• Clean Technology
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• v.13 no.2
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• pp.109-114
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• 2007

In this study, we performed basic researches to develop wet purification system for improving air qualities of ventilation in semiconductor manufacturing process. Using 0.5 M aqueous solution of $KMnO_4$, 50 ppm of $NH_3$, SOx and NOx were reduced to 99% successfully. However, the removal of $O_3$ was limited to $22{\sim}30%$ for all the tested chemical solutionsincluding $KMnO_4$. Therefore, adoption of a dry ozone filter is necessary to reduce $O_3$ below a satisfactory level. For all the chemical solutions tested, NOx removal efficiency increased as NOx was mixed with $O_3$. As chemical solution was sprayed using water spraying system equipped with air atomizing type nozzle, the removal efficiencies of gaseous pollutants increased due to the increase of gas-liquid interfacial area.