• 한국세라믹학회지
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• 제31권7호
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• pp.731-738
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• 1994

TiN films were deposited on high speed steels by plasma assisted chemical vapor deposition (PACVD), cathode arc ion plating (CAIP) and reactive magnetron sputtering (RMS). The properties of the films deposited by the three different methods were compared. The preferred oriented plane of PACVD-TiN is (200) and those of CAIP-TiN and RMS-TiN are (111). PACVD-TiN shows a dome surface and a microstructure having small grains. CAIP-TiN shows the highest microhardness and the best adhesion strength of the three because it has a dense microstructure and an ill-defined interface. But is shows the greatest surface roughness due to the Ti droplet created by the arc. RMS-TiN shows a microstructure having large voids so that its properties in microhardness and adhesion are the worst of the three.

• 한국세라믹학회지
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• 제27권3호
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• pp.337-344
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• 1990

As a function of sintering temperature and time, the electrical properties of ruthenium based thick film resistors were investigated with microstructure. The variatio of resistivity and TCR(temperature coefficient of resistance)trends of sintered speciman at various sintering temperature were different low resistivity paste(Du Pont 1721) from high one(Du Pont 1741). These phenomena are deeply relative to microstructure of sintered film. With increasing the sintering temperature for 1721 system, the electrical sheet resistivity decreased, but again gradually increased above 80$0^{\circ}C$. And TCR trends in 1721 system are all positive. On the other hand the electrical sheet resistivity of 1741 resistor system decreased with sintering temperature. And TCR trends variable according to sintering temperature. TCR of speciman sintered at $700^{\circ}C$ was negative value, and TCR of 80$0^{\circ}C$ sintered speciman coexisted negative and positive value. But in case of speciman sintered at 90$0^{\circ}C$, TCR was positive value. As results of this fact, it was well known that the charge carrier contributied to electrical conduction in 1741 resistor system varied with sintering temperature.

• 한국세라믹학회지
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• 제54권1호
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• pp.38-42
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• 2017

Vanadium nitride (VN) coatings were deposited using inductively coupled plasma (ICP) assisted sputtering at different ICP powers. Microstructural, crystallographic and mechanical characterizations were performed by FE-SEM, AFM, XRD and nanoindentation. The results show that ICP has significant effects on coating's microstructure, structural and mechanical properties of VN coatings. With an increase in ICP power, coating microstructure evolved from a porous columnar structure to a highly dense one. Single- phase cubic (FCC) VN coatings with different preferential orientations and residual stresses were obtained as a function of ICP power. Average crystal grain sizes of single phase cubic (FCC) VN coatings were decreased from 10.1 nm to 4.0 nm with an increase in ICP power. The maximum hardness of 28.2 GPa was obtained for the coatings deposited at ICP power of 200 W. The smoothest surface morphology with Ra roughness of 1.7 nm was obtained in the VN coating sputtered at ICP power of 200 W.

• 한국세라믹학회지
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• 제35권7호
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• pp.671-678
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• 1998

Hertzian indentation tests with sphere indenters were used to study the mechanical properties of glass-in-filtrated alumina and spinel composites and evaluated the effect of preform microstructure and evaluated the effect of preform microstructure and glass con-tents on contanct damage and strength. The spinel composite showed more brittle behavior than the alumina composite which is verified from indentation stress-strain curve cone cracks and quasi-plastic deformation developed at subsurface. Failure originated from either cone cracks(brittle mode) or deformation zone(quasi-plastic mode) above critical load for cracking(Pc) and yield ({{{{ {P }_{Y } }}) with the brittle mode more dominant in the spinels and the quasi-plastic mode more dominant in the aluminas. Even though brittle mode was dominant in the spinel composites the strength degradation from accumulation of damage above these critical loads was conspicuously small suggesting that the glass-infiltrated composites should be highly damage tolerant to the blunt contacts.

• 한국세라믹학회지
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• 제32권10호
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• pp.1162-1168
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• 1995

Systematic studies of the effects of additives and processing variables on the sintered density and the effect of crystalline forms of starting powders on the microstructure of pressureless sintered silicon carbide are described. Oxide additives were effective for the densification of SiC up to 96% of theoretical density at temperature as low as 185$0^{\circ}C$. Use of embedding powder increased the sintered density, up to 98% of theoretical density, by decreasing the weight loss during sintering. Composite type duplex microstructure has been developed due to the $\beta$longrightarrow$\alpha$ phase transformation of SiC by sintering at 185$0^{\circ}C$ and heat treatment at 195$0^{\circ}C$ for 1h.

• 한국세라믹학회지
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• 제32권10호
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• pp.1103-1110
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• 1995

Silicon carbide (SiC) films have been deposited on the isotropic graphite by chemical vapor deposition. Change of deposition parameters affected significantly the microstructure and preferred orientation of SiC films. Preferred orientation of SiC films was (111) or (220), and microstructure showed the startified structure consisting of small crystallite or faceted columnar structure depending on the deposition parameters. For microhardness, (111) oriented film and stratified structure were superior to (220) oriented film and faceted columnar structure, respectively. Surface of (111) oriented films was less rough than that of (220) oriented films. Adhesion force between graphite substrate and SiC films was above 100N for crystalline films and 49N for amorphous film.

• 한국세라믹학회지
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• 제50권3호
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• pp.212-217
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• 2013

Ultra hard TiN coatings were fabricated by DC and ICP (inductively coupled plasma) magnetron sputtering techniques. The effects of ICP power, ranging from 0 to 300 W, on the coating microstructure, crystallographic, and mechanical properties were systematically investigated with FE-SEM, AFM, HR-XRD and nanoindentation. The results show that ICP power has a significant influence on the coating microstructure and mechanical properties of TiN coatings. With an increasing ICP power, the film microstructure evolves from an apparent columnar structure to a highly dense one. Grain sizes of TiN coatings decreased from 12.6 nm to 8.7 nm with an increase of the ICP power. A maximum nanohardness of 67.6 GPa was obtained for the coatings deposited at an ICP power of 300 W. The crystal structure and preferred orientation in the TiN coatings also varied with the ICP power, exerting an effective influence on film nanohardness.

• 한국세라믹학회지
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• 제31권3호
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• pp.235-240
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• 1994

The electric and magnetic properties of Mg1.9-2xMn0.05Fe4xO4+${\gamma}$+2wt% Al2O3, and its microstructure have been investigated as a function of ferrite composition (x=0.45, 0.5, 0.55). The microstructure turned out to be independent on the ferrite composition. The resistivity was decreased with increasing Fe contents, whereas the Curie temperature decreased. Saturation magnetization was varied from 1741 to 2022 G with composition, and squareness ratio (SR), coercive force (BHc) were decreased and increased with increasing Fe contents respectively, so the sample which SR and BHc were 0.97 Oe and 1.49 Oe can be attainable at x=0.45.

• 한국세라믹학회지
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• 제25권6호
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• pp.623-630
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• 1988

As a function of the composition and content of frit, the electrical property of Ag and Ag/Pd thick film conductors were investigated with microstructure. With increasing sintering temperature in Ag-frit thick film conductors, electrical sheet resistivity decreased, but again increased above 80$0^{\circ}C$. And when frit contents is 5wt%, compact and homogenious microstructure can be obtained, then electrical sheet resistivity has minimum value. In Ag/Pd-frit film conductor, the electrical sheet resistivity decreased with increasing sintering temperature. The system which having frit with low softing point has lower sheet resistivity then to add high softening point frit.

• 한국세라믹학회지
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• 제25권6호
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• pp.615-622
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• 1988

To develope good slip and microstructure of Si3N4 the knowledge of the interaction of particles in liquid systems is required. In this work polyethyleneimines was tested as a stabilizer for Si3N4-water system. The stability of slip dispersed with polyethyleneimines was good over a wide range of pH and concentrated slips with low viscosity could be cast. This work comprises a systematic investigation including determination of electrical mobility in order to estimate the particle surface charge, determination of sedimentation rate, as well as measurements of the viscosity as a function of dispersants, pH and shear rates. The influence of deflocculation on the microstructure of slip cast Si3N4 was discussed.