• Corrosion Science and Technology
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• v.7 no.2
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• pp.85-91
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• 2008

By operation in aqueous environment at high temperature and pressure, the structural materials from Primary Heat Transport System (PHTS) cover with protective oxide films, which maintain the corrosion rate in admissible limits. A lot of potential factors exist, which conduct to degradation of the protective films and consequently to intensification of the corrosion processes. The existing experience of different nuclear reactors shows that the water chemistry has an important role in integrity maintaining of the protective oxide films. To investigate the influence of water chemistry (pH, O2 dissolved, $Cl^-$, $F^-$) on corrosion of some structural materials (carbon and martensitic steel, Zr and Ni alloys) and to establish the maximum permissible values, corrosion experiments by static autoclaving and electrochemical methods were performed. The experimental results allowed us to establish the contribution of the water chemistry in initiation and evolution of some accelerated corrosion processes.

• Journal of Korean Vacuum Science & Technology
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• v.6 no.4
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• pp.143-148
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• 2002

Method of plasma-immersion ion deposition of hydrogenated DLC films on relatively thick flat dielectric substrates from plasma of not-self-sustained low-pressure gas arc discharge is suggested. Coating properties have been investigated experimentally, average energy Per a deposited carbon atom depending on discharge current has been calculated. Optimum deposition parameters lot obtaining sufficiently hard and transparent high-adhesive a-C:H films on a 4-mm thick glass substrates have been determined. Possibility to use these coatings for photo-tools protection from abrasion wear at low operating loads is shown in general.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.791-794
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• 2003

DLC thin films were prepared by microwave plasma-enhanced chemical vapor deposition method on silicon substrates using methane ($CH_4$) and hydrogen ($H_2$) gas mixture. The negative DC bias ($-450V{\sim}-550V$) was applied to enhance the adhesion between the film and the substrate. The films were characterized by Raman spectrometer. The surface morphology was observed by an atomic force microscope (AFM). And also, the friction coefficients were investigated by AFM in friction force microscope (FFM) mode, which were compared with the pin-on-disc (POD) measurement.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.714-718
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• 2003

Usually for the commercial preparation of barium titanate films or ceramics the reaction atmosphere must be preferably in air. However, normally air is not used because it contains carbon dioxide, which can easily react with barium to form the undesired product barium carbonate, leading to unwanted second-phase formation in the (mal stages of the process. In the present work a series of perovskite barium titanate films was prepared by the sol-gel method, using a metal alkoxide solutions in the electrophoretic deposition (EPD). The influence of several process parameters, like sintering temperature of sol preparation before EPD and heat-treatment temperature and non-oxidized atmosphere, on the film properties is described.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.842-845
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• 2003

DLC thin films were prepared by microwave plasma-enhanced chemical vapor deposition method on silicon substrates using methane ($CH_4$) and hydrogen ($H_2$) gas mixture. The negative DC bias ($-450V{\sim}-550V$) was applied to enhance the adhesion between the film and the substrate. The films were characterized by Raman spectrometer. The surface morphology was observed by an atomic force microscope (AFM). And also, the friction coefficients were investigated by AFM in friction force microscope (FFM) mode, which were compared with the pin-on-disc (POD) measurement.

• Carbon letters
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• v.1 no.3_4
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• pp.129-132
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• 2001

Carbonaceous thin films were prepared from acetylene and argon gases by plasma assisted chemical vapor deposition (Plasma CVD) at 873 K. The carbonaceous thin films were characterized by mainly Raman spectroscopy, and their electrochemical properties were studied by cyclic voltammetry and charge-discharge measurements in propylene carbonate (PC) solution. Raman spectra showed that crystallinity of carbonaceous thin films is correlated by the applied RF power. The difference of the applied RF power also affected on the results of cyclic voltammetry and charge-discharge measurements. In PC solution, intercalation and de-intercalation of lithium ion can occur as well as in the mixed solution of EC and DEC.

• Proceedings of the KSME Conference
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• 2001.11a
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• pp.876-881
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• 2001

DLC(Diamond-like carbon) films possess high hardness, low friction coefficient, and good wear resistance. Due to these properties, DLC films have been used extensively in magnetic hard disk industry. The objective of the present study was to investigate the influence of environmental condition on the tribological behavior of DLC coated hard disk. It is found that the tribological characteristics of DLC films are strongly affected by relative humidity and temperature. Specifically, the friction coefficient increases with increase in temperature at relative humidity of 50%. However, at 20% and 85% RH the effect of temperature was not significant. Also, the degree of wear could be observed using an AFM.

• Journal of the Korean Vacuum Society
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• v.5 no.1
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• pp.1-5
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• 1996

Noncrystalline films of diamond-like carbon (DLC) have been prepared by laser ablation technique at room temperature. A Q-switched Nd-YAG laser beam with wavelength of 1064 nm and pulse duration of 10 ns was focused onto a graphite target with power densities of about $10^9 W/\textrm{cm}^2$. The physical properties of the resulting films were analyzed with density, hardness, and resistivity measurements. The surface and bonding structure were investigated by atomic force microscopy (AFM), Raman spectroscopy, electron energy loss spectroscopy (EELS).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.72-73
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• 2005

Stress behavior was studied to investigate the internal behaviors of boron, carbon, and nitrogen in the 1000${\AA}$-thick tungsten boron carbon nitride (W-B-C-N) thin films. The impurities in the W-B-C-N thin films provide stuffing effects that were very effective for preventing the interdiffusion between interconnection metal and silicon substrate during the subsequent high temperature annealing process. The resistivity of W-B-C-N thin film decreases as an annealing temperature increase. The W-B-C-N thin films have compressive stress, and the stress value decreased up to $4.11\times10^{10}dyne/cm^2$ as an $N_2$ flow rate increases up to 3 sccm.

• Journal of the Korean Ceramic Society
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• v.53 no.6
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• pp.647-651
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• 2016

SiC films were prepared on glassy carbon substrates by laser chemical vapor deposition under a high pressure of $10^4Pa$ using a diode laser (wavelength = 808 nm) and a polysilaethylene precursor. (111)-oriented SiC films were formed at a deposition temperature ($T_{dep}$) range of 1150 - 1422 K. At $T_{dep}=1262K$, the SiC film with a high Lotgering factor of above 0.96 showed an exhibited pyramid-like surface morphology and flower-like grains. The highest deposition rate ($R_{dep}$) was $220{\mu}m\;h^{-1}$ at $T_{dep}=1262K$.