• Clean Technology
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• v.7 no.3
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• pp.203-214
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• 2001

A silicon oxide cleaning characteristic and its mechanism were studied in RF plasma cleaning system with various gases such as $CHF_3$, $CF_4$, Argon, oxygen and mixing gas. The experimental parameters - working pressure (100 mTorr), RF power (300 W, 500 W), electrode distance (5cm, 8cm, 11.5cm), cleaning time (90, 180 seconds), gas flow (50 sccm) were fixed to compare cleaning efficiency by gas types. The results were as follows. First, the argon plasma is retaining only physical sputtering effect and etch rate was low. Second, the oxygen plasma showed good cleaning efficiency in electrode distace of 5cm, 300W, 180secs, but surface roughness increased. Third, $CF_4$ Plasma could get the best cleaning efficiency. Fourth, $CHF_3$ plasma could know that addition gas that can lower the CFx/F ratio need. We could not get good cleaning efficiency in case of added argon to $CHF_3$. But, we could get good cleaning efficiency in case added oxygen.

• Clean Technology
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• v.3 no.2
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• pp.36-46
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• 1997

CFC and organic chlorine solvents has been used in the fine machinery and electronics industries for a long time since they have various excellent properties as cleaning agents. However, it is inevitable that alternative cleaning agents should be used since CFC and organic chlorine solvents were identified as ozone-depleting chemicals. There are various alternative cleaning agents. Among them, aqueous/semi-aqueous cleaning agents are environmentally friendly and promising in the long term. And their use and developement are on the increase in advanced countries, but few in our countries. In this paper, the charactistics and major components aqueous/semi-aqueous cleaning agents are analyzed and compared. And various cleaning equipments for aqueous/semi-aqueous cleaning agents such as immersion cleaner, ultronsonic cleaners, power spray cleaner, and vibration or rotational cleaners are compared and evaluated. Finally, important consideration points for selction of a cleaning system are analyzed and suggested in this paper.

• Particle and aerosol research
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• v.19 no.3
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• pp.63-76
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• 2023

An electrostatic precipitator (ESP) has a low pressure drop and a high collection efficiency but its collection efficiency can be reduced due to dust accumulation on the collection plates during long-term operations. In order to maintain the initial dust collection efficiency, it is necessary to periodically clean the collection plates. The common cleaning methods are using physical impacts or water sprays. These cleaning methods can lead to damage to the collection plate or generate wastewater. Herein, we implemented an electrodynamic screen (EDS) for ESP cleaning and evaluated its surface cleaning performance of particles. The EDS is an electrostatic system that can electrostatically repel particles on surfaces, allowing it to clean the ESP without causing damage and wastewater generation. Our evaluation included the analysis of the effects of AC voltage characteristics, electrode configuration and environmental conditions on the cleaning performance of the EDS with the aim of achieving effective surface cleaning. It has been demonstrated that activating the EDS cleans up to 65% of the particles on the surface, which indicates about 94% of our target cleaning zone.

• Korean Chemical Engineering Research
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• v.40 no.6
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• pp.769-777
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• 2002

Using four components - nonionic surfactants, water, hydrocarbon oil and an alcohol as cosurfactant, 12 types of cleaning agents were prepared, and their physical properties such as surface tension, viscosity, electroconductivity and phase stability were measured. As the formulated cleaning agents have low surface tensions(30.5-31.1 dyne/cm) and low viscosities (1.6-7.2 c.p.), they are satisfied with the general physical properties of water-in-oil(W/O) microemulsions for their industrial use. They showed a tendency that their temperature range for stable one-phase microemulsion decreased in accordance with the increase of alcohol/surfactant(A/S) ratio in the formulations. However, the temperature range of one-phase microemulsion was much more affected by hydrophilic lipophillic balance(HLB) value of the nonionic surfactant which increased its temperature range and it increased in accordance with the higher HLB value in the formulations. And the maximum content of water which can keep stable one-phase W/O microemulsion was measured at each sample. In addition, their temperature range for stable one-phase microemulsion was also measured. It was confirmed that the selection of surfactant type was very important for formulating a cleaning agent, since the W/O microemulsion system with the nonionic surfactant of the lower HLB value showed better cleaning efficacy that of the higher HLB value for abietic acid as a soil, which was used for preparing a rosin-type flux. In the formulated cleaning agents with the increase of A/S ratio in the formulations, however, there was no significant difference in cleaning efficacy. It was investigated that the differences of their cleaning efficacy was affected by the change of the condition of temperature and sonicating frequency as important factors in the industrial cleaning. That is, the higher, their cleaning temperature and the lower, their sonicating frequency, the more increased, their cleaning efficacy. Furthermore, using optical instruments like UV/Visable Spectrophotometer and FT-IR Spectrometer, their cleaning efficacy for abietic acid was measured. The removal of soil from the contaminated rinse water was measured by gravity separation method in the rinse bath. As a result, the cleaning agent system having the nonionic surfactant of HLB value 6.4 showed over 85% water-oil separation efficacy at over $25^{\circ}C$. Therefore, it was demonstrated in this work that the formulating cleaning agents were very effective for cleaning and economical in the possible introduction of water recycling system.

• Proceedings of KOSOMES biannual meeting
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• 2018.06a
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• pp.164-164
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• 2018

• Journal of the Korea Academia-Industrial cooperation Society
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• v.14 no.12
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• pp.6434-6440
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• 2013

In this paper, an integrated control system is proposed for automatic control and remote monitoring of pipeline type UV sterilizer. The proposed system can control the cleaning wiper in the sterilizer with various cleaning motions, and periodically check the contamination level of the UV lamps with the UV power sensors. Therefore, sterilizer repair and maintenance can be more effectively done. In addition, the control system based on the open-source processor can communicate with external smart devices via Bluetooth, and thus wirelessly exchange control commands and sensor data. Furthermore, the system is able to flexibly cope with changes of cleaning motions and sensors since its firmware can be wirelessly upgraded by using the smart device. Consequently, the proposed system is suitable to construct a smart sewage treatment system in small towns.

• Journal of the Korean Society of Clothing and Textiles
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• v.12 no.2 s.27
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• pp.207-216
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• 1988

This study is to examine the cleaningproof by dry cleaning runs and parts(shoulder, belly, butt) of garment leathers tanned chrome. This study is composed of three methods of test; color difference test, surface view by scanning electron micrographs, mechanical properties measurement by KES-FB system. The results obtained were as follows: 1. In stiffening of parts of sample, the belly is the best degree in smoothness, fullness, softness. But that of the butt have been found to be the worst degree and to be thick. 2. In fading of parts, the shoulder is an extreme case, but the belly is the best among three parts. 3. In dry cleaning runs, the view after 3 runs has been found to be the best result. 4. The stiffening after dry cleaning 1 run have been low grade, for the sample absorb much solvent of dry cleaning. And, the fading and the decoloration are to be worse after 5 runs. Because the leather surface is affected by dry cleaning runs.

• Proceedings of the KAIS Fall Conference
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• 2001.05a
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• pp.124-128
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• 2001

A present semiconductor cleaning technology is based upon RCA cleaning technology which consumes vast amounts of chemicals and ultra pure water(UPW) and is the high temperature Process. Therefore, this technology gives rise to the many environmental issues, and some alternatives such as functional water cleaning are being studied. The electrolyzed water was generated by an electrolysis system which consists of anode, cathode, and middle chambers. Oxidative water and reductive water were obtained in anode and cathode chambers, respectively. In case of NH$_4$Cl electrolyte, the oxidation-reduction potential and pH for anode water(AW) and cathode water(CW) were measured to be +1050mV and 4.8, and -750mV and 10.0, respectively. AW and CW were deteriorated after electrolyzed, but maintained their characteristics for more than 40 minutes sufficiently enough for cleaning. Their deterioration was correlated with CO$_2$ concentration changes dissolved from air. It was known that AW was effective for Cu removal, while CW was more effective for Fe removal. The particle distributions after various particle removal processes maintained the same pattern. In this work, RCA consumed about 9$\ell$chemicals, while EW did only 400$m\ell$ HCI electrolyte or 600$m\ell$ NH$_4$Cl electrolyte. It was hence concluded that EW cleaning technology would be very effective for eliminating environment, safety, and health(ESH) issues in the next generation semiconductor manufacturing.

• Journal of the Semiconductor & Display Technology
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• v.22 no.2
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• pp.17-23
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• 2023

In semiconductor manufacturing processes, a cleaning process is important that can remove sub-micron particles. Conventional wet cleaning methods using chemical have limits in removing nano-particles. Thus, physical forces of a mechanical vibration up to 1 MHz frequency, was tried to aid in detaching them from the substrates. In this article, we developed a 1 MHz quartz megasonic for a bare wafer cleaning using finite element analysis. At first, a 1 MHz megasonic prototype was manufactured. Using the results, a main product which can improve a particle removal performance, was analyzed and designed. The maximum impedance frequency was 992 kHz, which agreed well with the experimental value of 986 kHz (0.6% error). Acoustic pressure distributions were measured, and the result showed that maximum / average was 400.0~432.4%, and standard deviation / average was 46.4~47.3%. Finally, submicron particles were deposited and cleaned for the assessment of the system performance. As a result, the particle removal efficiency (PRE) was proved to be 92% with 11 W power. Reflecting these results, the developed product might be used in the semiconductor cleaning process.

• Particle and aerosol research
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• v.20 no.3
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• pp.103-114
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• 2024

Liquid-spray cleaning has recently been considered an eco-friendly cleaning method in the semiconductor industry because it efficiently cleans contaminated wafers without using any chemicals, relying instead on direct momentum transfer through dropwise impaction. Previous researches are mainly divided into two groups, such as modelling studies predicting the cleaning effect of single-droplet impact and experimental works for measuring particle removal efficiency (PRE) that essentially accompanies multiple droplet impacts. Here, we developed a Monte Carlo model to connect the single-droplet based model to the ensemble effect of multiple droplet impacts in real cleaning experiments, and thereby predict the PREs from the impaction conditions of droplets and the diameters of target particles. Additionally, we developed a two-fluid supersonic nozzle system, capable of spraying 10-60 ㎛ droplets under control of impact velocity, with aims to validate the model predictions of PREs for 15-130 nm contaminant particles on a Si wafer. We confirmed that the model predictions are in agreement with the experimental data within 7% and the cleaning time needs to be controlled for ensuring the efficient removal of particles.