• Title/Summary/Keyword: Auger

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Estimation of Total Astigmatism Quantity from Corneal Astigmatism on Koreans in Their Twenties (한국인의 20대에서 각막난시에 의한 전난시량의 예측)

  • Yoo, Jong-Sook;Yu, Dong-Sik;Han, Kyung-Ae;Kim, Se-Jin;Wi, Sung-Hyun
    • Journal of Korean Ophthalmic Optics Society
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    • v.13 no.4
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    • pp.151-154
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    • 2008
  • Purpose: Javals' rule is a commonly used formula for estimating total astigmatism from corneal astigmatism. Many researchers suggested a modication of Javals' rule. Therefore, we estimated the total astigmatism on the basis of measurements of corneal astigmatism and assessed the accuracy of Javals' rule. Methods: We estimated the total astigmatism on the basis of measurements of corneal astigmatism on 108 eyes of 54 subjects of koreans in their twenties. Results: The regression of the total astigmatism from corneal astigmatism is less than 1.25 of Javals' rule, but it was equivalent to Auger's modified Javals' rule. Conclusions: The regression equation for this study was as follows: Total Astigmatism=0.79 (Corneal Astigmatism)-0.49D${\times}$90.

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Field emission properties of diamond-like carbon films deposited by ion beam sputtering (이온빔 스퍼터링으로 제작된 다이아몬드성 카본 필름의 전계 방출 특성)

  • 안상혁;이광렬;전동렬
    • Journal of the Korean Vacuum Society
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    • v.8 no.1
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    • pp.36-42
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    • 1999
  • Field emission behaviors from diamond-like carbon films were investigated. The films were deposited on n-type Si wafer by ion beam sputtering method using 3 cm Kaufman type ion source. Regardless of the film thicknesses and atomic bond structure, the emission current was much enhanced by electrical breakdown between anode and the film surface. The effective work function was estimated to be about 0.1 eV. In order to identify the emission site, tungsten tip was scanned the damaged region damaged region but localized to a specific site. Analysis using Auger electron spectroscopy and SEM shows that SiC compound was not a sufficient condition for the electron emission. This result showed that the enhanced emission was mainly due to the changes in the chemical bond of the damaged region rather than the enhanced electric field caused by the morphological change.

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Sheet Resistance and Microstructure Evolution of Cobalt/Nickel Silicides with Annealing Temperature (코발트/니켈 복합실리사이드의 실리사이드온도에 따른 면저항과 미세구조 변화)

  • Jung Young-soon;Cheong Seong-hwee;Song Oh-sung
    • Korean Journal of Materials Research
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    • v.14 no.6
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    • pp.389-393
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    • 2004
  • The silicide layer used as a diffusion barrier in microelectronics is typically required to be below 50 nm-thick and, the same time, the silicides also need to have low contact resistance without agglomeration at high processing temperatures. We fabricated Si(100)/15 nm-Ni/15 nm-Co samples with a thermal evaporator, and annealed the samples for 40 seconds at temperatures ranging from $700^{\circ}C$ to $1100^{\circ}C$ using rapid thermal annealing. We investigated microstructural and compositional changes during annealing using transmission electron microscopy and auger electron spectroscopy. Sheet resistance of the annealed sample stack was measured with a four point probe. The sheet resistance measurements for our proposed Co/Ni composite silicide was below 8 $\Omega$/sq. even after annealing $1100^{\circ}C$, while conventional nickel-monosilicide showed abrupt phase transformation at $700^{\circ}C$. Microstructure and auger depth profiling showed that the silicides in our sample consisted of intermixed phases of $CoNiSi_{x}$ and NiSi. It was noticed that NiSi grew rapidly at the silicon interface with increasing annealing temperature without transforming into $NiSi_2$. Our results imply that Co/Ni composite silicide should have excellent high temperature stability even in post-silicidation processes.

AES Analysis of Au, Au/Cr, Au/Ni/Cr and Au/Pd/Cr Thin Films by the Change of Substrate Temperature and Annealing Temperature (기판온도와 열처리온도의 변화에 따른 Au/Cr, Au/Ni/Cr 및 Au/Pd/Cr 다층박막의 AES 분석)

  • Yoo, Kwang Soo;Jung, Hyung Jin
    • Analytical Science and Technology
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    • v.6 no.2
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    • pp.217-223
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    • 1993
  • Thin films of the Au/Cr, Au/Ni/Cr and Au/Pd/Cr systems were deposited on alumina substrates at ambient temperature and $250^{\circ}C$ in a high-vacuum resistance heating evaporator and annealed at $300^{\circ}C$, $450^{\circ}C$ and $600^{\circ}C$ for 1 hour in air, respectively. The film thicknesses of Au, Ni(or pd), and Cr were $1000{\AA}$, $300{\AA}$, and $50{\AA}$, respectively. The substrate temperature during deposition and the post-deposition annealing temperature affected the sheet resistance of thin-films due to the inter-diffusion of each layer. As a result of Auger depth profile analysis, in the Au/Cr system Cr already diffused out to Au surface during deposition at the substrate temperature of $250^{\circ}C$ and Au distribution changed after heat treatment. In the Au/Ni/Cr and Au/Pd/Cr systems, diffusion phenomena of Ni and Pd were found and especially Ni (approximately 45 at.%) diffused out to Au surface and oxidized.

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Formation of the Fullerene-type Graphite Spherulites in the Ni-C Liquid under High Pressure (고압하(高壓下) Ni-C 액상(液相) 속에서의 fullerene형(型) 구상흑연입자(球狀黑鉛粒子)의 형성(形成))

  • Park, Jong-Ku
    • Analytical Science and Technology
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    • v.6 no.2
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    • pp.149-156
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    • 1993
  • The formation of the graphite spherulites has been studied experimentally in the Ni-C liquid under high pressure and temperature. In the diamond-stable region the graphite spherulites were formed and grew stably. They were not the polycrystalline particles but the single crystals of the fullerene-type, respectively, grown spirally with much imperfection. And they were proved to be in a mixture state of carbon atoms with $sp^2$- and $sp^3$-bonding by an Auger electron spectroscope and a high resolution transmission electron microscope. As the pressure decreased from the diamond-stable region to the graphite-stable region, the shape of the graphite particles changed gradually from the sphere to the flaky shape. The formation of the graphite spherulites was attributed to the stable existence of the carbon atoms with $sp^3$ bonding in the diamond-stable region. The formation of the large fullerene-type graphite spherulites with much imperfection is well agreed with Kroto's prediction for growth of the giant fullerene.

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A Study on Manure Separator Using Screw Press for Dairy Farms (I) - Factorial Tests for Design of Dairy Manure Separator - (낙농가를 위한 스크루 압착식 축분 고액분리기 연구 I - 젖소용 축분 고액분리기 설계요인시험 구명 -)

  • Yu, Byeongkee;Kim, Hyuckjoo;Lee, Sunghyoun;Kim, Jungkon;Ahn, Heekwon;Ra, Changsix
    • Journal of Animal Environmental Science
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    • v.20 no.1
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    • pp.1-8
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    • 2014
  • The study on design criteria of solid-liquid separator for dairy farms was done by testing various screens, presses, and RPMs of screw auger with remodeled screw-press type pig-manure separator. The moisture content of separated solid increase from 68.3% to 74.2% as auger rotating speed increased from 9.8 to 29.2 RPM at 34.8 kPa of pressure and 1.0 mm of slit wedge wire screen condition. The moisture contents of separated solid were 72~77%, work efficiencies were 16~18 kg/min at 1.0 mm of slit wedge wire screen. The efficiency was higher than one at 0.5 mm of slit wedge wire screen, which was used to separate for pig manure. The best work efficiency was 18 kg/min at 42.5 kPa, 1.0 mm slit screen. The separated solid moisture content was 75% at this condition.

A Case Study on the High-quality DCM applied to the Foundation of Breakwater (방파제 기초에 적용된 고품질 DCM공법의 설계 및 시공 사례)

  • Kang, Yeoun-Ike;Shim, Min-Bo;Shim, Sung-Hyun;Kim, Ha-Young;Shim, Jae-Bum;Chun, Youn-Chul;Yoon, Jung-Ik
    • Proceedings of the Korean Geotechical Society Conference
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    • 2009.09a
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    • pp.815-826
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    • 2009
  • The paper presents a case study addressing the design and construction aspects for DCM(Deep Cement Mixing) method employed as the foundation of a caisson type breakwater with heavy weight(10,700 ton/EA) and a high design wave height($H_{1/3}$=8.7m). The DCM was designed for the project(Ulsan New Port North Breakwater Phase 1) by optimizing the pattern of DCM columns with a combination of short and long columns (i.e., block type(upper 3m)+wall type(lower)) and considering overlapped section between columns as a critical section against shear force where the coefficient of effective width of treated column($\alpha$) was estimated with caution. It was shown that the value can be 0.9 under the condition with the overlapped width of 30cm. In addition to that, a field trial test was performed after improving conventional DCM equipment (e.g., mixing blades, cement paste supplying pipes, multi auger motor, etc.) to establish a standardized DCM construction cycle (withdrawal rate of mixing blades) which can provide the prescribed strength. The result of the field strength test for cored DCM specimens shows that the averaged strength is larger than the target strength and the distribution of the strength(with a defect rate of 7%) also satisfies with the quality control normal distribution curve which allows defect rate of 15.9%.

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Numerical Analysis of a Two-Dimensional N-P-N Bipolar Transistor-BIPOLE (2차원 N-P-N 바이폴라 트랜지스터의 수치해석-BIPOLE)

  • 이종화
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.21 no.2
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    • pp.71-82
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    • 1984
  • A programme, called BIPOLE, for the numerical analysis of twotimensional n-p-n bipolar transistors was developed. It has included the SRH and Auger recolnbination processes, the mobility dependence on the impurity density and the electric field, and the band-gap narrowing effect. The finite difference equations of the fundamental semiconductor equations are formulated using Newton's method for Poisson's equation and the divergence theorem for the hole and electron continuity equations without physical restrictions. The matrix of the linearized equations is sparse, symmetric M-matrix. For the solution of the linearized equations ICCG method and Gummel's algorithm have been employed. The programme BIPOLE has been applied to various kinds of the steady-state problems of n-p-n transistors. For the examples of applications the variations of common emitter current gain, emitter and diffusion capacitances, and input and output characteristics are calculated. Three-dimensional representations of some D.C. physical quantities such as potential and charge carrier distributions were displayed. This programme will be used for the nome,rical analysis of the distortion phenom ana of two-dimensional n-p-n transistors. The BIPOLE programme is available for everyone.

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A Study of Magnetic Field Annealing on Microstructures and Magnetic Properties of Nanocomposite Sm-Co/Co Films

  • Yang, Choong-Jin;You, Cai-Yin;Zhang, Z.D.;Kim, Kyung-Soo;Han, Jong-Soo
    • Journal of Magnetics
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    • v.7 no.2
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    • pp.45-50
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    • 2002
  • A magnetic field annealing is firstly used for nanostructured Sm-Co/Co films, prepared by magnetron sputtering method. The effects of magnetic field annealing on single-layered Sm-Co films are different from those on multi-layered Sm-Co/Co films. A detailed analysis of microstructures and magnetic properties is made by means of HRTEM, Auger electron spectroscopy, XRD and Physical Property Measurement System (PPMS). From magnetic properties and microstructure analysis, it was confirmed that these differences originate from the effects of magnetic field annealing on crystallization behavior of the films. The relationship between magnetic properties and microstructures explains a different demagnetization process of single-layered and multilayered films. For the single-layered Sm-Co films, magnetic-field-annealing makes the main phases change from $CaCu_5/ to Zn_2Th_{17}$ structure, resulting in a decrease of coercivity. The results show that the magnetic-field-annealing is useful to improve the properties of nanostructured Sm-Co(30 nm)/Co(10 nm) films, which ascribe to improving the pinning effectiveness in coercivity mechanism and decreasing the magnetostatic interaction of films. A very high coercivity about 0.7 T was obtained from nanoscaled multi-layered Sm-Co(30 nm)-/Co(10 nm) films.

Pretreatment Condition of Cu by Ammonium-Based Mixed Solvent and Its Effects on the Fabrication of Ag-Coated Cu Particles (Ag 도금 Cu 입자의 제조에서 암모늄 기반 혼합 용매를 사용한 Cu 입자의 전처리 조건과 이의 영향)

  • Lee, Hee Bum;Lee, Jong-Hyun
    • Korean Journal of Materials Research
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    • v.26 no.3
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    • pp.109-116
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    • 2016
  • To achieve the fabrication of high-quality Ag-coated Cu particles through a wet chemical process, we reported herein pretreatment conditions using an ammonium-based mixed solvent for the removal of a $Cu_2O$ layer on Cu particles that were oxidized in air for 1 hr at $200^{\circ}C$ or for 3 days at room temperature. Furthermore, we discussed the results of post-Ag plating with respect to removal level of the oxide layer. X-ray diffraction results revealed that the removal rate of the oxide layer is directly proportional to the concentration of the pretreatment solvent. With the results of Auger electron spectroscopy using oxidized Cu plates, the concentrations required to completely remove 50-nm-thick and 2-nm-thick oxides within 5 min were determined to be X2.5 and X0.13. However, the optimal concentrations in an actual Ag plating process using Cu powder increased to X0.4 and X0.5, respectively, because the oxidation in powder may be accelerated and the complete removal of oxide should be tuned to the thickest oxide layer among all the particles. Back-scattered electron images showed the formation of pure fine Ag particles instead of a uniform and smooth Ag coating in the Ag plating performed after incomplete removal of the oxide layer, indicating that the remaining oxide layer obstructs heterogeneous nucleation and plating by reduced Ag atoms.