• Title/Summary/Keyword: Bragg (Distributed Bragg Reflectors) structure

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Multiple-Bit Encodings of Bragg Photonic-structures by Using Consecutive Etch with Various Square Wave Currents

  • Lee, Bo-Yeon;Hwang, Minwoo;Cho, Hyun;Kim, Hee-Chol;Cho, Sungdong
    • Journal of Integrative Natural Science
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    • v.4 no.3
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    • pp.192-196
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    • 2011
  • New method to encode multiple photonic features of Bragg type reflector on silicon wafer has been investigated. Multiple bit encodes of distributed Bragg reflector features have been prepared by electrochemical etching of crystalline silicon by using various square wave current densities. Optical characterization of multi-encoding of distributed Bragg reflectors on porous silicon was achieved by Ocean optics 2000 spectrometer for the search of possible applications of multiple bit encoding of distributed Bragg reflectors such as multiplexed assays and chemical sensors. The morphology and cross-sectional structure of multi-encoded distributed Bragg reflectors was investigated by field emission scanning electron micrograph.

Investigation of Relationship between Reflection Resonance and Applied Current Density in Bragg Photonic Crystal

  • Kim, Bumseok
    • Journal of Integrative Natural Science
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    • v.5 no.1
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    • pp.27-31
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    • 2012
  • Relationship between reflection resonance and applied current density in Bragg photonic crystal has been investigated. Multiple bit encodes of distributed Bragg reflector features have been prepared by electrochemical etching of crystalline silicon by using various square wave current densities. Optical characterization of multi-encoding of distributed Bragg reflectors on porous silicon was achieved by Ocean optics 2000 spectrometer for the search of possible applications of multiple bit encoding of distributed Bragg reflectors such as multiplexed assays and chemical sensors. The morphology and cross-sectional structure of multi-encoded distributed Bragg reflectors was investigated by field emission scanning electron micrograph.

Synthesis and Optically Characterization of Bragg Structure Porous Silicon (다층 다공성 실리콘의 합성과 그 광학적 특성 조사)

  • Kim, Sung Gi
    • Journal of Integrative Natural Science
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    • v.2 no.1
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    • pp.45-49
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    • 2009
  • Electrochemical etching of heavily doped p-type silicon wafers (boron doped, <100> orientation, resistivity; $0.8-1.2m{\Omega}/cm$) with different current density resulting two different refractive indices resulted in DBR (Distributed Bragg Reflectors) porous silicon, which exhibited strong in-plane anisotropy of refractive index (birefringence). Dielectric stacks of birefringent porous silicon acting as distributed Bragg reflectors have two distinct reflection bands depending on the polarization of the incident linearly polarized light. This effect is caused by a three-dimensional (in plane and in depth) variation of the refraction index. Optical characteristics of DBR porous silicon were investigated.

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1-D Photonic Crystals Based on Bragg Structure for Sensing and Drug Delivery Applications

  • Koh, Youngdae
    • Journal of Integrative Natural Science
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    • v.4 no.1
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    • pp.11-14
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    • 2011
  • Free-standing multilayer distributed Bragg reflectors (DBR) porous silicon dielectric mirrors, prepared by electrochemical etching of crystalline silicon using square wave currents are treated with polymethylmethacrylate (PMMA) to produce flexible, stable composite materials in which the porous silicon matrix is covered with caffeine-impregnated PMMA. Optically encoded free-standing DBR PSi dielectric mirrors retain the optical reflectivity. Optical characteristics of free-standing DBR PSi dielectric mirrors are stable and robust for 24 hrs in a pH 12 aqueous buffer solution. The appearance of caffeine and change of DBR peak were simultaneously measured by UV-vis spectrometer and Ocean optics 2000 spectrometer, respectively.

Optical Characterization of DBR Porous Silicon by Changing of Applied Current Density (전류세기의 변화에 따른 DBR 다공성 실리콘의 광학적 특성)

  • Choi, Tae-Eun;Park, Jaehyun
    • Journal of Integrative Natural Science
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    • v.2 no.2
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    • pp.82-85
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    • 2009
  • Distributed Bragg reflector (DBR) porous silicon (PSi) was generated by an electrochemical etching a bragg structure into a silicon wafer through electrode current in aqueous ethanolic HF solution. DBR PSi exhibiting unique reflectivity was successfully obtained by an electrochemical etching of silicon wafer using square current waveform. The multilayered photonic crystals of DBR PSi exhibited the reflection of a specific wavelength with high reflectivity in the optical reflectivity spectrum. In this work, we have developed a method to create refractive index in Si substrate through intensity of an electric current. The electrochemical process allows for precise control of the structural properties of DBR PSi such as thickness of the porous layer, porosity, and average pore diameter. The number of reflection peak of DBR PSi and its pore size increased as the intensity of electric current increased. This might be a demonstration for the fabrication of specific reflectors or filters.

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A High Radiation Efficiency and Narrow Beam Width of Optical Beam Steering Using a Silicon-based Grating Structure Integrated with Distributed Bragg Reflectors (분배 브래그 반사기가 집적된 실리콘 기반 격자 구조를 이용한 광학 빔 방사 효율 및 조향 선폭 성능 향상)

  • Hong, Yoo-Seung;Cho, Jun-Hyung;Sung, Hyuk-Kee
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.23 no.3
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    • pp.311-317
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    • 2019
  • We first numerically analyzed the characteristics of a silicon-based grating structure for beam steering. The analysis includes the basic principle of the grating structure according to the wavelength, peak radiation angle, radiation efficiency, and full-width at the half maximum(FWHM) of the radiation angle. Based on the analysis, we propose a silicon-based grating structure integrated with distributed Bragg reflector(DBR) to obtain a high radiation efficiency and narrow beam width simultaneously. We performed the numerical optimization of the radiation efficiency and FWHM of the radiation angle according to the DBR position. By the design optimization using the proposed grating structure compatible with the complementary metal-oxide semiconductor(CMOS) process, we achieved a maximum radiation efficiency of 87.1% and minimum FWHM of radiation angle of $4.68^{\circ}$.