• Title/Summary/Keyword: Ar rate

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Performance Analysis of Layered Cell Protocol for the Integrated Traffic of Packetized Voice and Low Bit-rate Data (패킷화된 음성과 저속의 데이터가 혼합된 트래픽을 위한 Layered Cell 프로토콜의 성능해석)

  • 이영교;박기식;정해원;조성준
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.24 no.7A
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    • pp.964-972
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    • 1999
  • In this paper, we proposed a simulation model to which apply the AAL 2 (AAL type 2) between BSC and MSC in the cellular mobile communication systems. We suggested the frame structure of processing the packets of short length and the scheme which multiplex to one or more ATM cell. Also, we analyzed the performance of the APR, transmission delay, and channel transmission efficiency used in the packetized voice traffic and the low bit-rate data traffic such as fax. From the simulation results, the maximum number of users are 47 users without using AAL 2 multiplexing, but the maximum number of users are 70 (Non-Overlapping scheme) users, 110 (Overlapping scheme) users, respectively. Thus, we knew that the Overlapping scheme is more efficient than the Non-Overlapping scheme. Finally, we showed that the optimum transmission buffer size is 4 ATM cells in the cellular communication systems with the bandwidth of 2 Mbps.

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The DC magnetron sputtering vacuum deposition of indium tin oxide thin film (ITO 박막의 DC 마그네트론 스퍼터링 진공 증착)

  • Hur, Chang-Wu
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.14 no.4
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    • pp.935-938
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    • 2010
  • Indium-tin-oxide (ITO) films show a low electrical resistance and high transmittance in the visible range of an optical spectrum. The transparent electrodes have to get resistivity and sheet resistance less than $1{\times}10^{-3}{\Omega}/cm$ and $10^3{\Omega}/sq$ respectively and transmittance over 80% at wavelength of 380nm~780nm. This study establishes DC magnetron sputtering process condition on ITO thin film by measuring electrical and optical properties of the thin film. As results, we obtained $300\;{\mu}{\Omega}cm$ resistivity of ITO films with good transmittance (above 90 %) under 90:10 wt% composition rate of $In_2O_3:SnO_2$. Also, we understood that the ITO thin film by DC magnetron sputtering depends on the deposition condition, especially substrate temperature, and the composition rate of $In_2O_3:SnO_2$ that is one of the most critical parameters was successfully optimized for high qualified transparent electrodes.

The Development of a Speech Recognition Method Robust to Channel Distortions and Noisy Environments for an Audio Response System(ARS) (잡음환경및 채널왜곡에 강인한 ARS용 전화음성인식 방식 연구)

  • Ahn, Jung-Mo;Yim, Kye-Jong;Kay, Young-Chul;Koo, Myoung-Wan
    • The Journal of the Acoustical Society of Korea
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    • v.16 no.2
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    • pp.41-48
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    • 1997
  • This paper proposes the methods for improving the recognition rate of theARS, especially equipped with the speech recognition capability. Telephone speech, which is the input to the ARS, is usually affected by the announcements from the system, channel noise, and channel distortion, thus directly applying the recognition algorithm developed for clean speech to the noisy telephone speech will bring the significant performance degradation. To cope with this problem, this paper proposes three methods: 1)the accurate detection of the inputting instant of the speech in order to immediately turn off the announcements from the system at that instant, 2)the effective end-point detection of the noisy telephone speech on the basis of Teager energy, and 3)the SDCN-based compensation of the channel distortion. Experiments on speaker-independent, noisy telephone speech reveal that the combination of the above three proposed methods provides great improvements on the recognition rate over the conventional method, showing about 77% in contrast to only 23%.

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Effects of High Molecular Weight Water-Soluble Chitosan can in 7tro Fertilization and Ovulation in Mice Fed a High-Fat Diet

  • Choo, Young-Kug;Choi, Hee-Gon;Kim, Jin-Kyung;Kwak, Dong-Hoon;Cho, Jung-Ran;Kim, Ji-Yeoun;Kim, Byung-Jin;Jung, Kyu-Yong;Choi, Bong-Kyu;Shin, Min-Kyo
    • Archives of Pharmacal Research
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    • v.25 no.2
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    • pp.178-183
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    • 2002
  • A high molecular ar weight water-soluble chitosan (WSC) with an average molecular weight of 300 kD and a deacethylation level of over 90% was produced using a simple multi-step-membrane separation process. It is known that WSC prevents obesity induced by a high-fat diet. Consequently, this study investigated whether or not WSC improved the ovarian dysfunction caused by obesity in mice. The mice were fed a high density protein and lipid diet for weeks, followed by the administration of WSC at 480 mg/kg body weight per day for 4 days. Thereafter, the changes in body weight, ovulation rate, in vivo and in vitro fertilization and emboryonic development were measured . WSC markedly reduced the body weight of obese mice fed with a high-fat diet, but not in mice fed with a normal diet. WSC had siginificant effects on the ovulation rate, both the in vivo and in vitro fertilization rates and embryonic development. These results indicate an improvement in the ovarian and oviduct dysfunction caused by obesity, and suggest an adjustment in the internal secretions and metabolic functions.

A Study on the Reduction of Electric Arc Furnace Dust with Carbon (탄소에 의한 전기로 분진의 환원반응에 관한 연구)

  • 진영주;김영진;박병구;이광학;김영홍;이재운
    • Resources Recycling
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    • v.7 no.3
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    • pp.27-35
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    • 1998
  • EAF dust generated from electric arc steelmaking process is classified as "hazardous" materials by tbe environmental regulation because of the existence of water leachable heavy metals such as Fe, Zn, Pb, and Cd. However, Fe and Zn among t the elements in the dust can be recovered to high valuable materials by applying a proper process. Therefore, in order to study t the possibility of recovery of iron from EAF dust, the effect oE carbon content and basicity, of synthesized EAF dust on the reduction rate of iron oxide was studied. Experimental results are as follows: TIle softening and melting temperature of the slag w was illcreased with increasing carbon addition amount [or carbon reduction eqUIvalent. At the carbon addition amount of 100% for carbon reduction equivalent and basicity of 1.7, reduction rate of $Fe_2O$ in the slag was the highest. The reaction order fur reduction of $Fe_2O$ by carbon was nearly first order.

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The effect of $O_2$ flow rate on die characteristics of ATO Thin Films by RF Magnetron Sputtering (RF Magnetron Sputtering을 이용한 ATO 박막의 산소 유량에 따른 특성 변화)

  • Kyeon, Dong-Min;Lee, Sung-Uk;Park, Mi-Ju;Kim, Young-Ryeol;Choi, Won-Seok;Hong, Byung-You
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.336-337
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    • 2007
  • 현재 투명전극의 재료로 ITO, ZnO, $SnO_2$등의 재료가 주로 이용되며, 낮은 저항률을 장점으로 가지는 ITO 박막이 가장 널리 이용되고 있으나, 가격이 비싸다는 단점을 가지고 있다. 이 밖에도 ITO 박막보다 가격이 저렴한 ZnO박막에 대한 연구가 많이 진행되고 있으나, 고온에서의 열적 불안정성 등의 문제로 상용화되지는 못하고 있다. 그러나 $SnO_2$ 박막은 ITO와 ZnO 박막보다 저항률이 다소 높지만, 우수한 열적, 화학적 안정성과 저렴한 가격으로 ITO 박막을 대체할 투명전도막 재료로 주목받고 있다. 본 연구에서는 $SnO_2$박막의 저항률 향상을 위하여 ATO(Antimony doped Tin Oxide) 박막을 RF Magnetron Sputtering 법으로 Coming glass위에 증착하였으며, 박막 증착시 산소 유량의 변화가 ATO 박막의 구조적, 전기적 그리고 광학적 특성에 미치는 효과를 연구하였다. 본 실험에서는 동작압력을 10 mTorr, RF power를 250W로 고정하고 $O_2$ 유량을 부분적으로 변화시키면서 증착되어진 ATO 박막을 분석한 결과 Ar:$O_2$의 비가 90:10일 때 최적의 가스비율로써 우수한 구조적, 전기적 그리고 광학적 특성을 보임을 확인하였다.

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A Study on Effect of Flex Additions for Selecting the Process Parameters in GMA Welding processes (GMA 용접공정에서 공정변수 선정을 위한 플럭스 첨가에 관한 연구)

  • Kim, In-Ju;Kim, Jun-Ki
    • Journal of the Korean Society of Mechanical Technology
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    • v.13 no.1
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    • pp.17-22
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    • 2011
  • As the quality of a weld joint is strongly influenced by process parameters the welding process, an intelligent algorithms that can predict the bead geometry and shape to accomplish the desired mechanical properties of the weldment should be developed. In this study, prepared by ${\Phi}1.6mm$ GMA welding of metal wire nose Advice jowelui 350A 600A grade level inverter welder and DAIHEN SCR's were carried out using welding. Welding conditions were 5.5m/min wire feed rate the welding current is rapidly transmit approximately 260A, welding voltage was about 30V. CTWD a 22mm, shielding gas was Ar 20L/min and the welding speed was a 240mm/min. Using data collected during welding equipment welding current and welding voltage waveform was analyzed by measuring the volume of the transition mode. Addition of $CaCO_3$ as a loss of the spread of the weld bead dilution rate decreased, suggesting that, GMA in the overlay welding bead shape control, dilution control and may be used as a welding flux is considered. Stabilizing effect of the arc by the Ca-containing $CaF_2$, $CaCO_3$, $CaMg(CO_3)_2$, respectively, welding flux 0.1wt.% added GMA welding and weld overlay were evaluated with dilution, $CaF_2$, and $CaMg(CO_3)_2$ added to the dilution of Seemed to increase.

Physiological and Ecological Comparison of Rice Cultivars Grown in Low Fertilized Condition (질소시비량에 따른 벼 생리생태적 특성 연구)

  • Gu, H.M.;You, O.J.;Park, J.H.
    • Journal of Practical Agriculture & Fisheries Research
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    • v.20 no.1
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    • pp.175-185
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    • 2018
  • This study was conducted to evaluate the physiological and ecological characters of rice cultivars suitable for low fertilized condition. 5 rice cultivars(Jinmibyeo, Sobibyeo, Hwayeongbyeo, Nagdongbyeo and Junambyeo) were cultivated for selection under 3 different nitrogen application levels, and 1 cultivars were selected. The results obtained are summarized as follows ; High yielded rice cultivars under low N application level were Junambyeo, Jinheng and Sobibyeo. Also these cultivars were yielded highly under conventional level(11kg/10a). Milled rice yield under conventional level(11kg/10a) was positively correlated with them under low N levels. Milled rice yield was most affected by no. of grain/m2. Rice cultivars that were high crop growth rate(CGR) before heading stage were Junambyeo, Sobibyeo and Nagdongbyeo. Grain filling rate was increased mostly until 20 days after heading, and decreased after this stage. Nitrogen use efficiency was higher under low N level(5.5kg/10a) than conventional level(11kg/10a). Especially, Junambyeo was most low in Apparent recovery of applied N(AR) under low N application level, but most high in Agronomic N use efficiency(ANUE). This characteristics of Junambyeo will to be useful for selection of variety suitable for growing under low fertilized condition.

Preventing Plasma Degradation of Plasma Resistant Ceramics via Surface Polishing (내플라즈마성 세라믹의 표면연마를 통한 플라즈마 열화방지)

  • Jae Ho Choi;Young Min Byun;Hyeong Jun Kim
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.3
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    • pp.130-135
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    • 2023
  • Plasma-resistant ceramic (PRC) is a material used to prevent internal damage in plasma processing equipment for semiconductors and displays. The challenge is to suppress particles falling off from damaged surfaces and increase retention time in order to improve productivity and introduce the latest miniaturization process. Here, we confirmed the effect of suppressing plasma deterioration and reducing the etch rate through surface treatment of existing PRC with an initial illumination level of 200 nm. In particular, quartz glass showed a decrease in etch rate of up to 10%. Furthermore, it is believed that micro-scale secondary particles formed on the microstructure of each material grow as crystals during the fluoridation process. This is a factor that can act as a killer defect when dropped, and is an essential consideration when analyzing plasma resistance. The plasma etching suppression effect of the initial illumination is thought to be due to partial over etching at the dihedral angle of the material due to the sputtering of re-emission of Ar+-based cations. This means that plasma damage due to densification can also be interpreted in existing PRC studies. The research results are significant in that they present surface treatment conditions that can be directly applied to existing PRC for mass production and a new perspective to analyze plasma resistance in addition to simple etching rates.

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The Film Property and Deposition Process of TSV Inside for 3D Interconnection (3D Interconnection을 위한 실리콘 관통 전극 내부의 절연막 증착 공정과 그 막의 특성에 관한 연구)

  • Seo, Sang-Woon;Kim, Gu-Sung
    • Journal of the Microelectronics and Packaging Society
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    • v.15 no.3
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    • pp.47-52
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    • 2008
  • This investigation was performed in order to study the properties of deposition and layers by Silicon Dioxide, SiO2, as dielectric onto Via and Trench which have high Aspect Ratio (AR). Thus, in order to confirm these properties, three types of CVD, which were PECVD, PETEOS, and ALD, were selected. On the experiment each of the property sections was estimated that step overage of PECVD: <30%, PETEOS: 45%, ALD: 75% and the RSM of PECVD: 27.8 nm, PETEOS: 2.1 nm, ALD: <2.0 nm. As a result of this experiment for the property of electric film, ALD was valuated to be the most favorable outcome. However, ALD was valuated to have the least quality for the deposition rate. ALD deposition rate, $10\;\AA/min$ by $1\;\AA$/1cycle, was prominently lower than PETEOS, which had the deposition rate of $5000\;\AA$/min. Since electric film requires at least $1000\;\AA$ thicknesses, ALD was not suitable for the deposition rate. which is the most important component in a practical use. Therefore, in this particular study, PETEOS was evaluated to be the most suitable recipe.

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