, and the weights for Power and Pressure are 4.45 and 5.24, respectively, showing effects 3 and 7 times greater than those with the 6-inch equipment on the cleaning rate. Additionally, we analyzed the cleaning Stdev and derived that there is a trade-off between increasing the cleaning Rate and reducing the cleaning Stdev.

• 한국생산제조학회지
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• 제22권4호
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• pp.643-651
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• 2013

This study applied a laser cleaning method (dry cleaning) that is used for cleaning semiconductor elements to dental implant cleaning. The lasers used in this study were pulsed fiber lasers with wavelengths of 1,064 and 532 nm. The peak output, energy per pulse, energy density per pulse, time of pulse experiment, and number of pulse experiments served as process variables for this study, and the variables were changed for each experiment. As a result, a laser with a wavelength of 532 nm showed much higher cleaning efficiency than its 1,064 nm counterpart. As the wavelength range decreased, the quantized energy increased and the reflection rate of the titanium used for the implant decreased; consequently, the energy absorption rate increased. Therefore, it is proposed that the energy density by wavelength has a greater influence on cleaning than does the output size.

• 청정기술
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• 제5권2호
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• pp.1-12
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• 1999

세정공정은 여러 산업체의 생산공정에 활용되고 있는 공정으로서 세정과정중 다양한 환경 오염물질을 배출하고 있다. 따라서, 환경 및 안전규제가 국내외적으로 엄격하여짐에 따라 기존의 세정공정에서 사용되었던 세정제를 환경문제나 유해성 문제를 야기시키지 않는 환경친화적인 세정제로 대체하는 것이 절실한 실정이다. 대체세정제를 선정하기 위해서 기존의 세정제에 필적할 만한 세정성을 갖춰야 하지만 세정성 평가방법이 정립되어 있지 않은 실정이다. 따라서 본 연구에서는 실험실이나 산업체에서 활용 가능한 여러 가지 세정평가법을 정리하여 보았고 국내외 현장 적용사례를 조사 분석하였다.