• Journal of the Korea Academia-Industrial cooperation Society
• /
• v.21 no.4
• /
• pp.596-601
• /
• 2020

Silicon carbide is considered a potentially useful material for high-temperature electronic devices because of its large band gap energy and p-type or n-type conduction that can be controlled by impurity doping. Accordingly, the thermoelectric properties of -SiC powder prepared by refined diatomite were investigated for high value-added applications of natural diatomite. -SiC powder was synthesized by a carbothermal reduction of the SiO₂ in refined diatomite using carbon black. An acid-treatment process was then performed to eliminate the remaining impurities (Fe, Ca, etc.). n-Type semiconductors were fabricated by sintering the pressed powder at 2000℃ for 1~5h in an N2 atmosphere. The electrical conductivity increased with increasing sintering time, which might be due to an increase in carrier concentration and improvement in grain-to-grain connectivity. The carrier compensation effect caused by the remaining acceptor impurities (Al, etc.) in the obtained -SiC had a deleterious influence on the electrical conductivity. The absolute value of the Seebeck coefficient increased with increasing sintering time, which might be due to a decrease in the stacking fault density accompanied by grain or crystallite growth. On the other hand, the power factor, which reflects the thermoelectric conversion efficiency of the present work, was slightly lower than that of the porous SiC semiconductors fabricated by conventional high-purity -SiC powder, it can be stated that the thermoelectric properties could be improved further by precise control of an acid-treatment process.

• Progress in Superconductivity
• /
• v.12 no.2
• /
• pp.75-81
• /
• 2011

We report on the progress that has been made in developing $MgB_2$ superconducting wires and tapes for commercialization and research efforts. A number of techniques have been developed to overcome the obstacle posed by the poor critical current density ($J_c$) of pristine $MgB_2$. Chemical doping has proved to be the effective way to modify and enhance the superconducting properties, such as the $J_c$ and the irreversibility field ($B_{irr}$). More than 100 different types of dopants have been investigated over the past 8 years. Among these, the most effective dopants have been identified to be SiC and malic acid ($C_4H_6O_5$). The best results, viz. a $B_{irr}$ of 22 T and $J_c$ of $30,000\;A{\cdot}cm^{-2}$ at 4.2 K and 10 T, were reported for malic acid doped $MgB_2$ wires, which matched the benchmark performance of commercial low temperature superconductor wires. In this work, we discuss the progress made in $MgB_2$ conductors over the past few years at the University of Wollongong, Hyper Tech Research, Inc., and Ohio State University.

• Journal of the Korean Vacuum Society
• /
• v.4 no.S2
• /
• pp.84-89
• /
• 1995

The growth and the film characteristics of heteroepitaxial $Si_{1-x}Ge_x$ films growth by the Rapid Thermal Chemical Vapor Deposition(RTCVD)method are described. For the growth of $Si_{1-x}Ge_x$ heteroepitaxial layers, $SiH_4/GeH_4/H_2$gas mixtures are used. The growth conditions are varied to investigate their effects on the Si/Ge composition ratios, the interface abruptness and crystalline properties. The Si/Ge composition ratios are analyzed with the RBS and the SIMS techniques, and the interface abruptness are deduced from these data. The crystalline properties are analyzed from TEM pictures. The experimental data shows that the crystalline perfection is excellent at the growth temperature of as low as $650^{\circ}C$, and the composition ratios change linearly with $SiH_4/GeT_$$ gas mixing ratios in our experimental ranges. Boron doping experiments are also performed using 200 ppm $B_2H_6$ source gas. The doping profiles are measured with SIMS technique. The SIMS data shows that the doping abruptness can be controlled within about 200$\AA$/decade.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2016.02a
• /
• pp.341-341
• /
• 2016

The discovery of light emission in nanostructured silicon has opened up new avenues of research in nano-silicon based devices. One such pathway is the application of silicon quantum dots in advanced photovoltaic and light emitting devices. Recently, there is increasing interest on the silicon quantum dots (c-Si QDs) films embedded in amorphous hydrogenated silicon-nitride dielectric matrix (a-SiNx: H), which are familiar as c-Si/a-SiNx:H QDs thin films. However, due to the limitation of the requirement of a very high deposition temperature along with post annealing and a low growth rate, extensive research are being undertaken to elevate these issues, for the point of view of applications, using plasma assisted deposition methods by using different plasma concepts. This work addresses about rapid growth and single step development of c-Si/a-SiNx:H QDs thin films deposited by RF (13.56 MHz) and ultra-high frequency (UHF ~ 320 MHz) low-pressure plasma processing of a mixture of silane (SiH4) and ammonia (NH3) gases diluted in hydrogen (H2) at a low growth temperature ($230^{\circ}C$). In the films the c-Si QDs of varying size, with an overall crystallinity of 60-80 %, are embedded in an a-SiNx: H matrix. The important result includes the formation of the tunable QD size of ~ 5-20 nm, having a thermodynamically favorable <220> crystallographic orientation, along with distinct signatures of the growth of ${\alpha}$-Si3N4 and ${\beta}$-Si3N4 components. Also, the roles of different plasma characteristics on the film properties are investigated using various plasma diagnostics and film analysis tools.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.13 no.11
• /
• pp.908-913
• /
• 2000

CoSi$_2$/p+/n diodes(bilayer diodes) were fabricated by using epitaxial CoSi$_2$grown from Co/Ti bilayer as a diffusion source. The I-V characteristics of p+/n diodes were measured and compared with those of diode made from Co monolayer (monolayer diode). Monolayer diodes showed typical p+n junction characteristics with the leakage current of as low as 10$^{-12}$ A and forward current 6-orders higher than the leakage current, when drive-in annealed at 90$0^{\circ}C$ for 20 sec.. On the other hand, bilayer diodes showed the Schottky-like behaviors with forward currents rather higher than those of monolyer diodes, but with too high leakage currents, when drive-in annealed at $700^{\circ}C$ or higher. However, when the annealing temperature was lowered to $700^{\circ}C$ and annealing time was increased to 60 sec., the leakage current was reduced to 10$^{-11}$ A and thus sho3wed typical diode characteristics. The high leakage currents for diodes annealed at $700^{\circ}C$ or higher was attributed to Shannon contacts formed due to unremoved Co-Ti-Si precipitates. But when annealed at 50$0^{\circ}C$, B ions diffused in the direction of the surface layer, and thus the leakage currents were reduced by removing Shannon contacts.

• Transactions on Electrical and Electronic Materials
• /
• v.1 no.1
• /
• pp.22-25
• /
• 2000

Polycrystalline SBTN layered ferroelectric thin film with various Nb mole ratios were prepared by sol-gel method Pt/ $SiO_2$/Si (100) substrates. The films were annealed at different temperature and characterized in terms of phase and microstructure. The films were crystallized with a high (105) diffraction intensity and had rodike structure, SBTN films fired at 800$^{circ}C$ revealed standard hysteresis loops with no fatigue for up to 10$^{10}$ cycles. At an applied voltage of 5V the dielectric constant($varepsilon$) , dissipation factor (tan $delta$), remanent polarization(ZPr) and coercive field(Ec) of typical S $r_{0.8}$B $i_{2.3}$(T $a_{1-x}$ N $b_{x}$) $O_{9+}$$alpha$/ thin film(x=0.1) prepared on Pt/ $SiO_2$/Si (100) were about 277.7, 0.042, 3.74$mu$C/$textrm{cm}^2$, and 24.8kv/cm respectively.ly.y. respectively.ly.y.y..

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.11a
• /
• pp.274-274
• /
• 2007

LTCC 소재로 응용을 위해 Mg-Si-O계 세라믹스에 glass frit을 첨가하여 소결 및 마이크로파 유전특성에 관한 연구를 진행하였다. $Mg_2SiO_4$를 기본조성으로 하고 $B_2O_3-ZnO-Na_2O-SiO_2-Al_2O_3$계 glass를 20~40wt%로 첨가하여 $900^{\circ}C$에서 1시간 소결하였을 때 glass 함량이 증가함에 따라 밀도$(g/cm^3)$ 및 유전율$(\varepsilon_r)$은 증가하였고 품질계수$(Q{\times}f_0)$ 값은 감소하는 경향을 보였다. $900^{\circ}C$에서 1시간 소결한 소결체의 유전특성은 유전율 $(\varepsilon_r)$ = 6.5, 품질계수 $(Q{\times}f_0)$ = 4,000(GHz), 온도계수 $({\tau}_f)={\pm}10ppm/^{\circ}C$로 우수한 특성을 확인하였다. 그리고 Glass Milling 효과에 따른 glass-ceramics 소결체의 미세구조, 마이크로파 유전특성을 비교 고찰하였다.

• Bulletin of the Korean Chemical Society
• /
• v.24 no.6
• /
• pp.832-836
• /
• 2003

To extend the knowledge of triple bonding between group 6 transition metal and heavier group 14 elements, the structural and bonding aspects of ($η^5-C_5H_5$)$(CO)_2$M≡ER (M = Cr, Mo, W; E = Si, Ge, Sn, Pb) are investigated by hybrid density functional calculations at the B3PW91 level. Substituent effects are also investigated with R = H, Me, $SiH_3$, Ph, $C_6H_3-2,6-Ph_2$, $C_6H_3-2,6-(C_6H_2-2,4,6-Me_3)_2$, and $C_6H_3-2,6-(C_6H_2-2,4,6- iPr_3)_2$.

• Journal of the Korean Magnetics Society
• /
• v.8 no.1
• /
• pp.21-26
• /
• 1998

The temperature dependence of the magnetoimpedance (MI) effect is important both for scientific study and for thermal stability of MI sensor. We have performed the measurement of MI effect in amorphous $Co_{66}Fe_1Ni_1B_{14}Si_{15}$ (Metglas 2714 A) ribbon from a cryogenic chamber where the temperature of the sample can vary from 10 K to 300 K. The ac current was fixed at 10 mA for all measured frequencies ranging from 100 KHz to 10 MHz. The magnetoimpedance ratio (MIR) was revealed the drastic increment as a function of MIR (T) = MIR (0) exp(cT$^2$) where c is a constant. The measured MIR values at room temperature are usually 2-3 times larger than the data measured at 10 K for all measured frequencies. However, the shapes of the MIR curves are remained. This result shows the potential application of the MI effect for a temperature sensor. The frequency dependence of MIR has shown the typical tendency where the maximum values of MIR are increasing ans also the shapes of MIR curves are getting broader as the measured frequency increases.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.11a
• /
• pp.265-265
• /
• 2007

In the present work, we have studied low temperature sintering and microwave dielectric properties of $ZnAl_2O_4$-zinc borosilicate (ZBS, 65ZnO-$25B_2O_3-10SiO_2$) glass composites. The focus of this paper was on the improvement of sinterability, low dielectric constant, and on the theoretical proof regarding of microwave dielectric properties in $ZnAl_2O_4$-ZBS glass composites, respectively. The $ZnAl_2O_4$ with 60 vo1% ZBS glass ensured successful sintering below $900^{\circ}C$. It is considered that the non-reactive liquid phase sintering (NPLS) occurred. In addition, $ZnAl_2O_4$ was observed in the $ZnAl_2O_4$-(x)ZBS composites, indicating that there were no reactions between $ZnAl_2O_4$ and ZBS glass. $ZnB_2O_4\;and\;Zn_2SiO_4$ with the willemite structure as the secondary phase was observed in the all $ZnAl_2O_4$-(x)ZBScomposites. In terms of dielectric properties, the application of the $ZnAl_2O_4$-(x)ZBS composites sintered at $900^{\circ}C$ to LTCC substrate were shown to be appropriate; $ZnAl_2O_4$-60ZBS (${\varepsilon}_r$= 6.7, $Q{\times}f$ value= 13,000 GHz, ${\tau}_f$= -30 ppm/$^{\circ}C$). Also, in this work was possible theoretical proof regarding of microwave dielectric properties in $ZnAl_2O_4$-(x)ZBS composites.