• 제목/요약/키워드: CdTe(110) surface

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CdTe 표면의 산화과정의 초기단계 (The Initial Stages of the Oxidation of the CdTe surfaces)

  • 김형도;오세정
    • 한국진공학회지
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    • 제1권1호
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    • pp.50-59
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    • 1992
  • X선 광전자 분광방법(XPS)에 의하여 CdTe의 절개된 (110) 표면과 스퍼터링된 표 면을 산소에 노출시키면서 CdTe 표면의 산화과정의 초기단계에 대하여 고찰하였다. Te 3d5/2, Cd 3d5/2, O 1s, Cd MNN 오제 스펙트럼 등의 분석으로부터 산화의 초기단계에서 산 소원자 두 개가 Te 원자 한 개에 결합하고 있음을 보았다.

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pphotoemission study of rare-earth metal(Eu) on the CdTe(110) surface

  • Kwanghyun-Cho;Oh, J.H.;Chung, J.;K.H.ppark;Oh, S.J.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1994년도 제6회 학술발표회 논문개요집
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    • pp.43-43
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    • 1994
  • We studied chemical reactio of Eu metal on the in situ cleaved CdTe(110) surface by pphotoemission sppectroscoppy using synchrotron radiation. The chamber was maintained with base ppressure $\leq$2${\times}$10-10 mb during the expperiment. The expperiment was carried out in pphoton Factory in Jappan. Core level pphotoemission sppectroscoppy was carried out with Al K${\alpha}$ Line. The CdTe simiconductor was determined to be pp-typpe with low dopping concentration from Hall measurement. We found that there are two reacted pphases of Te with Eu (related to divalent Eu and trivalent Eu, resppectively) from least square fitting of Te 4d sppectra, but three is no indication of Cd reaction. Trivalent Eu exists after roughly one monolayer depposition (600 sec. depposition time is considered as one monolayer), which is also observed at Eu 3d core level sppectra. Overlayer Eu is metallized after roughly 2 monolayers depposition, as can be deduced from the fact that metallic edge near Fermi level begins to appear. The intensity of core-level of Te decreases expponentially at the initial stage (near one monolayer) and after one monolayer depposition it decreases more slowly due to Te out-diffusion. We categorized the growth mode of Eu on CdTe as S-K growth mode (cluster formation after one monolayer deppisition) from the relative intensity pplot of Te 4d normalized to the cleaved surface. At cleaved surface band bending is already established due to surface defects. At first 100 sec. depposition time the shift toward lower binding side by 0.6 eV is found at all core level sppectra of all elements in semiconductor. This shift is considered as the re-adjustment of surface Fermi level to the pposition induced by Eu metal (0.2 eV above the valence band maximum).