• 한국응용과학기술학회지
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• 제22권3호
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• pp.204-211
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• 2005

The structure of nitrogen adsorption complex of fully dehydrated $Cd^{2+}$ ion exchanged zeolite-X, $|Cd_{46}(N)_{18}|[Si_{100}Al_{92}O_{384}]$, was determined in the cubic space group $Fd\overline{3}$ at 21(1) $^{\circ}C$ [a = 24.863(4) ] by single crystal X-ray diffraction analysis. The crystal was prepared by ion exchange in a flowing steam of 0.05 M aqueous solution $Cd(NO_3)_2$ : $Cd(O_2CCH_3)_2$ = 1:1 for five days, followed by dehydration at $500^{\circ}C$ and $2{\times}10^{-6}$ Tor. for two days, and exposured to 100 Tor. zeolitically dry nitrogen gas at 21(1) $^{\circ}C$. The structure was determined in atmosphere, and was refined within $F_0$ > $4{\sigma}(F_0)$ using reflection for which the final error can appear in indices $R_1$ = 0.097 and $wR_2$ = 0.150. In this structure, $Cd^{2+}$ ions occupied four crystallographic sites. Nine $Cd^{2+}$ ions filled the octahedral site I at the centers of hexagonal prisms (Cd-O = 2.452(16) ${\AA}$). Eight $Cd^{2+}$ ions filled site I' (Cd-O = 2.324(19) ${\AA}$). The remaining 29 $Cd^{2+}$ ions are found at two nonequivalent sites II (in the supercages) with occupancy of 11 and 18 ions. Each of these $Cd^{2+}$ ions coordinated to three framework oxygens, either at 2.159(15) or 2.147(14) ${\AA}$, respectively. Eighteen nitrogen molecules were adsorbed per unit cell and three per supercage.

• 한국결정성장학회지
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• 제24권1호
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• pp.1-7
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• 2014

질화알루미늄(AlN)은 뛰어난 열적, 전기절연성 특성을 갖고 있어 반도체 기판용 재료나 전자 패키징 재료로 주목받고 있다. 질화알루미늄은 소결온도가 높고 불순물로 인한 물성저하 때문에 고순도화 및 나노원료화가 필수적이다. 본 연구에서는 RF 유도결합 열플라즈마를 이용하여 알루미늄 분말로부터 고순도의 질화알루미늄 나노분말을 합성하였다. Sheath gas로 사용된 암모니아의 유량 제어를 통해 고순도의 질화알루미늄 나노분말이 합성되는 조건을 확립하고자 하였으며 합성된 분말은 XRD, SEM, TEM, BET, FTIR, N-O분석을 통해 특성분석을 진행하였다.

• 한국재료학회지
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• 제14권7호
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• pp.494-499
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• 2004

The structural, electrical and optical properties of GaN epilayers grown on various ion-implanted sapphire(0001) substrates by MOCVD were investigated. Sapphire substrates have been widely adopted to grow high quality GaN epilayer despite the large differences of lattice constant and thermal expansion coefficient between them. So, GaN or AlN buffer layer and pre-treatment was indispensably introduced before the GaN epilayer growth. The ion-implanted substrate's surface had decreased internal free energies during the growth of the ions implanted sapphire(0001) substrates. The crystal and optical properties of GaN epilayers grown in ions implanted sapphire(0001) substrate were improved. Also, excessively roughened and modified surface by ions degraded the GaN epilyers. Not only the ionic radius but also the chemical species of implanted sapphire(0001) substrates could improve the properties of GaN epilayers grown by MOCVD. This result implies that higher quality of GaN epilayers was achieved by using ion-implanted sapphire(0001) substrate with various ions.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.99-99
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• 2008

대구경, 고품질 GaN 단결정 기판은 HVPE 방법을 이용하여 제조하였다. 이때 성장 방법은 기판인 $Al_2O_3$ 단결정 기판을 질화처리 하였으며, 이종기판 성장 시 야기되는 격자 불일치와 성장 후 냉각동안에 열팽창 계수의 불일치로 야기되는 휨이나 crack 발생을 제거하기 위하여 step-growth 방법을 사용하였다. 사파이어 위에 성장된 GaN의 기판은 두께가 380um이며, 직경은 3"로 crack 발생은 없었으며, $600^{\circ}C$에서 레이저 분리 방법을 이용하여 사파이어와 분리하였다. 그러나 분리된 기판은 이종기판과의 접촉면에서 고밀도 결함발생으로 인하여 휨이 발생하였으며, 표면을 연마한 후 DCXRD의 FWHM은 107 arcsec, PL을 이용한 결함밀도는 $6.2\times10^6/cm^2$으로 나타났다.

• 한국세라믹학회지
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• 제30권8호
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• pp.615-622
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• 1993

In order to increase chemical durability of thin films in binary system B2O3-SiO2 and Al2O3-SiO2 on the slide glass by the dip-coating technique from TEOS(Tetraethyl Orthosilicate) and boric acid or aluminum nitrate, phosphoric acid(5~20mol%) was added, respectively. Corrosion of acid and alkali of samples treated with 1N, HCl, NaOH and distilled water at 10$0^{\circ}C$ for 15 minute, were measured IR transmittance and variance of transmittance at visible range. Surface structure of thin film was investigated with SEM and formation of crystal phase according to additiion of phosphoric acid was measrued with XRD. In Al2O3-SiO2 system, change of remarkable characteristic was not obtained at the addition of P2O5 but transmittance of thin film was decreased with addition of P2O5 in B2O3-SiO2 system.

• 한국결정성장학회지
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• 제4권2호
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• pp.119-130
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• 1994

저팽창 보로실리케이트 유리기판상에 직접 결정질실리콘 박막을 성장시켜 주는 것이 고순도 금속을 사용한 용액성장법으로는 어려운 관계로 18가지 다른 코팅을 유리기판상에 입혀 실험한 결과 알루미늄과 마그네슘 처리한 기판과 스퍼터링 방법으로 유리기판상에 실리콘 박막을 열처리해준 후 용액성장시켜준 기판의 경우에 양호한 결과가 나왔다. 성장온도 $420^{\circ}C~520^{\circ}C$ 범위에서 성장시킨 이박막은 태양전지와 태양전지의 모듈가격을 낮추는데 응용될 것으로 사료된다.

• 한국세라믹학회지
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• 제44권6호
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• pp.325-330
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• 2007

High porous AlO(OH) gel is used in precursor of ceramic material, coating material and porous catalyst. For use of these, not only physiochemical control for particle morphology, pore characteristic and peptization but also studies of synthetic method for preparation of high porous AlO(OH) gel were required. In this study, high porous AlO(OH) gel was prepared through the aging and filtration process of aluminum hydroxides gel precipitated by the hydrolysis reaction of $Na_2CO_3$ solution and $Al_2(SO_4)_3$ and $Na_2SO_4$ mixed solution. In this process, optimum synthetic condition of AlO(OH) gel having excellent pore volume as studying the effect of hydrolysis pH on gel precipitates has been studied. Hydrolysis pH brought about numerous changes on crystal morphology, surface area, pore volume and pore size. Physiochemical properties of gel were investigated as using XRD, TEM, TG/DTA, FT-IR and $N_2$ BET method.

• 한국정밀공학회지
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• 제14권2호
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• pp.113-119
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• 1997

This research intents to gain the sight for the qualitative characteristics of precision cutting by using the CNC lathe with a mono-crystal diamond(MCD) tool having a straight cutting edge. As an absolute value of tool setting angle becomes smaller, the surface roughness has improved. We knew that according to each of the machine tools and cutting edge radius, there exist a proper mininum feed and depth of engagement for improving the surface roughness. This results suggest that the proper values of feed and depth of engagement are about 11-15 .mu. m/rev, 10 .mu. m, respectively.

• Applied Microscopy
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• 제36권3호
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• pp.155-163
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• 2006

합성 사파이어 기판 시료-GaN반도체의 성장기판으로 사용된-의 내재하는 결함 형태를 전통적인 투과식 전자현미경 조사기법 (TEM), LACBED, HAADF-STEM 방법으로 관찰 분석하였다. 이 시료에서 주로 발견된 결함들은 두께 ${\sim}2nm$에서 32nm를 가진(0001)면 미소 쌍정(basal microtwins), 모체 결정과의 계면 주위의 변형 결함, (0001)면 전위결함(basal dislocations), 그리고 {$2\bar{1}\bar{1}3$} 피라미드 미끄럼면 중 한 면에서 일어나는 복잡한 형태의 전위 결함들이다 이들(0001)면 및 {$2\bar{1}\bar{1}3$}면에 전위 결함들은 미소 쌍정과 강하게 관련되어 일어나는 것으로 보인다. 또한 전위결함 밀도는 매우 균일하지 않으며 수 ${\mu}m$의 크기의 결함 밀집 영역에서는 그 밀도가 ${\sim}10^{10}/cm^2정도만큼 높지만 시료 전체에서의 평균은 대체적으로 ${\sim}10^5/cm^2보다 작다. 이 값은 보통 합성되는 결정에서 평균적으로 예상되는 수치이다.

• Journal of Periodontal and Implant Science
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• 제30권1호
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• pp.187-203
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• 2000

The precipitation of calcium phosphate on implant surface has been known to accelerate osseointegration and to enhance osseous adaptation. The present study was performed to examine whether the precipitation of calcium phosphate on Ti-6Al-4V alloy could be affected by the immersion in NaOH solution and heat treatment. Ti-6Al-4V alloy plates of $15{\times}3.5{\times}1mm$ in dimension were polished sequentially from #240 to #2,000 emery paper and one surface of each specimen was additionally polished with $0.1{\mu}m$ alumina paste. Polished specimens were soaked in various concentrations of NaOH solution(0.1, 1.0, 3.0, 5.0, 7.0, 10.0 M) at $60^{\circ}C$ for 24 hours for alkali treatment, and 5.0 M NaOH treated specimens were heated for 1 hour at each temperature of 400, 500, 600, 700, $800^{\circ}C$. After the alkali and heat treatments, specimens were soaked in the Hank's solution with pH 7.4 at $36.5^{\circ}C$ for 30days.The surface ingredient change of Ti-6Al-4V alloy was evaluated by thin-film X-ray diffractometer(TF-XRD) and the surface microstructure was observed by scanning electron microscope(SEM), and the elements of surface were analyzed by X-ray photoelectron spectroscopy(XPS). The results were obtained as follows ; 1. The precipitation of calcium phosphate on Ti-6Al-4V alloy was accelerated by the immersion in NaOH solution and heat treatment. 2. In Alkali treatment for the precipitation of calcium phosphate on Ti-6Al-4V alloy, the optimal concentration of NaOH solution was 5.0 M. 3. In heat treatment after alkali treatment in 5.0 M NaOH solution, the crystal formation on alloy surface was enhanced by increasing temperature. In heat treated alloys at $600^{\circ}C$, latticed structure and prominences of calcium phosphate layer were most dense. On heat treated alloy surface at the higher temperature(${\geq}700^{\circ}C$), main crystal form was titanium oxide rather than apatite. The above results suggested that the precipitation of calcium phosphate on the surface of Ti-6Al-4V alloy could be induced by alkali treatment in 5.0 M-NaOH solution and by heat treatment at $600^{\circ}C$.