• Title/Summary/Keyword: Beam current

검색결과 1,312건 처리시간 0.026초

Design of compact klystron amplifier using Field-emitter-arrays (FEA)-based cathode

  • Jin, Jeong-Gu;Ha, Hyun-Jun;Park, Gun-Sik
    • Journal of Korean Vacuum Science & Technology
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    • 제3권1호
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    • pp.59-65
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    • 1999
  • There has been an interest to develop an efficient, compact microwave device using field-emitter-arrays (FEA)-based cathode. Toe valuate the optimum device-efficiency in a compact size, the propagation properties of the premodulated electron beam for the FEA-based cathode is studied in detail by the computer simulation using a PIC code, MAGIC. For the premodulated electron beam whose phase of the energy leads the phase of the current by $\pi$/2, the amplitude of the downstream current modulation can be kept as high as the initial modulation level. Using the beam parameters with the beam voltage of 6kV and the current of 2.0A, 30% of efficiency is predicted when the quality factor of 800 is chosen. the device length is reduced about twice compared with that of the conventional device. The design of practical planar cathode is carried out to meet the minimum diameter of the electron beam as 0.5 mm.

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냉음극을 이용한 plasma전자 beam의 전기적 입력특성 I (A Study on Electric Characteristics of Plasma Electon Beam Produced by Cold Cathode.)

  • 전춘생;박용관
    • 전기의세계
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    • 제27권3호
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    • pp.36-42
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    • 1978
  • It has been investigates that electric characteristics of plasma electron beam in N$_{2}$, H$_{2}$ and Ar gas jars under various gas pressures during electron beams are formed. The results are as follows: 1)Electron beam is formed in the region of positive resistance on the characteristic curve. This phenomenon is identical in N$_{2}$, H$_{2}$ and Ar gases. 2)But in Ar gas, electron beam is formed at relatively lower gas pressure than in H$_{2}$ and N$_{2}$. 3)In pure gas either N$_{2}$, H$_{2}$ and N$_{2}$ the lower the gas pressure, the higher the voltage drop for the same electron beam current. 4)The region in which electron beam is formed is limited at a given pressure. 5)Beyond the limit mentioned above, it becomes glow discharge state and the current increases radically. 6)At a given gas pressure, electron beam voltage, that is, electrical power input increases with gap length.

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용입과 비이드 폭 에 미치는 전자 비임 용접 변수의 영향 (Effects of Welding Perameters on Bead Width and Penetration in Electron Beam Welding)

  • 김숙환;강춘식;윤종원;황선효
    • Journal of Welding and Joining
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    • 제2권1호
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    • pp.25-29
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    • 1984
  • In order to investigate the predominant factors which determine penetration depth and bead width in electron beam welding, bead-on-plate welding was carried out using 7075-T6 Al alloy. The results obtained from the present experiments can be summarized as follows; 1) With increasing accelerating voltage, bead width (B.W) decreases but penetration increases remarkably. 2) Increasing beam current results in increase of bead width and penetration respectively, and decrease of the ratio of penetration increment to beam current increment. 3) With increasing welding speed penetration decreases remarkably, while bead width creases.

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금 나노홀 어레이 제작을 위한 집속 이온빔의 공정 최적화 (Optimal Determination of the Fabrication Parameters in Focused Ion Beam for Milling Gold Nano Hole Array)

  • 조은별;권희민;이희선;여종석
    • 한국진공학회지
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    • 제22권5호
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    • pp.262-269
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    • 2013
  • 집속 이온빔 장비는 나노크기의 패턴을 제작하는 한 방법이지만, 정밀한 제작은 쉽지 않다. 그러므로 집속 이온빔 장비로 샘플을 제작할 때 고려해야 하는 공정 조건을 정리하여 초보자도 샘플제작이 가능하도록 도움을 주고자 한다. 본 장비로 원하는 나노크기의 패턴을 제작하기 위해서 집속 이온빔 장비의 공정변수들을 최적화 하는 과정이 중요하다. 가공할 때 고려해야 하는 변수에는 빔 전류량(빔 크기)과 도즈(빔 지속시간)가 있다. 도즈를 결정한 후에 패턴을 제작하는데 걸리는 시간과 패턴의 크기를 고려하여 빔 전류량을 선택하면 된다. 여기서 도즈는 제작하려는 나노크기의 패턴의 금속 두께에 따라 결정이 된다. 이 논문에서 최적화한 1 pA의 빔 전류와 $0.1nC/{\mu}m^2$의 도즈의 공정조건에서 100 nm 두께의 금 박막 위에 타원형의 구멍을 정밀하게 제작할 수 있다.

A study of characteristics for Image sticking in AC - Plasma Display Panel

  • Han, Yong-gyu;Lee, S.B.;Jeong, S.H.;Son, C.G.;Yoo, N.L.;Lee, H.J.;Lim, J.E.;Lee, J.H.;Jeoung, J.M.;Ko, B.D.;Oh, P.Y.;Moon, M.W.;Choi, Eun-Ha
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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    • pp.263-265
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    • 2005
  • In the alternative current plasma display panel(AC-PDP) technology, it is very important to remove the image sticking for improving an image quality. In this paper, we have investigated the driving method of alternative current plasma display panel(AC-PDP) for preventing image sticking. We have investigated the driving method of alternative current plasma display panel(AC-PDP) for preventing image sticking. The preventing method of image sticking was proposed by adopting the Sticking Remove Pulse(SRP). The variation of brightness is most affected by the MgO to be formed at the surface of the phosphor layer. As a result, the image sticking is reduced when the driving method adopted an SRP.

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Design and simulation of resonance based DC current sensor

  • Santhosh Kumar, B.V.M.P.;Suresh, K.;Varun Kumar, U.;Uma, G.;Umapathy, M.
    • Interaction and multiscale mechanics
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    • 제3권3호
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    • pp.257-266
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    • 2010
  • A novel resonance based proximity DC current sensor is proposed. The sensor consists of a piezo sensed and actuated cantilever beam with a permanent magnet mounted at its free end. When the sensor is placed in proximity to a wire carrying DC current, resonant frequency of the beam changes with change in current. This change in resonant frequency is used to determine the current through the wire. The structure is simulated in micro and meso scale using COMSOL Multi physics software and the sensor is found to be linear with good sensitivity.

스트럿-타이 모델을 이용한 프리스트레스트 더블 T형 보의 정착부 거동 연구 (A Study on Behavior for Anchorage Zone in Prestressed Double T Beam Using Strut-Tie Model)

  • 김종욱;이두성;민창식
    • 한국콘크리트학회:학술대회논문집
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    • 한국콘크리트학회 2002년도 봄 학술발표회 논문집
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    • pp.425-430
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    • 2002
  • This thesis is a study on behavior for anchorage zone in prestressed double T beam using strut-tie model. Stress conditions of Anchorage zone in prestressed double T beam are very disturbed because large concentrated forces act on relatively small areas. Hence, anchorage zone must be considered in Design of prestressed double T beam. If irrational design or irrational construction be conducted, that may lose stability in capacity as structure. In current design practice, certain parts of structure are designed with extreme accuracy, while anchorage zone in prestressed double T beam is designed using common sense, and experience. Therefore, it is generally very conservative. For that reason, logical, reasonable concept and accuracies are desired at design of anchorage zone in prestressed double T beam. Strut-tie method satisfies those desires. In this thesis, anchorage zone in prestressed double T beam is analyzed by considering prestressing forces. Strut-tie model is constructed based on principle stress trajectory obtained from 3D-finite element analysis in anchorage zone, and amounts of reinforcement be obtained. Results of analysis are compared with the way used in current design practice, and this thesis presents that strut-tie model can be an economical design than current design methods without losing the degree of safety.

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광 편향기 집적 레이저 다이오드의 제작 및 광의 편향 (Fabrication of deflector integrated laser diodes and light deflection)

  • 김강호;권오기;김종회;김현수;심은덕;오광룡;김석원
    • 한국광학회지
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    • 제15권2호
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    • pp.171-176
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    • 2004
  • 광 편향기가 집적된 레이저 다이오드를 제작하고 편향기 주입전류에 따른 레이저 다이오드의 특성 변화 및 출력광의 편향을 조사하였다. 레이저 다이오드와 집적된 수동 도파로의 상부 클래드 층의 일부분에 광 편향기를 집적하고, 편향기의 전류 주입에 따른 굴절률 변화를 유도하여 출력광의 편향이 발생하도록 하였다. 편향기의 전류 주입에 따른 출력광의 특성변화를 조사하기 위하여 편향기 주입 전류에 따른 레이저 다이오드의 문턱 전류(threshold current), 발진 효율(slope efficiency) 및 출력광 스펙트럼을 측정하였다. 측정 결과, 편향기 전류의 증가에 따라 출력광의 문턱 전류는 증가하고, 발진 효율은 감소하는 경향을 나타내었으나 출력광의 스펙트럼에는 영향을 주지 않는 특성을 나타내었다. 또한, 이론적 계산을 통해 광 편향기를 지나는 광이 편향됨을 확인하고, 편향기 집적 레이저 다이오드에서 출력되는 광의 far-field pattern을 측정하여 편향기 주입 전류에 따른 출력광의 편향을 실험적으로 확인하였다. 제작된 광 편향기 집적 레이저 다이오드에서 15 ㎃의 광 편향기 주입 전류 변화에 대해서 1.9$^{\circ}$의 편향각 변화를 측정 할 수 있었다.

냉음극형 대면적 펄스 전자빔 가속기의 빔인출 특성 (Characteristics of Electron Beam Extraction in Cold Cathode Type Large Cross-Sectional Pulsed Electron Beam Generator)

  • 우성훈;이광식;이동인;이홍식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2001년도 하계학술대회 논문집 C
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    • pp.1609-1611
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    • 2001
  • A large cross-section pulsed electron beam generator of cold cathode type has been developed for industrial applications, for example, waste water cleaning, flue gas cleaning, and pasteurization etc. The operational principle is based on the emission of secondary electrons from cold cathode when ions in the plasma hit the cathode, which are accelerated toward exit window by the gradient of an electric potential. The conventional electron beam generators need an electron scanning beam because the small cross section thermal electron emitter is used. The electron beam of large cross-section pulsed electron beam generator do not need to be scanned over target material because the beam cross section is large by 300$cm^2$. We have fabricated the large cross-sectional pulsed electron beam generator with the peak energy of 200keV and beam diameter of 200mm and obtained the large area electron beam in the air. The electron beam current has been investigated as a function of accelerating voltage, glow discharge current, helium pressure, distance from the exit window and radial distribution in front of the exit window.

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