• 한국분말재료학회지
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• 제22권1호
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• pp.32-38
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• 2015

The effect of heat treatment environment on the microstructure and properties of tantalum coating layer manufactured by kinetic spraying was examined. Heat treatments are conducted for one hour at $800^{\circ}C$, $900^{\circ}C$, and $1000^{\circ}C$ in two different environments of vacuum and Ar gas. Evaluation of microstructure and physical properties are conducted. High density ${\alpha}$-tantalum single phase coating layer with a porosity of 0.04% and hardness of 550 Hv can be obtained. As heat treatment temperature increases, porosity identically decreases regardless of heat treatment environment (vacuum and Ar gas). Hardness of heat treated coating layer especially in Ar gas environment deceases from 550 Hv to 490 Hv with increasing heat treatment temperature. That in vacuum environment deceases from 550 Hv to 530 Hv. The boundary between particles became vague as heat treatment temperature increases. Oxygen distribution of tantalum coating layer is minute after heat treatment in vacuum environment than Ar gas environment.

• 공업화학
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• 제30권3호
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• pp.358-364
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• 2019

반사 방지(anti-reflective; AR) 코팅막의 광학 특성 및 내오염성을 향상하기 위하여 tetraethylorthosilicate (TEOS)/염기 및 methyltrimethoxysilane (MTMS)/산 혼성 용액의 혼합비를 변화시키며 다양한 AR 코팅막을 제조하였다. 제조된 AR 코팅막은 UV-Vis, 접촉각 측정기, AFM, FT-IR 및 연필 경도 시험을 통해 특성을 분석하였다. MTMS/산 용액의 함량이 10 wt%인 혼성 용액으로 제조한 AR 코팅막에서 유리 기판은 매우 우수한 광학 특성(97.2%의 투과율), 우수한 내오염성($121^{\circ}$의 물 접촉각 및 $90^{\circ}$의 $CH_2I_2$ 접촉각), 중간 정도의 기계적 강도(4 H의 연필 경도)를 나타내었다. 특히 우수한 내오염성은 기판의 표면 위에서 혼성 용액 내 소량의 MTMS/산 용액으로부터 유래된 메틸기($-CH_3$)의 고른 분산에 기인한 것으로 고려되었다. 연필 경도 시험 결과로부터, AR 코팅막의 기계적 강도는 MTMS/산 용액의 함량이 증가할수록 향상되는 것으로 나타났다.

• 대한전자공학회논문지
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• 제21권6호
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• pp.64-69
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• 1984

Al-MIS(p-Si)태양전지의 최대 효율은 Al 박막을 0.6A/sec 이하의 속도로 증착시켜 80Å인 두께가 되었을 때임을 알았다. ZnS와 SiO로 AR coating을 했는데, 단층 피막일때는 각각 570Å과 690Å인 박막 두께에서 최대 Isc를 나타냈다. 이는 quarter-coating 조건인 n1d1=λ/4를 만족함을 알았다. 이중층 피막일 때는 한 층을 단층 피막때의 최적 두께를 유지하면서 다른 한 층을 조절했다. 이때의 최대 Isc는 단층피막일 때와 비슷한 값이었으나 넓은 범위의 두께에서 그 값이 그대로 유지되었다. 한편 dzns/ds10=1.9/2.3=570/690인 관계를 유지하면서 총 두께를 각각의 단층피막때의 최적 두께 합에 대해서 70∼90%로 얇게 했을 때 앞에서 논의한 어떤 경우보다도 20%이상의 더 높은 Isc를 얻을 수 있었다 따라서 높은 효율을 얻으면서 정밀한 두께 조절이 불필요한 새로운 AR coating방법을 얻었다.

• E2M - 전기 전자와 첨단 소재
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• 제9권5호
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• pp.498-505
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• 1996

In the present work, we have developed the simulator to optimize the process conditions of the AR(antireflection) and HR(high-reflection) coatings for the high power laser diode. The simulator can run on the PC. After making the simple optical model, we establish the Maxwell equations for the model by the operator conversion. By using the Mathematica, we derive a matrix for the multilayer system by applying the equations to the model and optimize the AR and HR coating process conditions by obtaining the reflection rate from the matrix. We also prove the validity of the simulator by comparing the simulation with the characteristics of the laser diode which is AR and HR coated according to the optimized conditions.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 디스플레이 광소자분야
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• pp.206-209
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• 2003

The purpose of AR and HR coating is acquire the very low reflection rate and the high reflection rate through the deposition of a thin film using the refraction ofmaterial. Basically if the high refractive material and the low refractive material are chosen and the condition for the experiment is determined, then we solve theproject with the optical design and multi thin film coating. First of all, we choose $SiO_2$for the low refractive material and $TiO_2$ for the high refractive material and apply Sputtering System easy to control the refraction rate and excellent in reconstruction to the equipment of thin film multiplication. For the control of the refraction rate and growth rate we modify RF Power and the ratio of Gas(Ar:O2), And we use Ellipsometer for estimation and analysis of the refraction rate and growth rate and AFM&SEM for the analysis of surface and component.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.593-596
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• 1999

This paper presents a process optimization of antireflectiun (AR) coating on crystalline Si solar cells. Theoretical and experimental investigations were performed on a doble-layer AR(DLAR) coating of MgF$_2$/CeO$_2$, We investigated CeO$_2$ films as an All layer because they hale a proper refractive index of 2.46 and demonstrate the same lattice constant as Si substrate. RF sputter grown CeO$_2$ film showed strong dependence on a deposition temperature. The CeO$_2$ film deposited at 400 $^{\circ}C$ exhibited a strong (111) preferred orientation and the lowest surface roughness of 6.87 $\AA$. Refractive index of MgF$_2$ film was measured as 1.386 for the most of growth temperature. An optimized DLAR coating showed a reflectance as low as 2.04 % in the wavelengths ranged from 0.4 7m to 1.1 7m. We achieved the efficiencies of solar cells greater than 15% with 3.12 % improvement with DLAR coatings . Further details on MgF$_2$, CeO$_2$ films, and cell fabrication Parameters are presented in this paper.

• 한국태양에너지학회 논문집
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• 제36권5호
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• pp.1-8
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• 2016

In this paper, we evaluated the effect of a silica-based Anti-Reflection(AR) coating for PV modules. The coating technique can be easily applied to large-scale PV modules at room temperature with improvements of the optical properties that is qualified by the optical transmission measurements on the coated cover glass of the modules. The power improvement of the large-scale PV modules shows the increasing about 2.4% at standard condition of the coating technique on average. To improve the AR coating effect of the PV modules, we have characterized the individual PV modules by the measurements of DC power output, modified performance ratio(PRm) and the regression. The results show that the significant improvements of the AR coating effect are 6.4%, 5.5% and 4.5% of increasing of the performances by using the measurements of DC power output, modified performance ratio(PRm) and the regression, respectively.

• 한국태양에너지학회:학술대회논문집
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• 한국태양에너지학회 2012년도 춘계학술발표대회 논문집
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• pp.243-247
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• 2012

The paper focuses on an anti-reflection (AR) coating deposited by PECVD in silicon solar cell fabrication. AR coating is effective to reduce the reflection of the light on the silicon wafer surface and then increase substantially the solar cell conversion efficiency. In this work, we carried out experiments to optimize double AR coating layer with silicon nitride and silicon oxide for the silicon solar cells. The p-type mono crystalline silicon wafers with $156{\times}156mm^2$ area, 0.5-3 ${\Omega}{\cdot}cm$ resistivity, and $200{\mu}m$ thickness were used. All wafers were textured in KOH solution, doped with $POCl_3$ and removed PSG before ARC process. The optimized thickness of each ARC layer was calculated by theoretical equation. For the double layer of AR coating, silicon nitride layer was deposited first using $SiH_4$ and $NH_3$, and then silicon oxide using $SiH_4$ and $N_2O$. As a result, reflectance of $SiO_2/SiN_x$ layer was lower than single $SiN_x$ and then it resulted in increase of short-circuit current and conversion efficiency. It indicates that the double AR coating layer is necessary to obtain the high efficiency solar cell with PECVD already used in commercial line.

• 한국전기전자재료학회논문지
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• 제29권12호
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• pp.814-818
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• 2016

DSSCs (dye-sensitized solar cells) based on $TiO_2/SiO_2$ multi layer AR (anti-reflection) coating on the outer glass FTO (fluorine-doped tin oxide) substrate are investigated. We have coated an AR layer on the surface of a DSSCs device by using an IAD (ion beam-assisted deposition) system and investigated the effects of the AR layer by measuring photovoltaic performance. Compared to the pure FTO substrate, the multi layer AR coating increased the total transmittance from 67.4 to 72.9% at 530 nm of wavelength. The main enhancement of solar conversion efficiency is attributed to the reduction of light reflection at the FTO substrate surface. This leads to the increase of Jsc and the efficiency improvement of DSSCs.

• Transactions on Electrical and Electronic Materials
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• 제1권4호
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• pp.11-15
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• 2000

This paper presents a process optimization of antireflection (AR) coating on crystalline Si solar cells. Theoretical and experimental investigations were performed on a double-layer AR(DLAR) coating of MgFe$_2$/GeO$_2$. We investigated GeO$_2$ films as an AR layer because they have a proper refractive index of 2.46 and demonstrate the same lattice constant as Si substrate. RF sputter grown GeO$_2$ film showed deposition temperature strong dependence. The GeO$_2$ at 400$\^{C}$ exhibited a strong (111) preferred orientation and the lowest surface roughness of 6.87 $\AA$. Refractive index of MgFe$_2$film was measured as 1.386 for the most of growth temperature. An optimized DLAR coating showed a reflectance as low as 2.04% in the wavelengths ranged from 0.4 ㎛ to 1.1 ㎛. Solar cells with a structure of MgFe$_2$/GeO$_2$/Ag/N$\^$+//p-type Si/P$\^$+//Al were investigated with the without DLAR coatings. We achieved the efficiency of solar cells greater than 15% with 3.12% improvement with DLAR coatings. Further details about MgFe$_2$,GeO$_2$ films, and cell fabrication parameters are presented in this paper.