Development of Plasma Assisted ALD equipment and electrical characteristic of TaN thin film deposited PAALD method (Plasma Assisted ALD 장비 계발과 PAALD법으로 증착 된 TaN 박막의 전기적 특성)
-
- Proceedings of the Korean Society Of Semiconductor Equipment Technology
- /
- 2005.05a
- /
- pp.139-145
- /
- 2005