• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.11a
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• pp.22-23
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• 2005

In order to increase the critical current of coated conductor, highly Bi-axially textured substrates are required. Texture uniformity of substrate is also important to fabricate high quality superconducting coated conductor because the amount of current flow along the coated conductor is limited by the defects such as bad textured area. Therefore, we need to evaluate the distribution of texture of Ni substrate along the length before buffer layer deposition on Ni tape. R2R(reel-to-reel) XRD system was used to measure the texture of long Ni substrate continuously. $\theta-2\theta$ scan of 10 m long Ni tape was measured and indicates that some of Ni(111) planes equally remain on Ni(002) textured substrate. The results of continuous Ni(220) $\Phi$-scan indicate that average FWHM is 9$^{\circ}$ within $\pm$1.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05a
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• pp.34-37
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• 2003

본 연구는 고온초전도 coated coductors의 기판으로 cube texture된 순수 Ni 기판을 개발하기 위하여 전체 가공율과 압연율에 따른 (100) texture의 변화와 1차적으로 열처리한 기판을 다시 압연한 후 재열처리 하였을 때의 전체 가공율과 압연율에 따른 (100) texture의 변화를 GADS XRD와 SEM을 이용하여 연구하고자 하였다. 그 결과, 압연 후에는 압연율에 관계없이 비교적 약한 강도의 (220)과 (200), (111), (311) peak가 나타났는데, 4%로 압연했을 경우 (220) peak가 가장 강한 peak로 나타난 반면, 10%로 압연한 경우에는 (200) peak가 비교적 강하게 나타났다. 그러나 이를 $900^{\circ}C$에서 열처리한 후에는 (200) peak 만 뚜렷이 발달되어 나타났는데, 전체 가공율과 압연율이 높을수록 (200) peak의 강도가 높게 나타나 압연을 통하여 발달한 결정립자의 (110) 면을 따른 배열이 열처리 과정을 통하여 회전하여 (100)면을 따른 배열로 바뀌는 것으로 추측할 수 있었다. 그러나 $900^{\circ}C$에서 열처리한 두께 0.2mm 판재를 다시 0.1mm까지 4%와 10%의 압연율로 압연하고 500~$900^{\circ}C$에서 1시간동안 최종 열처리한 후에는 상대적으로 낮은 2차 가공율에 의하여 집합조직의 전체 가공율과 압연율에의 의존성이 사라지는 것으로 나타났다.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.11a
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• pp.235-235
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• 2003

The development of a buffer layer is an important issue for the second -generation wire, YBCO coated metal wire. The buffer layer demands not only on the prohibition of the reaction between YBCO and metal substrate, but also the proper lattice match and conductivity for high critical current density (Jc) of YBCO superconductor, In order to satisfy these demands, we suggested CaRuO3 as a useful candidate having that the lattice mismatches with Ni (200) and with YBCO are 8.2% and 8.0%, respectively. The CaRuO3 thin films were deposited on Ni substrates using various methods, such as e-beam evaporation and DC and RF magnetron sputtering. These films were investigated using SEM, XRD, pole-figure and AES. In e-beam evaporation, the deposition temperature of CaRuO3 was the most important since both hi-axial texturing and NiO formation between Ni and CaRuO3 depended on it. Also, the oxygen flow rate had i[n effect on the growth of CaRuO3 on Ni substrates. The optimal conditions of crystal growth and film uniformity were 400$^{\circ}C$, 50 ㎃ and 7 ㎸ when oxygen flow rate was 70∼100sccm In RF magnetron sputtering, CaRuO3 was deposited on Ni substrates with various conditions and annealing temperatures. As a result, the conductivity of CaRuO3 thin films was dependent on CaRuO3 layer thickness and fabrication temperature. We suggested the multi-step deposition, such as two-step deposition with different temperature, to prohibit the NiO formation and to control the hi-axial texture.