• Title/Summary/Keyword: Argon plasma

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DECOMPOSITION OF HIGHER ORGANIC COMPOUND IN AN ATMOSPHERIC PRESSURE NON-EQUILIBRIUM PLASMA

  • Kitokawa, Kazutoshi;Itou, Akihito;Sugiyama, Kazuo
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.593-598
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    • 1996
  • Previously, in trying to prepare perovskite type oxide powders by microwave heating, we found out a non-equilibrium argon plasma is generated around the powders and discharge continues stable at atmospheric pressure. In this study, we tried the plasma decomposition of heat-stable higher organic compound such as palmitic acid which is the principal constituent of the fimger fats. It was proved that suitable amount of coexistence of oxygen radicals into the argon flow accelerates the decomposition of palmitic acid. The argon-oxygen mixed gas plasma was able to perform a complete elimination of higher organic compound.

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Luminance Efficacy of Inductively Coupled Argon Plasma (유도결합형 플라즈마에서의 아르곤 가스의 광 효율)

  • Lee, Young-Hwan;Pack, Kwang-Hyeon;Choi, Yong-Sung;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2004.11a
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    • pp.299-301
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    • 2004
  • Inductively coupled plasma is commonly used for electrodeless lamp due to its ease of plasma generation. Optical characteristics significantly depend on the RF power and gas pressure of the plasma. This paper describes the measurement of luminous efficacy as a function of RF power and gas pressure with a goal of finding optimal operating conditions of the electrodeless lamp. The gas pressure was varied from 10 [mTorr] to 100 [mTorr] and the RF power was varied from 10 [W] to 120 [W]. It was found that the luminous flux tends to be decreased when argon pressure is increased, and the luminous flux is increased as RF fewer is increased. It was also found that the luminance efficacy is high when the argon pressure is low and when the RF power is low.

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PARAMETER STUDY ON PLASMA-POLYMERIZATION OF LANTHANIDE DIPHTHALOCYANINE FILMS FOR ELECTROCHEMICAL DEVICES

  • Kashiwazaki, Naoya;Yamana, Masao
    • Journal of the Korean institute of surface engineering
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    • v.29 no.6
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    • pp.739-744
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    • 1996
  • Lanthanide diphthalocyanines have interesting properties on electrochemical and chemical redox reactions. It is however, difficult to use because of thier short device life. Plasma-polymerization attends to improvement thier device life. Yb-diphthalocyanine ($YbPc_2$) polymer film was deposited in a parallel plate electrodes-type RF plasma reactor. $YbPc_2$ was sublimed into the argon plasma, and polymer film was obtained on a substrate. Radio frequency was constant of 13.56MHz. Pressure of argon gas, sublimation rate of $YbPc_2$ and RF power were variable parameters depending on film quality. Surface of polymer films include a lot of sub-micron order lumps. It was indicated that size of lumps depends on polymerization degree controled by parameters. Size of lumps and polymerization degree are increased with RF power. However, by the high RF power over 40W, polymerization degree is decreased with RF power and surface of film is rough. In condition of RF power is high, polymerization will compete with etching of film. We obtained good films for electrochromic display with RF power of 20W, argon gas pressure of 8.0 Pa and sublimationrate of $1.2 \times 10$ mol/min, and good films for gas sensor with RF power of 30W, argon gas pressure of 10.6Pa and sublimation rate of $1.2 \times 10$ mol/min.

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Surface modification of $TiO_2$ by atmospheric pressure plasma

  • Jo, Sang-Jin;Jeong, Chung-Gyeong;Bu, Jin-Hyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.96-96
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    • 2010
  • To improve surface wettability, each sample was treated by atmospheric pressure plasma (APP) using dielectric barrier discharge (DBD) system. Argon and oxygen gases were used for treatment gas to modify the $TiO_2$ surface by APP with RF power range from 50 to 200 W. Water contact angle was decreased from $20^{\circ}$ to $10^{\circ}$ with argon only. However, water contact angle was decreased from $20^{\circ}$ to < $1^{\circ}$ with mixture of argon and oxygen. Water contact angle with $O_2$ plasma was lower than water contact angle with Ar plasma at the same RF power. It seems to be increasing the polar force of $TiO_2$ surface. Also, analysis result of X-ray photoelectron spectra (XPS) shows the increase of intensity of O1s shoulder peak, resulting in increasing of surface wettability by APP. Moreover, each water contact angle increased according to increase past time. However, contact angle increase with plasma treatment was lower than without plasma treatment. Additionally, the efficiency of $TiO_2$ photocatalyst was improved by plasma surface-treatment through the degradation experiment of phenol

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Fungal Sterilization Using Microwave-Induced Argon Plasma at Atmospheric Pressure

  • Park, Jong-Chul;Park, Bong-Joo;Han, Dong-Wook;Lee, Dong-Hee;Lee, In-Seop;Hyun, Soon-O.;Chun, Moon-Sung;Chung, Kie-Hyung;Maki Ahiara;Kosuke Takatori
    • Journal of Microbiology and Biotechnology
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    • v.14 no.1
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    • pp.188-192
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    • 2004
  • The main aim of this study was to investigate the sterilization effects of microwave-induced argon plasma at atmospheric pressure on paper materials contaminated with fungi. Plasma-treated filter papers showed no evidence to an unaided eye of burning or paper discoloration due to the plasma treatment. All fungi were perfectly sterilized in less than 1 sec, regardless of strains. These results indicate that this sterilization method for paper materials is easy to use, requires significantly less time than other traditional methods and different plasma sterilization methods, and is also nontoxic.

Numerical calculations of characteristics of Argon arc plasma using the control volume method (제어체적법에 의한 Ar 아크 플라즈마의 특성 계산)

  • Kim, Oe-Dong;Ko, Kwang-Cheol;Kang, Hyung-Boo
    • Proceedings of the KIEE Conference
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    • 1995.07c
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    • pp.1404-1406
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    • 1995
  • In this paper, argon gas was used for numerical analysis of an arc in a cutting plasma torch driven by constant current. We established nozzle-constricting type torch domain and calculated steady state characteristics of argon arc plasma using the control volume method(CVM). For simplicity, we assumed that the flow field is laminar and the local thermodynamic equilibrium(LTE) prevails in all domain regions. We also neglected cathode-fall and anode-fall effects. Considering magnetic pinch effect and viscosity effect, we solved the momentum equation. Voltage drop in the arc column due to input current was calculated from the temperature field obtained by the energy balance equation.

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Graphene Cleaning by Using Argon Inductively Coupled Plasma

  • Im, Yeong-Dae;Lee, Dae-Yeong;Ra, Chang-Ho;Yu, Won-Jong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.197-197
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    • 2012
  • Device 제작에 사용된 graphene은 일반적인 lithography 공정에서 resist residue에 의한 오염을 피할 수 없으며 이로 인하여 graphene의 pristine한 성질을 잃어버린다. 본 연구에서는 graphene을 저밀도의 argon inductively coupled plasma (Ar-ICP)를 통해 처리함으로서 graphene based back-gated field effect transistor (G-FET)의 특성변화를 유도한 결과에 대해서 보고한다. Argon capacitively coupled plasma (Ar-CCP)은 에 노출된 graphene은 강한 ion bombardment energy로 인하여 쉽게 planar C-C ${\pi}$ bonding (bonding energy: 2.7 eV)이 breaking되어 graphene의 defect이 발생되었다. 하지만 우리의 경우 저밀도의 Ar-ICP가 적용될 때 graphene의 defect이 제한되며 이와 동시에 contamination 만을 제거할 수 있었다. 소자의 전기적 측정 (Gsd-Vbg)을 통하여 contamination으로 인하여 p-doping된 graphene은 pristine 상태로 회복되었으며 mobility도 회복됨이 확인되었다. Ar-ICP를 이용한 graphene cleaning 방법은 저온공정, 대면적 공정, 고속공정을 모두 만족시키며 thermal annealing, electrical current annealing을 대체하여 graphene 기반 소자를 생산함에 있어 쉽고 빠르게 적용할 수 있는 강점이 있다.

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Study on the Fabrication and Characterization of Compact ECR Plasma System (Compact ECR plasma장치의 제작 및 특성 연구)

  • 윤민기;박원일;남기석;이기방
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.31A no.4
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    • pp.84-91
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    • 1994
  • A compact electron cyclotron resonance(ECR) plasma system composed of a microwave generator and a magnet coil was fabricated. A Langmuir single probe was used to investigate the plasma characteristics of the system through I-V measurements. The performance of the compact ECR plasma system was tested for the case of silicon etching reaction with $CF_{4}/O_{2}$(30%) mixed gas. Electron density and etch rate increased to maximum values and then decreased with increasing argon gas pressure, but electron temperature changed in the opposite way. The electron density and the electron temperature of argon gas plasma were 0.85${\times}~5.5{\times}10^{10}cm^{-3}$ and 4.5~6.0 eV, respectively, in the pressure range from $3{\times}10^{4}$ to 0.05Torr. The etch rate reached a maximum value at the position of 2.5cm from the bottom of plasma cavity. Etch rate uniformity was $\pm$6% across 6cm wafer. Anisotropic index was 0.75 at 1.5${\times}10^{-4}$Torr.

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Polymerization of Tetraethoxysilane by Using Remote Argon/dinitrogen oxide Microwave Plasma

  • Chun, Tae-Il;Rossbach, Volker
    • Textile Coloration and Finishing
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    • v.21 no.3
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    • pp.19-25
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    • 2009
  • Polymerization of tetraethoxysilane on a glass substrate was investigated by remote microwave plasma using argon with portions of nitrous oxide as carrier gas. Transparent layer like a thickness of 0.5 ${\mu}m$ 3 ${\mu}m$ were obtained, differing in chemical composition, depending on plasma power and treatment time as well as on ageing time. In general the milder the treatment and the shorter the ageing was, the higher was the content of organic structural elements in the layer. We have identified that the chemical structure of our samples composed of mainly Si O and Si C groups containing aliphatics, carbonyl groups. These results were obtained by X ray photon spectroscopy, Fourier transformed infrared spectroscopy, and scanning electron microscope combined with Energy dispersive X ray spectroscopy.

Low Voltage Plasma-on-a-Chip for Inactivation of Superbacteria (슈퍼박테리아 감염 치료를 위한 저전압 구동 플라즈마-온-칩)

  • Lim, Towoo;Hwang, Sol;Kim, Youngmin
    • Proceedings of the KIEE Conference
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    • 2015.07a
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    • pp.1249-1250
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    • 2015
  • We report a plasma-on-a-chip (POC) which provides a non-thermal atmospheric plasma for superbacteria infection treatment A three-electrode configuration allows an initiation carrier injection prior to a primary discharge, leading to a significant reduction in a breakdown voltage. A stable non-thermal argon plasma is generated using a pulsed glow discharge and inactivation of anti-biotic resistant bacteria, for example MRSA, is successfully demonstrated by exposing the bacteria to the argon plasma in a couple of minutes.

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