• 제목/요약/키워드: Ammonia plasma

검색결과 129건 처리시간 0.034초

Renal replacement therapy in neonates with an inborn error of metabolism

  • Cho, Heeyeon
    • Clinical and Experimental Pediatrics
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    • 제62권2호
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    • pp.43-47
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    • 2019
  • Hyperammonemia can be caused by several genetic inborn errors of metabolism including urea cycle defects, organic acidemias, fatty acid oxidation defects, and certain disorders of amino acid metabolism. High levels of ammonia are extremely neurotoxic, leading to astrocyte swelling, brain edema, coma, severe disability, and even death. Thus, emergency treatment for hyperammonemia must be initiated before a precise diagnosis is established. In neonates with hyperammonemia caused by an inborn error of metabolism, a few studies have suggested that peritoneal dialysis, intermittent hemodialysis, and continuous renal replacement therapy (RRT) are effective modalities for decreasing the plasma level of ammonia. In this review, we discuss the current literature related to the use of RRT for treating neonates with hyperammonemia caused by an inborn error of metabolism, including optimal prescriptions, prognosis, and outcomes. We also review the literature on new technologies and instrumentation for RRT in neonates.

청정 수소 저장을 위한 고효율, 저탄소 배출 암모니아 합성기술 동향 (Advancements in High-Efficiency Ammonia Synthesis Technology: A Key Solution for Green Hydrogen Storage in the Carbon-Neutral Era)

  • 정원준;김진태;조강희
    • 청정기술
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    • 제30권2호
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    • pp.71-93
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    • 2024
  • 최근, 무탄소 에너지원(특히, 선박 및 혼소 발전), 고효율 청정 수소 저장 및 매개체로써 암모니아가 다시 각광받고 있다. 암모니아는 화학공학에서 매우 중요한 공정 중 하나인 Haber-Bosch 공정을 통해 합성할 수 있지만, 이 공정은 에너지 소비량이 높고 탄소 배출량 역시 높아, 기존 공정을 통해 암모니아를 합성할 시 탄소 저감 효과가 미미하다. 이러한 기존 공정의 치명적인 단점을 해결하기 위해 최근, 높은 에너지 효율로 탄소 배출이 적게 암모니아를 합성할 수 있는 열화학적 합성 방법이 많이 개발되고 있다. 소재측면에서는 기존 공정보다 완화된 공정 조건에서도 충분히 높은 암모니아 합성 성능을 보일 수 있는 고성능 촉매 소재를 개발하는 연구가 진행되고 있으며, 공정측면에서는 매체 순환식(chemical-looping) 합성 방법, 플라즈마 합성방법, 기계화학적 합성 방식 등 다양하게 적용되고 있다. 이번 총설에서는 최근 청정수소 저장을 효과적으로 저장하기 위해 어떤 암모니아 합성 기술들이 개발되고 있는지 자세히 소개하고자 한다.

플라즈마 배연탈질에서 NOx 저감에 관한 반응제 특성 연구 (A Study on Reaction Characteristics for NOx Reduction in Flue Gas Denitrification using Plasma)

  • 백현창;신대현;우제경;김상국;김동찬;박영성
    • 대한환경공학회지
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    • 제22권12호
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    • pp.2247-2254
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    • 2000
  • 본 연구는 저온 플라즈마 탈질 기술의 전력소모량 절감과 처리율 향상을 모색하고자 저온 플라즈마 조건에서 NOx와 반응제의 반응 특성을 고찰하였다. 실험은 $20Nm^3/hr$의 실제 배가스와 wire-plate type 플라즈마 반응기를 이용하여 진행되었으며, 반응제로는 파라핀계와 올레핀계 탄화수소 및 $NH_3$를 사용하였다. 저온 플라즈마 조건에서 올레핀계 탄화수소는 파라핀계 탄화수소에 비하여 NO의 산화에 탁월한 효과를 보여 다량의 $NO_2$를 생성할 뿐만 아니라 미량의 CO도 생성하였다. 또한 NOx의 초기농도가 높아지면 NO의 산화율은 감소할 뿐만 아니라 올레핀계 탄화수소의 소모량도 두드러진 증가를 보였다. 한편 $NH_3$은 저온 플라즈마 조건에서 NO와의 환원반응이 촉진되지 않았지만 올레핀계 탄화수소에 의하여 산화된 $NO_2$의 제거에는 효과적인 경향을 보였다.

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플라즈마 화학반응에 의한 연소가스 중 NOx. SOx 동시제거 특성 (Simultaneous Removal Characteristics of NOx, SOx from Combustion Gases using Plasma Chemical Reaction)

  • 박재윤;고용술;이재동;손성도;박상현;고희석
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.406-409
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    • 1999
  • Experimental Investigations were carried out to remove NOx, SOx simultaneously from simulated flue gas[NO(0.02%)-SO$_2$(0.08%)-$CO_2$-Air-$N_2$] by using a plasma chemical reaction. Ammonia gas(14.81%) balanced by argon was diluted by all and was Introduced to mall simulated flue gas duct through NH$_3$ Injection system which is in downstream of reactor. The NH$_3$ molecular ratio(MR) was determined based on (NH3) to [NO+S0$_2$]. MR is 1, 1.5, 2.5. The NOx removal rate significantly increased with increasing NaOH bubble quantity. The SO$_2$ removal rate was not significantly effected by applied voltage, however it fairly Increased with increasing NH$_3$ molecule ratio. By-product aerosol particle was observed by XRD(X-ray diffraction) after sampling, The NOx, SOx removal rates, when H2O vapour bubbled by dry all was injected to plasma reactor, were better than those of other cases. When aqueous NaOH solution(20%) bubbled by 2.5( ι /min) of $N_2$ and 0.5 ( ι /min) NH$_3$(MR=1.5) were injected to simulated flue gas, The NOx. SOx removal rate was 95 ~ 100[%]

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나노펄스 코로나 방전의 온도 변화에 따른 이산화황 및 일산화질소 제거에 관한 실험적 연구 (The Experimental Study on Removal of Sulfur Dioxide and Nitrogen Oxide Using a Nano-Pulse Corona Discharger at Different Temperatures)

  • 한방우;김학준;김용진
    • 한국대기환경학회지
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    • 제27권4호
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    • pp.387-394
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    • 2011
  • A study on the removal of sulfur dioxide and nitrogen oxide was carried out using a non-thermal nano-pulse corona discharger at different gas temperatures. Pulse voltage with a high voltage of 50 kV, a pulse rising time of about 100 ns, a full width at half maximum of about 500 ns and a frequency of 1 kHz was applied to a wire-cylinder corona reactor. Ammonia and propylene gases were added into the corona reactor as additives with a static mixer. Ammonia addition had less effect on $SO_2$ reduction at the higher temperature because of the retardation of ammonium sulfate formation. However, propylene addition enhanced NO reduction at higher temperature due to increased gas mixture. $SO_2$ was further removed at the mixed $SO_2$ and NO gas due to increased $NO_2$ by the conversion of NO. The addition of ammonia and propylene gases was more highly dominant for the removal of sulfur dioxide compared to the sole pulse corona without the additives. However, the specific energy density per unit concentration of pulse corona as well as propylene additive was an important factor to remove NO gas. Therefore, the specific energy density per unit concentration of 0.04 Wh/($m^3{\cdot}ppm$) was necessary for the NO removal of more than 80% with the concentration ratio of 2.0 for propylene and NO. Hydrogen peroxide was another alternative additive to remove both $SO_2$ and NO in the nano-pulse corona discharger.

ALD 설비의 NH3(Ammonia)누출 시나리오에 대한 내부유동 및 제어 속도 해석 (Analysis of Internal Flow and Control Speed for NH3 (Ammonia) Leakage Scenario of ALD Facility)

  • 이성삼;안형환
    • 한국가스학회지
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    • 제26권5호
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    • pp.22-27
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    • 2022
  • 반도체 생산 설비 중 ALD는 열이나 플라즈마로 분해한 Gas를 Wafer에 증착시켜 원자층을 형성시키는 설비로 주로 인화성 물질인 NH3와 SIH4이 사용된다. 이중 NH3는 연소·폭발 범위가 상한(UFL) 33.6%, 하한(LEL) 15%로 폭발 범위가 비교적 좁지만 많은 양이 갑자기 한곳에 모이면 폭발할 수 있고, 피부에 닿거나 흡입하면 치명적이다. NH3는 ALD Gas inlet의 배관과 전기·기계 기구를 통해 Chamber로 공급되는데 많은 누출 가능점이 존재하여 누출 시 화재·폭발 또는 중독 사고로 이어질 수 있어 NH3 누출 시나리오에 대한 내부 유동과 제어 속도를 이해하고 고환기가 가능한 배기장치를 설계하는 것이 필요하여 본 연구자는 NH3의 누출시나리오를 CFD에 적용하여 내부유동과 제어 속도를 수치 분석하여 설계 시 반영할 수 있도록 하였다.

Effects of Concentrate to Roughage Ratio on the Formation of cis-9, trans-11 CLA and trans-11-Octadecenoic Acid in Rumen Fluid and Plasma of Sheep When Fed High Oleic or High Linoleic Acid Oils

  • Wang, J.H.;Choi, S.H.;Song, M.K.
    • Asian-Australasian Journal of Animal Sciences
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    • 제16권11호
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    • pp.1604-1609
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    • 2003
  • A metabolism trial with four ruminally fistulated sheep was conducted in a $4{\times}4$ Latin square design to examine the effect of concentrate to roughage ratio (70:30 vs. 85:15) and oil source (soybean oil vs. rapeseed oil) on the ruminal fermentation pattern and $C_{18}$-fatty acids composition including trans11-$C_{18:1}$ (trans11-ODA) and cis9, trans11-18:2 (cis9, trans11-CLA) in the rumen fluid and plasma. Oil was added to the concentrate at 5% level of the total diet (DM basis) and chopped rye grass hay was fed as roughage. An increased level of concentrate (85%) within supplemented oil slightly lowered pH but increased ammonia concentration. Supplementation of rapeseed oil relatively increased pH and ammonia concentration. Higher concentrate level resulted in increased tendencies of total VFA concentration while oil source did not affect the total VFA concentration and VFA proportion. Whole tract digestibilities of DM, CP, EE, NDF and OM in diets slightly increased at higher concentrate level. Proportions of oleic acid ($C_{18:1}$) and linoleic acid ($C_{18:2}$) in the rumen fluid were influenced by the fatty acid composition of oil source but oil source did not affect the in vitro formations of trans11-ODA and cis9, trans11-CLA. Slightly increased trans11-ODA and cis9, trans11-CLA proportions, however, were observed from the sheep fed high roughage diet supplemented with both soybean oil and rapeseed oil. The $C_{18:1}$ and $C_{18:2}$ composition in supplemented oils responded to those in plasma of sheep. Effects of concentrate to roughage ratio and oil source on trans11-ODA and cis9, trans11-CLA proportions in plasma were found to be small. Proportion of cis9, trans11-CLA in plasma tended to be increased from the sheep fed high roughage diet and collection time at 9h post feeding.

The Concept of Artificial Liver Support by Using the Extracorporeal Circulation System

  • Cheon, Min-Woo
    • Transactions on Electrical and Electronic Materials
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    • 제16권1호
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    • pp.25-28
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    • 2015
  • In this study, a basic research on artificial liver was performed for its application to people on the waiting list of liver transplant or patients with hepatic insufficiency. Artificial livers are generally classified into mechanic type, bioartificial type, and hybrid type. An extracorporeal circulation device was examined herein, which is indispensable in the application of an artificial liver, for its effectiveness in supporting the recovery of liver functions. Extracorporeal circulation system is a treatment and life-support system which sends out the patient's blood, removes toxicity by various methods, and then sends the blood back to the interior of the body. This study used an extracorporeal circulation system which enables the Plasma Perfusion by CVVH method, and applied the program of Bioateco corp. Animals with acute hepatic insufficiency were produced to apply the extracorporeal circulation device. As a result, their ammonia, bilirubin, SGOT, SGPT, and bile acid levels rose, confirming the liver function restoration in the experimental animals.

조성변화에 따른 PECVD SiON 박막의 물성특성 (Physical Characteristics of PECVD SiON Films with Composition Variation)

  • 조유정;한길진;김영철;서화일
    • 반도체디스플레이기술학회지
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    • 제4권3호
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    • pp.1-4
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    • 2005
  • Silicon oxynitride films were deposited using ammonia as a nitrogen source via PECVD (plasma enhanced chemical vapor deposition) to study the physical properties of the films. Silane and nitrous oxide were used as silicon and oxygen sources, respectively. The composition of the silicon oxynitride films was well controlled by changing the ratios of the sources and confirmed by XPS. The silicon oxynitride films with high oxygen content showed bigger compressive stress and less refractive index, while the values of surface roughness were around 1 nm, irrespective of the variation of the source ratios.

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Low-temperature synthesis of nc-Si/a-SiNx: H quantum dot thin films using RF/UHF high density PECVD plasmas

  • Yin, Yongyi;Sahu, B.B.;Lee, J.S.;Kim, H.R.;Han, Jeon G.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.341-341
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    • 2016
  • The discovery of light emission in nanostructured silicon has opened up new avenues of research in nano-silicon based devices. One such pathway is the application of silicon quantum dots in advanced photovoltaic and light emitting devices. Recently, there is increasing interest on the silicon quantum dots (c-Si QDs) films embedded in amorphous hydrogenated silicon-nitride dielectric matrix (a-SiNx: H), which are familiar as c-Si/a-SiNx:H QDs thin films. However, due to the limitation of the requirement of a very high deposition temperature along with post annealing and a low growth rate, extensive research are being undertaken to elevate these issues, for the point of view of applications, using plasma assisted deposition methods by using different plasma concepts. This work addresses about rapid growth and single step development of c-Si/a-SiNx:H QDs thin films deposited by RF (13.56 MHz) and ultra-high frequency (UHF ~ 320 MHz) low-pressure plasma processing of a mixture of silane (SiH4) and ammonia (NH3) gases diluted in hydrogen (H2) at a low growth temperature ($230^{\circ}C$). In the films the c-Si QDs of varying size, with an overall crystallinity of 60-80 %, are embedded in an a-SiNx: H matrix. The important result includes the formation of the tunable QD size of ~ 5-20 nm, having a thermodynamically favorable <220> crystallographic orientation, along with distinct signatures of the growth of ${\alpha}$-Si3N4 and ${\beta}$-Si3N4 components. Also, the roles of different plasma characteristics on the film properties are investigated using various plasma diagnostics and film analysis tools.

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