• 제목/요약/키워드: Acidic ionized water

검색결과 6건 처리시간 0.019초

산성수 도포가 면포에 미치는 임상적 연구 (The Clinical Study on the Effect of Spread Acidic Ionized Water on Acnes Disease)

  • 서형식;홍석훈
    • 한방안이비인후피부과학회지
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    • 제16권1호
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    • pp.154-158
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    • 2003
  • Objectives : The purpose of this study was to search liquid that mixing with powder drug on acnes disease. Conclusions : Out of acne patients who visited Oriental Medicine Hospital of Han-Seo University during December 2002 - February 2003, four female and five male were treated over four weeks. The average age were 21.44 years old. Before treatment, acne patients were sparsely with papules at the forehead, cheeks, lower jaw. After treatment during four weeks, seven acne patients change for the better, 77.8$\%$(mild improved 55.5$\%$, improved 11.1$\%$, much improved 11.1$\%$)

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이온수기 필터(pH)의 안정화 성능평가 (Stabilization Performance Evaluation of Filter(pH) Using Ionic Water Generator)

  • 남상엽;권윤중
    • 전자공학회논문지
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    • 제52권3호
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    • pp.199-205
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    • 2015
  • 본 연구는 이온수기의 필터에 관련된 것으로 요즘 건강에 많은 관심을 가지고 있는 물은 그 종류도 매우 다양하다. 그 중에서 이온 수기는 의료기기로 분류되어 식약청에서 승인을 거친 후 제조할 수 있고, 기능을 가지고 있는 물을 만드는 시스템이다. 이온 수기는 기본적으로 저장되고 포장된 물이 아니며 이온 수기는 수도나 지하수에 직접 연결되어 여러 가지 필터를 통해 깨끗하게 정수된 pH7~7.5의 중성수를 격막을 이용하여 전기 분해하면 물속에 있는 음이온과 양이온을 격막을 통해서 -전극 쪽에는 칼슘($Ca^+$), 칼륨($K^+$), 마그네슘($Mg^+$), 나트륨($Na^+$)을 포함한 물로 인체에 유익한 미네랄이 포함된 알칼리이온수를 얻을 수 있다. 일반적으로 이온수기에서 전기분해의 전압의 크기를 조절하여 Ph농도를 5~9까지 변화를 주어 사용한다. 통상1단(pH8), 2단(pH8.5), 3단(pH9), 4단(pH9.5)으로 알칼리 이온 수에 사용되고 -1단(pH6.0), -2단(pH5.0)의 산성이온수로 사용하고 있다. 그런데 초기 필터의 상태를 확인해 보면 직수에서 필터를 통과한 정수상태에서 물은 약알칼리로 출수된다는 것이 큰 문제이다. 따라서 초기에 설정된 이온수의 pH값은 필터가 안정화된 후 값은 전혀 틀린 값이 나온다는 것을 확인하였다. 즉 초기에 설정된 이온수기의 pH 값은 사용 중 크게 변화하여 참값이 될 수 없음을 규명하였다. 이 문제를 해결하기 위해서는 필터를 일정시간 통수 세척을 해서 사용하거나 필터의 초기 산성화 처리를 해서 중성화하여야 할 것으로 판단된다.

환원/확산 공정에 의한 고성능 Nd-Fe-B 자성분말의 제조 (Preparation of Highly Efficient Nd-Fe-B Magnetic Powders by Reduction/Diffusion Process)

  • 김동수;진춘강;백연경;최철진
    • 한국분말재료학회지
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    • 제20권3호
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    • pp.197-202
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    • 2013
  • A novel route to prepare Nd-Fe-B magnetic particles by utilizing both spray drying and reduction/diffusion processes was investigated in this study. Precursors were prepared by spray drying method using the aqueous solutions containing Nd salt, Fe salt and boric acid with stoichiometric ratios. Precursor particles could be obtained with various sizes from 2 to $10{\mu}m$ by controlling concentrations of the solutions and the average size of $2{\mu}m$ of precursors were selected for further steps. After heat treatment of precursors in air, Nd and Fe oxides were formed through desalting procedure, followed by reduction processes in Hydrogen ($H_2$) atmosphere and with Calcium (Ca) granules in Argon (Ar) successively. Moreover, diffusion between Nd and Fe occurred during Ca reduction and $Nd_2Fe_{14}B$ particles were formed. With Ca amount added to particles after $H_2$ reduction, intrinsic coercivity was changed from 1 to 10 kOe. In order to remove and leach CaO and residual Ca, de-ionized water and dilute acid were used. Acidic solutions were more effective to eliminate impurities, but Fe and Nd were dissolved out from the particles. Finally, $Nd_2Fe_{14}B$ magnetic particles were synthesized after washing in de-ionized water with a mean size of $2{\mu}m$ and their maximum energy product showed 9.23 MGOe.

Multicrystalline Silicon Texturing for Large Area CommercialSolar Cell of Low Cost and High Efficiency

  • Dhungel, S.K.;Karunagaran, B.;Kim, Kyung-Hae;Yoo, Jin-Su;SunWoo, H.;Manna, U.;Gangopadhyay, U.;Basu, P.K.;Mangalaraj, D;Yi, J.
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.280-284
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    • 2004
  • Multicrystalline silicon wafers were textured in an alkaline bath, basically using sodium hydroxide and in acidic bath, using mainly hydrofluoric acid (HF), nitric acid $(HNO_3)$ and de-ionized water (DIW). Some wafers were also acid polished for the comparative study. Comparison of average reflectance of the samples treated with the new recipe of acidic solution showed average diffuse reflectance less than even 5 percent in the optimized condition. Solar cells were thus fabricated with the samples following the main steps such as phosphorus doping for emitter layer formation, silicon nitride deposition for anti-reflection coating by plasma enhanced chemical vapor deposition (PECVD) and front surface passivation, screen printing metallization, co-firing in rapid thermal processing (RTP) Furnace and laser edge isolation and confirmed >14 % conversion efficiency from the best textured samples. This isotropic texturing approach can be instrumental to achieve high efficiency in mass production using relatively low cost silicon wafers as starting material.

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여드름의 한의학적 치료에 관한 고찰;국내 논문, 외용약을 중심으로 (The study on external treatment of oriental medical care on acne)

  • 김민애;김미보;신상호;변석미;고우신;이호섭;박선규;윤화정
    • 한방안이비인후피부과학회지
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    • 제21권2호
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    • pp.102-111
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    • 2008
  • Background : The purpose of this study is to make the oriental medicine treatment useful and develop the way of acne cure. Object&Metbod : This study is based on analysis of Recent paper about Oriental medicine of acne, mainly for the external treatment. Results: We analyzed recent treatis about acne cure with external treatment in clinical and analytic study. For the first, there are various clinical approaches with: single use of external treatment, external treatment and herb medicine methods and acidic ionized water. The others are about practical applications on the external treatment, and traditional chinese medical approaches. Conclusion: To develop the better medical care on acne, development and verifications of various treatment methods are necessary on the basis of the merits of oriental treatment.

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등방성 에칭용액을 이용한 다결정 실리콘의 표면조직화 (Texturing of Multi-crystalline Silicon Using Isotropic Etching Solution)

  • 음정현;최관영;남산;최균
    • 한국세라믹학회지
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    • 제46권6호
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    • pp.685-688
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    • 2009
  • Surface Texturing is very important process for high cell efficiency in crystalline silicon solar cell. Anisotropic texturing with an alkali etchant was known not to be able to produce uniform surface morphology in multi-crystalline silicon (mc-Si), because of its different etching rate with random crystal orientation. In order to reduce surface reflectance of mc-Si wafer, the general etching tendency was studied with HF/HN$O_3$/De-ionized Water acidic solution. And the surface structures of textured mc-Si in various HF/HN$O_3$ ratios were compared. The surface morphology and reflectance of textured silicon wafers were measured by FE-SEM and UVvisible spectrophotometer, respectively. We obtained average reflectance of $16{\sim}19$% for wavelength between 400 nm and 900 nm depending on different etching conditions.