• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.77-77
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• 2000

Titanium oxide (TiO2) thin films have valuable properties such as a high refractive index, excellent transmittance in the visible and near-IR frequency, and high chemical stability. Therefore it is extensively used in anti-reflection coating, sensor, and photocatalysis as electrical and optical applications. Specially, TiO2 have a high dielectric constant of 180 along the c axis and 90 along the a axis, so it is highlighted in fabricating dielectric capacitors in micro electronic devices. A variety of methods have been used to produce patterned self-assembled monolayers (SAMs), including microcontact printing ($\mu$CP), UV-photolithotgraphy, e-beam lithography, scanned-probe based micro-machining, and atom-lithography. Above all, thin film fabrication on $\mu$CP modified surface is a potentially low-cost, high-throughput method, because it does not require expensive photolithographic equipment, and it produce micrometer scale patterns in thin film materials. The patterned SAMs were used as thin resists, to transfer patterns onto thin films either by chemical etching or by selective deposition. In this study, we deposited TiO2 thin films on Si (1000 substrateds using titanium (IV) isopropoxide ([Ti(O(C3H7)4)] ; TIP as a single molecular precursor at deposition temperature in the range of 300-$700^{\circ}C$ without any carrier and bubbler gas. Crack-free, highly oriented TiO2 polycrystalline thin films with anatase phase and stoichimetric ratio of Ti and O were successfully deposited on Si(100) at temperature as low as 50$0^{\circ}C$. XRD and TED data showed that below 50$0^{\circ}C$, the TiO2 thin films were dominantly grown on Si(100) surfaces in the [211] direction, whereas with increasing the deposition temperature to $700^{\circ}C$, the main films growth direction was changed to be [200]. Two distinct growth behaviors were observed from the Arhenius plots. In addition to deposition of THe TiO2 thin films on Si(100) substrates, patterning of TiO2 thin films was also performed at grown temperature in the range of 300-50$0^{\circ}C$ by MOCVD onto the Si(100) substrates of which surface was modified by organic thin film template. The organic thin film of SAm is obtained by the $\mu$CP method. Alpha-step profile and optical microscope images showed that the boundaries between SAMs areas and selectively deposited TiO2 thin film areas are very definite and sharp. Capacitance - Voltage measurements made on TiO2 films gave a dielectric constant of 29, suggesting a possibility of electronic material applications.

• Journal of Electrochemical Science and Technology
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• 제2권2호
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• pp.68-75
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• 2011

In this review, we have investigated the effect of $TiO_2$-based blocking layers (t-BLs), deposited on a transparent conductive oxide (TCO)-coated glass substrate, on the photovoltaic performance of dye-sensitized solar cells (DSSCs). The t-BL was deposited using spin-coating or sputtering technique, and its thicknesses were varied to study the influence of the thin $TiO_2$ layer in between transparent conducting glass and nanocrystalline $TiO_2$ (nc-$TiO_2$). The DSSC with the t-BL showed the improved adhesion and the suppressed charge recombination at a TCO glass substrate than those without the t-BL, which led to the higher conversion efficiency.

• 공업화학
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• 제28권1호
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• pp.1-7
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• 2017

폴리디메틸실록산(PDMS)은 화학적 증기 증착 방법을 통해 다양한 물질에 5 nm 두께 이하의 박막 형태로 증착될 수 있다. $SiO_2$, $TiO_2$, ZnO, C, Ni 및 NiO와 같은 다양한 종류의 나노입자 표면에도 PDMS 박막은 증기 증착을 통해 고르게 형성될 수 있으며, PDMS가 증착된 표면은 완벽한 소수성을 갖게 된다. 이 소수성 박막은 안정성이 높아 산, 염기 및 자외선 노출 시에도 잘 분해되지 않으며, 또한 PDMS로 코팅된 나노입자는 다양한 환경 분야에 응용될 수 있다. PDMS 코팅된 소수성 $SiO_2$ 입자는 기름/물 혼합액에서 기름과 선택적으로 반응하고, 기름 유출 사고 시 유류 확산을 억제할 수 있으며, 유출된 기름을 물에서 물리적으로 쉽게 분리할 수 있게 해준다. PDMS 코팅된 $TiO_2$를 진공 상태에서 열처리 할 경우 $TiO_2$ 표면은 완전하게 친수성으로 개질되며, 이때 $TiO_2$가 가시광선을 흡수하여 반응할 수 있게 하는 산소 빈자리 또한 발생하게 된다. PDMS 코팅 후 열처리한 $TiO_2$는 아무 처리하지 않은 $TiO_2$에 비해 가시광 하에서 수중의 유기 염료를 분해하는데 더 뛰어난 광촉매 활성을 보인다. 우리는 해당 연구에서 제시하는 간단한 PDMS 박막 코팅 방법이 다양한 환경 과학 및 공학 분야에서 응용될 수 있음을 소개하고자 한다.

• 한국세라믹학회지
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• 제31권12호
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• pp.1577-1587
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• 1994

TiO2 thin films with the substitution of oxygen with nitrogen were deposited on silicon substrate by metalorganic chemical vapor deposition (MOCVD) using Ti(OCH(CH3)2)4 (titanium tetraisopropoxide, TTIP) and N2O as source materials. X-ray diffraction (XRD) results indicated that the crystal structure of the deposited thin films was anatase TiO2 with only (101) plane observed at the deposition temperatures of 36$0^{\circ}C$ and 38$0^{\circ}C$, and with (101) and (200) plane at above 40$0^{\circ}C$. Raman spectroscopic results indicated that the crystal structure was anatase TiO2 in accordance with the XRD results without any rutile, fcc TiN, or hcp TiN structure. No fundamental difference was observed with temperature increase, but the peak intensity at 194.5 cm-1 increased with strong intensity at 143.0 cm-1 for all samples. The crystalline size of the films varied from 49.2 nm to 63.9 nm with increasing temperature as determined by slow-scan XRD experiments. The refractive index of the films increased from 2.40 to 2.55 as temperature increased. X-ray photoelectron spectroscopy (XPS) study showed only Ti 2s, Ti 2p, C 1s, O 1s and O 2s peaks at the surface of the film. The composition of the surface was estimated to be TiO1.98 from the quatitative analysis. In the bulk of the film Ti 2s, Ti 2p, O 1s, O 2s, N 1s and N 2s were detected, and Ti-N bonding was observed due to the substitution of oxygen with nitrogen. A satellite structure was observed in the Ti 2p due to the Ti-N bonding, and the composition of titanium nitride was determined to be about TiN1.0 from the position of the binding energy of Ti-N 2p3/2 and the quatitative analysis. The spectrum of Ti 2p energy level could be the sum of a 4, 5, or 6 Gaussian curve reconstruction, and the case of the sum of the 6 Gaussian curve reconstruction was physically most meaningful. From the results of Auger electron spectroscopy (AES), it was known that the composition was not varied significantly throughout the whole thickness of the film, and silicon oxide was not observed at the interface between the film and the substrate. The composition of the film was possible (TiO2)1-x.(TiN)x or TiO2-2xNx and in this experimental condition x was found to be about 0.21-0.16.

• 한국결정성장학회지
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• 제9권1호
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• pp.34-38
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• 1999

유기금속 화학 증착법(MOCVD)을 이용하여 Si(100) 기판 위에 $TiO_2$와 PbO의 동시 증착으로 $Pb(TMHD)_2$(PT) 박막을 증착하였다. 원료물질로는 Titanium tetra-isopropoxide(TTIP)와 $Pb(TMHD)_2$를 사용하였다. 증착온도를 $520^{\circ}C$, Pbdbfid을 30 sccm으로 고정하고, 전체유량을 750 sccm으로 하여 TTIP의 증발온도와 유량에 따른 PT 박막의 XRD 변화를 관찰하였다. PT 박막 생성은 TTIP의 증발온도 및 유량이 각각 48~$50^{\circ}C$와 18~22sccm 영역에서 생성되었으며, 생성된 박막과 기판의 계면에서는 Pb, Si, O의 상호확산을 관찰할 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.77.2-77.2
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• 2013

In this talk, I will briefly review recent results of my group related to application of atomic layer deposition (ALD) for fabricating environmental catalysts and organic solar cells. ALD was used for preparing thin films of TiO2 and NiO on mesporous silica with a mean pore size of 15 nm. Upon depositing TiO2 thin films of TiO2 using ALD, the mesoporous structure of the silica substrate was preserved to some extent. We show that efficiency for removing toluene by adsorption and catalytic oxidation is dependent of mean thickness of TiO2 deposited on silica, i.e., fine tuning of the thickness of thin film using ALD can be beneficial for preparing high-performing adsorbents and oxidation catalysts of volatile organic compound. NiO/silica system prepared by ALD was used for catalysts of chemical conversion of CO2. Here, NiO nanoparticles are well dispersed on silica and confiend in the pore, showing high catalytic activity and stability at 800oC for CO2 reforming of methane reaction. We also used ALD for surface modulation of buffer layers of organic solar cell. TiO2 and ZnO thin films were deposited on wet-chemically prepared ZnO ripple structures, and thin films with mean thickness of ~2 nm showed highest power conversion efficiency of organic solar cell. Moreover, performance of ALD-prepared organic solar cells were shown to be more stable than those without ALD. Thin films of oxides deposited on ZnO ripple buffer layer could heal defect sites of ZnO, which can act as recombination center of electrons and holes.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1989년도 하계종합학술대회 논문집
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• pp.329-332
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• 1989

Lead titanate thin films were deposited on titanium substrates by a chemical vapour deposition(CVD) process involving the application of vapour mixtures of Pb, ethyl titanate( Ti($C_2H_5O_4$)), and oxygen. The lead titanate having a stoichiometric composition has a dc conductivity of $3.2{\times}10^{-12}{\Omega}^{-1}{\cdot}cm^{-1}$ at room temperature. The nonsaturating loops observed in present investigation may be attributed to the $TiO_2$ and TiO layers between the conductive substrate and the $PbTiO_3$ ferroelectric film. The ferroelectric properties of the stoichiometric $PbTiO_3$ film included a remanent polarization of 14.1 ${\mu}C/cm^2$ and a coercive field of 20.16 kV/cm.

• Korean Chemical Engineering Research
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• 제46권4호
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• pp.676-680
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• 2008

Radio-frequency (rf) 마그네트론 스퍼터링법을 이용하여 $SiO_2(2000{\AA})/Si$ 기판위에 TiN 박막이 증착되었다. $N_2/Ar$ 혼합가스에서 $N_2$ 가스의 농도, rf power, 공정압력 등을 변화시켜서 TiN 박막이 증착되었고 증착된 박막의 증착속도, 전기저항도 및 표면의 거칠기 등이 조사되었다. $N_2$ 가스의 농도가 증가함에 따라서 증착속도는 감소하였고 저항도는 증가하였으며 표면의 거칠기는 감소하였다. rf power가 증가함에 따라서 증착속도는 증가하였지만 저항도는 감소하였다. 증착압력의 증가에 따라서 증착속도는 큰 변화가 없었지만 저항도가 급격히 증가하였으며, 1 mTorr의 압력에서 $2.46{\times}10^{-4}{\Omega}cm$의 저항도를 갖는 TiN 박막이 얻어졌다. 박막의 증착속도와 저항도는 상관관계가 있는 것이 관찰되었고 특히 증착압력이 박막의 저항도에 가장 큰 영향을 미치는 것을 알 수 있었다.

• 한국재료학회지
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• 제4권8호
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• pp.861-869
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• 1994

Chemical vapor deposition using titanium tetra isopropoxide(TTIP) was employed to investigate effects of process parameters on the uniformity of $TiO_{2}$this films deposited on Indium Tin Oxide (ITO)coated glass. Deposition experiments were carried out at temperatures ranging from $300^{\circ}C$ to $400^{\circ}C$ under the pressure of 0.5~2 torrin a cold wall reactor which can handle 200mm substrate. It was found that the growth rate of $TiO_{2}$was closely related to the reaction temperature and the ractant gas compositions. Apparent activation energy for the deposition rate was 62.7lkJ/mol in the absence of $O_{2}$ and 100.4kj/mol in the presence of $O_{2}$, respectively. Homogeneous reactions in the gas phase were promoted when the total pressure of the reactor was increased. Variance in the film thickness was less than a few percent, but at high deposition rates film thickness was less uniform. Effects of reaction temperature on $TiO_{2}$ thin film characteristic was investigated with SEM, XRD and AES.

• 청정기술
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• 제11권3호
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• pp.123-128
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• 2005

$TiO_2$는 금속 산화물의 일종으로서 자체가 가지고 있는 물리화학적 안정성, 무독성, 탁월한 유기물의 산화분해력 등으로 인해 저농도의 환경 유해물질 정화 분야로 응용이 활발히 연구되고 있는 반도체 물질이다. 그러나 $TiO_2$는 자외선 영역대(${\lambda}$ < 387 nm, 태양광의 2.7%가 UV)의 빛을 통해서 활성을 나타내고, 여기된 전자의 빠른 전자-정공 재결합속도로 인해 광 효율이 저하되는 단점을 갖는다. 따라서 광 감응 파장대를 넓히고 재결합속도를 길게 함으로써 광효율을 높이고, 광촉매 활성을 증대하는 방향으로 연구의 초점이 모아지고 있는 실정이다. 본 연구에서는 $TiO_2$ 광촉매의 광 감응 파장대를 가시광선 영역으로 확대함과 동시에 여기된 전자와 정공의 재결합시간을 연장하기 위하여 백금(Pt)이 광침적(photodeposition)된 탄소(C) 도핑 $TiO_2$를 제조하였다. 제조한 $Pt-C-TiO_2$의 특성은 전자투과현미경(Transmission Electron Microscopic; TEM), 질소흡탈착법(Brunauer-Emmett-Teller method; BET), X-ray 회절 분석법(X-ray Diffractometer; XRD), 분광 산란 광도계(UV-visible diffuse reflectance spectroscopy; UV-Vis DRS), X-ray 광전자 광도계(X-ray Photoelectron Spectroscopy; XPS)를 통하여 살펴보았다. $Pt-C-TiO_2$의 광촉매 활성을 검증하기 위하여 아조 계열의 붉은색 염료인 Acid Red 44 ($C_{10}H_7N=NC_{10}H_3(SO_3Na)_2OH$)의 광분해 실험을 수행하였다. 광원은 Xe arc 램프(300 W, Oriel)를 사용하였으며 420 nm 이하 제거 필터를 사용하여 가시광 영역대의 빛만을 조사되도록 하였다. 그 결과, 제조한 $Pt-C-TiO_2$는 가시광선 하에서 사용제품과 비교하여 월등히 뛰어난 분해력을 보이며 $C-TiO_2$의 활성을 한 층 더 향상시킴을 확인하였다. 이는 무한 에너지 자원인 태양광을 이용한 염료 폐수 정화 시스템 응용으로의 유용한 결과라 할 수 있겠다.