• 제목/요약/키워드: CVD

검색결과 1,856건 처리시간 0.028초

글루타티온 S-전환효소 다형성과 뇌혈관질환(腦血管疾患) 및 사상체질 사이의 연관성(聯關性)에 관한 연구 (Interrelationships among Glutathione S-Transferase Polymorphisms, Cerebrovascular Disease and Sasang Constitution)

  • 김종관;한병삼;김경요;고기덕;옥윤영
    • 사상체질의학회지
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    • 제14권1호
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    • pp.123-131
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    • 2002
  • Glutathione S-transferase polymorphisms (GST) were examined in 98 cases with cerebrovascular disease (CVD) to test the hypothesis that GST polymorphisms confer a risk to an individual to develop CVD. Tobacco smoke is a major cause of both cancer and vascular disease. We therefore were stratified the subjects with CVD for smoking status, and then examined whether polymorphisms in this detoxification enzyme gene, GST, influence risk of CVD. Neither GSTM1 nor GSTT1 genotypes in the CVD group was significantly different from the control group (n=230), even in smokers. We attempted the combined analyses for GSTM1 and GSTT1 genotypes in CVD for smoking status. No significant association observed between the combined genotypes and CVD. We also classified the subjects and control group into four types according to Sasang Constitutional Medicine, Korean Traditional Oriental Medicine, and investigated the association among GST genotypes, CVD, and Sasang constitutional classification. Our observations do not confirm the effect of the GSTM1 and GSTT1 genotypes as a risk factor for CVD, even in smokers. Furthermore, we first attempted to evaluate the efficacy of Sasang Constitutional Medicine, and to find an association with CVD.

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Glutathione S-transferase polymorphisms and traditional classification in Korean population with cerebrovascular disease

  • Um, Jae-Young;Ok, Yoon-Young;Joo, Jong-Cheon;Kim, Kyung-Yo;Kim, Na-Hyung;Hong, Seung-Heon;Kim, Hyung-Min
    • Advances in Traditional Medicine
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    • 제4권2호
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    • pp.112-119
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    • 2004
  • Glutathione S-transferase polymorphisms (GST) were examined in 98 cases with cerebrovascular disease (CVD) to test the hypothesis that GST polymorphisms confer a risk to an individual to develop CVD. Tobacco smoke is a major cause of both cancer and vascular disease. We therefore were stratified the subjects with CVD for smoking status, and then examined whether polymorphisms in this detoxification enzyme gene, GST, influence risk of CVD. Neither GSTM1 nor GSTT1 genotypes in the CVD group was significantly different from the control group (n=230), even in smokers. We attempted the combined analyses for GSTM1 and GSTT1 genotypes in CVD for smoking status. No significant association observed between the combined genotypes and CVD. We also classified the subjects and control group into four types according to Sasang Constitutional Medicine, Korean Traditional Oriental Medicine, and investigated the association among GST genotypes, CVD, and Sasang constitutional classification. Our observations do not confirm the effect of the GSTM1 and GSTT1 genotypes as a risk factor for CVD, even in smokers. Furthermore, we first attempted to evaluate the efficacy of Sasang Constitutional Medicine, and to find an association with CVD.

Decomposition of Socioeconomic Inequality in Cardiovascular Disease Prevalence in the Adult Population: A Cohort-based Cross-sectional Study in Northwest Iran

  • Pourfarzi, Farhad;Moghadam, Telma Zahirian;Zandian, Hamed
    • Journal of Preventive Medicine and Public Health
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    • 제55권3호
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    • pp.297-306
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    • 2022
  • Objectives: The incidence of cardiovascular disease (CVD) mortality is increasing in developing countries. This study aimed to decompose the socioeconomic inequality of CVD in Iran. Methods: This cross-sectional population-based study was conducted on 20 519 adults who enrolled in the Ardabil Non-Communicable Disease cohort study. Principal component analysis and multivariable logistic regression were used, respectively, to estimate socioeconomic status and to describe the relationships between CVD prevalence and the explanatory variables. The relative concentration index, concentration curve, and Blinder-Oaxaca decomposition model were used to measure and decompose the socioeconomic inequality. Results: The overall age-adjusted prevalence of CVD was 8.4% in northwest Iran. Multivariable logistic regression showed that older adults, overweight or obese adults, and people with hypertension and diabetes were more likely to have CVD. Moreover, people with low economic status were 38% more likely to have CVD than people with high economic status. The prevalence of CVD was mainly concentrated among the poor (concentration index, -0.077: 95% confidence interval, -0.103 to -0.060), and 78.66% of the gap between the poorest and richest groups was attributed to differences in the distribution of the explanatory variables included in the model. Conclusions: The most important factors affecting inequality in CVD were old age, chronic illness (hypertension and diabetes), marital status, and socioeconomic status. This study documented stark inequality in the prevalence of CVD, wherein the poor were more affected than the rich. Therefore, it is necessary to implement policies to monitor, screen, and control CVD in poor people living in northwest Iran.

Comparing Korea Occupational Safety & Health Agency and National Health Insurance Service's cardio-cerebrovascular diseases risk-assessment tools using data from one hospital's health checkups

  • Yunrae Cho;Dong Geon Kim;Byung-Chan Park;Seonhee Yang;Sang Kyu Kim
    • Annals of Occupational and Environmental Medicine
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    • 제35권
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    • pp.35.1-35.11
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    • 2023
  • Background: Cardio-cerebrovascular diseases (CVDs) are the most common cause of death worldwide. Various CVD risk assessment tools have been developed. In South Korea, the Korea Occupational Safety & Health Agency (KOSHA) and the National Health Insurance Service (NHIS) have provided CVD risk assessments with health checkups. Since 2018, the KOSHA guide has stated that NHIS CVD risk assessment tool could be used as an alternative of KOSHA assessment tool for evaluating CVD risk of workers. The objective of this study was to determine the correlation and agreement between the KOSHA and the NHIS CVD risk assessment tools. Methods: Subjects of this study were 17,485 examinees aged 20 to 64 years who had undergone medical examinations from January 2021 to December 2021 at a general hospital. We classified subjects into low-risk, moderate-risk, high-risk, and highest-risk groups according to KOSHA and NHIS's CVD risk assessment tools. We then compared them with cross-analysis, Spearman correlation analysis, and linearly weighted kappa coefficient. Results: The correlation between KOSHA and NHIS tools was statistically significant (p-value < 0.001), with a correlation coefficient of 0.403 and a kappa coefficient of 0.203. When we compared risk group distribution using KOSHA and NHIS tools, CVD risk of 6,498 (37.1%) participants showed a concordance. Compared to the NHIS tool, the KOSHA tool classified 9,908 (56.7%) participants into a lower risk category and 1,079 (6.2%) participants into a higher risk category. Conclusions: In this study, KOSHA and NHIS tools showed a moderate correlation with a fair agreement. The NHIS tool showed a tendency to classify participants to higher CVD risk group than the KOSHA tool. To prevent CVD more effectively, a higher estimation tool among verified CVD risk assessment methods should be selected and managements such as early intervention and treatment of risk factors should be performed targeting the high-risk group.

HI-$H_2O$ 기상 혼합물에서 Silica 막의 안정성 (Stability of a Silica Membrane in the HI-$H_2O$ Gaseous Mixture)

  • 황갑진;박주식;이상호;최호상
    • 멤브레인
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    • 제14권3호
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    • pp.201-206
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    • 2004
  • 열화학적 IS 공정에서 요오드화수소의 분해에 적용하기 위하여 화학증착법(CVD)으로 제조된 silica 막의 안정성을 HI-$H_2O$ 기상 혼합물에서 평가하였다. Si 원천으로 tetraethoxysilane을 사용하여 서로 다른 CVD 온도로 기공크기가 100 nm인 $\alpha$-alumina를 처리하였다. CVD온도는 $700^{\circ}C$, $650^{\circ}C$, $600^{\circ}C$이었다. $600^{\circ}C$에서 수행한 단일 성분의 투과 실험에서 측정한 막의 $H_2$/$N_2$ 선택도는 CVD 온도 $700^{\circ}C$의 M1 막은 43.2, $650^{\circ}C$의 M2 막은 12.6, $600^{\circ}C$의 M3 막은 8.7을 나타내었다. HI-$H_2O$ 기상 혼합물에서 안정성 실험은 $450^{\circ}C$에서 수행하였는데, CVD 온도 $650^{\circ}C$에서 처리된 막이 다른 온도에서 처리된 막보다 더 안정성이 더 좋은 결과를 얻었다.

Improving Visual Accessibility for Color Vision Deficiency Based on MPEG-21

  • Yang, Seung-Ji;Ro, Yong-Man;Nam, Je-Ho;Hong, Jin-Woo;Choi, Sang-Yul;Lee, Jin-Hak
    • ETRI Journal
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    • 제26권3호
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    • pp.195-202
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    • 2004
  • In this paper, we propose a visual accessibility technique in an MPEG-21 framework. In particular, MPEG-21 visual accessibility for the colored-visual resource of a digital item is proposed to give better accessibility of color information to people with color vision deficiency (CVD). We propose an adaptation system for CVD as well as a description of CVD in MPEG-21. To verify the usefulness of the proposed method, computer simulations with CVD and color adaptation were performed. Furthermore, a statistical experiment was performed using volunteers with CVD in order to verify the effectiveness of the proposed visual accessibility technique in MPEG-21. Both the experimental and simulation results show that the proposed adaptations technique can provide better color information, particularly to people with CVD.

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Single-Domain-Like Graphene with ZnO-Stitching by Defect-Selective Atomic Layer Deposition

  • 김홍범;박경선;;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.329-329
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    • 2016
  • Large-area graphene films produced by means of chemical vapor deposition (CVD) are polycrystalline and thus contain numerous grain boundaries that can greatly degrade their performance and produce inhomogeneous properties. A better grain boundary engineering in CVD graphene is essential to realize the full potential of graphene in large-scale applications. Here, we report a defect-selective atomic layer deposition (ALD) for stitching grain boundaries of CVD graphene with ZnO so as to increase the connectivity between grains. In the present ALD process, ZnO with hexagonal wurtzite structure was selectively grown mainly on the defect-rich grain boundaries to produce ZnO-stitched CVD graphene with well-connected grains. For the CVD graphene film after ZnO stitching, the inter-grain mobility is notably improved with only a little change in free carrier density. We also demonstrate how ZnO-stitched CVD graphene can be successfully integrated into wafer-scale arrays of top-gated field effect transistors on 4-inch Si and polymer substrates, revealing remarkable device-to-device uniformity.

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MOS 소자에서 WSi$_2$ 게이트 전극이 Thin Oxide 성질에 미치는 영향 (Effect of WSi$_2$ Gate Electrode on Thin Oxide Properties in MOS Device)

  • 박진성;이현우;김갑식;문종하;이은구
    • 한국세라믹학회지
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    • 제35권3호
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    • pp.259-263
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    • 1998
  • WSi2/CVD-Si/SiO2/Si-substrate의 폴리사이드 구조에서 실리콘 증착 POCl3 확산 그리고 WSi2 증착 유무에 따른 Thin oxide 특성을 연구했다 WSi2 막을 증착하지 않은 CVD-Si/SiO2/Si-substrate 구조에서 CVD-Si을 po-lycrystalline-Si으로 증착한 시편이 amorphous-Si을 증착한 시편보다 산화막 불량이 적다 WSi2 를 증착시킨 WSi2/CVD-Si/SiO2./Si-substrate의 구조에서 CVD-Si의 polycrystalline-Si 혹든 amorphous-Si 의 막 증착에 따른 thin oxide의 불량율 차이는 미미하다 산화막 불량은 CVD-Si에 확산시킨 인(P) 증가 즉 면저항(sheet resistance) 감소로 증가한다. Thin oxide의 절연특성은 WSi2 증착으로 저하된다 WSi2 증착으로 산화막 두께는 증가하나 막 특성은 열등해져 산화막 절연성이 떨어진다.

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레이저 CVD 텅스텐막 증착을 통한 TFT LCD 불량배선 수리 (Repairing of a Defective Metallic Line using Laser CVD Deposited Tungsten Film in TFT LCD)

  • 김석군;손정석;이기선
    • 한국전기전자재료학회논문지
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    • 제17권10호
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    • pp.1114-1119
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    • 2004
  • The photodepositioned tungsten film by laser CVD has been carried out the taping test with scotch tape over 10 times. As a result, it exhibited strong adhesion to the under-film such as ITO and SiNx patterned on the LCD substrate. However, it was seriously attacked by alkaline solution used for removing polyimide. And a thickness of laser CVD tungsten film had a close relation to a speed of laser scanning. Also we have improved the success rate of a laser CVD repair with making two pairs of contact hole structure and decreasing laser scanning speed.

Application of thermodynamics to chemical vapor deposition

  • Latifa Gueroudji;Hwang, Nong-Moon
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 1998년도 PROCEEDINGS OF THE 15TH KACG TECHNICAL MEETING-PACIFIC RIM 3 SATELLITE SYMPOSIUM SESSION 4, HOTEL HYUNDAI, KYONGJU, SEPTEMBER 20-23, 1998
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    • pp.1-20
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    • 1998
  • Processing of thin films by chemical vapor deposition (CVD) is accompanied by chemical reactions, in which the rigorous kinetic analysis is difficult to achieve. In these conditions, thermodynamic calculation leads to better understanding of the CVD process and helps to optimise the experimental parameters to obtain a desired product. A CVD phase diagram has been used as guide lines for the process. By determining the effect of each process variable on the driving force for deposition, the thermodynamic limit for the substrate temperature that diamond can deposit is calculated in the C-H system by assuming that the limit is defined by the CVD diamond phase diagram. The addition of iso-supersaturation ratio lines to the CVD phase diagram in the Si-Cl-H system provides additional information about the effects of CVD process variables.

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