• 접착 및 계면
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• 제24권3호
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• pp.86-94
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• 2023

OLED 소자를 용액공정으로 제작함에 있어 음극 전극의 용액공정화가 기술적인 난제이므로 별도의 기판에 음극 전극을 형성하고 PEI 층을 접합층으로 사용하여 이를 다른 기판의 소자와 물리적, 전기적으로 연결하는 연구를 진행하였다. PEI 용액의 농도, PEI 층의 두께 및 첨가제 혼합 등을 변수로 하였으며 접착력 측정기와 EOD 소자 제작을 통하여 특성을 확인한 결과는 다음과 같다. PEI 용액의 농도가 높을수록 접착강도가 증가하였으나 막 두께의 증가로 전류 밀도가 감소하였다. 0.1 wt% PEI 용액에 첨가제로서 조비톨과 PEG를 혼합한 결과 PEG를 0.5 wt%의 농도로 혼합한 조건에서 900 mA/cm² 의 최대 전류 밀도를 얻었으며 양호한 접착 상태와 소자의 점등도 확인되었다.

• 대한소아치과학회지
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• 제26권1호
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• pp.53-61
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• 1999

Newley developed dentin bonding system which contains self-etching primer performed the removing of smear layer and etching procedure at once. So, it make possible more simple and shorter working time, the stronger bonding strength than conventional dentin bonding system. Cavities were prepared in the buccal and lingual surface of 30 extracted primary molars, and randomly assigned into three equal groups of 10 each. All cavities were filled with Z-100 composite resin following manufacturer's specifications after priming of three different dentin bonding system. Specimens stored for 7 days in 37 degree C water, thermocycled for 1000 cycles between 5 degree C and 55 degree C, immersed in 50% silvernitrate solution for 24 hours, and embedded in resin before being sectioned longitudinally. Data were analyzed by t-test and ANOVA. Mac-Bond II and Clearfil Linear-Bond II showed less microleakage at the occlusal and gingival margins compared to Scotchbond Multi Purpose. All dentin bonding systems showed significantly less microleakage at the occlusal margins compared to the gingival margins. But, there were no significantley difference between each group.

• Bulletin of the Korean Chemical Society
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• 제24권3호
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• pp.325-333
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• 2003

An analysis of the electronic structure and bonding in the ternary silicide YNiSi₃is made, using extended Huckel tight-binding calculations. The YNiSi₃structure consists of Ni-capped Si₂dimer layers and Si zigzag chains. Significant bonding interactions are present between the silicon atoms in the structure. The oxidation state formalism of $(Y^{3+})(Ni^0)(Si^3)^{3-}$ for YNiSi₃constitutes a good starting point to describe its electronic structure. Si atoms receive electrons from the most electropositive Y in YNiSi₃, and Ni 3d and Si 3p states dominate below the Fermi level. There is an interesting electron balance between the two Si and Ni sublattices. Since the ${\pi}^*$ orbitals in the Si chain and the Ni d and s block levels are almost completely occupied, the charge balance for YNiSi₃can be rewritten as $(Y^{3+})(Ni^{2-})(Si^{2-})(Si-Si)^+$, making the Si₂layers oxidized. These results suggest that the Si zigzag chain contains single bonds and the Si₂double layer possesses single bonds within a dimer with a partial double bond character. Strong Si-Si and Ni-Si bonding interactions are important for giving stability to the structure, while essentially no metal-metal bonding exists at all. The 2D metallic behavior of this compound is due to the Si-Si interaction leading to dispersion of the several Si₂π bands crossing the Fermi level in the plane perpendicular to the crystallographic b axis.

• 대한치과기공학회지
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• 제35권4호
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• pp.353-358
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• 2013

Purpose: This study was observation shear bonding strength by compositional change and firing step of a Ni-Cr alloy for porcelain fused metal crown. The aim of study was to suggest the material for firing step of Ni71-Cr14 alloy to development of alloy for porcelain fused to metal crown. Methods: The test was on the two kinds of Ni-Cr alloy specimens. The surfaces of two alloys were analyzed by EDX in order to observe oxide characteristic. And the shear test was performed by MTS. Results: The surface property and oxide characteristic analysis of oxide layer, weight percentage of Element O within $Ni_{71}Cr_{14}$ alloy measured 23.32wt%, and $Ni_{59}Cr_{24}$ alloy was measured 23.03wt%. And the maximum shear bonding strength was measured 58.02MPa between $Ni_{59}Cr_{24}$ alloy and vintage halo(H4 group). Conclusion: The surface property and oxide characteristic three kind of Ni-Cr alloy was similar. and shear bonding strength showed the highest bonding strength in H4 specimens.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2015년도 춘계학술대회 논문집
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• pp.154-154
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• 2015

현재 액체로켓 엔진 연소기 내벽은 bonding layer NiCrAlY과 Top layer $ZrO_2$가 플라즈마 용사 방식으로 형성 된다. 이는 뛰어난 열 차폐 특성과 작업시간이 짧은 장점이 있지만, bonding layer와 Top layer 사이의 열팽창 계수 차이로 인한 균열 발생 가능성이 내재 되어 있고, 연소실 내벽에 균일한 두께의 코팅층을 형성하기 어렵고 설비가 비싸다는 단점으로 인하여 세라믹 코팅 층을 금속 코팅 층으로 대체 하고자 한다. 금속 코팅층은 모재와의 밀착성이 높고, 우수한 산화 및 부식방지 기능을 가지며 저렴하다는 장점이 있다. 또한 코팅 후 연마 작업이 가능해 연소실 내부형상을 설계조건 대로 유지 할 수 있는 특징이 있다. 따라서 본 연구에서는 연소실 내벽에 적용할 모재, 무전해 Ni-P 도금과 전해 Cr 도금층 사이의 밀착력 향상을 위한 방법에 대한 연구를 하였다. 밀착력 향상을 위한 요소로 전처리 용액과 열처리 시간에 따른 영향을 알아보고자 하였으며, 이를 위해서 5가지의 산세 용액으로 각 시편을 산세 한 후, 6시간, 12시간, 18시간 열처리 하여 단면을 비교하여 열처리에 영향을 알아보고자 하였다. 연구 결과 산세 용액의 영향은 크게 나타나지 않았으며, 열처리 시간이 길수록 Ni-P/Cr의 확산이 더 잘 일어나 확산층이 더 넓어지면서 밀착력이 더 좋아 진 것으로 판단되어 진다.

• 한국재료학회지
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• 제34권3호
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• pp.163-169
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• 2024

As the limitations of Moore's Law become evident, there has been growing interest in advanced packaging technologies. Among various 3D packaging techniques, Cu-SiO₂ hybrid bonding has gained attention in heterogeneous devices. However, certain issues, such as its high-temperature processing conditions and copper oxidation, can affect electrical properties and mechanical reliability. Therefore, we studied depositing only a heterometal on top of the Cu in Cu-SiO₂ composite substrates to prevent copper surface oxidation and to lower bonding process temperature. The heterometal needs to be deposited as an ultra-thin layer of less than 10 nm, for copper diffusion. We established the process conditions for depositing a Co film using a Co(EtCp)₂ precursor and utilizing plasma-enhanced atomic layer deposition (PEALD), which allows for precise atomic level thickness control. In addition, we attempted to use a growth inhibitor by growing a self-assembled monolayer (SAM) material, octadecyltrichlorosilane (ODTS), on a SiO₂ substrate to selectively suppress the growth of Co film. We compared the growth behavior of the Co film under various PEALD process conditions and examined their selectivity based on the ODTS growth time.

• 마이크로전자및패키징학회지
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• 제28권3호
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• pp.9-15
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• 2021

최근 반도체 소자의 소형화는 물리적 한계에 봉착했으며, 이를 극복하기 위한 방법 중 하나로 반도체 소자를 수직으로 쌓는 3D 패키징이 활발하게 개발되었다. 3D 패키징은 TSV, 웨이퍼 연삭, 본딩의 단위공정이 필요하며, 성능향상과 미세피치를 위해서 구리 본딩이 매우 중요하게 대두되고 있다. 본 연구에서는 대기중에서의 구리 표면의 산화방지와 저온 구리 본딩에 티타늄 나노 박막이 미치는 영향을 조사하였다. 상온과 200℃ 사이의 낮은 온도 범위에서 티타늄이 구리로 확산되는 속도가 구리가 티타늄으로 확산되는 속도보다 빠르게 나타났고, 이는 티타늄 나노 박막이 저온 구리 본딩에 효과적임을 보여준다. 12 nm 티타늄 박막은 구리 표면 위에 균일하게 증착되었고, 표면거칠기(R_q)를 4.1 nm에서 3.2 nm로 낮추었다. 티타늄 나노 박막을 이용한 구리 본딩은 200℃에서 1 시간 동안 진행하였고, 이후 동일한 온도와 시간 동안 열처리를 하였다. 본딩 이후 측정된 평균 전단강도는 13.2 MPa이었다.

• Corrosion Science and Technology
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• 제7권1호
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• pp.50-60
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• 2008

The majority of the described experimental results deal with relatively pure aluminium. Variations were made in the pretreatment of the aluminum substrates and an investigation was performed on the resulting changes in oxide layer composition and chemistry. Subsequently, the bonding behavior of the surfaces was investigated by using model adhesion molecules. These molecules were chosen to represent the bonding functionality of an organic polymer. They were applied onto the pretreated surfaces as a monolayer and the bonding behavior was studied using infrared reflection absorption spectroscopy. A direct and clear relation was found between the hydroxyl fraction on the oxide surfaces and the amount of molecules that subsequently bonded to the surface. Moreover, it was found that most bonds between the oxide surface and organic functional groups are not stable in the presence of water. The best performance was obtained using molecules, which are capable of chemisorption with the oxide surface. Finally, it was found that freshly prepared relatively pure aluminum substrates, which are left in air, rapidly lose their bonding capacity towards organic functional groups. This can be attributed to the adsorption of contamination and water to the oxide surface. In addition the adhesion of a typical epoxy-coated aluminum system was investigated during exposure to water at different temperatures. The coating was found to quite rapidly lose its adhesion upon exposure to water. This rapid loss of adhesion corresponds well with the data where it was demonstrated that the studied epoxy coating only bonds through physisorptive hydrogen bonding, these bonds not being stable in the presence of water. After the initial loss the adhesion of the coating was however found to recover again and even exceeded the adhesion prior to exposure. The improvement could be ascribed to the growth of a thin oxyhydroxide layer on the aluminum substrate, which forms a new, water-stable and stronger bond with the epoxy coating. Two routes for improvement of adhesion are finally decribed including an interphasial polymeric thin layer and a treatment in boiling water of the substrate before coating takes place. The adhesion properties were finely also studied as a function of the Mg content of the alloys. It was shown that an enrichment of Mg in the oxide could take place when Mg containing alloys are heat-treated. It is expected that for these alloys the (hydr)oxide fraction also depends on the pre-treatment and on the distribution of magnesium as compared to the aluminium hydroxides, with a direct impact on adhesive properties.

• 한국재료학회지
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• 제8권8호
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• pp.744-750
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• 1998

마이크로 머신 소자는 일반전자 소자와 달리 소자 자체에 미세한 기계적 구조물을 갖고 있으며, 이의 구동을 통하여 센서 또는 엑츄에이터의 기능을 갖게 된다. 이 소자들은 그 작동 요구특성에 따라 패키지의 기계적, 환경적 격리를 요구하거나 분위기조절이 요구되는 등 까다로운 패키지 특성을 필요로 한다. 또한 미세한 작동소자들로 인하여 열 및 열응력에 매우 민감하며, 패키지방법에 따라 구동부위의 작동 특성이 크게 변화할 수 있다. 본 연구에서는 마이크로 머신 소자가 패키지 상에 접촉되어 패키지 될 때, 소자의 접촉 재료 및 공정온도, 크기 등이 마이크로 머신 소자에 미치는 열응력을 연구하였다. 유한요소해석법을 사용하여 소자에 미치는 열응력과 이로 인한 마이크로머신 소자의 물리적 변형을 예측하고, 이를 통하여 마이크로 머신 소자 패키지에 최소한의 열응력을 미치는 소자접속 재료의 선별과 패키지 설계의 최적화를 이루고자 하였다.

• 한국전기화학회:학술대회논문집
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• 한국전기화학회 2005년도 수소연료전지공동심포지움 2005논문집
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• pp.383-390
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• 2005

Effect of applying a DC voltage on the interfacial reaction at the metal to zirconia interface was investigated utilizing an oxygen ionic conductivity of partially stabilized zirconia. The joining of copper rod and zirconia tube was carried out in Ar gas atmosphere at $1000^{\circ}C$. There are two type of the joining. The one is the reaction bond consisting of copper and zirconia was dominated by surface reaction with a undetectable very thin layer. It was found that copper elements were diffused to zirconia side, but that Zr ions were not diffused to copper side. These results mean application of a DC voltage to migrate oxygen to the copper-zirconia interface can oxidize metal at the copper-zirconia interface and the bonding reaction between zirconia and copper oxide may occur. The other is the reaction bonding was dominated by interdiffusion with a very thick interface layer. This result mean application of a DC voltage can reduce zirconia at the interface. The bonding reaction is to be an alloying between Zr and Cu.