• 보존과학회지
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• 제35권2호
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• pp.159-168
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• 2019

플라스틱에 첨가된 가소제는 플라스틱이 열화되면서 표면으로 빠져나오는 삼출 현상을 야기한다. 가소제가 첨가된 플라스틱 작품은 이 현상으로 인해 표면이 끈적해지고 먼지와 이물질이 부착되어 표면 오염이 발생할 수 있다. 이에 본 연구에서는 가소제가 가장 많이 사용되는 PVC를 대상으로 가소제 종류별 열화 양상 및 화학적 세척법을 연구하고자 하였다. 각각 다른 가소제가 첨가된 PVC 시편을 열화시킨 후 현미경 관찰, 색도 및 중량 측정, 적외선분광분석을 통해 열화 양상을 평가하였으며 동일한 방법으로 가소제가 삼출된 시편의 세척효과와 안정성을 평가하였다. 연구 결과, DOP 첨가 시편은 변색, DOA 첨가 시편은 중량 감소가 두드러졌으며 TOTM 첨가 시편은 변색과 더불어 가소제 삼출현상이 발생하였다. 가소제가 삼출된 TOTM 시편을 대상으로 화학적 세척법을 비교한 결과 에틸 알코올과 KOH 수용액은 세척효과는 좋았으나 안정성이 떨어졌으며 계면활성제는 세척효과와 안정성이 모두 준수한 것으로 나타났다. 본 연구 결과는 향후 가소제가 첨가된 플라스틱 보존처리에 활용될 수 있을 것으로 기대하는 바이다.

• 청정기술
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• 제12권1호
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• pp.1-9
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• 2006

산업세정제 중에서 환경친화적이라 대체 세정제로 유망한 수계세정제를 배합하고 임의 세정성을 평가하였다. 수계세정제 배합시 EO부가 몰수가 3, 5, 7인 primary alcohol ethoxylate계열의 비이온계면활성제를 주계면활성제(S)로 하고 음이온계면활성제, 알코올류 등을 보조계면활성제(A)로 하여 수계세정제를 배합하였고, 이들 배합비(A/S)에 따른 절삭유와 그리스의 혼합오염물에 대한 세정성을 평가하였다. 또한 builder인 NaOH, KOH, $Na_2CO_3$, $NaHCO_3$를 첨가하여 세정효율 향상을 평가하였다. 세정성 평가 실험결과 보조계면활성제로는 음이온계면활성제인 Triethanolamine Lauryl Sulfate(TLS) 사용 시에 가장 세정효율이 좋았고, builder로는 NaOH, $Na_2CO_3$가 우수한 세정효율을 보여주었다.

• 전자공학회논문지A
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• 제31A권4호
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• pp.63-69
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• 1994

The Ultrahigh Vacuum Electron Cyclotron Resonance Chemical Vapor Deposition(UHV-ECRCVD) system whose base pressure is 1${\times}10^{9}$ torr has been constructed. In-situ cleaning prior to the epitaxial growth was carried out at 56$0^{\circ}C$ by ECR generated uniform hydrogen plasma whose density is $10^{10}/cm{3}$. The natural oxide was effectively removed without damage by applying positive DC bias(+10V) to the substrate. RHEED(Reflection High Energy Electron Diffraction) analysis has been used to confirm the removal of the surgace oxide and the streaky 2$\times$1 reconstruction of the Si surface, and the suppression of the substrate damage is anaylized by X-TEM(cross-sectional Transmission Electron Microscopy). Surface cleaning technique by ECR hydrogen plasma confirmed good quality epitaxial growth at low temperature.

• 한국응용과학기술학회지
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• 제13권3호
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• pp.111-117
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• 1996

Many alternatives to Trichlorothane & Trichlorotrifluoroethane mainly used as cleaning solvent for industrial parts are developed and commercialized because the solvent is scheduled to phaseout after 1996. Considering there are many kinds of parts and contaminants in all parts cleaning, It is essential to investigating the characteristics and performance of the alternatives prior to use. For the contaminant of a standard oil, waters, hydrocarbon and halogen parts which are the comercially available and promising alternatives were experimented at the same condition of Trichlorothane & Trichlorotrifluoroethane to check the cleaning performance. Overally, the removal efficiency of halogen solvent parts was better than that of hydrocarbon or waters parts for removing the standard oil used in this experiment.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 1997년도 춘계학술대회논문집; 경주코오롱호텔; 22-23 May 1997
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• pp.656-661
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• 1997

Ultrasonic cleaning at high frequency near 1MHz, called megasonic cleaning, is commonly used to remove particles less than 1.mu.m by generating accelerations on them. Ultrasonic waves generated from piezoelectric transducers are transmitted through a non-metallic inner container which is used to isolate a cleaning object from metallic ions. The transmission characteristics of a double-structured megasonic cleaner on the variations of parameters such as the thickness and oblique angle of a inner container, chemical ratio of a cleaning agent and temperature and transmittivity are investigated. The results are used to determine an optimum cleaning condition.

• 멤브레인
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• 제28권1호
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• pp.62-66
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• 2018

본 연구에서는 순수와 유사한 밀도의 세척형 구형 입자를 제작하고 순수 수조 내에서 산기량 및 입자 농도에 따른 입자의 유동 속도를 측정하였다. 세척형 구형 입자 1~3%를 MLSS 8,000 mg/L인 활성슬러지 용액에 주입하고 20 LMH 및 산기량 500 mL/min 조건에서 FR 및 SFCO 모드로 동시에 투과 실험하였다. 사용한 분리막은 유효 막면적이 $90cm^2$, 공칭 세공크기가 $0.4{\mu}m$인 평막이다. 입자 농도가 증가할수록 TMP가 감소하였으며 FR 모드, 입자 농도 2%일 때 가장 효과적인 것으로 확인되었다.

• 한국응용과학기술학회지
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• 제27권2호
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• pp.107-113
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• 2010

The object of this research is to conform of practicable possibility and recycling of producing junk after citrus fruits is processed. With extracting d-limonene oil that have 70~90% a component of oil out of junk citrus peel, making certain the about 12000ppm concentration of it. Limonene derived from citrus in jeju using conventional synthetic detergents can be replaced with the development of environmentally friendly natural detergent investigated the possibility. Mostly due to ocean dumping, disposal and cause environmental problems by recycling natural citrus cleaner alternative to the research conducted on the possibility. Cleaning efficiency with temperature did not affect the largest concentrations were able to identify the difference between cleaning efficiency. At least 10% of the d-limonene oil could be from the cleaning performance, increasing the concentration of the cleaning efficiency was increased in size. Ultrasonic is very high removal efficiency under the conditions shown in the cause of pure self-generated ultrasonic cleaning power as co-effects of d-limonene oil appears to chemical cleaning effect of ultrasonic cavitation occurs in the physical cleaning effect due to a combination of synergistic stability is maximized by low concentrations of d-limonene oil in a short time showed an excellent cleaning ability. Having the ability of cleaning at the same time, considering the side recycling in the junk citrus peels reflects possibility of basic materials utility eco-friendly in the skin soap, bath soap, cosmetics etc, through ability of exclusion a contaminant in based cleaning effect(EC) it can prospect substitution effect environmentally in the pre existence synthetic detergents.

• 한국환경과학회지
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• 제16권8호
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• pp.873-879
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• 2007

For the purpose of development of an environmentally friendly aqueous cleanser, some experimental researches on emulsification of D-limonene were performed. OA series surfactants with different molecular weight were adapted as an emulsifier for preparation of O/W emulsion. Cleaning power of aqueous cleanser was measured by a dipping method adapting abietic acid(AA) as a solubilizate. Besides, drop size and drop size distribution, contact angle and storage stability of the aqueous cleansers were also measured and relationships among them were examined. Decrease in molecular weight of surfactant induced small drop size and contact angie, resulting in high cleaning power of aqueous cleanser. Aqueous cleanser consisted of 3wt.% OA300 and 30wt.% D-limonene showed the highest cleaning power, but displayed unfortunately with low storage stability. The storage stability of the aqueous cleanser with OA300 was significantly enhanced by addition of 0.5wt.% OA600 at the expanse of decrease in cleaning power.

• 전자공학회논문지A
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• 제30A권11호
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• pp.99-104
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• 1993

We analyzed the D.I. water used in wet cleaning process of semiconductor device manufacturing both at the D.I. water plant and at the wafer cleaning bath to detect the impurity source of D.I. water contamination. This shows that the quantity of impurity is related to the resistivity of D.I. water, and we found that the cleanliness of the wafer surface processed in D.I. water bath was affected by the degree of the ionic impurity contamination. So we evaluated the cleaning effect as different method for Fe ion, having the best adsoptivity on wafer surface. Moreover the temperature effect of the D.I. water is investigated in case of anion in order to remove the chemical residue after wet process. In addition to the control of D.I. water resistivity, chemical analysis of impurity control in D.I. water should be included and a suitable cleaning an drinsing method needs to be investigated for a high yielding semiconductor device.

• Transactions on Electrical and Electronic Materials
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• 제10권3호
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• pp.71-74
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• 2009

Electroplated Cu is a cost efficient metallization method in microelectronic packaging applications. Typically in 3-D chip staking technology, utilizing through silicon via (TSV), electroplated Cu metallization is inevitable for the throughput as well as reducing the cost of ownership (COO).To achieve a comparable film quality to sputtering or CVD, a pre-cleaning process as well as plating process is crucial. In this research, atmospheric plasma is employed to reduce the usage of chemicals, such as trichloroethylene (TCE) and sodium hydroxide (NaHO), by substituting the chemical assisted organic cleaning process with plasma surface treatment for Cu electroplating. By employing atmospheric plasma treatment, marginally acceptable electroplating and cleaning results are achieved without the use of hazardous chemicals. The experimental results show that the substitution of the chemical process with plasma treatment is plausible from an environmentally friendly aspect. In addition, plasma treatment on immersion Sn/Cu was also performed to find out the solderability of plasma treated Sn/Cu for practical industrial applications.