• 제목/요약/키워드: Al2O3 박막

검색결과 632건 처리시간 0.023초

YSZ 박막의 성장속도와 특성에 미치는 전기화학증착의 조건의 영향(II) (Influences of Electrochemical Vapor Deposition Conditions on Growth Rate ad Characteristics of YSZ Thin films(II))

  • 박동원;전치훈;김대룡
    • 한국세라믹학회지
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    • 제33권3호
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    • pp.355-361
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    • 1996
  • Yttria stabilized zirconia (YSZ) thin films were prepared by the electrochemical vapor deposition (EVD) method on the porous Al2O3 substrates. Y2O3 mol% of thin film was linearly increased with yttrium mole fraction of vapor phase. As yttrium mole fraction(Zyc13=0.18) increased dense and faceted thin films were enhanced. However as the yttrium mole fraction (Zyc13=0.04) decreased porous thin films with monoclinnic phase prevailed. With increasing pressure difference of substrate sides penetration depth decreased porosity and amount of monoclinic phase in the films increased.

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F 농도 조절을 통한 AZO 박막의 광학적 전기적 특성 향상 (Improvement of Optical and Electrical Properties of AZO Thin Films by Controlling Fluorine Concentration)

  • 장수영;장준성;조은애;;김지훈;문종하;김진혁
    • 한국재료학회지
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    • 제31권3호
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    • pp.150-155
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    • 2021
  • Zinc oxide (ZnO) based transparent conducting oxides (TCO) thin films, are used in many applications such as solar cells, flat panel displays, and LEDs due to their wide bandgap nature and excellent electrical properties. In the present work, fluorine and aluminium-doped ZnO targets are prepared and thin films are deposited on soda-lime glass substrate using a RF magnetron sputtering unit. The aluminium concentration is fixed at 2 wt%, and the fluorine concentration is adjusted between 0 to 2.0 wt% with five different concentrations, namely, Al2ZnO98(AZO), F0.5AZO97.5(FAZO1), F1AZO97(FAZO2), F1.5AZO96.5(FAZO3), and F2AZO96(FAZO4). Thin films are deposited with an RF power of 40 W and working pressure of 5 m Torr at 270 ℃. The morphological analysis performed for the thin film reveals that surface roughness decreases in FAZO1 and FAZO2 samples when doped with a small amount of fluorine. Further, optical and electrical properties measured for FAZO1 sample show average optical transmissions of over 89 % in the visible region and 82.5 % in the infrared region, followed by low resistivity and sheet resistance of 3.59 × 10-4 Ωcm and 5.52 Ω/sq, respectively. In future, these thin films with excellent optoelectronic properties can be used for thin-film solar cell and other optoelectronics applications.

펄스 레이저 증착(PLD)법에 의한 ZnO 박막 성장과 열처리 효과 (Growth and Effect of Thermal Annealing for ZnO Thin Film by Pulsed Laser Deposition)

  • 홍광준
    • 한국전기전자재료학회논문지
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    • 제17권5호
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    • pp.467-475
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    • 2004
  • ZnO epilayer were synthesized by the pulsed laser deposition(PLD) process on $Al_2$ $O_3$substrate after irradiating the surface of the ZnO sintered pellet by the ArF(193 nm) excimer laser. The epilayers of ZnO were achieved on sapphire(A $l_2$ $O_3$) substrate at a temperature of 400 $^{\circ}C$. The crystalline structure of epilayer was investigated by the photoluminescence and double crystal X-ray diffraction(DCXD). The carrier density and mobility of ZnO epilayer measured with Hall effect by van der Pauw method are 8.27${\times}$$10^{16}$$cm^{-3}$ and 299 $\textrm{cm}^2$/Vㆍs at 293 K, respectively. The temperature dependence of the energy band gap of the ZnO obtained from the absorption spectra was well described by the Varshni's relation, $E_{g}$(T)= 3.3973 eV - (2.69 ${\times}$ 10$_{-4}$ eV/K) $T^2$(T+463k). After the as-grown ZnO epilayer was annealed in Zn atmospheres, oxygen and vaccum the origin of point defects of ZnO atmospheres has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{Zn}$ , $V_{o}$ , Z $n_{int}$, and $O_{int}$ obtained by PL measurements were classified as a donors or accepters type. In addition, we concluded that the heat-treatment in the oxygen atmosphere converted ZnO thin films to an optical p-type. Also, we confirmed that vacuum in ZnO/A $l_2$ $O_3$did not form the native defects because vacuum in ZnO thin films existed in the form of stable bonds.s.s.s.

High-k 유전박막 MIS 커패시터의 플라즈마 etching damage에 대한 연구 (Plasma Etching Damage of High-k Dielectric Layer of MIS Capacitor)

  • 양승국;송호영;오범환;이승걸;이일항;박새근
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2003년도 하계종합학술대회 논문집 II
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    • pp.1045-1048
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    • 2003
  • In this paper, we studied plasma damage of MIS capacitor with $Al_2$O$_3$ dielectric film. Using capacitor pattern with the same area but different perimeters, we tried to separate etching damage mechanism and to optimize the dry etching process. After etching both metal and dielectric layer by the same condition, leakage current and C-V measurements were carried out for Pt/A1$_2$O$_3$/Si structures. The flatband voltage shift was appeared in the C-V plot, and it was caused by the variation of the fixed interface charge and the interface trapped charge. From I-V measurement, it was found the leakage current along the periphery could not be ignored. Finally, we established the process condition of RF power 300W, 100mTorr, Ar/Cl$_2$ gas 60sccm as an optimal etching condition.

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진공 원자층 증착법을 적용한 염료감응형 태양전지의 효율 향상 연구

  • 신진호;강상우;김진태;고문규;황택성;윤주영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.175-175
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    • 2011
  • 최근 석유 자원의 고갈로 인하여 요구되는 대체 에너지 개발의 필요성이 대두되고 있다. 그중 태양에너지는 지구의 생명체가 살아가는 에너지의 근원으로서 매초 800~1,000 W에 달하는 에너지양으로 볼 때 태양은 인류가 가장 풍부하게 활용할 수 있는 에너지원이다. 태양에너지를 이용한 염료감응형 태양전지(Dye-Sensitized Solar Cells, DSSCs)는 제조원가를 낮출 수 있고, 유리 전극을 이용한 투명한 태양전지를 제조할 수 있어 건물의 유리창등으로 응용할 수 있는 장점이있다. 이러한 광변환 효율을 증가시키기 위한 방법으로 전기방사 TiO2 Nanofiber를 기계적으로 갈아서 제조한 TiO2 Nanorod 와 TiO2 Nanoparticle를 섞어서 만든 paste를 이용하여 넓은 표면적과 빠른 전자수송도를 갖게 하였고, 흡착된 염료에서 발생되는 광전자가 전해질의 산화, 환원되는 요오드 이온(I-/I3-)과의 재결합(recombination)현상을 TiO2 전극 위에 높은 밴드갭(band-gap)을 가지는 Al2O3 박막을 TriMethylAluminium (TMA) 전구체를 이용한 원자층 증착(Atomic Layer Deposition, ALD) 공정을 사용하여 진공증착 통해 광전변환효율이 떨어지는 현상을 방지하여 효율을 높였다.

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$BaTiO_3/SrTiO_3$ 이종층 박막/후막의 유전특성 ($BaTiO_3/SrTiO_3$ Heterolayered Thin/Thick films Dielectric Properties)

  • 한상욱;김지헌;박인길;이성갑;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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    • pp.1850-1852
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    • 2005
  • $SrTiO_3$ and $BaTiO_3$ sol-liquids and powders were prepared by the sol-gel method. $SrTiO_3/BaTiO_3$ heterolayered thin/thick films have been prepared on the $Al_2O_3$ substrates by screen printing and spin-coating method. The thin films were sintered at $750^{\circ}C$ in the air for 1 hour and the thick films sintered at $1325^{\circ}C$ in the air for 2 hours, respectively. The $SrTiO_3/BaTiO_3$ thin/thick films's structural and dielectric properties were investigated. Increasing the spin-coating times, (110), (200), (211) peaks of the $SrTiO_3$ were increased. The X-ray diffraction(XRD) patterns and SEM photographs indicated that the $SrTiO_3$ phase were formed in the surface of $BaTiO_3$ thick films. The average thickness of a $BaTiO_3$ thick films and $SrTiO_3$ thin films were $50{\mu}m$ and 400nm, respectively The dielectric constant and dielectric loss of the $SrTiO_3/BaTiO_3$ thin/thick films with $SrTiO_3$ coated 5 times were 1598 and 0.0436 at 10KHz.

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상부전극에 따른 SCT 세라믹 박막의 전기적 특성 (Electrical Properties of SCT Ceramic Thin Film with Top Electrode)

  • 조춘남;김진사;신철기;최운식;김충혁;박용필;유영각;이준응
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 D
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    • pp.1501-1503
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    • 1999
  • The $(Sr_{0.85}Ca_{0.15})TiO_3$(SCT) thin films are deposited on Pt-coated electrode$(Pt/TiO_2/SiO_2/Si)$ using RF sputtering method. Ag, Cu, Al, Pt films for the formation of top eletrode were doposited on SCT thin films by thermal evaporator and sputtering. The effects of top electodes have be studied on SCT samples with a variety of top electrode materials.

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Pt/Ti 발열체가 내장된 TMA 가스 측정용 ZnO 박막 가스 센서 (ZnO thin film Gas sensors for detection of TMA gas with Pt/Ti thin film heater)

  • 류지열;박성현;최혁환;권태하
    • 전자공학회논문지A
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    • 제33A권6호
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    • pp.127-135
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    • 1996
  • To increase the sensitivity and the selectivity of the sensors to TMA gas, the composition ratio and the growth conditions of the ZnO films are studied. Annealing of the ZnO films in the various time ranges and temperatures in the oxygen is carried out to enhance the stbility of the electrical resistance. Pt/Ti heater deposited on backside of the substrates in used to control the operating temperature of th esensor. The ZnO thin film sensors doped to 4.0 wt% $Al_{2}$O$_{3}$ 1.0wt.% TiO$_{2}$ and 0.2wt.% V$_{2}$O$_{5}$ exhibited a high sensitivity and an excellent selectivity for TMA gas. The sensors made with the thin films annealed at 700$^{\circ}$C for 60 minutes in the oxygen atmosphere had a good stability and linearity. The heater deposited in the ratio of 1 to 1 (Pt:Ti) had a good heating properties. The sensors fabricated using above conditions showed a good response to the actual gases of a mackerel at a step of deterioration after death.

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화학적으로 변형된 전구용액을 이용한 YBCO 박막 제조 (Fabrication of YBCO films in MOD processing via chemically modified precursor solution)

  • 김영국;유재무;정국채;고재웅;김영준;한봉수
    • Progress in Superconductivity
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    • 제7권2호
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    • pp.158-161
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    • 2006
  • Superconducting YBCO films were successfully fabricated by MOD process using chemically modified precursor solution. In this study, a chemically modified precursor solution for MOD processing was synthesized using metal-organic salts and organic additives. It was shown that crack-free and uniform precursor films were formed after calcination in humidified Oxygen atmosphere. Less than 3 hours are required to finish the calcination process. XRD measurement shows that $BaF_2,\;CuO,\;Y_2O_3$ are major constituent of precursor films. Furthermore, YBCO films without any secondary phases were successfully fabricated after annealing in wet $Ar/O_2$ atmosphere. The YBCO film prepared on a $LaAlO_3$ single crystal substrate ($10mm{\times}10mm$) gives transport $I_c$ of 10A at 77K. This chemical modification approach is a possible candidate for improving MOD-processing of YBCO coated conductor.

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정전분무 장치를 이용한 C축 일방향 바륨페라이트(BaFe12O19) 박막형성 (Preparation of C-plane oriented BaFe12O19 film by electrospray deposition of colloidal precursor particles)

  • 이혜문;김용진
    • 한국입자에어로졸학회지
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    • 제6권1호
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    • pp.21-27
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    • 2010
  • New process consisting of electrospray and epitaxial crystal growth processes was applied to the preparation of c-plane oriented barium ferrite ($BaFe_{12}O_{19}$) thin film for high density magnetic recording media. Sodium citrate aided process was proper to preparation of amorphous $BaFe_{12}O_{19}$ nanoparticles with geometric mean diameter of 3 nm and geometric standard deviation of 1.1. The electrospray was applicable to the prepare of amorphous $BaFe_{12}O_{19}$ thin film on a substrate, and the film thickness could be controlled by adjusting the electrospray deposition time. The c-plane oriented $BaFe_{12}O_{19}$ thin film was successfully prepared by 3 step annealing process of the $BaFe_{12}O_{19}$ amorphous film on a sapphire($Al_2O_3$) substrate; annealing at $350^{\circ}C$ for 30 min, annealing at $500^{\circ}C$ for 30 min, and annealing at $700^{\circ}C$ for 60 min.