• 제목/요약/키워드: AntiReflection

검색결과 255건 처리시간 0.028초

결정질 실리콘 태양전지를 위한 고주파 PECVD SiNx막 연구 (A Study on Silicon Nitride Films by high frequency PECVD for Crystalline Silicon Solar Cells)

  • 김정환;노시철;최정호;정종대;서화일
    • 반도체디스플레이기술학회지
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    • 제11권2호
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    • pp.7-11
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    • 2012
  • SiNx films have been wildly used as anti-reflection coatings and passivation for crystalline silicon solar cells. In this study, the SiNx films were deposited by using high frequency (13.56MHz) PECVD and optical & passivation properties were investigated. The RF power was changed in a certain range for the film deposition. Then, the refractive index, etch rate, minority carrier lifetime and cell efficiency were measured to study the properties of the film respectively. The optimal deposition conditions for application to crystalline silicon solar cells were proposed as results of the study. Finally, the best cell efficiency of 16.98% was obtained from the solar cell with the SiNx films deposited by RF power of 550W.

고효율 Solar Cell 제조를 위한 Firing 공정 조건의 최적화 (Optimization of the firing process condition for high efficiency solar cells on single-crystalline silicon)

  • 정세원;이성준;홍상진;한승수
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2006년도 추계학술발표회 초록집
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    • pp.4-5
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    • 2006
  • This paper represents modeling and optimization techniques for solar cell process on single-crystalline float zone (FZ) wafers with high efficiency; There were the four significant processes : i)emitter formation by diffusion, anti-reflection-coating (ARC) with silicon nitride using plasma-enhanced chemical vapor deposition (PECVD); iii)screen-printing for front and back metallization; and iv)contact formation by firing. In order to increase the performance of solar cells, the contact formation process is modeled and optimized. This paper utilizes the design of experiments (DOE) in contact formation to reduce process time, fabrication costs. The experiments were designed by using central composite design which is composed of $2^4$ factorial design augmented by 8 axial points with three center points. After contact formation process, the efficiency of the solar cell is modeled using neural networks. This model is used to analyse the characteristics of the process, and to optimize the process condition using genetic algorithms (GA). Finally, find optimal recipe for solar cell efficiency.

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탄소비율에 따른 Diamond-like Carbon Film의 광학적 및 기계적 특성 (Optical and Mechanical Properties of Diamond-like Carbon Film with Variation of Carbon Ratio)

  • 윤덕용;박용섭;최원석;홍병유
    • 한국전기전자재료학회논문지
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    • 제21권9호
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    • pp.808-811
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    • 2008
  • Optical and mechanical properties of diamond-like carbon (DLC) films synthesized by RF plasma enhanced chemical vapor deposition were investigated as a function the C/H ratio in gas mixture. The C/H ratio was varied from 6 to 10 %, adjusting the amount of $CH_4$ and $H_2$ as the source gas. The optical and mechanical properties of DLC films were characterized by UV spectrometer, Ellipsometer and Nano-indenter. The change of the C/H ratio during synthesis of DLC films had many effects on the growth rate, transmittance, refractive index and hardness. The growth rate of the films increased exponentially with the increase in C/H ratio. The hardness of the films showed the tendency to improve with increasing C/H ratio, whereas the transmittance decreased. The refractive index was varied from 2.03 to 2.17, and these refractive indexes close to 2.0 indicates that it can be applied to Si-based solar cell.

Oxy-nitride막질 증착조건에 따른 Cell Current Instability 개선 연구 (Study on improvement of cell current instability)

  • 정영진;김진우;박영혜;김대근;정태진;노용한
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.119-120
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    • 2007
  • 반도체 공정에서 사용되는 ILD막질 중 oxy-nitrde(SiON) film은 contact etch stopper, photo공정을 위한 ARL(anti-reflection lay떠 그리고, 후속공정의 plasma damage에 대한 blocking layer로서의 역할을 담당하며 많은 공정에 널리 사용되고 있다. 그러나 막질 자체의 불완전성 (trap site, dangling bond)에 의해 cell current instability(CCI) 특성을 악화 시킬 수 있어 이에 대한 원인규명 및 대책이 요구되었다. 본 연구는 미국 S사(社) super flash memory에서 oxy-nitride 막질 증착 시의 gas flow량에 따른 CCI 특성변화를 연구하고 최적의 공정조건을 제시하고자 한다.

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태양전지 적용을 위한 PECVD 실리콘 질화막 증착 및 가스비 가변에 따른 효과

  • 공대영;박승만;이준신
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.305-305
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    • 2010
  • 태양전지의 개발이 본격화 되면서 태양전지 웨이퍼 표면에서의 재결합에 의한 손실을 줄이고 전면에서의 반사도를 감소시키기 위한 ARC (Anti-reflection Coating) layer에 대한 연구가 활발히 진행되고 있다. 이 중 대표적인 물질이 실리콘 질화막이 있다. 실리콘 질화막은 PECVD(plasma-enhanced chemical vapor deposition)법으로 저온에서 실리콘 기판 위에 증착 가능한 장점이 있다. 또한 실리콘 질화막의 광학적, 전기적인 특성은 $SiH_4:NH_3$의 화학적 조성비에 의해 결정되며 가스비 가변에 따라 균일도 및 굴절률 조절을 가능케 하여 태양전지의 효율을 향상시킬 수 있다. 본 연구에서는 태양전지의 표면 반사도 저감 및 효율 향상에 최적화된 실리콘 질화막을 형성하기 위해 PECVD를 이용하였고, 가스비 가변을 통해 굴절률을 조절하여 실리콘 질화막을 증착하고 이를 이용한 태양전지를 제작한 후 특성을 비교, 분석하였다. 실리콘 질화막 증착을 위해 압력, 온도, 파워를 1Torr, $450^{\circ}C$, 300W로 고정하고 가스비는 $SiH_4$를 45 sccm으로 고정한 후 $NH_3$의 양을 각각 30, 60, 90, 120 sccm으로 가변하였다. $SiH_4:NH_3$ 비율이 45:90일 때 박막의 passivation효과가 최대였으며 이 조건로 ARC를 형성한 태양전지는 77% 후반의 높은 FF(Fill Factor)와 17%의 광 변환 효율을 나타냈다.

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ZnO 나노 입자 분산 레진의 thermal imprinting 공정을 통한 기능성 패턴 제작 (Fabrication of Functional ZnO Nano-particles Dispersion Resin Pattern Through Thermal Imprinting Process)

  • 권무현;이헌
    • 한국정밀공학회지
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    • 제28권12호
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    • pp.1419-1424
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    • 2011
  • Nanoimprint lithography is a next generation lithography technology, which enables to fabricate nano to micron-scale patterns through simple and low cost process. Nanoimprint lithography has been applied in various industry fields such as light emitting diodes, solar cells and display. Functional patterns, including anti-reflection moth-eye pattern, photonic crystal pattern, fabricated by nanoimprint lithography are used to improve overall efficiency of devices in that fields. For these reasons, in this study, sub-micron-scaled functional patterns were directly fabricated on Si and glass substrates by thermal imprinting process using ZnO nano-particles dispersion resin. Through the thermal imprinting process, arrays of sub-micron-scaled pillar and hole patterns were successfully fabricated on the Si and glass substrates. And then, the topography, components and optical property of the imprinted ZnO nano-particles/resin patterns are characterized by Scanning Electron Microscope, Energy-dispersive X-ray spectroscopy and UV-vis spectrometer, respectively.

Mode conversion and scattering analysis of guided waves at delaminations in laminated composite beams

  • Soleimanpour, Reza;Ng, Ching-Tai
    • Structural Monitoring and Maintenance
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    • 제2권3호
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    • pp.213-236
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    • 2015
  • The paper presents an investigation into the mode conversion and scattering characteristics of guided waves at delaminations in laminated composite beams. A three-dimensional (3D) finite element (FE) model, which is experimentally verified using data measured by 3D scanning laser vibrometer, is used in the investigation. The study consists of two parts. The first part investigates the excitability of the fundamental anti-symmetric mode ($A_0$) of guided wave in laminated composite beams. It is found that there are some unique phenomena, which do not exist for guided waves in plate structures, make the analysis become more complicated. The phenomena are observed in numerical study using 3D FE simulations. In the second part, several delaminated composite beams are studied numerically to investigate the mode conversion and scattering characteristics of the $A_0$ guided wave at delaminations. Different sizes, locations and through-thickness locations of the delaminations are investigated in detail. The mode conversion and scattering phenomena of guided waves at the delaminations are studied by calculating reflection and transmission coefficients. The results show that the sizes, locations and through-thickness locations of the delaminations have significant effects on the scattering characteristics of guided waves at the delaminations. The results of this research would provide better understanding of guided waves propagation and scattering at the delaminations in the laminated composite beams, and improve the performance of guided wave damage detection methods.

Polarization Maintaining Dichroic Beam-splitter and Its Surface Shape Control by Back Side AR Coating

  • Ma, Chong;Chen, Gang;Liu, Dingquan;Zhang, Rongjun;He, Junbo;Zhu, Xudan;Li, Daqi
    • Current Optics and Photonics
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    • 제5권5호
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    • pp.576-582
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    • 2021
  • Dichroic beam-splitter (DBS) with polarization-maintaining took an important role in the free space quantum telecommunication tests on the Micius satellite of China. In this presentation, we designed and prepared a 50 layer polarization-maintaining DBS coating by a dual ion beam sputtering deposition (Dual-IBS) method. In order to solve a stress problem, an 18 layer special anti-reflection (AR) coating with similar physical thickness ratio was deposited on the backside. By stress compensation, the surface flatness RMS value of the DBS sample decreased from 0.341 λ (@632.8 nm) to 0.103 λ while beam splitting and polarization maintaining properties were almost kept unchanged. Further, we discussed the mechanism of film stress and stress compensation by equation deduction and found that total stress had a strong relationship with the total physical thickness and the ratio of layer materials.

마모 및 나노 압입 시험을 이용한 PUA계 레진의 내구성 비교 (Comparison of Durability for PUA Type Resin using Wear and Nano-indentation Test)

  • 최현민;권신;정윤교;조영태
    • 한국기계가공학회지
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    • 제17권5호
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    • pp.8-15
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    • 2018
  • Films with special properties (e.g., water-repellent films, optical films, anti-reflection films, and flexible films) are referred to as functional films. Recently, there has been interest in fine patterning methods for film fabrication. In particular there have been many studies that use a UV nanoimprint process involving a UV curing method. In this paper, a polymer film was fabricated by the UV nanoimprint process with a micro-pattern, and its durability was evaluated by a wear test and a nano-indentation test. The film mechanical properties (such as coefficient of friction, hardness, and modulus of elasticity) were measured. Moreover, the choice of PUA type resin used in the UV nanoimprint process was confirmed to impact the durability of the thin film. Despite making the polymer film samples using the same method and PUA type resin, different coefficient of friction, hardness, and modulus of elasticity values were obtained. PUA 4 resin had the most favorable coefficient of friction, hardness, and modulus of elasticity. This material is predicted to produce a high durability functional film.

이온빔 플라즈마 처리된 플라스틱 기판에 의한 OLED의 광추출 효율 향상 (Improvement of Out-coupling Efficiency of Organic Light Emitting Device by Ion-beam Plasma-treated Plastic Substrate)

  • 김현우;송태민;이형준;전용민;권정현
    • 반도체디스플레이기술학회지
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    • 제21권2호
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    • pp.7-10
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    • 2022
  • A functional polyethylene terephthalate substrate to increase light extraction efficiency of organic light-emitting diodes is studied. We formed nano-structured PET surfaces by controlling the power, gas, and exposure time of the linear ion-beam. The haze of the polyethylene terephthalate can be controlled from 0.2% to 76.0% by changing the peak-to-valley roughness of nano structure by adjusting the exposure cycle. The treated polyethylene terephthalate shows average haze of 76.0%, average total transmittance of 86.6%. The functional PET increases the current efficiency of organic light-emitting diodes by 47% compared to that of organic light-emitting diode on bare polyethylene terephthalate. In addition to polyethylene terephthalate with light extraction performance, by conducting additional research on the development of functional PET with anti-reflection and barrier performance, it will be possible to develop flexible substrates suitable for organic light-emitting diodes lighting and transparent flexible displays.