The characteristic study according to the oxygen content of the A-IGZO thin film prepared by RF Magnetron Sputtering method (RF magnetron sputtering법으로 증착된 a-IGZO 박막의 산소함량에 대한 특성연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2010.06a
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- pp.386-386
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- 2010