• Title/Summary/Keyword: Argon plasma

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The Graft Polymerization of Acrylic Acid in Vapour Phase onto Poly(ethylene terephthalate) by Cold Plasma Part (I) (저온 Plasma를 이용한 Poly(ethylene terephthalate)에의 Acrylic Acid의 기상 Graft 공중합 반응(I))

  • 천태일;최석철;모상영
    • Textile Coloration and Finishing
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    • v.1 no.1
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    • pp.7-18
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    • 1989
  • The distinguishing characteristic of the glow discharge is that chemical reaction induced by partially ionized gases are limited only to the substrate surface. Most studies have been done on the plasma etching and polymerization. The graft polymerization in vapour phase by cold plasma has been rarely investigated. In this study the system of tub3ar reaction chamber with capacitively coupled electrode of alternative current of 60 Hz was employed for the graft polymerization. The graft polymerization of Acylic Acid(AA) onto the poly (ethylene terephthalate) (PET) was carried out by treatment of PET film and fabric by cold plasma (glow discharge of argon gas), followed by the supply of AA vapour. The graft yield was about 1 wt%. The surface property was determined by contact angle, the surface tension was evaluated by zisman’s plot and equation of surface tension mesurement. The results were as follows: 1. In order to obtain lower contact angle, it was effective to avoid the vicinity of electrodes for a setting position of substrate. 2. Contact angle affected on the monomer pressure and its duration of exposure to the acid vapour. 3. Polymer radical formation was influenced by the changes of the value of current density and plasma treatment time. 4. Total surface tension of plasma grafted PET film increased. With an increase in the carboxylic acid content, the dispersion force decreased, while, the polar force and hydrogen bonding force increased. 5. The contact angle decreased from $75^\circ$ to around $30^\circ$ by plasma grafting. There was no ageing effect on the contact angle after 4 months.

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A Study of Homogeneous Sterilization of Micro-sized Food Powder by Rotatable Low-Temperature Plasma System (회전형 저온 플라즈마 시스템을 이용한 분말식품의 균일한 살균 연구)

  • Kim, Myung Chan;Park, Duck Mo;Han, Jin Soo;Woo, In Bong;Kim, Dong Hoo;Jang, Seong Eun;Yoon, Chan Suk;Kim, In
    • The Korean Journal of Food And Nutrition
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    • v.31 no.2
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    • pp.301-307
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    • 2018
  • In this study, a relatively effective process is used to sterilize Escherichia coli on the surface of micro-sized calcium citrate powder using nitrogen and argon as process gases in a low-temperature vacuum plasma treatment. The purpose of this study is to confirm and to introduce the effectiveness of homogeneous surface treatment for the sterilization of fine inorganic powder by the rotatable low-temperature RF plasma system designed by ourselves. The results of the test using 3M petrifilm showed that there were no remarkable spots in the case of the surface of plasma treated powder, whereas the untreated powder showed many blue spots, which indicating that the E. coli was alive. After 5 days, in the same samples, the blue spots were seen to be larger and darker than before, while the plasma-treated powder showed no changes. The results from FE-SEM analysis showed that the E. coli was damaged and/or destroyed by reactive species generated in the plasma space, resulting in the E. coli being sterilized. Furthermore, the sterilization effects according to the selected parameters ($N_2$ and Ar; flow rate 30 and 50 sccm) adapted in this study were mutually similar, regardless of such different process parameters, and this indicates that homogeneous treatment of powder surfaces could be more effective than conventional methods. Therefore, the plasma apparatus used in this study may be a practical method to use in a powerful sterilization process in powder-type food.

Atmospheric-Pressure Plasma Treatment of Ethylene-Vinyl Acetate (EVA) to Enhance Adhesion Energy between EVA and Polyurethane (상압 플라즈마 표면처리에 따른 Ethylene-Vinyl Acetate (EVA)의 표면개질 및 Polyurethane과의 접착력 증진)

  • Kim, Jeong-Soon;Uhm, Han-S;Kim, Hyoung-Suk
    • Elastomers and Composites
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    • v.39 no.1
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    • pp.3-11
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    • 2004
  • Plasma treatment is frequently used to increase surface functionality and surface activity. It enables to improve various surface properties such as catalytic selectivity, printability, and interfacial adhesion between various materials. Surface or the ethylene-vinyl acetate (EVA) is exposed under an atmospheric pressure plasma torch (APPT), generated by dielectric barrier discharge (DBD), and the treated surfaces are systemically investigated. Argon, air, and oxygen are used as a processing gas. Properties of the treated EVA surfaces are investigated by the zeta-potential measurements and surface free energies. It is shown that the plasma treatment leads to a drastic increase of surface functional groups of EVA, as the increase of its adhesion energy ($G_{IC}$). Therefore, it is concluded that the APPT process is an effective means to improve adhesion of EVA and polyurethane (PU).

Study of the Diffusion of Phosphorus Dependent on Temperatures for Selective Emitter Doping Process of Atmospheric Pressure Plasma (대기압 플라즈마의 선택적 도핑 공정에서 온도에 의한 인(Phosphorus)의 확산연구)

  • Kim, Sang Hun;Yun, Myoung Soo;Park, Jong In;Koo, Je Huan;Kim, In Tae;Choi, Eun Ha;Cho, Guangsup;Kwon, Gi-Chung
    • Journal of the Korean institute of surface engineering
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    • v.47 no.5
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    • pp.227-232
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    • 2014
  • In this study, we propose the application of doping process technology for atmospheric pressure plasma. The plasma treatment means the wafer is warmed via resistance heating from current paths. These paths are induced by the surface charge density in the presence of illuminating Argon atmospheric plasmas. Furthermore, it is investigated on the high-concentration doping to a selective partial region in P type solar cell wafer. It is identified that diffusion of impurities is related to the wafer temperature. For the fixed plasma treatment time, plasma currents were set with 40, 70, 120 mA. For the processing time, IR(Infra-Red) images are analyzed via a camera dependent on the temperature of the P type wafer. Phosphorus concentrations are also analyzed through SIMS profiles from doped wafer. According to the analysis for doping process, as applied plasma currents increase, so the doping depth becomes deeper. As the junction depth is deeper, so the surface resistance is to be lowered. In addition, the surface charge density has a tendency inversely proportional to the initial phosphorus concentration. Overall, when the plasma current increases, then it becomes higher temperatures in wafer. It is shown that the diffusion of the impurity is critically dependent on the temperature of wafers.

Linear Ion Beam Applications for Roll-to-Roll Metal Thin Film Coatings on PET Substrates

  • Lee, Seunghun;Kim, Do-Geun
    • Applied Science and Convergence Technology
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    • v.24 no.5
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    • pp.162-166
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    • 2015
  • Linear ion beams have been introduced for the ion beam treatments of flexible substrates in roll-to-roll web coating systems. Anode layer linear ion sources (300 mm width) were used to make the linear ion beams. Oxygen ion beams having an ion energy from 200 eV to 800 eV used for the adhesion improvement of Cu thin films on PET substrates. The Cu thin films deposited by a conventional magnetron sputtering on the oxygen ion beam treated PET substrates showed Class 5 adhesion defined by ASTM D3359-97 (tape test). Argon ion beams with 1~3 keV used for the ion beam sputtering deposition process, which aims to control the initial layer before the magnetron sputtering deposition. When the discharge power of the linear ion source is 1.2 kW, static deposition rate of Cu and Ni were 7.4 and $3.5{\AA}/sec$, respectively.

방전플라즈마 소결에 의한 SiC-$ZrB_2$ 복합체 개발

  • Kim, Cheol-Ho;Sin, Yong-Deok;Ju, Jin-Yeong;Lee, Jeong-Hun;Lee, Hui-Seung;Kim, Jae-Jin;Lee, Jong-Seok
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.87-87
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    • 2009
  • The composites were fabricated by adding 30, 40, 50, 60[vol.%] Zirconium Diboride(hereafter, $ZrB_2$) powders as a second phase to Silicon Carbide(hereafter, SiC) matrix. SiC-$ZrB_2$ composites were sintered by Spark Plasma Sintering(hereafter, SPS) in argon gas atmosphere. The relative density SiC+30[vol.%]$ZrB_2$, SiC+40[vol.%]$ZrB_2$, SiC+50[vol.%]$ZrB_2$ and SiC+60[vol.%]$ZrB_2$ composites are 94.98[%], 99.57[%], 96.58[%] and 93.62[%] respectively.

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Prediction of Anode Temperatures of Free Burning Arcs Using a Simplified Unified Model

  • Jeon, Hong-Pil;Lee, Jong-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.565-565
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    • 2013
  • Free burning arcs where the work piece acts as an anode are frequently used for a number of applications. Our investigation is exclusively concerned with a simplified unified model of arcs and anode under steady state conditions at atmospheric pressure. The model is used to make predictions of arc and anode temperatures and arc voltage for a 200 A arc in argon. The computed temperatures along the axis between the cathode tip and the anode surface compare well the measured data. This knowledge of free burning arcfeatures can play a role in developing the atmospheric plasma systems, however, further investigation should include the modelling of Cu evaporation from anode and non-LTE situation near electrodes for more realistic calculations.

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아크 용접에서 구동력에 따른 열 및 물질 유동에 관한 연구

  • 김원훈;나석주
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 1996.11a
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    • pp.27-41
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    • 1996
  • In this study the heat transfer and fluid flow of the molten pool in stationary gas tungsten arc welding using argon shielding gas were investigated. Transporting phenomena from the welding arc to the base material surface, such as current density, heat flux, arc pressure and shear stress acting on the weld pool surface, were taken from the simulation results of the corresponding welding arc. Various driving forces for the weld pool convection were considered, self-induced electromagnetic, surface tension, buoyancy, and impinging plasma arc forces. Furthermore, the effect of surface depression due to the arc pressure acting on the molten pool surface was considered. Because fusion boundary has a curved and unknown shape during welding, a boundary-fitted coordinate system was adopted to precisely describe the boundary for the momentum equation. The numerical model was applied to AISI 304 stainless steel and compared with the experimental results.

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Diamond Synthesis by the Thermal Plasma CVD at Atmospheric Pressure (대기압 열플라즈마 CVD에 의한 다이아몬드 합성)

  • Lee, Jae-Ho;Ko, Myung-Wan;Park, Dong-Wha
    • Applied Chemistry for Engineering
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    • v.5 no.1
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    • pp.16-23
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    • 1994
  • In an argon thermal plasma CVD system diamond of metastable state was synthesized on molydenum substrate and concentration ratio of methane to hydrogen. Diamond was relatively well obtained when surface temperature of substrate was $890^{\circ}C$ and concentration of methane ratio was 0.5 percents.

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A study on the AIN thin films fabricated by RF magnetron sputtering (RF Magnetron Sputtering 법으로 제조된 AIN 박막에 관한 연구)

  • 남창길;최승우;천희곤;조동율
    • Journal of the Korean Vacuum Society
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    • v.6 no.1
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    • pp.44-49
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    • 1997
  • AIN thin films were deposited on silicon and glass substrates by sputtering Al target and introducing mixed gases of argon and nitrogen into reactive RF magnetron sputter. The substrate was not heated to protect the PC (polycarbonate) substrate and the micro-sized pregroove morphology on the surface of PC substrate. But its temperature was around $100^{\circ}C$ due to the self-heating by plasma. The crystallinity, cross-section morphology and refractive index were characterized by changing various deposition parameters.

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