• Journal of the Korean Crystal Growth and Crystal Technology
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• v.17 no.1
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• pp.18-22
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• 2007

Carbon nanofilaments were deposited on silicon oxide substrate by thermal chemical vapor deposition method. We used $Fe(CO)_5$ as the catalyst for the carbon nanofilaments formation. Around $800^{\circ}C$ substrate temperature, the formation density of carbon nanofilaments could be enhanced by the vacuum sublimation technique of $Fe(CO)_5$, compared with the conventional spin coating technique. Finally, we could achieve the low temperature, as low as $350^{\circ}C$, formation of carbon nanofilaments using the sublimated Fe-complex nanograins with thermal chemical vapor deposition. Detailed morphologies and characteristics of the carbon nanofilaments were investigated. Based on these results, the role of the vacuum sublimation technique for the low temperature deposition of carbon nanofilaments was discussed.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.17 no.4
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• pp.160-164
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• 2007

Carbon nanofibers were deposited on silicon oxide substrate by thermal chemical vapor deposition method. For the enhancement of the characteristics of carbon nanofibers, the source gases ($C_2H_2,\;H_2$) flows were intentionally manipulated as the cyclic on/off modulation of $C_2H_2$ flow. By the cyclic modulation process during the initial deposition stage, the formation density of carbon nanofibers on the substrate could be much more enhanced. The diameter of as-grown carbon nanofibers was also reduced by the cyclic modulation process. The cause for the variation in the characteristics of carbon nanofibers by the cyclic modulation process was discussed in association with the hydrogen gas etching ability.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.344.2-344.2
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• 2016

Fully and partially grown hexagonal boron nitride (h-BN) on Cu foil, synthesized by chemical vapor deposition method, was studied using Raman and SEM measurements. Fully and partially grown samples were successfully made from borane-ammonia complex to controlling pressure and growth time. The fully grown h-BN and partially grown h-BN exhibits a ~ 1370 cm-1 B-N vibrational mode (E2g). Especially, well-aligned triangular h-BN monolayer was observed on some domain of Cu foil using SEM measurements.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.35 no.10
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• pp.465-472
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• 1986

The present study was carried out to investigate the mechanism which control the voltage instability and the breakdown of CVD Al2O3 on Si substrates. Our sample were metal-Al2O3-Oi Capacitors with both Al and Au field plates. Electron injection and trapping, with resultant positive flatband voltage shift, occur at fields as low as 1-2[MV/cm.] We developed an approximate method for computing the location of the centroid of the trapped electrons. Our results indicate that the electrons are trapped near the injecting interface, at least for fields less than about 5[MV/cm ] Because of continued charging, a true steady state is probably never reached, and the only unique I-V curve is the one obtained initially, when the traps are empty. We measured this I-V curve for both polarities of applied voltage, using a fresh sample for each point. The observed current densities are much larger than those obtained in thermally grawn SiO2.

• Journal of the Korean institute of surface engineering
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• v.33 no.2
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• pp.69-76
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• 2000

The rf plasma chemical vapor deposition is a common method employed for diamond or amorphous carbon deposition. Diamond possesses the strongest bonding, as exemplified by a number of unique properties-extraordinary hardness, high thermal conductivity, and a high melting tempera tore. Therefore, it is very important to investigate the synthesis of semiconducting diamond and its use as semiconductor devices. An inductively coupled rf plasma CVD system for producing amorphous carbon films were developed. Uniform temperature and concentration profiles are requisites for the deposition of high quality large-area films. The system consists of rf matching network, deposition chamber, pumping lines for gas system. Gas mixtures with methane, and hydrogen have been used and Si (100) wafers used as a substrate. Amorphous carbon films were deposited with methane concentration of 1.5% at the process pressure of S torr~20 torr, and process temperature of about $750^{\circ}C$. The nucleation and growth of the amorphous carbon films have been characterized by several methods such as SEM and XRD.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.24 no.4 s.175
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• pp.900-906
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• 2000

Ceramic, PCD and CBN tools are available for the difficult-to-cut-materials such as hardened carbon tool steel, stainless steel, Inconel 718 and etc. Ceramic tools are likely to be chipped and abruptly broken before the appearance of normal wear in turning. Ceramic tools are suitable for continuous in turning, not for intermittent in milling. In this study, TiN/TiCN multi-layer coated ceramic tools were found to restrain the chipping, breaking and early fracture and to increase the critical cutting speed owing to TiN/TiCN multi-layer coating in Arc Ion Plating of PVD method.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.103-103
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• 2003

ZnO$_{1-x}$(또는 Zn$_{1+x}$O) 산화아연은 과잉의 아연(또는 oxygen vacancy)이 도우너(donor) 역할을 하는 비화학양론적 n형 산화물 반도체이다. ZnO는 높은 투과율을 가지고 온도나 주변환경에 대해 매우 안정하며, 또한 이미 상용화된 ITO (Indium tin oxide)에 비해 식각 특성이 우수하고, 수소 플라즈마에 대한 저항성이 크다는 장점 때문에 가스센서와 디스플레이용 소자 등 다양한 분야에 응용이 가능하다. ZnO 박막은 CVD, Reactive Magnetron Sputtering, Electron-beam Evaporation 등 여러 가지방법으로 제작할 수 있다. 본 연구에서는 형성된 박막의 구성성분이 타겟의 성분과 유사하고 낯은 기판온도에서도 박막이 형성되어지는 장점을 가지는 Pulsed Laser Deposition 방법을 사용하여 유리 기판위에 ZnO 박막을 형성하였다.다.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.43-43
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• 2003

Carbon nanotubes(CNTs) have many application points, which are field emission devices, composites, hydrogen storage, nanodevices, supercapacitor and secondary battery. The most promising application point is emitter tip mays of field emission devices. Furthermore, it may be also useful as a vacuum device for high frequency and high power. But, there are some obstacles to fabricate carbon nanotube field emission device. One is that CNTs grown by CVD method has weak adhesion with substrate and the other is non-uniform length of them. These problems are very crucial in aging property and reliability of device in the field emission.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.9 no.1
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• pp.96-101
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• 2000

Ceramic, PCD and CBN tools are available for the difficult-to-cut-materials such as hardened carbon tool steel, stainless steel, Inconel 718 and etc.. Ceramic toolsare likely to be chipped and abruptly broken before the appearance of normal wear in turning. Ther2efore ceramic tools are suitable for continuous cut in turning not for intermittent in milling. In this study, TiN/TiCN multi-layer coated ceramic tools were found to restrain the chipping, breaking and early fracture and to increase the critical cutting speed owing to TiN/TiCN multi-layer coating in Arc Ion Plating of PVD method.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.2
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• pp.76-79
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• 1999

Low-hydrogenated DLC films were coated on the Mo-tip FEAs by 'layer-by-layer' process based on the plasma-enhanced CVD method. The hydrogen content in the DLC film deposited by the 'layer-by-layer' process was appeared to be remarkably lowered through SIMS analysis. Also, the low-hydrogenated DLC-coated Mo-tip FEA showed good potentiality for FED applications in terms of turn-on voltage, emission current, emission stability and light emitting uniformity.