• 제목/요약/키워드: Band GAp Energy

검색결과 705건 처리시간 0.03초

Splitting effect of photocurrent for $CdIn_2Te_4$ single crystal

  • You, Sang-Ha;Hong, Kwang-Joon
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.84-85
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    • 2009
  • The single crystals of p-$CdIn_2Te_4$ were grown by the Bridgman method without the seed crystal. From photocurrent measurements, it was found that three peaks, A, B, and C, correspond to the intrinsic transition from the valence band states of $\Gamma_7(A)$, $\Gamma_6(B)$, and $\Gamma_7(C)$ to the conduction band state of $\Gamma_6$, respectively. The crystal field splitting and the spin orbit splitting were found to be 0.2360 and 0.1119 eV, respectively, from the photocurrent spectroscopy. The temperature dependence of the $CdIn_2Te_4$ band gap energy was given by the equation of $E_g(T)=E_g(0)$ - $(9.43\times10^{-3})T^2$/(2676+T). $E_g(0)$ was estimated to be 1.4750, 1.7110, and 1.8229 eV at the valence band states of A, B, and C, respectively. The band gap energy of $p-CdIn_2Te_4$ at room temperature was determined to be 1.2023 eV.

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Nb를 포함하는 불소산화물에서 구조적 뒤틀림에 따른 에너지 띠 간격의 변화 (Variation of Band Gap Energy upon Structural Distortion for Nb-containing Oxyfluorides)

  • 김현준;김승주
    • 대한화학회지
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    • 제51권3호
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    • pp.265-269
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    • 2007
  • 국부적인 결정구조와 에너지 띠 간격 간 상관관계를 고찰하기 위하여 Nb를 포함하는 일련의 불소 산화물에 대하여 결정구조와 자외선-가시광선 확산 반사율 스펙트럼을 비교, 연구하였다. 이 실험에서 다룬 RbSrNb2O6F와 RbCaNb2O6F, RbNb2O5F는 공통적으로, 꼭지점 공유를 하고 있는 NbO5F 팔면체로 구성되어 있 다. 구조적 뒤틀림 정도의 척도로 볼 수 있는 Nb-O(F)-Nb 평균 결합각은 RbSrNb2O6F에서 158.6°, RbCaNb2O6F 에서 149.6° 그리고 RbNb2O5F에서 139.5o이다. 확산 반사율 스펙트럼으로부터 구한 에너지 띠 간격은 Nb-O(F)-Nb 결합각이 감소할수록 증가하는 경향을 보였다. 즉 RbSrNb2O6F, RbCaNb2O6F, RbNb2O5F 각각의 화합물에 대해 서 3.48 eV, 3.75 eV, 4.03 eV 의 값을 나타내었다. 이러한 실험적 결과는 Nb를 포함하는 불소 산화물에서 국 부구조의 변화를 통해 띠 간격을 약 0.6 eV의 범위에서 조절할 수 있음을 의미한다.

Study on Indium-free and Indium-reduced thin film Solar absorber materials for photovoltaic application

  • Kim, Kyoo-Ho;Wibowo, Rachmat Adhi
    • 신재생에너지
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    • 제3권4호
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    • pp.54-62
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    • 2007
  • In this paper, we report the research highlight on the preparation and characterization of Indium-free $Cu_2ZnSnSe_4$ and Indium-reduced $CulnZnSe_2$ thin films in order to seek the viability of these absorber materials to be applied in thin film solar cells. The films of $Cu_2ZnSnSe_4\;and\;CulnZnSe_2$ were prepared using mixed binary chalcogenides powders. It was observed that Cu concentration was a function of substrate temperature as well as CuSe mole ratio in the target. Under an optimized condition, $Cu_2ZnSnSe_4\;and\;CulnZnSe_2$ thin films grew with strong [112]. [220/204] and [312/116] reflections. Both $Cu_2ZnSnSe_4\;and\;CulnZnSe_2$ films were found to exhibit a high absorption coefficient of $104^4cm^{-1}\;Cu_2ZnSnSe_4$ film showed a band gap of 1.5eV which closes to the optimum band gap of an ideal solar absorber for a solar cell. On the other side, an increase of optical band gap from 1.0 to 1.25eV was found to be proportional with an increase of Zn concentration in the $CulnZnSe_2$ film. All films in this study revealed a p-type semiconductor characteristic.

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Temperature dependence of energy band gap for ZnO thin films

  • Hong, Myung-Seok;Hong, Kwang-Joon
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.99-100
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    • 2007
  • ZnO films on $Al_2O_3$ substrates were grown using a pulsed laser deposition method. Through photoluminescence (PL) and X-ray diffraction (XRD) measurements, the optimum growth conditions for the ZnO growth were established. The results of the XRD measurements indicate that ZnO films were strongly oriented to the c-axis of the hexagonal structure and epitaxially crystallized under constraints created by the substrate. The full width half maximum for a theta curve of the (0002) peak was $0.201^{\circ}$. Also, from the PL measurements, the grown ZnO films were observed to give free exciton behaviour, which indicates a high quality of the epilayer. The Hall mobility and carrier density of the ZnO films at 293 K were estimated to be $299\;cm^2/V\;s$ and $8.27\;{\times}\;10^{16}\;cm^{-3}$, respectively. The absorption spectra revealed that the temperature dependance of the optical band gap on the ZnO films was $E_g(T)\;=\;3.439\;eV\;-\;(5.30\;{\times}\;10^{-4}\;ev/K)T^2(367\;+\;T)$.

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온도 및 조성비 변화에 따른 질화물계 화합물 반도체 InAs1-X NX의 에너지 밴드갭 계산 (The Calculation of the Energy Band Gaps of Zincblende InAs1-X NX on Temperature and Composition)

  • 정호용;김대익
    • 한국전자통신학회논문지
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    • 제11권12호
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    • pp.1165-1174
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    • 2016
  • 본 연구에서는 무질서 효과가 고려된, 새로이 가정한 가상 결정 근사법 내의 Empirical Pseudopotential Method(EPM)를 사용하여 3원계 질화물계 화합물 반도체 InAs1-xNx의 휨 매개변수 및 에너지 밴드갭을 계산하였다. InAs1-xNx 조성비 구간($0{\leq}x{\leq}0.05$)에서 계산된 휨 매개변수는 4.1eV를 갖으며, 해당되는 에너지 밴드갭들이 급격히 감소하고 있음을 알 수 있었다. EPM에 의한 계산 결과를 온도와 조성비를 고려한 수정된 Band Anti-Crossing(BAC) 모델에 적용하여 질화물계 화합물 반도체 InAs1-xNx의 에너지 띠구조를 계산하였다. 또한 InAs1-xNx의 결합 상수 CMN=1.8 등을 결정할 수 있었으며, 계산결과는 실험치를 대체로 잘 설명할 수 있었다.

Variation of the Si-induced Gap State by the N defect at the Si/SiO2 Interface

  • 김규형;정석민
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.128.1-128.1
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    • 2016
  • Nitrided-metal gates on the high-${\kappa}$ dielectric material are widely studied because of their use for sub-20nm semiconductor devices and the academic interest for the evanescent states at the Si/insulator interface. Issues in these systems with the Si substrate are the electron mobility degradation and the reliability problems caused from N defects that permeates between the Si and the $SiO_2$ buffer layer interface from the nitrided-gate during the gate deposition process. Previous studies proposed the N defect structures with the gap states at the Si band gap region. However, recent experimental data shows the possibility of the most stable structure without any N defect state between the bulk Si valence band maximum (VBM) and conduction band minimum (CBM). In this talk, we present a new type of the N defect structure and the electronic structure of the proposed structure by using the first-principles calculation. We find that the pair structure of N atoms at the $Si/SiO_2$ interface has the lowest energy among the structures considered. In the electronic structure, the N pair changes the eigenvalue of the silicon-induced gap state (SIGS) that is spatially localized at the interface and energetically located just above the bulk VBM. With increase of the number of N defects, the SIGS gradually disappears in the bulk Si gap region, as a result, the system gap is increased by the N defect. We find that the SIGS shift with the N defect mainly originates from the change of the kinetic energy part of the eigenstate by the reduction of the SIGS modulation for the incorporated N defect.

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SnS (tin monosulfide) thin films obtained by atomic layer deposition (ALD)

  • Hu, Weiguang;Cho, Young Joon;Chang, Hyo Sik
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.305.2-305.2
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    • 2016
  • Tin monosulfide (SnS) is one promising candidate absorber material which replace the current technology based on cadmium telluride (CdTe) and copper indium gallium sulfide selenide (CIGS) for its suitable optical band gap, high absorption coefficient, earth-abundant, non-toxic and cost-effective. During past years work, thin film solar cells based on SnS films had been improved to 4.36% certified efficiency. In this study, Tin monosul fide was obtained by atomic layer deposition (ALD) using the reaction of Tetrakis (dimethylamino) tin (TDMASn, [(CH3)2N]4Sn) and hydrogen sulfide (H2S) at low temperatures (100 to 200 oC). The direct optical band gap and strong optical absorption of SnS films were observed throughout the Ultraviolet visible spectroscopy (UV VIS), and the properties of SnS films were analyzed by sanning Electron Microscope (SEM) and X-Ray Diffraction (XRD).

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졸-겔법에 의한 CdS 분산$SiO_2$ Glass 박막의 비선형광학특성

  • 문종수;강종봉;김경문
    • 한국세라믹학회지
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    • 제33권12호
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    • pp.1353-1364
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    • 1996
  • Recently semiconductor doped glasses have attracted attention as nonlinear optical materials because of their large third order nonlinear optical properties. The transparent and homogeneous CdS-doped SiO2 glass thin films were obtained by the dip=coating process of the sol-gel method. Thin films were consisted of glasses containing CdS microcrystallites which were formed by dissolved Cd2+ and S2- ions in a SiO2 matrix solutions. A subsequent thermal treatment of this samples led the formation of colloidal agglomerates and finally of microcrystallites. The size of CdS microcrystallites was about 4 to 15 nm after thermal treatments at various heating conditions. From the optical absorption spectra of the CdS-doped SiO2 glass films it was found that the absorption edge was blue-shifted compared with that of the bulk CdS crystal(~2, 4 eV) and that the amount of energy shift was inversely proportional to the crystal size. And the band gap energy increased with the decrease in crystallite size indicating that the quantum size effects occured.

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Binding energy study from photocurrent signal in HgCdTe layers

  • Hong, Kwang-Joon
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.379-379
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    • 2010
  • $Hg_{1_x}Cd_xTe$ (MCT) was grown by hot wall epitaxy. Prior to the MCT growth, the CdTe (111) buffer layer was grown on the GaAs substrate at the temperature of $590^{\circ}C$ for 15 min. When the thickness of the CdTe buffer layer was $5\;{\mu}m$ or thicker, the full width at half maximum values obtained from the x-ray rocking curves were found to significantly decrease. After a good quality CdTe buffer layer was grown, the MCT epilayers were grown on the CdTe (111) /GaAs substrate at various temperatures in situ. The crystal quality for those epilayers was investigated by means of the x-ray rocking curves and the photocurrent experiment. The photoconductor characterization for the epilayers was also measured. The energy band gap of MCT was determined from the photocurrent measurement and the x composition rates from the temperature dependence of the energy band gap were turned out.

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Properties of Inclined Silicon Carbide Thin Films Deposited by Vacuum Thermal Evaporation

  • Hamadi Oday A.;Yahia Khaled Z.;Jassim Oday N.S.
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제5권3호
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    • pp.182-186
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    • 2005
  • In this work, thermal evaporation system was employed to deposit thin films of SiC on glass substrates in order to determine the parameters of them. Measurements included transmission, absorption, Seebak effect, resistivity and conductivity, absorption coefficient, type of energy band-gap, extinction coefficient as functions of photon energy and the effect of increasing film thickness on transmittance. Results explained that SiC thin film is an n-type semiconductor of indirect energy band-gap of ${\sim}3eV$, cut-off wavelength of 448nm, absorption coefficient of $3.4395{\times}10^{4}cm^{-1}$ and extinction coefficient of 0.154. The experimental measured values are in good agreement with the typical values of SiC thin films prepared by other advanced deposition techniques.