• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
• /
• pp.174-174
• /
• 2000

A strong antiferromagnetic coupling in Fe/Si multilayered films (MLF) had been recently discovered and much consideration has been given to whether the coupling in the Fe/Si MLF system has the same origin as the metal/metal MLF. Nevertheless, the nature of the interfacial ron silicide is still controversial. On one hand, a metal/ semiconductor structure was suggested with a narrow band-gap semiconducting $\varepsilon$-FeSi spacer that mediates the coupling. However, some features show that the nature of coupling can be well understood in terms of the conventional metal/metal multilayered system. It is well known that both magneto-optical (MO) and optical properties of a metal depend strongly on their electronic structure that is also correlated with the atomic and chemical ordering. In this study, the nature of the interfacial regions is the Fe/Si multilayers has been investigated by the experimental and computer-simulated MO and optical spectroscopies. The Fe/Si MLF were prepared by rf-sputtering onto glass substrates at room temperature with the number of repetition N=50. The thickness of Fe sublayer was fixed at 3.0nm while the Si sublayer thickness was varied from 1.0 to 2.0 nm. The topmost layer of all the Fe/Si MLF is Fe. In order to carry out the computer simulations, the information on the MO and optical parameters of the materials that may constitute a real multilayered structure should be known in advance. For this purpose, we also prepared Fe, Si, FeSi2 and FeSi samples. The structural characterization of Fe/Si MLF was performed by low- and high -angle x-ray diffraction with a Cu-K$\alpha$ radiation and by transmission electron microscopy. A bulk $\varepsilon$-FeSi was also investigated. The MO and optical properties were measured at room temperature in the 1.0-4.7 eV energy range. The theoretical simulations of MO and optical properties for the Fe/Si MLF were performed by solving exactly a multireflection problem using the scattering matrix approach assuming various stoichiometries of a nonmagnetic spacer separating the antiferromagnetically coupled Fe layers. The simulated spectra of a model structure of FeSi2 or $\varepsilon$-FeSi as the spacer turned out to fail in explaining the experimental spectra of the Fe/Si MLF in both intensity and shape. Thus, the decisive disagreement between experimental and simulated MO and optical properties ruled out the hypothesis of FeSi2 and $\varepsilon$-FeSi as the nonmagnetic spacer. By supposing the spontaneous formation of a metallic ζ-FeSi, a reasonable agreement between experimental and simulated MO and optical spectra was obtained.

• 한국전기전자재료학회논문지
• /
• 제36권4호
• /
• pp.351-361
• /
• 2023

본 논문은 대학연구실과 산업현장에서 태양전지를 연구 개발하는 초년생들이 태양전지 성능 분석하는 데 있어 가장 기본적이면서도 중요한 양자효율(quantum efficiency) 측정, 분석 방법에 이해를 돕는 것을 목적으로 한다. 양자효율의 정의를 시작으로, 측정 방법, 분석 방법에 대한 자세한 소개와 함께 태양광 스펙트럼으로부터 태양전지 소재의 밴드 갭에 따른 이론적인 전류밀도를 계산하고, 이론적인 전류밀도와 양자효율 측정, 분석을 통해 태양전지의 성능을 분석하는 방법에 대해 깊이 있게 논의한다. 태양전지의 양자효율 측정 분석은 태양전지를 깊이(전면, bulk, 후면)에 따라 분석할 수 있어 태양전지 성능 분석에 직관을 줄 수 있는 매우 유용한 방법이다. 이론적 전류밀도와 양자효율 측정 분석에 대한 깊은 이해로 태양전지를 연구하는 학생과 연구원들이 태양전지의 성능 분석을 하는 데 있어 기반으로 활용할 수 있기를 기대한다.

• 대한화학회지
• /
• 제59권5호
• /
• pp.397-406
• /
• 2015

II-VI 족 무기 화합물 반도체인 ZnO는 폭 넓은 응용분야 때문에 많은 관심을 받고 있다. ZnO는 넓은 밴드갭(3.37 eV)과 큰 excitation binding energy(60 meV)를 가지고 있고 광학특성, 반도체, 압전특성, 자성, 항균성, 광촉매 등 여러 분야에 응용 가능한 물질로 알려져 있다. 특히 광촉매 분야에 적용할 때 재수득의 문제를 위해 자성을 갖는 물질과 core-shell 구조를 이루는 연구가 활발히 진행 되고 있다. 본 연구에서, magnetic core-shell ZnFe₂O₄@ZnO@SiO₂ nanoparticles(NPs)는 3단계 과정을 통해 성공적으로 합성하였다. 합성된 물질들의 구조적 특성을 확인하기 위해 X-ray diffraction(XRD), Scanning electron microscopy (SEM), Fourier transform infrared spectroscopy(FT-IR)을 사용하였다. ZnFe₂O₄ spinel 구조와 ZnO wurtzite 구조는 XRD를 사용하여 확인되었고, 전구체의 농도별 분석을 통해 ZnO 생성 비율을 확인 하였다. 합성된 물질들은SEM을 통하여 표면의 변화를 확인하였다. SiO₂층의 형성과 ZnFe₂O₄@ZnO@SiO₂ NPs의 합성은 FT-IR을 통해 Fe-O, Zn-O 및 Si-O-Si 결합을 확인하였다. 합성된 물질들의 자기적 성질은 Vibrating sample magnetometer(VSM)을 사용 하여 분석하였다. ZnO층과 SiO₂ 층의 형성의 결과는 자성의 증가와 감소로 확인하였다. 합성된 ZnFe₂O₄@ZnO@SiO₂ NPs의 광촉매 효과는 오염물질 대신 methylene blue(MB)를 사용하여 UV 조사 하에 암실에서 실험하였다.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2010년도 하계학술대회 논문집
• /
• pp.375-375
• /
• 2010

CdTe as an absorber material is widely used in thin film solar cells with the heterostructure due to its almost ideal band gap energy of 1.45 eV, high photovoltaic conversion efficiency, low cost and stable performance. The deposition methods and preparation conditions for the fabrication of CdTe are very important for the achievement of high solar cell conversion efficiency. There are some rearranged reports about the deposition methods available for the preparation of CdTe thin films such as close spaced sublimation (CSS), physical vapor deposition (PVD), vacuum evaporation, vapor transport deposition (VTD), closed space vapor transport, electrodeposition, screen printing, spray pyrolysis, metalorganic chemical vapor deposition (MOCVD), and RF sputtering. The RF sputtering method for the preparation of CdTe thin films has important advantages in that the thin films can be prepared at low growth temperatures with large-area deposition suitable for mass-production. The authors reported that the optical and electrical properties of CdTe thin film were closely connected by the thickness-uniformity of the film in the previous study [1], which means that the better optical absorbance and the higher carrier concentration could be obtained in the better condition of thickness-uniformity for CdTe thin film. The thickness-uniformity could be controlled and improved by the some process parameters such as vacuum level and RF power in the sputtering process of CdTe thin films. However, there is a limitation to improve the thickness-uniformity only in the preparation process [1]. So it is necessary to introduce the external or additional method for improving the thickness-uniformity of CdTe thin film because the cell size of thin film solar cell will be enlarged. Therefore, the authors firstly applied the chemical mechanical polishing (CMP) process to improving the thickness-uniformity of CdTe thin films with a G&P POLI-450 CMP polisher [2]. CMP process is the most important process in semiconductor manufacturing processes in order to planarize the surface of the wafer even over 300 mm and to form the copper interconnects with damascene process. Some important CMP characteristics for CdTe were obtained including removal rate (RR), WIWNU%, RMS roughness, and peak-to-valley roughness [2]. With these important results, the CMP process for CdTe thin films was performed to improve the thickness-uniformity of the sputtering-deposited CdTe thin film which had the worst two thickness-uniformities of them. Some optical properties including optical transmittance and absorbance of the CdTe thin films were measured by using a UV-Visible spectrophotometer (Varian Techtron, Cary500scan) in the range of 400 - 800 nm. After CMP process, the thickness-uniformities became better than that of the best condition in the previous sputtering process of CdTe thin films. Consequently, the optical properties were directly affected by the thickness-uniformity of CdTe thin film. The absorbance of CdTe thin films was improved although the thickness of CdTe thin film was not changed.

• 공업화학
• /
• 제22권1호
• /
• pp.15-20
• /
• 2011

2,3-Dimethyl-5,8-dithiophen-2-yl-quinoxaline을 기본 골격으로 한 poly[2,3-dimethyl-5,8-dithiophene-2-yl-quinoxaline-alt-9,9-dihexyl-9H-fluorene] (PFTQT)과 poly[2,3-dimethyl-5,8-dithiophene-2-yl-quinoxaline-alt-10-hexyl-10H-phenothiazine] (PPTTQT)을 Suzuki coupling법을 이용하여 중합 하였다. 합성된 고분자들은 chloroform, chlorobenzene, o-dichlorobenzene, tetrahydrofuran (THF), toluene과 같은 유기용매에 대한 용해도가 우수하였고, PFTQT의 최대흡수파장과 밴드 갭은 각각 440 nm와 2.30 eV이고, PPTTQT의 경우는 각각 445 nm와 2.23 eV이었다. PFTQT의 HOMO 및 LUMO 에너지준위는 -6.05와 -3.75 eV이고, PPTTQT의 경우는 각각 -5.89와 -3.66 eV이었다. 합성된 고분자들과 전자 받개 물질인 (6)-1-(3-(methoxycarbonyl)-{5}-1-phenyl[5,6]-fullerene (PCBM)을 1 : 2의 중량비로 블렌딩하여 제작한 태양전지의 효율은 AM (air mass) 1.5 G, 1 sun 조건($100mA/cm^2$)에서 PFTQT는 0.24%, PPTTQT의 경우는 0.16%로 측정되었다. 그리고 소자의 단락전류 밀도($J_{sc}$), FF (fill factor)와 개방전압($V_{oc}$)은 PFTQT의 경우 각각 $0.97mA/cm^2$, 29%, 0.86 V이며, PPTTQT의 경우 각각 $0.80mA/cm^2$, 28%, 0.71 V이었다.