• Journal of Electrochemical Science and Technology
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• 제3권4호
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• pp.159-164
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• 2012

Magnesium (Mg) deposition and dissolution behaviors of 0.2 M $MgBu_2-(AlCl_2Et)_2$, 0.5 M $Mg(ClO_4)_2$, and 0.4M $(PhMgCl)_2-AlCl_3$-based electrolytes with and without tris(pentafluorophenyl) borane (TPFPB) are investigated by ex situ scanning electron microscopy (SEM) and galvanostatic cycling of Mg/copper (Cu) cells. To ascertain the factors responsible for the anodic stability of the electrolytes, linear sweep voltammogrametry (LSV) experiments for various electrolytes and solvents are conducted. The effects of TPFPB as an additive on the anodic stability of 0.4M ($(PhMgCl)_2-AlCl_3$/THF electrolyte are also discussed.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2003년도 춘계학술대회논문집
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• pp.127-130
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• 2003

Electrolytic polishing is the anodic dissolution process in the transpassive state. It removes non-metallic inclusions and improves mechanical and corrosion resistance of stainless steel. Electrolytic polishing is normally used to remove a very thin layer of material from the surface of a metal object. An electrolyte of phosphoric, sulfuric and distilled water has been used in this study. In the low current density region, there can be found plateau region and material removal process and leveling process occur successively. In this study, an electrochemical polishing process using pulse current is adopted as a new electrochemical polishing process. In electrochemical machining processes, it has been found that pulse electrochemical processes provide an attractive alternative to the electrochemical processes using continuous current. Hence, this study will discuss the electrochemical polishing processes in low current density region and pulse electrochemical polishing.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 1998년도 추계학술대회 논문집
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• pp.186-191
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• 1998

Electropolishing is the anodic dissolution process in the transpassive state. It removes non-metallic inclusions and improves mechanical and corrosion resistance of stainless steel. If there is a Bailby layer, it will be recovered again. Electropolishing is normally used to remove a very thin layer of material on the surface of a metal component. The aim of this study is to determine the tendencies of electropolishing STS316L tubes in terms of current density, machining time, temperature, electrode gap and surface roughness.

• 소성∙가공
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• 제12권4호
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• pp.388-393
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• 2003

Electrolytic polishing is the anodic dissolution process in the transpassive state. It removes non-metallic inclusions and improves mechanical and corrosion resistance of stainless steel. Electrolytic polishing is normally used to remove a very thin layer of material from the surface of a metal object. An electrolyte of phosphoric acid 50% in vol., sulfuric acid 20% in vol. and distilled water 30% in vol. has been used in this study. In the low current density region, there can be found plateau region and material removal process and leveling process occur successively. In this study, an electrochemical polishing process using pulse current is adopted as a new electrochemical polishing process. In electrochemical machining processes, it has been found that pulse electrochemical processes provide an attractive alternative to the electrochemical processes using continuous current. Hence, this study will discuss the electrochemical polishing processes in low current density region and pulse electrochemical polishing.

• Corrosion Science and Technology
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• 제6권6호
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• pp.311-315
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• 2007

The anodic polarization behavior of equiatomic TiNi shape memory alloy with pure titanium as a reference material was investigated by means of open circuit potential measurement and potentiodynamic polarization technique. And the structure of passive films on TiNi intermetallic compounds was also conducted using AES and ESCA. While the dissolved Ni(II) ion did not affect the dissolution rate and passivation of TiNi alloy, the dissolved Ti(III) ion was oxidated to Ti(IV) ion on passivated TiNi surface at passivation potential. It has also been found that the Ti(IV) ion increases the steady state potential, and passivates TiNi alloy at a limited concentration of Ti(IV) ion. The analysis by AES showed that passive film of TiNi alloy was composed of titanium oxide and nickel oxide, and the content of titanium was three times higher than that of nickel in outer side of passive film. According to the ESCA analysis, the passive film was composed of $TiO_2$ and NiO. It seems reasonable to suppose that NiO could act as unstabilizer to the oxide film and could be dissolved preferentially. Therefore, nickel oxide contained in the passive film may promote the dissolution of the film, and it could be explained the reason of higher pitting susceptibility of TiNi alloy than pure Ti.

• Journal of Electrochemical Science and Technology
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• 제5권4호
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• pp.115-127
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• 2014

Cd-Pb thin films were electrodeposited from a diluted chloride solution using stainless steel rotating disc electrode. The linear sweep voltammograms of the single metallic ions show that electrodeposition of these ions was mass transfer control due to the plateau observed for different rotations at concentration (50 and 200 ppm). The voltammograms of binary system elucidate that electrodeposition process always start at cathodic potential located between the potential of individual metals. Currents transients measurements, anodic linear sweep voltammetry (ALSV) and atomic force microscopy (AFM) were used to characterize the electrocryatalization process and morphology of thin films. ALSV profiles show a differentiation for the dissolution process of individual metals and binary system. Two peaks of dissolution Cd-Pb film were observed for the binary system with different metal ion concentration ratios. The model of Scharifker and Hills was used to analyze the current transients and it revealed that Cd-Pb electrocrystalization processes at low concentration is governed by three-dimensional progressive nucleation controlled by diffusion, while at higher concentration starts as a progressive nucleation then switch to instantaneous nucleation process. AFM images reveal that Cd-Pb film electrodeposited at low concentration is more roughness than Cd-Pb film electrodeposited at high concentrated solution.

• Journal of Advanced Marine Engineering and Technology
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• 제29권1호
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• pp.107-115
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• 2005

The effects on the formation of anodic oxide films on Mg-Al alloy (AZ91) in 1M-NaOH solution was investigated using parameters of current density and time during anodizing The general tendency has been confirmed that the increase of anodizing time improves the corrosion resistance. It is considered that the formation of anodic oxide film was increased by increasing the applied current and the anodizing time to generate active dissolution reaction In anodizing at constant current density. passivity potentials shifted to noble direction with increasing current densities. It was confirmed that oxygen quantify in anodic oxide films increased with anodizing time. The compact films above 4 $mA/cm^2$ were formed with the shape of an island in grooves at early stage and then grew with combination of the islands

• 자원리싸이클링
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• 제10권1호
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• pp.42-48
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• 2001

The dissolution behavior of gold and silver from gold-silver alloys in aerated cyanide solutions has been investigated by an electrochemical means as well as a direct measurement of gold and silver ions reported in the bulk solution as a function of time using rotating disc electrodes. The variables studied included oxygen partial pressure, rotating speed of the disc, concentration of cyanide, temperature and composition of the allyos. The dissolution potential and the rate of dissolution were obtained in view of the anodic and cathodic current-potential relationships. The results were discussed in terms of the mixed potential theory. The results showed that the dissolution rate of gold and silver from the alloys was controlled partially by chemical reaction. but largely by transport of either oxygen or cyanide, depending on their relative concentration under the experimental conditions employed in this study.

• 한국표면공학회지
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• 제17권3호
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• pp.78-86
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• 1984

Hard anodic oxide film was investigated formed on pure aluminium with various temperature (30$^{\circ}-60^{\circ}C$), current densities (1.5-3.0A/$dm^2$) and concentrations(3-15g/l) of oxalic acid in 0.5M malic acid bath. The resulting characteristic of the anodic oxide film obtained were summarized as follows in the view point of physical and mechanical properties in relation with the above process variables. 1. The film thickness increased with oxalic acid concentration and bath temperature, while the reversed phenomena were obtained at a high concentration of oxalic acid and high temperature due to the severe dissolution of the anodic oxide film. 2. The hardness and the abrasion resistance were improved by lowering the addition of oxalic acid and the bath temperature. This feature was directly dependent on the porosity formed on the anodic oxide film. 3. The maximum hardness of anodic oxide film showed Hv 579 in the temperature of 30$^{\circ}C$ with the current density, 2.5A/$dm^2$ in the 0.5M malic acid bath mixed with 5g/l oxalic acid.

• Journal of Welding and Joining
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• 제18권3호
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• pp.97-105
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• 2000

The stress corrosion cracking(SCC) and hydrogen embrittlement cracking(HEC) characteristics of a weathering steel weldment were investigated in aerated acid-chloride solution. The electrochemical properties of weldment were investigated by polarization test and galvanic corrosion test. Weathering steel did not show passive behavior in the acid-chloride solution. Galvanic corrosion between the weld metal and the base metal was not observed because the base metal was anodic to the weld metal. The slow-strain-rate tests(SSRT0 were conducted at a constant strain rate o 7.87×{TEX}$10^{-7}${/TEX}/s at corrosion potential, and at potentiostatically controlled anodic and cathodic potentials. The weldment of weathering steel was susceptible to both anodic dissolution SCC and hydrogen evolution HEC.